WO2024257916A1 - Method for manufacturing double-sided flexible printed circuit board - Google Patents

Method for manufacturing double-sided flexible printed circuit board Download PDF

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Publication number
WO2024257916A1
WO2024257916A1 PCT/KR2023/008211 KR2023008211W WO2024257916A1 WO 2024257916 A1 WO2024257916 A1 WO 2024257916A1 KR 2023008211 W KR2023008211 W KR 2023008211W WO 2024257916 A1 WO2024257916 A1 WO 2024257916A1
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conductive
flexible printed
circuit board
printed circuit
double
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French (fr)
Korean (ko)
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한병채
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    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K1/00Printed circuits
    • H05K1/02Details
    • H05K1/09Use of materials for the conductive, e.g. metallic pattern
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/40Forming printed elements for providing electric connections to or between printed circuits
    • H05K3/42Plated through-holes or plated via connections

Definitions

  • the present invention relates to a method for manufacturing a double-sided flexible printed circuit board having circuit boards formed on both sides of an insulating film.
  • a flexible printed circuit board is a flexible substrate that forms a circuit pattern on a thin insulating film and can be bent flexibly. It is widely used in cases where bending and flexibility are required when mounting components, such as mobile devices such as smartphones and display devices.
  • FCCL flexible copper clad laminate
  • a copper layer is laminated on a polyimide film layer as a substrate (raw material)
  • the circuit pattern is mainly formed by performing operations such as laminating, exposing, developing, and etching of a dry film on the FCCL.
  • a double-sided FCCL substrate is generally used.
  • the double-sided FCCL substrate is in the form of a copper layer laminated on both sides of a polyimide film layer.
  • Through holes are formed in these double-sided FCCLs, and the inner walls of the through holes are plated using electroless copper plating or other methods to electrically connect the copper layers on both sides, thereby enabling circuit connection on both sides of the flexible printed circuit board.
  • Through holes are usually formed through a drilling process using an NC drill or laser. Precision machining is required to avoid damage to both the film and the copper layer, and the more through holes there are, the longer the process takes and the more costly it becomes.
  • a separate process of plating the inner wall of the through hole must be performed for electrical connection of the inner hole, and this process is performed by first conducting current on both sides of the inside of the through hole using a method such as electroless plating, and then performing electrolytic plating to increase the thickness of the plating layer inside the through hole.
  • the upper and lower surfaces of the FCCL with the copper layer have the total thickness of the sum of the thickness of the existing copper layer, the thickness of the electroless plating layer, and the thickness of the electrolytic plating layer, and the thickness of the inner side wall of the through hole has the total thickness of the sum of the thickness of the electroless plating layer and the thickness of the electrolytic plating layer, so there is a difference in the thickness.
  • a discontinuous connection may occur at the connection portion of the upper and lower surfaces where the copper layer is located and the plating layer on the inner side wall of the through hole, which may cause a defect.
  • the present invention is intended to solve the problems of the conventional double-sided flexible printed circuit board manufacturing method as described above, and provides a method for manufacturing a double-sided flexible printed circuit board capable of forming a circuit connected on both sides in a cheaper and simpler manner than the conventional method.
  • a method for manufacturing a double-sided flexible printed circuit board according to the present invention is characterized by including the steps of: forming a hole in a non-conductive film; covering the non-conductive film in which the hole is formed with a conductive seed material; applying a dry film to each of both surfaces of the non-conductive film covered with the conductive seed material; removing a portion corresponding to a through-hole region and a circuit pattern region to be plated from the dry film; plating the non-conductive film with a conductive material to form a plated through-hole and a circuit pattern; and removing a remaining dry film and a conductive seed material positioned below the remaining dry film.
  • the step of removing the residual dry film and the conductive seed material positioned below the residual dry film is characterized in that the residual dry film and the conductive seed material positioned below the residual dry film are removed through etching.
  • the present invention is characterized in that at least a portion of the conductive material plated by the etching is etched away.
  • the present invention is characterized in that plating of the conductive material is performed taking into consideration the thickness to which the conductive material is to be cut.
  • the present invention is characterized in that removal of a portion corresponding to a through-hole area and a circuit pattern area where plating is to be performed in the dry film is performed in consideration of the width by which the conductive material is to be cut.
  • the step of covering the non-conductive film with a conductive seed material is characterized by covering the non-conductive film with the conductive seed material through dry plating.
  • the step of removing a portion corresponding to the through-hole region and the circuit pattern region is characterized by removing a portion corresponding to the through-hole region and the circuit pattern region from the dry film through exposure and development of the dry film.
  • the step of forming the plated through hole and circuit pattern is characterized by performing plating of the conductive material through electroplating.
  • the conductive seed material is characterized by being one of titanium, nickel, chromium and copper, or an alloy of at least two of titanium, nickel, chromium and copper.
  • the conductive seed material is characterized by being composed of a plurality of layers.
  • the conductive material is copper.
  • the non-conductive film is characterized by being a polyimide film.
  • the method for manufacturing a double-sided flexible printed circuit board according to the present invention covers a non-conductive film having holes formed therein with a conductive material, forms an area to be plated, and then forms plated through holes and a circuit pattern together through a single plating process, thereby omitting a separate hole plating process, thereby having the effect of reducing the time and cost required for manufacturing a double-sided flexible printed circuit board.
  • the method for manufacturing a double-sided flexible printed circuit board according to the present invention has the effect of improving the reliability of the through-hole portion by forming plated through-holes and circuit patterns together through a single plating process, thereby preventing the occurrence of discontinuous connection patterns, etc.
  • the method for manufacturing a double-sided flexible printed circuit board according to the present invention has the effect of enabling a simpler method than the drilling process used in the case of using a double-sided FCCL for forming through holes or achieving high precision by first forming holes only in a non-conductive film.
  • FIG. 1 is a flow chart for explaining a method for manufacturing a double-sided flexible printed circuit board according to one embodiment of the present invention.
  • FIGS. 2 to 7 are exemplary diagrams for explaining a method for manufacturing a double-sided flexible printed circuit board according to one embodiment of the present invention.
  • FIGS. 8 to 10 are exemplary views for explaining a method for manufacturing a multilayer flexible printed circuit board by laminating intermediate products of a double-sided flexible printed circuit board manufactured by a method for manufacturing a double-sided flexible printed circuit board according to one embodiment of the present invention.
  • FIG. 1 is a flow chart for explaining a method for manufacturing a double-sided flexible printed circuit board according to an embodiment of the present invention
  • FIGS. 2 to 7 are exemplary diagrams for explaining a method for manufacturing a double-sided flexible printed circuit board according to an embodiment of the present invention.
  • the method for manufacturing a double-sided flexible printed circuit board according to an embodiment of the present invention will be explained as follows.
  • a method for manufacturing a double-sided flexible printed circuit board first forms a hole (2) in a non-conductive film (1) (S100). That is, as illustrated in FIG. 2, an area where a through hole is to be formed is formed in advance in the non-conductive film (1).
  • the formation of the hole (2) can be performed in various ways, such as processing by drilling or processing by laser, and unlike the processing of double-sided FCCL, since only the non-conductive film (1) is processed, there are fewer restrictions on the processing method compared to the drilling process when using double-sided FCCL, and it can be performed in a simpler process.
  • the non-conductive film (1) may be, for example, a polyimide film, but may also be a film of another insulating material.
  • Fig. 2 (a) is a drawing of a non-conductive film (1) viewed from above
  • Fig. 2 (b) is a drawing in which only the dotted line portion of Fig. 2 (a) is cut out for explanation and a cross-section thereof (a cross-section in the thickness direction of the non-conductive film (1), i.e., a plane perpendicular to the plane of Fig. 2 (a)) is depicted.
  • the manufacturing process will be described based on this cross-section, and the implementation of a conventional circuit pattern in which a circuit pattern viewed from above is connected in a circular or linear manner corresponds to a matter widely known in the technical field of the present invention, and therefore a detailed description thereof will be omitted.
  • a process of covering the film (1) in which the hole (2) is formed with a conductive seed material (3) is performed (S200). At this time, as shown in Fig. 3, the entire exposed area of the film (1), including the inner wall of the through hole, can be covered with the conductive seed material (3).
  • the conductive seed material (3) may be a conductive material such as titanium, nickel, chromium, copper, or an alloy thereof.
  • the conductive seed material (3) may be composed of multiple layers, for example, may be composed of two layers.
  • the lower layer of the conductive seed material (3) may be made of one of titanium, nickel, chromium, and copper, or an alloy thereof, in order to improve bonding strength with the non-conductive film (1) and cleanly remove it in the soft etching process described later.
  • the upper layer of the conductive seed material (3) may use copper or a copper alloy in order to secure bonding strength with the lower layer, facilitate smooth plating of the conductive material (5) described later, and secure adhesion of the dry film (4).
  • the direction facing outward from the non-conductive film (1) is referred to as upward. That is, when explaining with reference to FIGS. 3 and 4, etc., the conductive seed material (3) can be referred to as being located above the non-conductive film (1) and below the dry film (4). Since the upper and lower surfaces can be described symmetrically with reference to the drawings, the same criterion can be applied.
  • the application of the conductive seed material (3) can be performed by a dry plating method, and can be performed by, for example, an E-Beam, Evaporation, CVD, PVD method, etc. However, it is not limited thereto, and various methods capable of plating the conductive material on the insulating film can be used.
  • a dry film (4) is applied to both sides of the film (1) covered with the conductive seed material (3) (S300). That is, as shown in Fig. 4, laminating or the like is performed so that the dry film (4) is attached to both sides of the film (1) covered with the conductive seed material (3).
  • the dry film corresponding to the areas (6, 7) where plating is to be performed can be removed, as shown in Fig. 5.
  • the pattern of the dry film (4) to be removed can be determined by considering the width of the circuit pattern to be cut (reduced) in the etching (soft etching) process described later. That is, the width of the pattern of the dry film (4) to be removed can be determined by adding the width reduced in the soft etching process to the width of the circuit pattern to be manufactured.
  • step (S400) copper plating is performed to form a circuit pattern and through-hole plating is performed (S500).
  • plating can be performed by electroplating (electroplating) to perform the circuit pattern and through-hole plating at the same time.
  • a circuit pattern (5) with both sides electrically connected is formed on both sides of the film (1) (on the conductive seed material (3)). That is, according to the present invention, even without performing a separate plating process to plate through holes for connecting the circuit patterns on both sides of the film (1), plating of through holes can be performed simultaneously with the formation of the circuit pattern.
  • conductive seed material (3) may also be applied to the side of the film (1), so that copper may also be plated on that part.
  • an external processing process such as an altar exists during the actual product manufacturing process, it does not affect the actual product.
  • copper is described as being plated, but if necessary, a conductive material other than copper may be plated to form a circuit pattern (5).
  • the residual dry film (4) remaining on the conductive seed material (3) and the conductive seed material (3) underneath the residual dry film (4) are removed (S600).
  • the residual dry film (4) can be removed using an alkaline chemical agent, etc.
  • the conductive seed material (3) located below the residual dry film (4) is also removed.
  • This can be achieved by selecting a chemical agent for etching (soft etching) in consideration of the properties of the conductive seed material (3), etc.
  • a chemical agent for etching soft etching
  • an acid chemical agent can be used.
  • a part of the surface of the circuit pattern (5) may be shaved off, and by performing the plating of the step (S500) (by controlling the time of electroplating, etc.) in consideration of the thickness of the circuit pattern (5) shaved off in this manner, a circuit pattern (5) having a thickness of a desired specification can be formed.
  • the thickness of the conductive layer formed on the non-conductive film (1) is the sum of the thickness of the circuit pattern (5) from which a part is shaved off and the thickness of the conductive seed material (3), so that a conductive layer having a desired specification can be formed in consideration of this.
  • the reduction in the width of the circuit pattern (5) can be reflected by changing the width of the pattern of the dry film (4).
  • a circuit pattern (5) is formed on both sides of an insulating film (1), and a double-sided flexible printed circuit board intermediate product in the form of a plated through-hole for electrical connection of the circuit pattern (5) formed on both sides can be obtained.
  • the thickness of the circuit pattern (5) formed on both sides and the thickness of the side wall of the through-hole are the same because they are plating layers formed in one process, and they are integrally formed so that no problems occur at the connection part.
  • the product can be completed through processes such as terminal plating and external processing, and components can be mounted as needed.
  • This process can be the same as the manufacturing method of a typical flexible printed circuit board.
  • FIGS. 8 to 10 are exemplary views for explaining a method for manufacturing a multilayer flexible printed circuit board by laminating intermediate products of a double-sided flexible printed circuit board manufactured by a method for manufacturing a double-sided flexible printed circuit board according to one embodiment of the present invention.
  • the intermediate product of the double-sided flexible printed circuit board can be laminated with a non-conductive layer (9) therebetween.
  • the non-conductive layer (9) can be a polyimide film, and in this case, the intermediate product of the double-sided flexible printed circuit board can be attached to the non-conductive layer (9) by utilizing an adhesive material (8).
  • the non-conductive layer can be formed by utilizing the non-conductive adhesive itself.
  • a hole (10) may be formed to perform a multi-layer connection, and plating of the inner wall of the hole (10) may be performed.
  • this process can be used as is in a method used in manufacturing a double-sided printed circuit board using a conventional double-sided FCCL substrate, a detailed description thereof will be omitted.
  • cross-section + double-sided + cross-section is also possible, and various other deformations such as cross-section + double-sided + double-sided + cross-section are also possible.
  • the product can be completed through processes such as terminal plating and external processing, and components can be mounted as needed.
  • This process can be the same as the manufacturing method of a typical flexible printed circuit board.
  • the present invention can be performed in a flexible printed circuit board manufacturing facility configured to perform each process such as hole processing, dry plating, laminating, exposure, development, etching, electroplating, and attachment, and a control device of such manufacturing facility can control the operation of each process.
  • a control device of such manufacturing facility can control the operation of each process.
  • Such manufacturing facility can additionally be equipped with a robot arm, a transfer belt, etc. for transferring a product between each process, and various other equipment can be added in addition.
  • the control device can include a computer-readable storage medium that stores commands for controlling the manufacturing facility to perform each process, and such storage medium can be coupled with a processor and configured to cause the processor to perform each step of the present invention.

