ATA163695A - 2-hydroxyphenyltriazine - Google Patents

2-hydroxyphenyltriazine

Info

Publication number
ATA163695A
ATA163695A AT0163695A AT163695A ATA163695A AT A163695 A ATA163695 A AT A163695A AT 0163695 A AT0163695 A AT 0163695A AT 163695 A AT163695 A AT 163695A AT A163695 A ATA163695 A AT A163695A
Authority
AT
Austria
Prior art keywords
hydroxyphenyltriazine
Prior art date
Application number
AT0163695A
Other languages
English (en)
Other versions
AT405515B (de
Original Assignee
Ciba Sc Holding Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ciba Sc Holding Ag filed Critical Ciba Sc Holding Ag
Publication of ATA163695A publication Critical patent/ATA163695A/de
Application granted granted Critical
Publication of AT405515B publication Critical patent/AT405515B/de

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D251/00—Heterocyclic compounds containing 1,3,5-triazine rings
    • C07D251/02—Heterocyclic compounds containing 1,3,5-triazine rings not condensed with other rings
    • C07D251/12—Heterocyclic compounds containing 1,3,5-triazine rings not condensed with other rings having three double bonds between ring members or between ring members and non-ring members
    • C07D251/14—Heterocyclic compounds containing 1,3,5-triazine rings not condensed with other rings having three double bonds between ring members or between ring members and non-ring members with hydrogen or carbon atoms directly attached to at least one ring carbon atom
    • C07D251/24—Heterocyclic compounds containing 1,3,5-triazine rings not condensed with other rings having three double bonds between ring members or between ring members and non-ring members with hydrogen or carbon atoms directly attached to at least one ring carbon atom to three ring carbon atoms
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F12/00—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an aromatic carbocyclic ring
    • C08F12/02—Monomers containing only one unsaturated aliphatic radical
    • C08F12/04—Monomers containing only one unsaturated aliphatic radical containing one ring
    • C08F12/14—Monomers containing only one unsaturated aliphatic radical containing one ring substituted by hetero atoms or groups containing heteroatoms
    • C08F12/26—Nitrogen
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F20/00—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride, ester, amide, imide or nitrile thereof
    • C08F20/02—Monocarboxylic acids having less than ten carbon atoms, Derivatives thereof
    • C08F20/10—Esters
    • C08F20/34—Esters containing nitrogen, e.g. N,N-dimethylaminoethyl (meth)acrylate
    • C08F20/36—Esters containing nitrogen, e.g. N,N-dimethylaminoethyl (meth)acrylate containing oxygen in addition to the carboxy oxygen, e.g. 2-N-morpholinoethyl (meth)acrylate or 2-isocyanatoethyl (meth)acrylate
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F212/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an aromatic carbocyclic ring
    • C08F212/02—Monomers containing only one unsaturated aliphatic radical
    • C08F212/04—Monomers containing only one unsaturated aliphatic radical containing one ring
    • C08F212/06—Hydrocarbons
    • C08F212/08—Styrene
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F212/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an aromatic carbocyclic ring
    • C08F212/02—Monomers containing only one unsaturated aliphatic radical
    • C08F212/04—Monomers containing only one unsaturated aliphatic radical containing one ring
    • C08F212/14—Monomers containing only one unsaturated aliphatic radical containing one ring substituted by heteroatoms or groups containing heteroatoms
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/04—Acids; Metal salts or ammonium salts thereof
    • C08F220/06—Acrylic acid; Methacrylic acid; Metal salts or ammonium salts thereof
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/10—Esters
    • C08F220/12—Esters of monohydric alcohols or phenols
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/42—Nitriles
    • C08F220/44—Acrylonitrile
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/52—Amides or imides
    • C08F220/54—Amides, e.g. N,N-dimethylacrylamide or N-isopropylacrylamide
    • C08F220/56—Acrylamide; Methacrylamide
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F226/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a single or double bond to nitrogen or by a heterocyclic ring containing nitrogen
    • C08F226/06—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a single or double bond to nitrogen or by a heterocyclic ring containing nitrogen by a heterocyclic ring containing nitrogen
    • C08F226/08—N-Vinyl-pyrrolidine
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F226/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a single or double bond to nitrogen or by a heterocyclic ring containing nitrogen
    • C08F226/06—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a single or double bond to nitrogen or by a heterocyclic ring containing nitrogen by a heterocyclic ring containing nitrogen
    • C08F226/10—N-Vinyl-pyrrolidone
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00—Use of organic ingredients
    • C08K5/0008—Organic ingredients according to more than one of the "one dot" groups of C08K5/01 - C08K5/59
    • C08K5/005—Stabilisers against oxidation, heat, light, ozone
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00—Use of organic ingredients
    • C08K5/16—Nitrogen-containing compounds
    • C08K5/34—Heterocyclic compounds having nitrogen in the ring
    • C08K5/3467—Heterocyclic compounds having nitrogen in the ring having more than two nitrogen atoms in the ring
    • C08K5/3477—Six-membered rings
    • C08K5/3492—Triazines
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D7/00—Features of coating compositions, not provided for in group C09D5/00; Processes for incorporating ingredients in coating compositions
    • C09D7/40—Additives
    • C09D7/48—Stabilisers against degradation by oxygen, light or heat
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C1/00—Photosensitive materials
    • G03C1/76—Photosensitive materials characterised by the base or auxiliary layers
    • G03C1/815—Photosensitive materials characterised by the base or auxiliary layers characterised by means for filtering or absorbing ultraviolet light, e.g. optical bleaching
    • G03C1/8155—Organic compounds therefor
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00—Use of organic ingredients
    • C08K5/16—Nitrogen-containing compounds
    • C08K5/34—Heterocyclic compounds having nitrogen in the ring
    • C08K5/3467—Heterocyclic compounds having nitrogen in the ring having more than two nitrogen atoms in the ring
    • C08K5/3477—Six-membered rings
    • C08K5/3492—Triazines
    • C08K5/34926—Triazines also containing heterocyclic groups other than triazine groups

