ZW21279A1 - Photopolymerisable compositions - Google Patents

Photopolymerisable compositions

Info

Publication number
ZW21279A1
ZW21279A1 ZW212/79A ZW21279A ZW21279A1 ZW 21279 A1 ZW21279 A1 ZW 21279A1 ZW 212/79 A ZW212/79 A ZW 212/79A ZW 21279 A ZW21279 A ZW 21279A ZW 21279 A1 ZW21279 A1 ZW 21279A1
Authority
ZW
Zimbabwe
Prior art keywords
polymerisation
acid
compositions
under
photopolymerisable compositions
Prior art date
Application number
ZW212/79A
Other languages
English (en)
Inventor
Robert Clayton Mcguiness
Anthony Ledwith
Original Assignee
Ici Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ici Ltd filed Critical Ici Ltd
Publication of ZW21279A1 publication Critical patent/ZW21279A1/xx

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G65/00—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule
    • C08G65/02—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from cyclic ethers by opening of the heterocyclic ring
    • C08G65/04—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from cyclic ethers by opening of the heterocyclic ring from cyclic ethers only
    • C08G65/06—Cyclic ethers having no atoms other than carbon and hydrogen outside the ring
    • C08G65/08—Saturated oxiranes
    • C08G65/10—Saturated oxiranes characterised by the catalysts used
    • C08G65/105—Onium compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable

Landscapes

  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Medicinal Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Paints Or Removers (AREA)
  • Polymerisation Methods In General (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Polymerization Catalysts (AREA)
  • Electrochromic Elements, Electrophoresis, Or Variable Reflection Or Absorption Elements (AREA)
  • Polyethers (AREA)
  • Other Resins Obtained By Reactions Not Involving Carbon-To-Carbon Unsaturated Bonds (AREA)
  • Epoxy Resins (AREA)
ZW212/79A 1978-10-27 1979-10-24 Photopolymerisable compositions ZW21279A1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GB7842235 1978-10-27

Publications (1)

Publication Number Publication Date
ZW21279A1 true ZW21279A1 (en) 1981-05-27

Family

ID=10500642

Family Applications (1)

Application Number Title Priority Date Filing Date
ZW212/79A ZW21279A1 (en) 1978-10-27 1979-10-24 Photopolymerisable compositions

Country Status (12)

Country Link
EP (1) EP0010897B1 (fr)
JP (1) JPS5560521A (fr)
AT (1) ATE6002T1 (fr)
AU (1) AU5195979A (fr)
CA (1) CA1126436A (fr)
DE (1) DE2966584D1 (fr)
DK (1) DK453579A (fr)
ES (1) ES485415A1 (fr)
IE (1) IE49092B1 (fr)
NZ (1) NZ191925A (fr)
ZA (1) ZA795794B (fr)
ZW (1) ZW21279A1 (fr)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4351708A (en) * 1980-02-29 1982-09-28 Ciba-Geigy Corporation Photochemically or thermally polymerizable mixtures
US4336366A (en) * 1980-02-29 1982-06-22 Ciba-Geigy Corporation Thermally polymerizable mixtures and processes for the thermally-initiated polymerization of cationically polymerizable compounds
DE3107087A1 (de) * 1980-02-29 1981-12-24 CIBA-GEIGY AG, 4002 Basel "photopolymerisierbare gemische und verfahren zur photopolymerisation von kationisch polymerisierbaren verbindungen"
US4564578A (en) * 1982-11-25 1986-01-14 Ciba-Geigy Corporation Novel thioxanthones substituted by alpha-aminoalkyl groups
JPS61500974A (ja) * 1983-10-28 1986-05-15 ロクタイト．コ−ポレ−シヨン ２つの硬化タイプのプレポリマ−を含む光硬化性組成物
GB8332073D0 (en) * 1983-12-01 1984-01-11 Ciba Geigy Ag Polymerisable compositions
DE3639955A1 (de) * 1986-11-22 1988-05-26 Wolfen Filmfab Veb Verfahren zur herstellung fotopolymerisierbarer materialien
DE3641053A1 (de) * 1986-12-19 1988-06-16 Wolfen Filmfab Veb Fotopolymerisierbares material
US4800152A (en) * 1987-03-16 1989-01-24 International Business Machines Corporation Negative resist compositions
IE872653L (en) * 1987-10-05 1989-04-05 Hoffmann La Roche Cationically curable compositions
JPH01238656A (ja) * 1988-03-18 1989-09-22 Nippon Paint Co Ltd 高感度光重合性組成物
US6635195B1 (en) * 2000-02-04 2003-10-21 Essilor International Compagnie Generale D'optique Cationic photopolymerization of diepisulfides and application to the manufacture of optical lenses

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4028204A (en) * 1971-11-18 1977-06-07 Sun Chemical Corporation Photopolymerizable compounds and compositions comprising the product of the reaction of a resin and a polycarboxy-substituted benzophenone
US3741769A (en) * 1972-10-24 1973-06-26 Minnesota Mining & Mfg Novel photosensitive polymerizable systems and their use
GB1539192A (en) * 1975-01-27 1979-01-31 Ici Ltd Photopolymerisable compositions
US4256828A (en) * 1975-09-02 1981-03-17 Minnesota Mining And Manufacturing Company Photocopolymerizable compositions based on epoxy and hydroxyl-containing organic materials

Also Published As

Publication number Publication date
DK453579A (da) 1980-04-28
IE49092B1 (en) 1985-07-24
DE2966584D1 (en) 1984-03-01
EP0010897A3 (en) 1981-01-21
ZA795794B (en) 1980-10-29
EP0010897B1 (fr) 1984-01-25
AU5195979A (en) 1981-04-30
JPS5560521A (en) 1980-05-07
NZ191925A (en) 1981-12-15
ES485415A1 (es) 1980-09-01
ATE6002T1 (de) 1984-02-15
IE792031L (en) 1980-04-27
EP0010897A2 (fr) 1980-05-14
CA1126436A (fr) 1982-06-22

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