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  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Manufacturing & Machinery (AREA)
  • Printing Elements For Providing Electric Connections Between Printed Circuits (AREA)

Abstract

The present invention relates to a method for manufacturing a double-sided flexible printed circuit board, the method comprising the steps of: forming a hole in a non-conductive film; covering the non-conductive film having the hole with a conductive seed material; applying dry films to both sides of the non-conductive film covered with the conductive seed material; removing portions of the dry films corresponding to a through hole area and a circuit pattern area that are to be plated; forming a plated through hole and circuit pattern by plating the non-conductive film with a conductive material; and removing the remaining dry films and the conductive seed material under the remaining dry films.

Description

양면 연성인쇄회로기판 제조 방법Method for manufacturing double-sided flexible printed circuit board

본 발명은 절연성 필름의 양면에 회로기판이 형성된 양면 연성인쇄회로기판의 제조 방법에 관한 것이다.The present invention relates to a method for manufacturing a double-sided flexible printed circuit board having circuit boards formed on both sides of an insulating film.

연성인쇄회로기판(FPCB; Flexible Printed Circuit Board)은 얇은 절연 필름에 회로패턴을 형성하여 유연하게 구부러질 수 있는 기판으로, 부품의 장착시 굴곡 및 유연성이 요구되는 경우, 예를 들어 스마트폰과 같은 모바일기기나 디스플레이 장치 등에 많이 사용되고 있다.A flexible printed circuit board (FPCB) is a flexible substrate that forms a circuit pattern on a thin insulating film and can be bent flexibly. It is widely used in cases where bending and flexibility are required when mounting components, such as mobile devices such as smartphones and display devices.

