WO2026018332A1 - Dispositif à faisceau de particules chargées et procédé d'ajustement de dispositif à faisceau de particules chargées - Google Patents

Dispositif à faisceau de particules chargées et procédé d'ajustement de dispositif à faisceau de particules chargées

Info

Publication number
WO2026018332A1
WO2026018332A1 PCT/JP2024/025619 JP2024025619W WO2026018332A1 WO 2026018332 A1 WO2026018332 A1 WO 2026018332A1 JP 2024025619 W JP2024025619 W JP 2024025619W WO 2026018332 A1 WO2026018332 A1 WO 2026018332A1
Authority
WO
WIPO (PCT)
Prior art keywords
charged particle
particle beam
slit
energy
width
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
PCT/JP2024/025619
Other languages
English (en)
Japanese (ja)
Inventor
悠太 今井
央和 玉置
邦康 中村
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi High Tech Corp
Original Assignee
Hitachi High Tech Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi High Tech Corp filed Critical Hitachi High Tech Corp
Priority to PCT/JP2024/025619 priority Critical patent/WO2026018332A1/fr
Publication of WO2026018332A1 publication Critical patent/WO2026018332A1/fr
Pending legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/05—Electron or ion-optical arrangements for separating electrons or ions according to their energy or mass
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/22—Optical, image processing or photographic arrangements associated with the tube