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Health & Medical Sciences (AREA)
  • Materials Engineering (AREA)
  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Wood Science & Technology (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Plural Heterocyclic Compounds (AREA)
  • Anti-Oxidant Or Stabilizer Compositions (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Pharmaceuticals Containing Other Organic And Inorganic Compounds (AREA)
  • Macromolecular Compounds Obtained By Forming Nitrogen-Containing Linkages In General (AREA)
  • Heterocyclic Carbon Compounds Containing A Hetero Ring Having Nitrogen And Oxygen As The Only Ring Hetero Atoms (AREA)
  • Materials For Photolithography (AREA)
  • Silicon Polymers (AREA)
  • Hydrogenated Pyridines (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
AT0163695A 1994-10-04 1995-10-03 2-hydroxyphenyltriazine AT405515B (de)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
CH298994 1994-10-04
CH303994 1994-10-10
CH36495 1995-02-08

Publications (2)

Publication Number Publication Date
ATA163695A true ATA163695A (de) 1999-01-15
AT405515B AT405515B (de) 1999-09-27

Family

ID=27172042

Family Applications (1)

Application Number Title Priority Date Filing Date
AT0163695A AT405515B (de) 1994-10-04 1995-10-03 2-hydroxyphenyltriazine

Country Status (17)

Country Link
US (2) US5672704A (de)
JP (1) JP4126400B2 (de)
KR (2) KR960014109A (de)
CN (1) CN1070186C (de)
AT (1) AT405515B (de)
AU (1) AU698297B2 (de)
BE (1) BE1008871A5 (de)
BR (1) BR9504276A (de)
CA (1) CA2159694A1 (de)
CZ (1) CZ255695A3 (de)
DE (1) DE19536730A1 (de)
ES (1) ES2106684B1 (de)
FR (1) FR2725204B1 (de)
GB (1) GB2293823B (de)
IT (1) IT1281195B1 (de)
NL (1) NL1001338C2 (de)
SK (1) SK123095A3 (de)