이러한 연성인쇄회로기판은 일반적으로 폴리이미드 필름층 위에 동박층이 적층된 동박적층필름(FCCL; Flexible Copper Clad Laminate)을 기재(원자재)로 이용하여 제작되며, 동박적층필름에 드라이 필름의 라미네이팅, 노광, 현상, 에칭 등의 작업을 수행하여 회로패턴을 형성하는 방식을 주로 사용하고 있다.These flexible printed circuit boards are generally manufactured using a flexible copper clad laminate (FCCL) in which a copper layer is laminated on a polyimide film layer as a substrate (raw material), and the circuit pattern is mainly formed by performing operations such as laminating, exposing, developing, and etching of a dry film on the FCCL.

한편 연성인쇄회로기판의 양면에 회로연결을 수행하기 위해 양면 연성인쇄회로기판을 제조하는 경우, 일반적으로 양면 FCCL 기재를 사용하는데, 양면 FCCL 기재는 폴리이미드 필름층의 양면에 동박층이 적층된 형태이다.Meanwhile, when manufacturing a double-sided flexible printed circuit board to perform circuit connections on both sides of the flexible printed circuit board, a double-sided FCCL substrate is generally used. The double-sided FCCL substrate is in the form of a copper layer laminated on both sides of a polyimide film layer.

이러한 양면 FCCL에 관통홀(쓰루(through) 홀, 비아(via) 홀)을 형성하고, 무전해 동 도금 등의 방식으로 관통홀의 내벽을 도금하여 양면의 동박층을 전기적으로 연결시켜 연성인쇄회로기판의 양면의 회로 연결이 가능하게 한다.Through holes (via holes) are formed in these double-sided FCCLs, and the inner walls of the through holes are plated using electroless copper plating or other methods to electrically connect the copper layers on both sides, thereby enabling circuit connection on both sides of the flexible printed circuit board.

관통홀은 보통 NC 드릴 또는 레이저를 사용한 드릴링 과정을 통해 형성되는데, 필름과 동박층 모두에 손상이 발생하지 않아야 하므로 정밀한 가공이 요구되며, 관통홀이 많을수록 공정에 소요되는 시간과 비용이 늘어나게 된다.Through holes are usually formed through a drilling process using an NC drill or laser. Precision machining is required to avoid damage to both the film and the copper layer, and the more through holes there are, the longer the process takes and the more costly it becomes.

또한 내부홀의 전기적 연결을 위해 관통홀의 내벽을 도금하는 과정을 별도로 수행하여야 하며, 이 공정은 우선 무전해 도금 등의 방법으로 관통홀 내부를 양면 통전을 시키고 이어 관통홀 내부의 도금층 두께를 증가시키기 위한 전해 도금을 실시하는 방식으로 수행된다.In addition, a separate process of plating the inner wall of the through hole must be performed for electrical connection of the inner hole, and this process is performed by first conducting current on both sides of the inside of the through hole using a method such as electroless plating, and then performing electrolytic plating to increase the thickness of the plating layer inside the through hole.

그런데, 전체 구리의 두께를 살펴볼 때, FCCL의 동박층이 있는 상하면은 기존 동박층의 두께와 무전해 도금층의 두께와 전해 도금층의 두께의 합이 전체 두께로 나타나고, 관통홀 내부 측벽의 두께는 무전해 도금층의 두께와 전해 도금층의 두께의 합이 전체 두께로 나타나므로, 그 두께에 차이가 발생한다.However, when looking at the overall thickness of copper, the upper and lower surfaces of the FCCL with the copper layer have the total thickness of the sum of the thickness of the existing copper layer, the thickness of the electroless plating layer, and the thickness of the electrolytic plating layer, and the thickness of the inner side wall of the through hole has the total thickness of the sum of the thickness of the electroless plating layer and the thickness of the electrolytic plating layer, so there is a difference in the thickness.

또한 이러한 각 측의 형성 과정 및 그 두께의 차이에 의해 동박층이 있는 상하면과 관통홀 내부 측벽의 도금층의 연결 부분에 불연속 연결부가 생길 수 있고 이는 불량의 원인이 될 수 있다.In addition, due to the formation process of each side and the difference in thickness, a discontinuous connection may occur at the connection portion of the upper and lower surfaces where the copper layer is located and the plating layer on the inner side wall of the through hole, which may cause a defect.

이와 같이 기존의 공정은 전기적으로 연결되는 관통홀을 형성하기 위해 여러 과정을 거치므로 높은 공정 비용이 발생하고 관리요소가 추가로 필요하므로 제조 비용이 상승할 수밖에 없으며, 또한 양면 FCCL의 가격이 상대적으로 고가라는 문제점이 있다. 이상의 설명은 각 제조사 별로 다양한 공정방법이 있으며 다소간의 차이는 있을 수 있다.In this way, the existing process has several steps to form electrically connected through holes, so it incurs high process costs and requires additional management elements, which inevitably increases manufacturing costs. In addition, there is a problem that the price of double-sided FCCL is relatively high. The above explanation is that each manufacturer has various process methods and there may be some differences.

이에 제조 원가의 절감 방안에 대한 여러가지 다양한 방법의 연구 개발이 진행되고 있으나, 동박층의 손상, 신뢰성에 대한 문제점 발생, 전체 공정에 소요되는 시간이나 원가가 오히려 증가하는 등의 문제점이 있어 산업 현장에서 많이 사용되고 있지는 않은 실정이다.Accordingly, research and development of various methods for reducing manufacturing costs are being conducted, but they are not widely used in industrial settings due to problems such as damage to the copper layer, reliability issues, and increases in the time and cost required for the entire process.

한편 본 발명의 배경기술은 대한민국 공개특허 10-2018-0016323호(2018.02.14)에 개시되어 있다. Meanwhile, the background technology of the present invention is disclosed in Korean Patent Publication No. 10-2018-0016323 (February 14, 2018).

본 발명은 상기와 같은 종래 양면 연성인쇄회로기판 제조 방법의 문제점을 해결하기 위한 것으로, 종래 방법 대비 저렴하고 간단한 방법으로 양면이 연결된 회로 형성이 가능한 양면 연성인쇄회로기판을 제조할 수 있도록 하는 방법을 제공하는데 그 목적이 있다.The present invention is intended to solve the problems of the conventional double-sided flexible printed circuit board manufacturing method as described above, and provides a method for manufacturing a double-sided flexible printed circuit board capable of forming a circuit connected on both sides in a cheaper and simpler manner than the conventional method.

본 발명에 따른 양면 연성인쇄회로기판 제조 방법은 비전도성 필름에 홀을 형성하는 단계; 상기 홀이 형성된 상기 비전도성 필름을 전도성 시드 물질로 덮는 단계; 상기 전도성 시드 물질로 덮인 상기 비전도성 필름의 양면에 각각 드라이 필름을 도포하는 단계; 상기 드라이 필름에서 도금이 수행될 쓰루 홀 영역 및 회로패턴 영역에 대응하는 부분을 제거하는 단계; 상기 비전도성 필름에 전도성 물질의 도금을 수행하여 도금된 쓰루 홀 및 회로패턴을 형성하는 단계; 및 잔여 드라이 필름 및 상기 잔여 드라이 필름의 아래쪽으로 위치한 전도성 시드 물질을 제거하는 단계를 포함하는 것을 특징으로 한다.A method for manufacturing a double-sided flexible printed circuit board according to the present invention is characterized by including the steps of: forming a hole in a non-conductive film; covering the non-conductive film in which the hole is formed with a conductive seed material; applying a dry film to each of both surfaces of the non-conductive film covered with the conductive seed material; removing a portion corresponding to a through-hole region and a circuit pattern region to be plated from the dry film; plating the non-conductive film with a conductive material to form a plated through-hole and a circuit pattern; and removing a remaining dry film and a conductive seed material positioned below the remaining dry film.