Definitions

  • the present invention relates to a charged particle beam device and a method for adjusting a charged particle beam device.
  • TEM transmission electron microscope
  • ⁇ EELS Electro Energy Loss Spectroscopy
  • EF imaging Acquisition of a sample image (EF image) that has only a specific loss energy.
  • energy filter optics Devices that combine such a system with a TEM to perform electron beam energy loss spectroscopy are called energy filter optics, and those placed after the TEM housing are called post-column energy filters.
  • the same charged particle beam device Since EELS spectra and EF images are complementary, it is desirable for the same charged particle beam device to be equipped with an optical system that can perform both spectral acquisition and imaging.
  • Patent Document 1 discloses a technology for changing the optical conditions at the slit plane between spectrum acquisition and EF image acquisition in a post-column energy filter optical system capable of achieving both spectrum acquisition and imaging, in order to acquire EELS spectra over a wider energy range.
  • the chromatic dispersion spot width at the slit plane is fixed, and the passing energy width is selected by adjusting the slit opening width.
  • This method requires precise control of the slit opening and closing, which can lead to a complex slit mechanism, reduced throughput when conditions are changed, and a corresponding decrease in usability.
  • the present invention has the following configuration to achieve the above object.
  • a first lens group that converges the dispersed charged particle beam; a slit through which the converged charged particle beam is formed as a chromatic dispersion plane and through which a portion of the energy of the beam passes; a second lens group that diverges the passed charged particle beam; a detector that forms an image of the diverged charged particle beam and detects the formed image; and a controller that controls at least one of the charged particle source, the electromagnetic lens group, the spectrometer, the first lens group, the slit, the second lens group, and the detector, wherein the controller controls the first lens group so that the charged particle beam changes the chromatic dispersion plane in the X direction and the Y direction when the direction of chromatic dispersion at the slit plane is the X direction and the direction perpendicular to the X direction is the Y direction.
  • the present invention provides a charged particle beam device that enables highly accurate energy filter imaging using a simple slit mechanism, as well as a method for adjusting a charged particle beam device.
  • FIG. 1 is a schematic diagram showing the configuration of the main parts of an electron beam energy spectroscopy device.
  • 1A and 1B are diagrams illustrating the principles of spectrum acquisition and EF imaging.
  • FIG. 1 is a schematic diagram illustrating an electron optical system of an electron beam energy spectroscopy apparatus.
  • 1 is a diagram illustrating a method for selectively passing only specific energy.
  • 10A and 10B are graphs showing changes in aberration when measured using an apparatus in which the amount of chromatic dispersion of the spot is simply adjusted.
  • 10A and 10B are diagrams for explaining a study of changing focus conditions on a slit plane.
  • FIG. 10 is a diagram showing the results when defocusing occurs in the Y direction.
  • FIG. 10 is a diagram showing an example of control of the Y-direction width relative to the selected energy width.
  • FIG. 1 is a diagram showing the configuration of an embodiment using a transmission electron microscope and an energy filter.
  • 10 is a flowchart for acquiring an EF image using Y-direction width adjustment.
  • 10 is a flowchart illustrating an EF image acquisition process including correction according to the Y-direction width amount.
  • 10 is a flowchart of parameter correction of control equation (1).
  • FIG. 1 is a schematic diagram of the main components of an electron beam energy spectroscopy apparatus according to an embodiment of the present invention.
  • a charged particle beam (the dashed dot in the figure indicates the optical axis of the charged particle beam) emitted from a charged particle beam source 10 is subjected to energy dispersion by a spectrometer 15, after which a charged particle beam energy loss spectrum is formed on an energy selection slit 19 (sometimes simply referred to as a "slit").
  • Two electromagnetic lens groups 12 and 13 are located upstream of the spectrometer 15, and a first lens group 14 is located between the spectrometer 15 and the energy-selecting slit 19.
  • the electron beam is energy-dispersed on the energy-selecting slit 19 by the spectrometer 15, and an electron beam energy loss spectrum is formed by the quadrupole lens action of the first lens group 14.
  • the energy-selecting slit 19 selects only electron beams with a desired energy range and allows them to pass through a second lens group 20 located downstream of the energy-selecting slit 19.
  • the detector 16 typically uses a two-dimensional sensor such as a CCD or C-MOS to obtain both a charged particle beam image and a spectral image, but a separate sensor for acquiring the spectrum may also be provided.
  • a two-dimensional sensor such as a CCD or C-MOS to obtain both a charged particle beam image and a spectral image
  • a separate sensor for acquiring the spectrum may also be provided.
  • a one-dimensional sensor consisting of 1024 channels can be used to detect the intensity of the electron beam incident on each channel, thereby obtaining an electron beam energy loss spectrum.
  • Figure 2(a) shows the case where energy loss at a specific position in a sample is acquired as a spectrum. While viewing the two-dimensional TEM image detected by detector 16, electromagnetic lens group 12 (converging lens) and electromagnetic lens group 13 (imaging lens) are adjusted so that the area (site) of the sample to be observed is in focus.
  • the charged particle beam that passes through the area to be observed is energy dispersed by a spectrometer (prism) according to its energy height (magnitude), and is then focused by a first lens group 14 (multipole lens such as a quadrupole lens) 14 to focus at the energy-selecting slit 19.
  • the charged particle beam that passes through the energy-selecting slit position is then focused again by a second lens group 20 (multipole lens such as a quadrupole lens) to focus at the detector 16.
  • a second lens group 20 multipole lens such as a quadrupole lens
  • the charged particle beam that has passed through the charged particle beam irradiation position on the sample is detected at positions aligned by energy, so by plotting energy (energy loss: Energy Loss (eV)) on the horizontal axis and the number of counts on the vertical axis, it is possible to visualize the energy loss due to the substances contained in the observed area.
