ZA928055B - Photosensitive elastomer polymer composition for flexographic printing plates processible in aqueous solutions - Google Patents

Photosensitive elastomer polymer composition for flexographic printing plates processible in aqueous solutions

Info

Publication number
ZA928055B
ZA928055B ZA928055A ZA928055A ZA928055B ZA 928055 B ZA928055 B ZA 928055B ZA 928055 A ZA928055 A ZA 928055A ZA 928055 A ZA928055 A ZA 928055A ZA 928055 B ZA928055 B ZA 928055B
Authority
ZA
South Africa
Prior art keywords
processible
polymer composition
aqueous solutions
flexographic printing
printing plates
Prior art date
Application number
ZA928055A
Other languages
English (en)
Inventor
Arthur Leroy Berrier
Rustom Sam Kanga
Original Assignee
Grace W R & Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Grace W R & Co filed Critical Grace W R & Co
Publication of ZA928055B publication Critical patent/ZA928055B/xx

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers

Landscapes

  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Polymerisation Methods In General (AREA)
  • Graft Or Block Polymers (AREA)
  • Paints Or Removers (AREA)
ZA928055A 1991-11-19 1992-10-19 Photosensitive elastomer polymer composition for flexographic printing plates processible in aqueous solutions ZA928055B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US79428591A 1991-11-19 1991-11-19

Publications (1)

Publication Number Publication Date
ZA928055B true ZA928055B (en) 1994-04-19

Family

ID=25162224

Family Applications (1)

Application Number Title Priority Date Filing Date
ZA928055A ZA928055B (en) 1991-11-19 1992-10-19 Photosensitive elastomer polymer composition for flexographic printing plates processible in aqueous solutions

Country Status (7)

Country Link
EP (1) EP0543632A1 (ja)
JP (1) JPH05265207A (ja)
AU (1) AU663339B2 (ja)
BR (1) BR9204350A (ja)
CA (1) CA2081426A1 (ja)
NZ (1) NZ244718A (ja)
ZA (1) ZA928055B (ja)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW353158B (en) * 1994-03-09 1999-02-21 Nat Starch Chem Invest Aqueous photoresist composition, method for preparing the same and circuit board comprising thereof
ATE187190T1 (de) * 1995-06-15 1999-12-15 Raychem Ltd Gele hergestellt aus triblockkopolymeren
US5919604A (en) * 1997-07-30 1999-07-06 Polyfibron Technologies, Inc. Rubber-based aqueous developable photopolymers and photocurable elements comprising same
AU2001250391A1 (en) * 2000-03-16 2001-09-24 Kraton Polymers Research B.V. Polymeric composition
JP5237858B2 (ja) * 2008-03-04 2013-07-17 株式会社クラレ メタクリル系樹脂用改質剤
KR20160102986A (ko) * 2013-12-27 2016-08-31 요코하마 고무 가부시키가이샤 자외선 경화형 수지 조성물 및 적층체

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CA1099435A (en) * 1971-04-01 1981-04-14 Gwendyline Y. Y. T. Chen Photosensitive block copolymer composition and elements
JPH0284343A (ja) * 1988-03-16 1990-03-26 Canon Inc 液体噴射記録ヘッド
US5135837A (en) * 1990-09-05 1992-08-04 E. I. Du Pont De Nemours And Company Photosensitive elastomeric element having improved solvent resistance
DE9016663U1 (de) * 1990-10-11 1991-02-28 Hoechst Ag, 65929 Frankfurt Neue amphiphile elastomere Blockcopolymerisate
DE4032238A1 (de) * 1990-10-11 1992-04-23 Hoechst Ag Lichthaertbares elastomeres gemisch und daraus erhaltenes aufzeichnungsmaterial fuer die herstellung von reliefdruckplatten

Also Published As

Publication number Publication date
CA2081426A1 (en) 1993-05-20
AU663339B2 (en) 1995-10-05
EP0543632A1 (en) 1993-05-26
BR9204350A (pt) 1993-05-25
AU2733892A (en) 1993-05-20
JPH05265207A (ja) 1993-10-15
NZ244718A (en) 1995-04-27

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