본 발명에서 상기 잔여 드라이 필름 및 상기 잔여 드라이 필름의 아래쪽으로 위치한 전도성 시드 물질을 제거하는 단계는, 에칭을 통해 상기 잔여 드라이 필름 및 상기 잔여 드라이 필름의 아래쪽으로 위치한 전도성 시드 물질을 제거하는 것을 특징으로 한다.In the present invention, the step of removing the residual dry film and the conductive seed material positioned below the residual dry film is characterized in that the residual dry film and the conductive seed material positioned below the residual dry film are removed through etching.

본 발명에서 상기 에칭에 의해 도금된 상기 전도성 물질의 적어도 일부가 깎이는 것을 특징으로 한다.The present invention is characterized in that at least a portion of the conductive material plated by the etching is etched away.

본 발명에서 상기 전도성 물질이 깎이게 될 두께를 고려하여 상기 전도성 물질의 도금이 수행되는 것을 특징으로 한다.The present invention is characterized in that plating of the conductive material is performed taking into consideration the thickness to which the conductive material is to be cut.

본 발명에서 상기 전도성 물질이 깎이게 될 폭을 고려하여 상기 드라이 필름에서 도금이 수행될 쓰루 홀 영역 및 회로패턴 영역에 대응하는 부분의 제거가 수행되는 것을 특징으로 한다.In the present invention, it is characterized in that removal of a portion corresponding to a through-hole area and a circuit pattern area where plating is to be performed in the dry film is performed in consideration of the width by which the conductive material is to be cut.

본 발명에서 상기 비전도성 필름을 전도성 시드 물질로 덮는 단계는, 건식도금을 통해 상기 비전도성 필름을 상기 전도성 시드 물질로 덮는 것을 특징으로 한다.In the present invention, the step of covering the non-conductive film with a conductive seed material is characterized by covering the non-conductive film with the conductive seed material through dry plating.

본 발명에서 상기 쓰루 홀 영역 및 회로패턴 영역에 대응하는 부분을 제거하는 단계는, 상기 드라이 필름에 대한 노광 및 현상을 통해 상기 드라이 필름에서 상기 쓰루 홀 영역 및 회로패턴 영역에 대응하는 부분을 제거하는 것을 특징으로 한다.In the present invention, the step of removing a portion corresponding to the through-hole region and the circuit pattern region is characterized by removing a portion corresponding to the through-hole region and the circuit pattern region from the dry film through exposure and development of the dry film.

본 발명에서 상기 도금된 쓰루 홀 및 회로패턴을 형성하는 단계는, 전기도금을 통해 상기 전도성 물질의 도금을 수행하는 것을 특징으로 한다.In the present invention, the step of forming the plated through hole and circuit pattern is characterized by performing plating of the conductive material through electroplating.

본 발명에서 상기 전도성 시드 물질은, 티타늄, 니켈, 크롬 및 구리 중 하나이거나, 티타늄, 니켈, 크롬 및 구리 중 적어도 둘 이상의 합금인 것을 특징으로 한다.In the present invention, the conductive seed material is characterized by being one of titanium, nickel, chromium and copper, or an alloy of at least two of titanium, nickel, chromium and copper.

본 발명에서 상기 전도성 시드 물질은, 복수의 층으로 구성되는 것을 특징으로 한다.In the present invention, the conductive seed material is characterized by being composed of a plurality of layers.

본 발명에서 상기 전도성 물질은 구리인 것을 특징으로 한다.In the present invention, it is characterized in that the conductive material is copper.

본 발명에서 상기 비전도성 필름은 폴리이미드 필름인 것을 특징으로 한다.In the present invention, the non-conductive film is characterized by being a polyimide film.

본 발명에 따른 양면 연성인쇄회로기판 제조 방법은 홀이 형성된 비전도성 필름을 전도성 물질로 덮고 도금될 영역을 형성한 후, 한번의 도금을 통해 도금된 쓰루 홀 및 회로패턴을 같이 형성함으로써, 별도의 홀 도금 과정을 생략할 수 있으므로 양면 연성인쇄회로기판의 제조에 소요되는 시간과 비용을 절감할 수 있도록 하는 효과가 있다.The method for manufacturing a double-sided flexible printed circuit board according to the present invention covers a non-conductive film having holes formed therein with a conductive material, forms an area to be plated, and then forms plated through holes and a circuit pattern together through a single plating process, thereby omitting a separate hole plating process, thereby having the effect of reducing the time and cost required for manufacturing a double-sided flexible printed circuit board.

본 발명에 따른 양면 연성인쇄회로기판 제조 방법은 한번의 도금을 통해 도금된 쓰루 홀 및 회로패턴을 같이 형성함으로써 불연속 연결 형태 등이 발생하지 않아 쓰루 홀 부분의 신뢰성을 향상시켜 줄 수 있도록 하는 효과가 있다.The method for manufacturing a double-sided flexible printed circuit board according to the present invention has the effect of improving the reliability of the through-hole portion by forming plated through-holes and circuit patterns together through a single plating process, thereby preventing the occurrence of discontinuous connection patterns, etc.

본 발명에 따른 양면 연성인쇄회로기판 제조 방법은 비전도성 필름에만 먼저 홀을 형성함으로써, 쓰루 홀 형성에 있어 양면 FCCL를 사용하는 경우의 드릴링 공정보다 간단한 방식을 사용할 수 있거나 높은 정밀도를 달성할 수 있도록 하는 효과가 있다.The method for manufacturing a double-sided flexible printed circuit board according to the present invention has the effect of enabling a simpler method than the drilling process used in the case of using a double-sided FCCL for forming through holes or achieving high precision by first forming holes only in a non-conductive film.

도 1은 본 발명의 일 실시예에 따른 양면 연성인쇄회로기판 제조 방법을 설명하기 위한 흐름도이다.FIG. 1 is a flow chart for explaining a method for manufacturing a double-sided flexible printed circuit board according to one embodiment of the present invention.

도 2 내지 도 7은 본 발명의 일 실시예에 따른 양면 연성인쇄회로기판 제조 방법을 설명하기 위한 예시도이다.FIGS. 2 to 7 are exemplary diagrams for explaining a method for manufacturing a double-sided flexible printed circuit board according to one embodiment of the present invention.

도 8 내지 도 10은 본 발명의 일 실시예에 따른 양면 연성인쇄회로기판 제조 방법으로 제조된 양면 연성인쇄회로기판의 중간 제품을 적층하여 다층 연성인쇄회로기판을 제조하는 방법을 설명하기 위한 예시도이다.FIGS. 8 to 10 are exemplary views for explaining a method for manufacturing a multilayer flexible printed circuit board by laminating intermediate products of a double-sided flexible printed circuit board manufactured by a method for manufacturing a double-sided flexible printed circuit board according to one embodiment of the present invention.

이하, 첨부된 도면을 참조하여 본 발명에 따른 양면 연성인쇄회로기판 제조 방법의 일 실시예를 설명한다. 이 과정에서 도면에 도시된 선들의 두께나 구성요소의 크기 등은 설명의 명료성과 편의상 과장되게 또는 생략하여 도시되어 있을 수 있다. 또한, 후술되는 용어들은 본 발명에서의 기능을 고려하여 정의된 용어들로서 이는 사용자, 운용자의 의도 또는 관례에 따라 달라질 수 있다. 그러므로, 이러한 용어들에 대한 정의는 본 명세서 전반에 걸친 내용을 토대로 내려져야 할 것이다.Hereinafter, with reference to the attached drawings, one embodiment of a method for manufacturing a double-sided flexible printed circuit board according to the present invention will be described. In this process, the thickness of lines or the size of components illustrated in the drawings may be exaggerated or omitted for the sake of clarity and convenience of explanation. In addition, the terms described below are terms defined in consideration of their functions in the present invention, and may vary depending on the intention or custom of the user or operator. Therefore, the definitions of these terms should be made based on the contents throughout this specification.