  • energy loss Energy Loss (eV)
  • peaks derived from carbon (C), sulfur (S), and nitrogen (N) are observed, indicating that the sample area being observed contains at least carbon, sulfur, and nitrogen.
  • the electromagnetic lens group 12 is adjusted so that the charged particle beam is irradiated onto the observation field, observation area, or location within the sample where energy filter imaging is desired.
  • the charged particle beam that has passed through the location where energy filter imaging is desired is converged to focus on the energy-selecting slit 19 surface, as in Figure 2(a).
  • an energy-selecting slit 19 is placed on the energy-selecting slit 19 surface, and the opening position and width of the energy-selecting slit 19 are adjusted to allow only the energy desired to be observed to pass.
  • the second lens group 20 is controlled so that the charged particle beam that has passed through the slit forms a transmitted image of the sample on the detection surface of the detector 16. This makes it possible to illuminate only the area with the selected energy.
  • FIG. Figure 3 is a diagram illustrating the trajectory of the electron beam during imaging.
  • the electron beam that has passed through the sample is deflected by a prism and then focused onto the slit plane.
  • This forms chromatic dispersion spots (different energies, i.e., different frequencies, of the charged particle beam) at different positions on the slit plane for each energy.
  • a slit with an opening perpendicular to the chromatic dispersion is used to selectively pass only specific energies. Only electrons that have passed through the slit are used to form an image again on the detection plane of the detector 16. This makes it possible to obtain an EF image formed by transmitted electrons with only a specific loss energy range.
  • Figure 4(a) shows the conventional method.
  • the electron beam that passes through the sample during imaging is controlled so that it has a shape that has chromatic dispersion in the slit opening direction at the slit plane.
  • the wavelength of actual charged particle beams is not in the visible light range, so humans cannot recognize it as a "color.”
  • Figure 4 and Figure 6 which will be discussed later, chromatic dispersion, with red at the left end (long wavelength, i.e., low energy) and purple at the right end (short wavelength, i.e., high energy), is represented by different densities of hatched dots.
  • the width of the color dispersion spot on the slit surface is fixed, and the passing energy width is controlled by adjusting the slit opening width.
  • the narrower the slit width the smaller the passing area of the spot in the color dispersion direction, so the energy width passing through the slit (selected energy width) becomes narrower, and by widening the slit width, a wider energy band can be passed.
  • This method is called the color dispersion fixed method.
  • the position change on the slit in the color dispersion direction due to differences in energy is generally on the order of a few ⁇ m per 1 eV.
  • Creating a slit that meets these specifications requires a complex mechanism, which can increase costs and even reduce usability due to poor maintenance.
  • there is often a trade-off between precise controllability of the opening width and drive speed raising concerns that observation throughput may also decrease when conditions change.
  • Figure 4(b) shows the fixed slit width method adopted by the present invention.
  • the slit opening width at the slit plane is fixed, and the passing energy width is selected by adjusting the amount of chromatic dispersion of the spot.
  • This method allows for a simplification of the slit mechanism compared to conventional technology.
  • conditions can be changed very quickly.
  • chromatic aberration the focal position varies depending on the wavelength of the electron beam.
  • FIG. 5(a) shows the optical system used for the confirmation.
  • the electron beam was focused at the slit plane in both the X and Y trajectories.
  • the chromatic dispersion at the slit plane in this optical system was compared by calculating isochromaticity, an index that represents the energy shift in the EF image due to aberration.
  • the results are shown in Figure 5(b). It can be seen that as the chromatic dispersion at the slit plane increases, the aberration increases and the isochromaticity deteriorates.
  • FIG. 6(a) is a conceptual diagram of the trajectory of an electron beam in a pre-slit optical system in an embodiment of the present invention.
  • the electron beam emitted from the spectrometer was focused in the X direction (the vertical direction in the upper diagram of Figure 6(a)) at the slit plane, and only the focus was shifted in the Y direction (the vertical direction in the lower diagram of Figure 6(a)).
  • Figure 6(b) shows a conceptual diagram comparing the electron beam spot shape on the slit plane under these conditions with conventional conditions.
  • the left image in Figure 6(b) is a conventional charged particle beam image on the slit plane. It is also in focus in the Y direction (up and down on the page), and a thin spot is formed. Ideally, the spot width in the Y direction on the slit plane when conventionally focused is as close to zero as possible, at most a few ⁇ m.
  • the right image shows the spot shape in this embodiment.
  • Figure 7 shows the results of a comparison of the deviation in color isochromaticity between the conventional method and Y defocus control.
  • electronic trajectory control is used to control the spot to defocus in the Y direction and reduce aberrations, as in this embodiment, it is possible to suppress changes in color isochromaticity (vertical axis) relative to the amount of chromatic dispersion at the slit surface (horizontal axis), and it can be seen that color isochromaticity is significantly improved compared to the conventional method, especially under conditions of large chromatic dispersion.
  • the Y-direction width (Wy) should be controlled according to the selected energy width (Ew). For example, this is changed according to the following control formula (1).
  • dslit is the slit opening width
  • C0 to C3 are coefficients.
  • the coefficient C0 corresponds to the selection energy width in the optimal trajectory when control is performed using the conventional chromatic dispersion fixed method.
  • the coefficients C1 to C3 are proportional coefficients to the order of the selection energy width Ew.
  • control equation It is desirable to determine the coefficients of this control equation beforehand through electron optical simulation. Even more preferably, it is desirable to obtain the optimum values of the coefficients by performing additional measurements on the actual device. For example, by measuring the Y-direction width at the slit plane and correlating this with the aberration and color isochromatism measured under the same conditions, it is possible to precisely determine the coefficients of the control equation.