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CH692739A5 (de) * 1996-03-26 2002-10-15 Ciba Sc Holding Ag Polymerzusammensetzungen enthaltend 2-Hydroxyphenyl-1,3,5-triazine als UV-Absorber sowie neue 2-Hydroxyphenyl-1,3,5-triazine
EP0834304B1 (de) * 1996-09-17 2005-01-26 Ciba SC Holding AG Verwendung liposomogener UV-Absorber zum Schutz des Haars
DE19735901A1 (de) * 1997-08-19 1999-02-25 Beiersdorf Ag Kosmetische oder dermatologische Lichtschutzmittel, welche als Festkörper vorliegende UV-Filtersubstanzen und polymere UV-Filtersubstanzen auf Siliconbasis enthalten
DE19735900A1 (de) * 1997-08-19 1999-02-25 Beiersdorf Ag Kosmetische oder dermatologische Lichtschutzmittel, welche gelöste Triazinderivate und polymere UV-Filtersubstanzen auf Siliconbasis enthalten
US6239276B1 (en) 1998-06-22 2001-05-29 Cytec Technology Corporation Non-yellowing para-tertiary-alkyl phenyl substituted triazine and pyrimidine ultraviolet light absorbers
JP2002518485A (ja) * 1998-06-22 2002-06-25 チバ スペシャルティ ケミカルズ ホールディング インコーポレーテッド ヒンダードフェノールを含むトリスアリール−１，３，５−トリアジン紫外光吸収剤
US6297377B1 (en) 1998-06-22 2001-10-02 Cytec Technology Corporation Benzocycle-substituted triazine and pyrimidine ultraviolet light absorbers
ZA9810599B (en) * 1998-06-22 1999-07-30 Cytec Tech Corp Triazine UV absorber comprising amino resins.
DE69924490T2 (de) 1998-06-22 2006-01-19 Ciba Speciality Chemicals Holding Inc. Poly-trisaryl-1,3,5-triazin-carbamate als uv-lichtabsorber
WO2000014076A1 (en) * 1998-09-04 2000-03-16 Ciba Specialty Chemicals Holding Inc. Process for making 2,4-dihydroxyphenyl and 2-hydroxy-4-alkoxyphenyl substituted triazine compounds
TWI259182B (en) 1998-11-17 2006-08-01 Cytec Tech Corp Process for preparing triazines using a combination of Lewis acids with reaction promoters
JP4873782B2 (ja) * 1998-12-23 2012-02-08 チバ ホールディング インコーポレーテッド 低い多分散性を有するポリマー状安定剤
EP1094094A4 (de) * 1999-04-12 2002-07-24 Asahi Denka Kogyo Kk Zusammensetzung aus polymermaterial
US6191199B1 (en) * 1999-05-03 2001-02-20 Ciba Speciatly Chemicals Corporation Stabilized adhesive compositions containing highly soluble, high extinction photostable hydroxyphenyl-s-triazine UV absorbers and laminated articles derived therefrom
US6867250B1 (en) 2000-10-30 2005-03-15 Cytec Technology Corp. Non-yellowing ortho-dialkyl aryl substituted triazine ultraviolet light absorbers
US6855269B2 (en) 2001-11-09 2005-02-15 Cytec Technology Corp. Phenyl ether-substituted hydroxyphenyl triazine ultraviolet light absorbers
JP2005510611A (ja) * 2001-11-30 2005-04-21 チバ　スペシャルティ　ケミカルズ　ホールディング　インコーポレーテッド ポリマーネットワーク用２−ヒドロキシフェニル−ｓ−トリアジン架橋剤
JP2004099115A (ja) * 2002-07-16 2004-04-02 Misawa Homes Co Ltd 木質様成形品、製造装置及び製造方法
ES2262033T3 (es) * 2003-01-09 2006-11-16 Alcon, Inc. Absorvedores de luz uv con doble funcion para materiales de lentes oftalmicas.
US7279527B2 (en) * 2005-04-22 2007-10-09 Bridgestone Corporation Method of converting anionic living end to protected free radical living end and applications thereof
EP1888539B1 (de) * 2005-06-10 2013-09-18 Basf Se Hydroxyphenyltriazine mit einem aromatischen, carbocyclischen, fusionierten ringsystem
US20080008620A1 (en) * 2006-06-23 2008-01-10 Alkis Alexiadis Bimodal light bulb and devices for sterilizing and cleansing
US7396887B1 (en) * 2006-12-29 2008-07-08 Bridgestone Corporation Insitu removal of chelator from anionic polymerization reactions
US8030410B2 (en) * 2006-12-29 2011-10-04 Bridgestone Corporation Method for generating free radical capable polymers using carbonyl-containing compounds
US7560509B2 (en) * 2006-12-29 2009-07-14 Bridgestone Corporation Method of directing grafting by controlling the location of high vinyl segments in a polymer
US7737218B2 (en) * 2006-12-29 2010-06-15 Bridgestone Corporation Method for generating free radical capable polymers using tin or silicon halide compounds
US20080157641A1 (en) * 2006-12-31 2008-07-03 Rachael Wren Grout Multi-use Free Standing Seating and Storage Unit
CN101743261B (zh) * 2007-07-13 2013-04-03 昭和电工株式会社 含有三嗪环的高分子化合物和使用该高分子化合物的有机发光元件
JP5675647B2 (ja) 2009-01-19 2015-02-25 ビーエーエスエフ ソシエタス・ヨーロピアＢａｓｆ Ｓｅ 有機黒色顔料およびその製造
JP5613481B2 (ja) * 2009-07-29 2014-10-22 富士フイルム株式会社 新規なトリアジン誘導体、紫外線吸収剤
JP2012114125A (ja) * 2010-11-19 2012-06-14 Fujifilm Corp 太陽電池封止材及びそれを用いた太陽電池モジュール
WO2013083565A1 (en) * 2011-12-05 2013-06-13 Arizona Chemical Company, Llc Uv-protecting rosin
US20150210651A1 (en) 2012-08-23 2015-07-30 Bayer Materialscience Ag Vapour deposition of organic uv absorbers onto plastic substrates
KR102194159B1 (ko) 2012-12-20 2020-12-22 쓰리엠 이노베이티브 프로퍼티즈 캄파니 자외선 흡수 기를 갖는 올리고머를 포함하는 플루오로중합체 조성물
US20160017169A1 (en) 2013-02-01 2016-01-21 Bayer Materialscience Ag Uv-curable coating composition
US9593088B2 (en) 2013-02-01 2017-03-14 Covestro Deutschland Ag Method for producing a polymerizable UV absorber
CN106661365B (zh) 2014-06-25 2019-03-01 3M创新有限公司 包含至少一种低聚物的含氟聚合物组合物
US11110689B2 (en) 2014-06-25 2021-09-07 3M Innovative Properties Company Pressure sensitive adhesive composition including ultraviolet light-absorbing oligomer
JP2017528537A (ja) * 2014-06-25 2017-09-28 スリーエム イノベイティブ プロパティズ カンパニー トリアジン基を含むコポリマー、並びにそれらを含む組成物
US10519350B2 (en) 2015-06-25 2019-12-31 3M Innovative Properties Company Copolymer including ultraviolet light-absorbing group and compositions including the same
CN110678448A (zh) * 2017-05-25 2020-01-10 株式会社Adeka 三嗪化合物、固化性组合物、固化物的制造方法及其固化物
CN107935952B (zh) * 2017-12-01 2019-11-15 北京天罡助剂有限责任公司 一种三嗪-5的制备方法