도 1은 본 발명의 일 실시예에 따른 양면 연성인쇄회로기판 제조 방법을 설명하기 위한 흐름도이고, 도 2 내지 도 7은 본 발명의 일 실시예에 따른 양면 연성인쇄회로기판 제조 방법을 설명하기 위한 예시도로서, 이를 참조하여 본 발명의 일 실시예에 따른 양면 연성인쇄회로기판 제조 방법을 설명하면 다음과 같다.FIG. 1 is a flow chart for explaining a method for manufacturing a double-sided flexible printed circuit board according to an embodiment of the present invention, and FIGS. 2 to 7 are exemplary diagrams for explaining a method for manufacturing a double-sided flexible printed circuit board according to an embodiment of the present invention. With reference to these, the method for manufacturing a double-sided flexible printed circuit board according to an embodiment of the present invention will be explained as follows.

도 1에 도시된 것과 같이, 본 발명의 일 실시예에 따른 양면 연성인쇄회로기판 제조 방법은 먼저 비전도성 필름(1)에 홀(hole)(2)을 형성한다(S100). 즉, 도 2에 도시된 것과 같이, 쓰루 홀이 형성될 영역을 비전도성 필름(1)에 미리 형성한다.As illustrated in FIG. 1, a method for manufacturing a double-sided flexible printed circuit board according to one embodiment of the present invention first forms a hole (2) in a non-conductive film (1) (S100). That is, as illustrated in FIG. 2, an area where a through hole is to be formed is formed in advance in the non-conductive film (1).

이때 홀(2)의 형성은 드릴링에 의한 가공, 레이저에 의한 가공 등 다양한 방식으로 수행될 수 있으며, 양면 FCCL의 가공과 달리 비전도성 필름(1)만을 가공하는 것이므로, 양면 FCCL를 사용하는 경우의 드릴링 공정에 비해 가공 방식에 제약이 적으며 보다 간단한 과정으로 수행될 수 있다.At this time, the formation of the hole (2) can be performed in various ways, such as processing by drilling or processing by laser, and unlike the processing of double-sided FCCL, since only the non-conductive film (1) is processed, there are fewer restrictions on the processing method compared to the drilling process when using double-sided FCCL, and it can be performed in a simpler process.

한편, 홀에 제품이 실장되는지 여부, 홀이 완성된 제품(기판)의 외부에 노출되는지 여부 등에 따라 쓰루 홀, 비아 홀, blind 홀, buried 홀 등의 다양한 표현이 사용되나 용도의 차이를 제외하면 동등한 형상을 가지는 것이므로, 본 발명에서는 쓰루 홀로 통칭하기로 한다.Meanwhile, various expressions such as through hole, via hole, blind hole, and buried hole are used depending on whether the product is mounted in the hole or whether the hole is exposed to the outside of the finished product (board), but since they have the same shape except for the difference in use, they are collectively referred to as through holes in the present invention.

여기서 비전도성 필름(1)은 예를 들어, 폴리이미드 필름(polyimide film)일 수 있으나, 다른 절연 재질의 필름일 수도 있다.Here, the non-conductive film (1) may be, for example, a polyimide film, but may also be a film of another insulating material.

도 2의 (a)는 비전도성 필름(1)을 위에서 내려다본 도면이고, 도 2 (b)는 설명을 위해 도 2의 (a)의 점선 부분만을 잘라내어 그 단면(비전도성 필름(1)의 두께 방향의 단면, 즉, 도 2의 (a)의 평면과 수직인 평면)을 형상화한 것으로, 후술하는 도면에서는 이러한 단면을 기준으로 제조 과정을 설명하기로 하며, 위에서 내려다본 회로패턴이 원형, 선형 등으로 이어져 있는 통상적인 회로패턴의 구현은 본 발명의 기술분야에서 널리 알려진 내용에 해당하므로, 자세한 설명은 생략하기로 한다.Fig. 2 (a) is a drawing of a non-conductive film (1) viewed from above, and Fig. 2 (b) is a drawing in which only the dotted line portion of Fig. 2 (a) is cut out for explanation and a cross-section thereof (a cross-section in the thickness direction of the non-conductive film (1), i.e., a plane perpendicular to the plane of Fig. 2 (a)) is depicted. In the drawings described below, the manufacturing process will be described based on this cross-section, and the implementation of a conventional circuit pattern in which a circuit pattern viewed from above is connected in a circular or linear manner corresponds to a matter widely known in the technical field of the present invention, and therefore a detailed description thereof will be omitted.

또한 본 실시예에서는 홀(2)을 하나만 도시하였으나, 필요에 따라 복수의 홀을 형성할 수 있을 것이다.In addition, in this embodiment, only one hole (2) is shown, but multiple holes may be formed as needed.

이어서, 홀(2)이 형성된 필름(1)을 전도성 시드 물질(3)로 덮는 처리를 수행한다(S200). 이때 도 3에 도시된 것과 같이, 쓰루 홀의 내벽을 포함한 필름(1)의 노출된 전체 영역이 전도성 시드 물질(3)로 덮일 수 있다.Next, a process of covering the film (1) in which the hole (2) is formed with a conductive seed material (3) is performed (S200). At this time, as shown in Fig. 3, the entire exposed area of the film (1), including the inner wall of the through hole, can be covered with the conductive seed material (3).

이때 전도성 시드 물질(3)은 티타늄, 니켈, 크롬, 구리 등의 전도성 물질이거나 이들의 합금일 수 있다.At this time, the conductive seed material (3) may be a conductive material such as titanium, nickel, chromium, copper, or an alloy thereof.

또한 전도성 시드 물질(3)은 복수의 층으로 구성될 수도 있으며, 예를 들어 2개의 층으로 구성될 수 있다. 이때 전도성 시드 물질(3)의 하층부는 비전도성 필름(1)과의 결합력의 향상, 후술할 소프트 에칭 과정에서의 깨끗한 제거를 위해 티타늄, 니켈, 크롬, 구리 중 하나이거나 이들의 합금일 수 있다. 또한 전도성 시드 물질(3)의 상층부는 하층부와의 결합력 확보, 후술할 전도성 물질(5)의 원활한 도금 도모, 드라이 필름(4)의 접착력 확보를 위해 구리 또는 구리합금이 사용될 수 있다.In addition, the conductive seed material (3) may be composed of multiple layers, for example, may be composed of two layers. At this time, the lower layer of the conductive seed material (3) may be made of one of titanium, nickel, chromium, and copper, or an alloy thereof, in order to improve bonding strength with the non-conductive film (1) and cleanly remove it in the soft etching process described later. In addition, the upper layer of the conductive seed material (3) may use copper or a copper alloy in order to secure bonding strength with the lower layer, facilitate smooth plating of the conductive material (5) described later, and secure adhesion of the dry film (4).

한편, 본 발명에서는 설명의 편의를 위해 비전도성 필름(1)을 기준으로 그 바깥쪽으로 향하는 방향을 위쪽으로 지칭하기로 한다. 즉, 도 3, 4 등을 기준으로 설명할 때, 전도성 시드 물질(3)은 비전도성 필름(1)의 위쪽에 그리고 드라이 필름(4)의 아래쪽 위치한 것으로 지칭될 수 있다. 도면을 기준으로 위쪽의 면과 아래쪽의 면은 대칭적으로 설명될 수 있으므로 같은 기준이 적용될 수 있을 것이다.Meanwhile, in the present invention, for the convenience of explanation, the direction facing outward from the non-conductive film (1) is referred to as upward. That is, when explaining with reference to FIGS. 3 and 4, etc., the conductive seed material (3) can be referred to as being located above the non-conductive film (1) and below the dry film (4). Since the upper and lower surfaces can be described symmetrically with reference to the drawings, the same criterion can be applied.

여기서 전도성 시드 물질(3)의 도포는 건식도금의 방식으로 수행될 수 있으며, 예를 들어, E-Beam, Evaporation, CVD, PVD 방식 등으로 수행될 수 있다. 다만 이에 한정되는 것은 아니므로, 전도성 물질을 절연성 필름에 도금할 수 있는 다양한 방식이 사용될 수 있을 것이다.Here, the application of the conductive seed material (3) can be performed by a dry plating method, and can be performed by, for example, an E-Beam, Evaporation, CVD, PVD method, etc. However, it is not limited thereto, and various methods capable of plating the conductive material on the insulating film can be used.