  • the control equation may simply be a first-order linear equation for the selected energy width Ew, as needed, or a control equation that takes higher orders into account may also be used.
  • Figure 8 shows an example of controlling the Y-direction width relative to the selected energy width according to control formula (1), assuming a slit opening width of 10 ⁇ m.
  • the spot Y-direction width is changed to a size on the order of mm.
  • the selected energy width is in the range of 2 to 20 eV as shown in Figure 8(a)
  • the Y-direction width is controlled in the range of 0 to 10 mm. Since reducing aberration in areas with small selected energy widths is particularly important, if observation is desired over a selected energy width of at least 5 eV or less, the Y-direction width should be controlled in the range of 1 mm or more, preferably 2 mm or more.
  • a control method that changes the Y-direction width partially and in stages according to the selected energy width is also acceptable.
  • the range of the selected energy width may be divided into stages, and the same stage may be controlled at a constant Y-direction width.
  • Figure 8(b) shows stepwise Y-direction width control when the slit opening width is 10 ⁇ m.
  • the range of the selected energy width is divided into sections of 2.5 eV or less, 2.5 to 5 eV, 5 to 10 eV, and 10 eV or more, and each section is controlled to a constant Y-direction width using the average Y-direction width calculated using the control formula.
  • each section is controlled to a constant Y-direction width using the average Y-direction width calculated using the control formula.
  • the Y-direction width of these spots is controlled using multipole lenses placed before and after the prism in the energy filter optical system.
  • this does not necessarily mean that adjustments cannot be made using the lens system in front of the prism, and changing the incident trajectory onto the prism as necessary is permissible.
  • the electron beam spot on the slit is adjusted to a shape defocused in the direction perpendicular to the direction of chromatic dispersion, and the filtering energy width is controlled.
  • FIG. 9 The configuration of an embodiment in which the present invention is applied to a transmission electron microscope is shown in Figure 9. The main components are described below.
  • An electron beam (the dotted line in the figure indicates the optical axis of the electron beam) generated by an electron beam source 1 is converged by an objective lens 4 and irradiated onto a sample 5.
  • the electron beam transmitted through the sample 5 is incident on an electron beam energy spectrometer (sometimes abbreviated as "spectrometer”) 15 by an electromagnetic lens group 13, and the energy of the electron beam is analyzed by an energy filter optical system including the electron beam energy spectrometer 15, allowing for measurement of an electron beam energy loss spectrum and observation of an element distribution image.
  • spectrometer electron beam energy spectrometer
  • the energy filter optical system is composed of a multipole lens 40 located upstream of the spectrometer 15, and a first lens group 14 and a second lens group 20 located downstream of the spectrometer 15, an electron beam detector (hereinafter sometimes abbreviated as "detector") 16 that detects the energy-dispersed electron beam, and an energy-selecting slit (slit) 19.
  • a detector electron beam detector
  • the control device 21 includes a control unit 30 that controls the position of the electron beam on the sample, scans and moves the electron beam, controls the electron beam energy analysis conditions of the electron beam energy spectrometer 15, such as the excitation conditions, and the focus conditions, magnification conditions, and aberration correction conditions of the electron beam energy loss spectrum, and calculates the electron beam energy loss spectrum detected by the electron beam detector 16. It also includes a memory unit 27 that stores a database of the elements to be measured and control parameters for various lenses such as the multipole lens 40, electromagnetic lens group 13, and first lens group 14, an input unit 31 through which the operator inputs the elements to be measured, and an output unit 25 that displays the electron beam energy loss spectrum and element distribution image.
  • a control unit 30 controls the position of the electron beam on the sample, scans and moves the electron beam, controls the electron beam energy analysis conditions of the electron beam energy spectrometer 15, such as the excitation conditions, and the focus conditions, magnification conditions, and aberration correction conditions of the electron beam energy loss spectrum, and calculates the electron beam energy loss spectrum detected by the
  • control device 21 during spectrum measurement.
  • the control unit 30 retrieves the corresponding element information from the database and controls various lenses, such as the multipole lens 40, electromagnetic lens group 13, and first lens group 14, as well as the spectrometer 15, according to the element-specific measurement conditions contained in the element information, causing an electron beam within an energy range that includes the element-specific energy to be incident on the electron beam detector 16.
  • the electron beam intensity signal from each channel of the electron beam detector 16 becomes an electron beam energy loss spectrum.
  • the electron beam intensity signal from the electron beam detector 16 undergoes spectral background correction and electron beam detector gain correction, among other corrections.
  • the calculated spectrum is stored in the memory unit 27 and displayed on the output unit 25. Through this series of processes, the operator can obtain a spectrum and an element distribution image.
  • the optimal electron trajectory conditions for observation are calculated based on the set irradiation conditions and selected energy range (S105).
  • the optimal conditions may be calculated by referring to the results of a prior electron trajectory simulation, or by recalculating the simulations sequentially. It is also possible to perform adjustment experiments in advance using the same equipment and correct the simulation results.
  • the optimal Y-direction width of the color dispersion spot formed on the slit plane is determined based on the calculated optical trajectory conditions and selected energy width (S106).
  • S106 selected energy width
  • a control formula that calculates the optimal value corresponding to the selected energy width is created and referenced.
  • the control formula may be created by simulation, or some parameters of the control formula may be determined by experimentation with an actual device.
