ZA77896B - Additive for improved electroplating process - Google Patents

Additive for improved electroplating process

Info

Publication number
ZA77896B
ZA77896B ZA770896A ZA77896A ZA77896B ZA 77896 B ZA77896 B ZA 77896B ZA 770896 A ZA770896 A ZA 770896A ZA 77896 A ZA77896 A ZA 77896A ZA 77896 B ZA77896 B ZA 77896B
Authority
ZA
South Africa
Prior art keywords
additive
electroplating process
improved electroplating
improved
electroplating
Prior art date
Application number
ZA770896A
Other languages
English (en)
Inventor
E Harbulak
Original Assignee
M & T Chemicals Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by M & T Chemicals Inc filed Critical M & T Chemicals Inc
Publication of ZA77896B publication Critical patent/ZA77896B/xx

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00Electroplating: Baths therefor
    • C25D3/02Electroplating: Baths therefor from solutions
    • C25D3/56Electroplating: Baths therefor from solutions of alloys
    • C25D3/562Electroplating: Baths therefor from solutions of alloys containing more than 50% by weight of iron or nickel or cobalt
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00Electroplating: Baths therefor
    • C25D3/02Electroplating: Baths therefor from solutions
    • C25D3/12Electroplating: Baths therefor from solutions of nickel or cobalt
    • C25D3/14Electroplating: Baths therefor from solutions of nickel or cobalt from baths containing acetylenic or heterocyclic compounds

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Electroplating And Plating Baths Therefor (AREA)
  • Electrolytic Production Of Metals (AREA)
  • Coating With Molten Metal (AREA)
  • Chemically Coating (AREA)
ZA770896A 1976-06-18 1977-02-15 Additive for improved electroplating process ZA77896B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US69749076A 1976-06-18 1976-06-18

Publications (1)

Publication Number Publication Date
ZA77896B true ZA77896B (en) 1977-12-28

Family

ID=24801331

Family Applications (1)

Application Number Title Priority Date Filing Date
ZA770896A ZA77896B (en) 1976-06-18 1977-02-15 Additive for improved electroplating process

Country Status (20)

Country Link
US (1) US4069112A (fr)
JP (1) JPS52156138A (fr)
AR (1) AR216911A1 (fr)
AU (1) AU509447B2 (fr)
BE (1) BE855425A (fr)
BR (1) BR7702667A (fr)
CA (1) CA1081650A (fr)
DE (1) DE2718284A1 (fr)
DK (1) DK271177A (fr)
ES (1) ES457484A1 (fr)
FR (1) FR2355096A1 (fr)
GB (1) GB1521238A (fr)
IT (1) IT1080255B (fr)
MX (1) MX4434E (fr)
NL (1) NL7706722A (fr)
NO (1) NO772116L (fr)
NZ (1) NZ183529A (fr)
PL (1) PL198944A1 (fr)
SE (1) SE7703113L (fr)
ZA (1) ZA77896B (fr)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2157319A (en) * 1984-04-13 1985-10-23 Toyo Kohan Co Ltd Tin free steel and its production
DE3416993A1 (de) * 1984-05-09 1985-11-21 Gerhard Collardin GmbH, 5000 Köln Waessrige, saure, nickel- und cobalt-ionen enthaltende elektrolyte zur galvanischen abscheidung von harten, anlaufbestaendigen, weiss glaenzenden legierungsueberzuegen
TWI758252B (zh) * 2015-06-30 2022-03-21 美商麥克達米德恩索龍股份有限公司 微電子中之互連的鈷填充
EP3485069B1 (fr) * 2016-07-18 2021-04-28 Basf Se Composition pour dépôt de cobalt comprenant un additif pour remplissage d'éléments submicroniques sans vide
US11035048B2 (en) * 2017-07-05 2021-06-15 Macdermid Enthone Inc. Cobalt filling of interconnects
WO2019088127A1 (fr) * 2017-10-31 2019-05-09 住友精化株式会社 Additif pour solutions électrolytiques non aqueuses, solution électrolytique non aqueuse et dispositif de stockage d'électricité

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR1266377A (fr) * 1960-09-01 1961-07-07 Metal & Thermit Corp Dépôt électrolytique de nickel brillant
US3376207A (en) * 1965-05-17 1968-04-02 Patent Serm Ag Electrodeposition of nickel and electrolytes therefor
US3697392A (en) * 1970-07-02 1972-10-10 Allied Res Prod Inc Electrodeposition of nickel

Also Published As

Publication number Publication date
DE2718284A1 (de) 1977-12-29
PL198944A1 (pl) 1978-03-13
NL7706722A (nl) 1977-12-20
US4069112A (en) 1978-01-17
DK271177A (da) 1977-12-19
BE855425A (fr) 1977-10-03
MX4434E (es) 1982-05-04
ES457484A1 (es) 1978-03-16
BR7702667A (pt) 1978-03-28
GB1521238A (en) 1978-08-16
NO772116L (no) 1977-12-20
CA1081650A (fr) 1980-07-15
SE7703113L (sv) 1977-12-19
AU2288577A (en) 1978-09-07
JPS52156138A (en) 1977-12-26
AR216911A1 (es) 1980-02-15
FR2355096A1 (fr) 1978-01-13
AU509447B2 (en) 1980-05-15
IT1080255B (it) 1985-05-16
NZ183529A (en) 1979-01-11

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