상기 단계(S200) 이후, 전도성 시드 물질(3)로 덮인 필름(1)의 양면에 드라이 필름(4)을 도포한다(S300). 즉, 도 4에 도시된 것과 같이, 라미네이팅 등을 수행하여 전도성 시드 물질(3)로 덮인 필름(1)의 양면에 드라이 필름(4)이 부착되도록 한다.After the above step (S200), a dry film (4) is applied to both sides of the film (1) covered with the conductive seed material (3) (S300). That is, as shown in Fig. 4, laminating or the like is performed so that the dry film (4) is attached to both sides of the film (1) covered with the conductive seed material (3).

이어서 노광 및 현상을 수행하여 도금이 수행될 회로패턴 영역(7) 및 쓰루 홀 영역(6)에 대응하는 드라이 필름(4)을 제거한다(S400).Next, exposure and development are performed to remove the dry film (4) corresponding to the circuit pattern area (7) and the through-hole area (6) where plating is to be performed (S400).

예를 들어, 노광을 통해 도금이 수행될 필요가 없는 영역에만 빛을 조사하여 폴리머로 반응시키고, 화학 약품 등을 활용한 현상을 통해 빛을 받지 않은 영역만을 제거함으로써, 도 5에 도시된 것과 같이, 도금이 수행될 영역(6, 7)에 대응하는 드라이 필름이 제거되도록 할 수 있다.For example, by irradiating light only to areas where plating does not need to be performed through exposure to cause a polymer reaction, and removing only the areas that were not exposed to light through development using chemicals, etc., the dry film corresponding to the areas (6, 7) where plating is to be performed can be removed, as shown in Fig. 5.

이때 후술할 에칭(소프트 에칭) 과정에서의 깎이는(축소되는) 회로패턴의 폭을 고려하여 제거되는 드라이 필름(4)의 패턴이 결정될 수 있다. 즉, 제조하기 원하는 회로패턴의 폭에 소프트 에칭 과정에서 축소되는 폭을 더한 값으로 제거되는 드라이 필름(4)의 패턴의 폭을 결정할 수 있다.At this time, the pattern of the dry film (4) to be removed can be determined by considering the width of the circuit pattern to be cut (reduced) in the etching (soft etching) process described later. That is, the width of the pattern of the dry film (4) to be removed can be determined by adding the width reduced in the soft etching process to the width of the circuit pattern to be manufactured.

한편, 상기 단계(S300, S400)의 라미네이팅, 노광, 현상 과정에서 부가적인 공정(스크러빙, 세척, 건조 등)이 더 수행될 수 있으며, 라미네이팅, 노광, 현상 등의 공정은 본 발명의 기술분야에서 널리 알려진 기술에 해당하므로, 각 공정을 수행하는 구체적인 내용에 대해서는 생략하기로 한다.Meanwhile, additional processes (scrubbing, washing, drying, etc.) may be further performed during the laminating, exposure, and developing processes of the above steps (S300, S400), and since the processes of laminating, exposure, and development correspond to technologies widely known in the technical field of the present invention, specific details of performing each process will be omitted.

상기 단계(S400) 이후, 동 도금을 수행하여 회로패턴 형성 및 쓰루 홀 도금을 수행한다(S500). 도 5에 도시된 것과 같이, 도금이 수행될 부분에는 전도성 시드 물질(3)이 노출되어 있으므로, 전기도금(전해도금)의 방식으로 도금을 수행하여 회로패턴 및 쓰루 홀 도금을 한번에 수행할 수 있다.After the above step (S400), copper plating is performed to form a circuit pattern and through-hole plating is performed (S500). As illustrated in Fig. 5, since the conductive seed material (3) is exposed in the area where plating is to be performed, plating can be performed by electroplating (electroplating) to perform the circuit pattern and through-hole plating at the same time.

이를 통해, 도 6에 도시된 것과 같이, 양면이 전기적으로 연결된 회로패턴(5)이 필름(1)의 양면에(전도성 시드 물질(3) 위에) 형성된다. 즉, 본 발명에 의할 때에는 필름(1)의 양면의 회로패턴을 연결하기 위한 쓰루 홀을 도금하기 위해 별도의 도금 공정을 수행하지 않더라도 회로패턴의 형성과 함께 쓰루 홀의 도금이 같이 수행될 수 있다.Through this, as illustrated in Fig. 6, a circuit pattern (5) with both sides electrically connected is formed on both sides of the film (1) (on the conductive seed material (3)). That is, according to the present invention, even without performing a separate plating process to plate through holes for connecting the circuit patterns on both sides of the film (1), plating of through holes can be performed simultaneously with the formation of the circuit pattern.

도 6에 도시되지는 않았으나, 필름(1)의 측면에도 전도성 시드 물질(3)이 도포되어 있을 수 있으므로, 해당 부분에도 구리가 도금될 수 있다. 다만, 실제 제품 생산 과정에서 제단 등의 외형 가공 과정이 존재하므로, 실제 제품에는 영향을 주지 않는다.Although not shown in Fig. 6, conductive seed material (3) may also be applied to the side of the film (1), so that copper may also be plated on that part. However, since an external processing process such as an altar exists during the actual product manufacturing process, it does not affect the actual product.

한편 본 실시예에서는 구리를 도금하는 것으로 설명하였으나, 필요에 따라 구리가 아닌 다른 전도성 물질이 도금되어 회로패턴(5)이 형성될 수도 있다.Meanwhile, in this embodiment, copper is described as being plated, but if necessary, a conductive material other than copper may be plated to form a circuit pattern (5).

이어서, 전도성 시드 물질(3) 위에 남아 있는 잔여 드라이 필름(4)과, 잔여 드라이 필름(4) 아래쪽의 전도성 시드 물질(3)을 제거한다(S600). 예를 들어, 알칼리계 화학 약품 등을 통하여 잔여 드라이 필름(4)을 제거할 수 있다.Next, the residual dry film (4) remaining on the conductive seed material (3) and the conductive seed material (3) underneath the residual dry film (4) are removed (S600). For example, the residual dry film (4) can be removed using an alkaline chemical agent, etc.

이어서 잔여 드라이 필름(4)에 더해 잔여 드라이 필름(4)의 아래쪽에 위치한 전도성 시드 물질(3)도 제거 한다. 이는 전도성 시드 물질(3)의 물성 등을 고려하여 에칭(소프트 에칭)을 위한 화약 약품을 선정하는 방식 등으로 달성될 수 있다. 예를 들어 산계 약품이 사용될 수 있다. 이러한 과정에서 회로패턴(5)의 표면 일부가 깎이게 될 수 있으며, 이렇게 깎이는 회로패턴(5)의 두께를 고려하여 상기 단계(S500)의 도금을 수행(전기도금의 시간 등을 조절)함으로써, 원하는 사양의 두께의 회로패턴(5)을 형성할 수 있다. 즉, 비전도성 필름(1) 위에 형성된 전도성 층의 두께는 일부가 깎인 회로패턴(5)의 두께와 전도성 시드 물질(3)의 두께를 더한 값이므로, 이를 고려하여 원하는 사양의 전도성 층을 형성할 수 있다.Next, in addition to the residual dry film (4), the conductive seed material (3) located below the residual dry film (4) is also removed. This can be achieved by selecting a chemical agent for etching (soft etching) in consideration of the properties of the conductive seed material (3), etc. For example, an acid chemical agent can be used. In this process, a part of the surface of the circuit pattern (5) may be shaved off, and by performing the plating of the step (S500) (by controlling the time of electroplating, etc.) in consideration of the thickness of the circuit pattern (5) shaved off in this manner, a circuit pattern (5) having a thickness of a desired specification can be formed. That is, the thickness of the conductive layer formed on the non-conductive film (1) is the sum of the thickness of the circuit pattern (5) from which a part is shaved off and the thickness of the conductive seed material (3), so that a conductive layer having a desired specification can be formed in consideration of this.

한편 전술한 내용과 같이, 회로패턴(5)의 폭의 축소는 드라이 필름(4)의 패턴의 폭을 변경하는 방식으로 반영될 수 있다.Meanwhile, as described above, the reduction in the width of the circuit pattern (5) can be reflected by changing the width of the pattern of the dry film (4).