  • the electron trajectory is adjusted using a multipole lens (S107).
  • the trajectory of the optical system is adjusted mainly using a quadrupole lens so that an EF image can be formed at the final detection plane in response to the trajectory change in the pre-slit optical system that occurs when the spot on the slit surface is changed.
  • the electron trajectory is finely adjusted using a hexapole, octopole, decapole, or dodecapole lens, etc., to correct aberrations in the EF image.
  • the amount of adjustment using these multipole lenses may also be an amount of adjustment that corresponds to the difference in change in the spot shape on the slit surface.
  • An EF image is captured using the adjusted electron trajectory (S108), and the flow ends (S109).
  • the EF image acquisition flow presented in Figure 10 shows an example of EF image acquisition for a single filtering energy width, but in practice it can also be applied to imaging with continuously changed filtering energy widths.
  • the filtering energy width is changed by changing the spot shape on the slit plane, making it possible to acquire high-quality images without the need to mechanically open and close the slit. Therefore, another feature is that it is possible to perform measurements with freely changed filtering energy widths at high speed. For example, it is possible to quickly search for an energy width that clearly shows the contrast of a target area of the sample from images in which the filtering energy width is continuously changed.
  • the amount of chromatic dispersion that must be satisfied at the slit plane to pass through the desired selected energy width is determined for the current slit opening width (S114).
  • the optimal electron trajectory conditions for observation are calculated based on the set irradiation conditions and selected energy width (S115). Based on the calculated optical trajectory conditions and selected energy width, the optimal Y-direction width of the chromatic dispersion spot formed at the slit plane is determined (S116).
  • the electron trajectory of the pre-slit optical system using a multipole lens is adjusted so that the determined color dispersion spot shape is formed on the slit plane (S117).
  • a step may be added to measure the shape of the spot on the slit plane and its width in the Y direction. Measuring the spot shape allows for more precise adjustments.
  • the change in Y-direction width is less than or equal to a set value (S118). If it is less than or equal to the set value, the electron trajectory of the post-slit optical system is adjusted using a multipole lens so that an EF image is formed on the detector (S119). At the same time, aberration correction in the post-slit optical system is performed using a multipole lens. The EF image is then captured (S120), and the flow ends (S124). If the change in Y-direction width is greater than the set value in S118, additional aberration correction conditions are determined (S121).
  • the additional correction conditions are determined, for example, so that the amount of aberration correction increases in proportion to the amount of change in the Y-direction width.
  • the electron trajectory of the post-slit optical system is adjusted using a multipole lens so that an EF image is formed on the detector (S122).
  • aberration correction is simultaneously performed using a multipole lens at the conventional intensity.
  • detailed aberration correction is performed using a multipole lens (S123).
  • a supplementary aberration correction multipole lens may be added to the optical system, and the added lens may be used to compensate for the necessary correction amount.
  • an EF image is captured (S120), and the flow ends (S124).
  • the flow for correcting the parameters of control formula (1) may be as shown in Figure 12. Following the start of the flow (S131), first, basic observation conditions such as acceleration voltage and field of view size are set according to the intended observation target (S132). Next, the filtering energy width for which the control formula is to be corrected is set (S133).
  • the initial condition for the optimal Y-direction width of the spot on the slit plane is set using the control formula before correction (S134).
  • the electron trajectory is adjusted using a multipole lens to achieve the set spot shape (S135).
  • color isochromaticity is measured (S136). Color isochromaticity can be measured, for example, by recording the change in brightness at each position of the EF image on the detection plane when the acceleration voltage or prism excitation current is changed, and analyzing the relationship between the amount of brightness change and the energy passing through the slit. The energy passing through the slit can be estimated from the amount of change in acceleration voltage or prism excitation current.
  • the reference value is set to a value that is sufficiently good for the quality of the EF image that is ultimately desired to be acquired. If the color matching is not better than the reference value, the spot shape on the slit plane is adjusted (S138). At this time, the electron trajectory is adjusted using a multipole lens so that the chromatic dispersion amount of the slit plane spot in the X direction is maintained while changing the width in the Y direction. After adjusting the spot shape, the color matching is measured again, and the adjustment step is repeated until the obtained color matching is better than the reference value. Next, the adjusted spot shape is acquired, and the Y-direction width is measured (S139).
  • the Y-direction width may be measured, for example, by adjusting the multipole lens of the post-slit optical system so that the spot on the slit plane is imaged onto the detection plane, and measuring the spot shape on the detection plane to determine the Y-direction width of the spot on the slit plane.
  • a deflector disposed upstream of the slit may be used to scan the chromatic dispersion spot over the slit in the Y direction, and the Y-direction width may be estimated from the change in intensity detected by the detector during scanning.
  • control formula correction flow may be performed only for important filtering energy widths used by the user for EF image measurement, or multiple adjustments may be made for any number of filtering energy widths to perform more detailed control formula corrections.
  • Electron beam source 4: Objective lens
  • 5 Sample
  • 10 Charged particle beam source
  • 12 Electromagnetic lens group
  • 13 Electromagnetic lens group
  • 14 First lens group
  • 15 Electron beam energy spectrometer
  • 16 Electron beam detector
  • 16 Detector
  • 19 Energy-selecting slit
  • 20 Second lens group
  • 21 Control device
  • 25 Output unit
  • 27 Memory unit
  • 30 Control unit
  • 31 Input unit
  • 40 Multipole lens.