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CH484695A (de) * 1962-10-30 1970-01-31 Ciba Geigy Verwendung von neuen Hydroxyphenyl-1,3,5-triazinen als Ultraviolettschutzmittel ausserhalb der Textilindustrie
NL130993C (de) * 1963-02-07
CH469053A (de) * 1963-07-26 1969-02-28 Ciba Geigy Verwendung von neuen Hydroxyphenyl-1,3,5-triazinen als Schutzmittel gegen Ultraviolettstrahlung für nichttextile organische Materialien
CH485484A (de) * 1964-12-04 1970-02-15 Ciba Geigy Verwendung von neuen Hydroxyphenyl-1,3,5-triazinen als Schutzmittel gegen Ultraviollettstrahlung für organische Materialien ausserhalb der Textilindustrie
CH481954A (de) * 1965-11-09 1969-11-30 Ciba Geigy Verfahren zur Herstellung von gegen die Einwirkung ultravioletter Strahlen geschützten Polymeren
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EP0434619B1 (de) * 1989-12-21 1995-09-06 Ciba SC Holding AG Verfahren zum Einbau von O-Hydroxyphenyl-S-triazinen in organische Polymere
EP0530135A1 (de) * 1991-06-03 1993-03-03 Ciba-Geigy Ag UV-Absorber enthaltendes photographisches Material
EP0520938B1 (de) * 1991-06-03 1997-09-24 Ciba SC Holding AG UV-Absorber enthaltendes photographisches Material
DE59208885D1 (de) * 1991-09-05 1997-10-16 Ciba Geigy Ag UV-Absorber enthaltendes photographisches Material

Also Published As

Publication number Publication date
NL1001338A1 (nl) 1996-04-04
GB9520046D0 (en) 1995-12-06
ITMI952019A0 (de) 1995-10-03
AU698297B2 (en) 1998-10-29
KR100496131B1 (ko) 2005-06-17
JPH08259545A (ja) 1996-10-08
AU3304995A (en) 1996-04-18
CZ255695A3 (en) 1996-04-17
CA2159694A1 (en) 1996-04-05
US5672704A (en) 1997-09-30
ITMI952019A1 (it) 1997-04-03
SK123095A3 (en) 1996-06-05
ES2106684B1 (es) 1998-07-01
ES2106684A1 (es) 1997-11-01
FR2725204A1 (fr) 1996-04-05
US5869588A (en) 1999-02-09
NL1001338C2 (nl) 1996-04-12
AT405515B (de) 1999-09-27
IT1281195B1 (it) 1998-02-17
CN1130625A (zh) 1996-09-11
BR9504276A (pt) 1996-10-01
BE1008871A5 (fr) 1996-08-06
DE19536730A1 (de) 1996-04-11
KR960014109A (ko) 1996-05-22
GB2293823B (en) 1997-01-22
CN1070186C (zh) 2001-08-29
JP4126400B2 (ja) 2008-07-30
GB2293823A (en) 1996-04-10
FR2725204B1 (fr) 1997-06-06

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