이후 회로패턴(5)이나, 절연성 필름(1)의 표면을 매끄럽게 처리하거나, 제거되지 않은 드라이 필름(4), 전도성 시드 물질(3)을 추가로 제거하는 등의 부가 공정이 수행될 수 있으며, 이를 위해 본 발명의 기술분야에서 이미 알려진 다양한 방식, 부가 공정이 활용될 수 있다. Afterwards, additional processes such as smoothing the surface of the circuit pattern (5) or the insulating film (1), or additionally removing the unremoved dry film (4) or conductive seed material (3) can be performed, and for this purpose, various methods and additional processes already known in the technical field of the present invention can be utilized.

이에 따라 도 7에 도시된 것과 같이, 절연성 필름(1)의 양면에 회로패턴(5)이 형성되어 있으며, 양면에 형성된 회로패턴(5)의 전기적 연결을 위한 도금된 쓰루 홀이 존재하는 형태의 양면 연성인쇄회로기판의 중간 제품을 획득할 수 있다. 이렇게 형성된 중간 제품의 경우 양면에 형성된 회로패턴(5)의 뚜께와 스루홀의 측벽의 두께는 한공정으로 이루어진 도금층이므로 두께가 같고 일체형이 되어 연결부의 문제가 발생하지 않는다.Accordingly, as illustrated in Fig. 7, a circuit pattern (5) is formed on both sides of an insulating film (1), and a double-sided flexible printed circuit board intermediate product in the form of a plated through-hole for electrical connection of the circuit pattern (5) formed on both sides can be obtained. In the case of the intermediate product formed in this manner, the thickness of the circuit pattern (5) formed on both sides and the thickness of the side wall of the through-hole are the same because they are plating layers formed in one process, and they are integrally formed so that no problems occur at the connection part.

이후 단자 도금, 외형 가공 등의 공정을 통해 제품이 완성될 수 있으며, 필요에 따라 부품이 실장될 수도 있다. 이러한 과정은 통상적인 연성인쇄회로기판의 제작 방식과 동일할 수 있다.Afterwards, the product can be completed through processes such as terminal plating and external processing, and components can be mounted as needed. This process can be the same as the manufacturing method of a typical flexible printed circuit board.

도 8 내지 도 10은 본 발명의 일 실시예에 따른 양면 연성인쇄회로기판 제조 방법으로 제조된 양면 연성인쇄회로기판의 중간 제품을 적층하여 다층 연성인쇄회로기판을 제조하는 방법을 설명하기 위한 예시도이다.FIGS. 8 to 10 are exemplary views for explaining a method for manufacturing a multilayer flexible printed circuit board by laminating intermediate products of a double-sided flexible printed circuit board manufactured by a method for manufacturing a double-sided flexible printed circuit board according to one embodiment of the present invention.

도 8에 도시된 것과 같이, 양면 연성인쇄회로기판의 중간 제품을 비전도성층(9)을 사이에 두고 적층할 수 있다. 비전도성층(9)은 폴리이미드 필름일 수 있으며, 이러한 경우 접착기재(8)를 활용하여 양면 연성인쇄회로기판의 중간 제품을 비전도성층(9)에 부착할 수 있다. 또는 비전도성 접착제 그 자체를 활용하여 비전도성층을 형성하도록 구성될 수도 있다.As shown in Fig. 8, the intermediate product of the double-sided flexible printed circuit board can be laminated with a non-conductive layer (9) therebetween. The non-conductive layer (9) can be a polyimide film, and in this case, the intermediate product of the double-sided flexible printed circuit board can be attached to the non-conductive layer (9) by utilizing an adhesive material (8). Alternatively, the non-conductive layer can be formed by utilizing the non-conductive adhesive itself.

이후 도 9에 도시된 것과 같이, 다층의 연결을 수행하기 위해 홀(10)을 형성하고, 이러한 홀(10)의 내벽의 도금을 수행할 수 있다. 다만 이러한 과정은 종래의 양면 FCCL 기재를 이용한 양면 인쇄회로기판 제조 방식에서 사용되던 방식을 그대로 사용할 수 있는 것이므로, 이에 대한 더 자세한 설명은 생략하기로 한다.Thereafter, as shown in Fig. 9, a hole (10) may be formed to perform a multi-layer connection, and plating of the inner wall of the hole (10) may be performed. However, since this process can be used as is in a method used in manufacturing a double-sided printed circuit board using a conventional double-sided FCCL substrate, a detailed description thereof will be omitted.

또한 도 10에 도시된 것과 같이, 단면 + 양면 + 단면의 형태로 적층하는 것도 가능하며, 이외에도 단면 + 양면 + 양면 + 단면 등 다양한 형태의 변형이 가능하다.In addition, as illustrated in Fig. 10, lamination in the form of cross-section + double-sided + cross-section is also possible, and various other deformations such as cross-section + double-sided + double-sided + cross-section are also possible.

이렇게 다층으로 적층된 중간 제품의 경우에도 단자 도금, 외형 가공 등의 공정을 통해 제품이 완성될 수 있으며, 필요에 따라 부품이 실장될 수도 있다. 이러한 과정은 통상적인 연성인쇄회로기판의 제작 방식과 동일할 수 있다.Even in the case of such multi-layered intermediate products, the product can be completed through processes such as terminal plating and external processing, and components can be mounted as needed. This process can be the same as the manufacturing method of a typical flexible printed circuit board.

전술한 공정 사이에 제품 생산을 위한 추가적인 공정(예: 세척 공정, 건조 공정 등)이 필요에 따라 부가될 수도 있다.Additional processes for product production (e.g., washing process, drying process, etc.) may be added between the aforementioned processes as needed.

한편 본 발명은 홀 가공, 건식도금, 라미네이팅, 노광, 현상, 에칭, 전기도금, 부착 등의 각 공정을 수행할 수 있도록 구성된 연성인쇄회로기판 제조설비에서 수행될 수 있으며, 이러한 제조설비의 제어장치가 각 공정의 동작을 제어할 수 있다. 이러한 제조설비는 각 공정 사이에 제품을 이송하기 위한 로봇팔, 이송벨트 등을 부가적으로 구비할 수 있으며, 이외에도 다양한 장비가 부가될 수 있다. 또한 제어장치는 각 공정을 수행하도록 제조설비를 제어하기 위한 명령어들을 저장하는 컴퓨터 판독 가능한 저장매체를 포함할 수 있으며, 이러한 저장매체는 프로세서와 결합되어 프로세서로 하여금 본 발명의 각 단계를 수행하게끔 구성될 수 있다.Meanwhile, the present invention can be performed in a flexible printed circuit board manufacturing facility configured to perform each process such as hole processing, dry plating, laminating, exposure, development, etching, electroplating, and attachment, and a control device of such manufacturing facility can control the operation of each process. Such manufacturing facility can additionally be equipped with a robot arm, a transfer belt, etc. for transferring a product between each process, and various other equipment can be added in addition. In addition, the control device can include a computer-readable storage medium that stores commands for controlling the manufacturing facility to perform each process, and such storage medium can be coupled with a processor and configured to cause the processor to perform each step of the present invention.

본 발명은 도면에 도시된 실시예를 참고로 하여 설명되었으나, 이는 예시적인 것에 불과하며, 당해 기술이 속하는 분야에서 통상의 지식을 가진 자라면 이로부터 다양한 변형 및 균등한 타 실시예가 가능하다는 점을 이해할 것이다. 따라서 본 발명의 기술적 보호범위는 아래의 특허청구범위에 의해서 정하여져야 할 것이다.Although the present invention has been described with reference to the embodiments shown in the drawings, these are merely exemplary, and those skilled in the art will understand that various modifications and equivalent other embodiments are possible therefrom. Accordingly, the technical protection scope of the present invention should be defined by the following patent claims.