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)

Abstract

Afin de fournir un dispositif à faisceau de particules chargées permettant à la fois d'obtenir des fonctions d'imagerie EELS et de filtre d'énergie au moyen d'un mécanisme à fente simple, ainsi qu'un procédé d'ajustement du dispositif à faisceau de particules chargées, l'invention concerne un dispositif à faisceau de particules chargées comprenant : un spectroscope qui effectue une spectroscopie d'énergie sur un faisceau de particules chargées ayant traversé un échantillon ; un premier groupe de lentilles qui focalise le faisceau de particules chargées dispersé ; et une fente avec laquelle le faisceau de particules chargées focalisé est formé comme une surface de dispersion de couleurs et par laquelle passe une partie de l'énergie, le premier groupe de lentilles étant commandé de telle sorte que la surface de dispersion de couleurs du faisceau de particules chargées soit variable dans une direction X et une direction Y lorsque la direction de dispersion de couleurs sur la surface de la fente est la direction X et que la direction perpendiculaire à la direction X est la direction Y. L'invention concerne également un procédé d'ajustement du dispositif à faisceau de particules chargées.
PCT/JP2024/025619 2024-07-17 2024-07-17 Dispositif à faisceau de particules chargées et procédé d'ajustement de dispositif à faisceau de particules chargées Pending WO2026018332A1 (fr)

Priority Applications (1)

Application Number Priority Date Filing Date Title
PCT/JP2024/025619 WO2026018332A1 (fr) 2024-07-17 2024-07-17 Dispositif à faisceau de particules chargées et procédé d'ajustement de dispositif à faisceau de particules chargées

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/JP2024/025619 WO2026018332A1 (fr) 2024-07-17 2024-07-17 Dispositif à faisceau de particules chargées et procédé d'ajustement de dispositif à faisceau de particules chargées

Publications (1)

Publication Number Publication Date
WO2026018332A1 true WO2026018332A1 (fr) 2026-01-22

Family

ID=98437135

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2024/025619 Pending WO2026018332A1 (fr) 2024-07-17 2024-07-17 Dispositif à faisceau de particules chargées et procédé d'ajustement de dispositif à faisceau de particules chargées

Country Status (1)

Country Link
WO (1) WO2026018332A1 (fr)

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2012104502A (ja) * 2012-01-23 2012-05-31 Hitachi High-Technologies Corp 電子分光器を有する透過型電子顕微鏡装置，試料ホルダ，試料台及びスペクトル像の取得方法
JP2012243763A (ja) * 2011-05-19 2012-12-10 Hermes Microvision Inc 荷電粒子ビーム装置用モノクロメータ及びこれを用いた電子装置
JP2019102464A (ja) * 2017-12-07 2019-06-24 エフ イー アイ カンパニＦｅｉ Ｃｏｍｐａｎｙ 改善されたｅｅｌｓ／ｅｆｔｅｍモジュールを有する透過型荷電粒子顕微鏡
US20190311880A1 (en) * 2018-04-05 2019-10-10 Fei Company Electron energy loss spectroscopy with adjustable energy resolution
JP2021162590A (ja) * 2020-03-31 2021-10-11 エフ イー アイ カンパニFei Company 電子エネルギー損失分光検出器を備えた透過型荷電粒子顕微鏡
JP2022078007A (ja) * 2020-11-12 2022-05-24 エフ イー アイ カンパニ 荷電粒子ビームのエネルギー幅を決定する方法

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2012243763A (ja) * 2011-05-19 2012-12-10 Hermes Microvision Inc 荷電粒子ビーム装置用モノクロメータ及びこれを用いた電子装置
JP2012104502A (ja) * 2012-01-23 2012-05-31 Hitachi High-Technologies Corp 電子分光器を有する透過型電子顕微鏡装置，試料ホルダ，試料台及びスペクトル像の取得方法
JP2019102464A (ja) * 2017-12-07 2019-06-24 エフ イー アイ カンパニＦｅｉ Ｃｏｍｐａｎｙ 改善されたｅｅｌｓ／ｅｆｔｅｍモジュールを有する透過型荷電粒子顕微鏡
US20190311880A1 (en) * 2018-04-05 2019-10-10 Fei Company Electron energy loss spectroscopy with adjustable energy resolution
JP2021162590A (ja) * 2020-03-31 2021-10-11 エフ イー アイ カンパニFei Company 電子エネルギー損失分光検出器を備えた透過型荷電粒子顕微鏡
JP2022078007A (ja) * 2020-11-12 2022-05-24 エフ イー アイ カンパニ 荷電粒子ビームのエネルギー幅を決定する方法

Similar Documents

Publication Publication Date Title
US6570156B1 (en) Autoadjusting electron microscope
EP1965407B1 (fr) Microscope à électrons de transmission fourni avec un spectroscope électronique
JP3687541B2 (ja) 元素マッピング装置、走査透過型電子顕微鏡および元素マッピング方法
JP5517584B2 (ja) 電子顕微鏡
EP2388796A1 (fr) Détection simultanée d'électrons
US10134558B2 (en) Scanning electron microscope
US8263936B2 (en) Transmission electron microscope having electron spectroscope
JPWO2000041206A1 (ja) 元素マッピング装置、走査透過型電子顕微鏡および元素マッピング方法
EP2375436A1 (fr) Microscope électronique à transmission avec spectromètre électronique
JP3979945B2 (ja) 電子分光系を有した電子線装置
US7888641B2 (en) Electron microscope with electron spectrometer
US12217929B2 (en) Systems and methods for chromatic aberration mitigation
US9589761B2 (en) Electron microscope and method of adjusting same
US9362082B2 (en) Electron microscope and method of adjusting monochromator
EP1463089A2 (fr) Microscope électronique avec filtre d'énergie
JP2001307672A (ja) 元素分析装置及び走査透過型電子顕微鏡並びに元素分析方法
WO2026018332A1 (fr) Dispositif à faisceau de particules chargées et procédé d'ajustement de dispositif à faisceau de particules chargées
JP4449573B2 (ja) 元素マッピング装置，走査透過型電子顕微鏡および元素マッピング方法
WO2010089950A1 (fr) Procédé d'ajustement d'axe optique de rayonnement de particules chargées et dispositif de rayonnement des particules chargées
JP4048925B2 (ja) 電子顕微鏡
EP3840010A1 (fr) Systèmes et procédés d'atténuation d'aberrations chromatiques
US20260016334A1 (en) Method for adapting an aperture geometry of an aperture of an aperture diaphragm to a beam path of light beams in a spectrometer
JP2005302335A (ja) 電子線エネルギー分光装置及びそれを備えた電子顕微鏡
JP4512514B2 (ja) 電子線分光器を備えた透過型電子顕微鏡
JP2007266016A (ja) 電子顕微鏡

Legal Events

Date Code Title Description
121 Ep: the epo has been informed by wipo that ep was designated in this application

Ref document number: 24947918

Country of ref document: EP

Kind code of ref document: A1