Claims (12)

비전도성 필름에 홀을 형성하는 단계;A step of forming a hole in a non-conductive film; 상기 홀이 형성된 상기 비전도성 필름을 전도성 시드 물질로 덮는 단계;A step of covering the non-conductive film in which the hole is formed with a conductive seed material; 상기 전도성 시드 물질로 덮인 상기 비전도성 필름의 양면에 각각 드라이 필름을 도포하는 단계;A step of applying a dry film to each side of the non-conductive film covered with the conductive seed material; 상기 드라이 필름에서 도금이 수행될 쓰루 홀 영역 및 회로패턴 영역에 대응하는 부분을 제거하는 단계;A step of removing a portion corresponding to a through-hole area and a circuit pattern area where plating is to be performed in the above dry film; 상기 비전도성 필름에 전도성 물질의 도금을 수행하여 도금된 쓰루 홀 및 회로패턴을 형성하는 단계; 및A step of forming a plated through hole and a circuit pattern by performing plating of a conductive material on the above non-conductive film; and 잔여 드라이 필름 및 상기 잔여 드라이 필름의 아래쪽으로 위치한 전도성 시드 물질을 제거하는 단계를 포함하는 양면 연성인쇄회로기판 제조 방법.A method for manufacturing a double-sided flexible printed circuit board, comprising the step of removing a residual dry film and a conductive seed material positioned below the residual dry film. 제1항에 있어서,In the first paragraph, 상기 잔여 드라이 필름 및 상기 잔여 드라이 필름의 아래쪽으로 위치한 전도성 시드 물질을 제거하는 단계는, 에칭을 통해 상기 잔여 드라이 필름 및 상기 잔여 드라이 필름의 아래쪽으로 위치한 전도성 시드 물질을 제거하는 것을 특징으로 하는 양면 연성인쇄회로기판 제조 방법.A method for manufacturing a double-sided flexible printed circuit board, characterized in that the step of removing the residual dry film and the conductive seed material positioned below the residual dry film removes the residual dry film and the conductive seed material positioned below the residual dry film through etching. 제2항에 있어서,In the second paragraph, 상기 에칭에 의해 도금된 상기 전도성 물질의 적어도 일부가 깎이는 것을 특징으로 하는 양면 연성인쇄회로기판 제조 방법.A method for manufacturing a double-sided flexible printed circuit board, characterized in that at least a portion of the conductive material plated by the etching is abraded. 제3항에 있어서,In the third paragraph, 상기 전도성 물질이 깎이게 될 두께를 고려하여 상기 전도성 물질의 도금이 수행되는 것을 특징으로 하는 양면 연성인쇄회로기판 제조 방법.A method for manufacturing a double-sided flexible printed circuit board, characterized in that plating of the conductive material is performed taking into account the thickness to which the conductive material is to be cut. 제3항에 있어서,In the third paragraph, 상기 전도성 물질이 깎이게 될 폭을 고려하여 상기 드라이 필름에서 도금이 수행될 쓰루 홀 영역 및 회로패턴 영역에 대응하는 부분의 제거가 수행되는 것을 특징으로 하는 양면 연성인쇄회로기판 제조 방법.A method for manufacturing a double-sided flexible printed circuit board, characterized in that removal of a portion corresponding to a through-hole area and a circuit pattern area where plating is to be performed in the dry film is performed considering a width by which the conductive material is to be cut. 제1항에 있어서,In the first paragraph, 상기 비전도성 필름을 전도성 시드 물질로 덮는 단계는, 건식도금을 통해 상기 비전도성 필름을 상기 전도성 시드 물질로 덮는 것을 특징으로 하는 양면 연성인쇄회로기판 제조 방법.A method for manufacturing a double-sided flexible printed circuit board, characterized in that the step of covering the non-conductive film with a conductive seed material comprises covering the non-conductive film with the conductive seed material through dry plating. 제1항에 있어서,In the first paragraph, 상기 쓰루 홀 영역 및 회로패턴 영역에 대응하는 부분을 제거하는 단계는, 상기 드라이 필름에 대한 노광 및 현상을 통해 상기 드라이 필름에서 상기 쓰루 홀 영역 및 회로패턴 영역에 대응하는 부분을 제거하는 것을 특징으로 하는 양면 연성인쇄회로기판 제조 방법.A method for manufacturing a double-sided flexible printed circuit board, characterized in that the step of removing a portion corresponding to the through-hole area and the circuit pattern area removes a portion corresponding to the through-hole area and the circuit pattern area from the dry film through exposure and development of the dry film. 제1항에 있어서,In the first paragraph, 상기 도금된 쓰루 홀 및 회로패턴을 형성하는 단계는, 전기도금을 통해 상기 전도성 물질의 도금을 수행하는 것을 특징으로 하는 양면 연성인쇄회로기판 제조 방법.A method for manufacturing a double-sided flexible printed circuit board, characterized in that the step of forming the plated through hole and circuit pattern comprises performing plating of the conductive material through electroplating. 제1항에 있어서,In the first paragraph, 상기 전도성 시드 물질은, 티타늄, 니켈, 크롬 및 구리 중 하나이거나, 티타늄, 니켈, 크롬 및 구리 중 적어도 둘 이상의 합금인 것을 특징으로 하는 양면 연성인쇄회로기판 제조 방법.A method for manufacturing a double-sided flexible printed circuit board, characterized in that the conductive seed material is one of titanium, nickel, chromium and copper, or an alloy of at least two of titanium, nickel, chromium and copper. 제1항에 있어서,In the first paragraph, 상기 전도성 시드 물질은, 복수의 층으로 구성되는 것을 특징으로 하는 양면 연성인쇄회로기판 제조 방법.A method for manufacturing a double-sided flexible printed circuit board, characterized in that the conductive seed material is composed of a plurality of layers. 제1항에 있어서,In the first paragraph, 상기 전도성 물질은 구리인 것을 특징으로 하는 양면 연성인쇄회로기판 제조 방법.A method for manufacturing a double-sided flexible printed circuit board, characterized in that the conductive material is copper. 제1항에 있어서,In the first paragraph, 상기 비전도성 필름은 폴리이미드 필름인 것을 특징으로 하는 양면 연성인쇄회로기판 제조 방법.A method for manufacturing a double-sided flexible printed circuit board, characterized in that the above non-conductive film is a polyimide film.
PCT/KR2023/008211 2023-06-14 2023-06-14 Method for manufacturing double-sided flexible printed circuit board Ceased WO2024257916A1 (en)

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Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0261301A2 (en) * 1986-09-22 1988-03-30 Ube Industries, Ltd. Process for the preparation of circuit-printed board having plated through-hole
KR100771352B1 (en) * 2006-09-19 2007-10-29 삼성전기주식회사 Manufacturing method of printed circuit board
KR20130051124A (en) * 2011-11-09 2013-05-20 엘지이노텍 주식회사 Thin multi layer printed circuit board using pi core and manufaturing mathod therefor
KR20130078441A (en) * 2011-12-30 2013-07-10 영풍전자 주식회사 A method for manufacturing a printed circuit board
JP2013219337A (en) * 2012-03-16 2013-10-24 Sumitomo Bakelite Co Ltd Laminated board, and method for manufacturing printed wiring board
KR20230093958A (en) * 2021-12-20 2023-06-27 한병채 Manufacturing method of double side flexible printed circuit board

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0261301A2 (en) * 1986-09-22 1988-03-30 Ube Industries, Ltd. Process for the preparation of circuit-printed board having plated through-hole
KR100771352B1 (en) * 2006-09-19 2007-10-29 삼성전기주식회사 Manufacturing method of printed circuit board
KR20130051124A (en) * 2011-11-09 2013-05-20 엘지이노텍 주식회사 Thin multi layer printed circuit board using pi core and manufaturing mathod therefor
KR20130078441A (en) * 2011-12-30 2013-07-10 영풍전자 주식회사 A method for manufacturing a printed circuit board
JP2013219337A (en) * 2012-03-16 2013-10-24 Sumitomo Bakelite Co Ltd Laminated board, and method for manufacturing printed wiring board
KR20230093958A (en) * 2021-12-20 2023-06-27 한병채 Manufacturing method of double side flexible printed circuit board

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