ATE109925T1 - Verfahren zur herstellung eines flachen bildschirms mit aktiver matrix und einer ram die mim bauelemente verwendet. - Google Patents

Verfahren zur herstellung eines flachen bildschirms mit aktiver matrix und einer ram die mim bauelemente verwendet.

Info

Publication number
ATE109925T1
ATE109925T1 AT89403632T AT89403632T ATE109925T1 AT E109925 T1 ATE109925 T1 AT E109925T1 AT 89403632 T AT89403632 T AT 89403632T AT 89403632 T AT89403632 T AT 89403632T AT E109925 T1 ATE109925 T1 AT E109925T1
Authority
AT
Austria
Prior art keywords
active matrix
ram
making
flat panel
matrix flat
Prior art date
Application number
AT89403632T
Other languages
English (en)
Inventor
Patrick Sangouard
Original Assignee
Chambre De Commerce Et D Ind D
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Chambre De Commerce Et D Ind D filed Critical Chambre De Commerce Et D Ind D
Application granted granted Critical
Publication of ATE109925T1 publication Critical patent/ATE109925T1/de

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10B—ELECTRONIC MEMORY DEVICES
    • H10B12/00—Dynamic random access memory [DRAM] devices
    • H10B12/30—DRAM devices comprising one-transistor - one-capacitor [1T-1C] memory cells
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D86/00—Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N70/00—Solid-state devices having no potential barriers, and specially adapted for rectifying, amplifying, oscillating or switching

Landscapes

  • Liquid Crystal (AREA)
  • Glass Compositions (AREA)
  • Electrochromic Elements, Electrophoresis, Or Variable Reflection Or Absorption Elements (AREA)
  • Semiconductor Memories (AREA)
  • Nitrogen And Oxygen Or Sulfur-Condensed Heterocyclic Ring Systems (AREA)
  • Steroid Compounds (AREA)
  • Devices For Indicating Variable Information By Combining Individual Elements (AREA)
AT89403632T 1988-12-27 1989-12-22 Verfahren zur herstellung eines flachen bildschirms mit aktiver matrix und einer ram die mim bauelemente verwendet. ATE109925T1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR8817246A FR2641645B1 (fr) 1988-12-27 1988-12-27 Procede de realisation d'un composant mim et application a la realisation d'un ecran plat ou d'une ram

Publications (1)

Publication Number Publication Date
ATE109925T1 true ATE109925T1 (de) 1994-08-15

Family

ID=9373472

Family Applications (1)

Application Number Title Priority Date Filing Date
AT89403632T ATE109925T1 (de) 1988-12-27 1989-12-22 Verfahren zur herstellung eines flachen bildschirms mit aktiver matrix und einer ram die mim bauelemente verwendet.

Country Status (9)

Country Link
US (1) US5086009A (de)
EP (1) EP0376830B1 (de)
JP (1) JPH02226231A (de)
AT (1) ATE109925T1 (de)
CA (1) CA2006465A1 (de)
DE (1) DE68917450T2 (de)
FI (1) FI896139A7 (de)
FR (1) FR2641645B1 (de)
IL (1) IL92771A0 (de)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB9117680D0 (en) * 1991-08-16 1991-10-02 Philips Electronic Associated Electronic matrix array devices
US5422293A (en) * 1991-12-24 1995-06-06 Casio Computer Co., Ltd. Method for manufacturing a TFT panel
KR950008931B1 (ko) * 1992-07-22 1995-08-09 삼성전자주식회사 표시패널의 제조방법
JP3302187B2 (ja) * 1994-08-18 2002-07-15 キヤノン株式会社 薄膜トランジスタ、これを用いた半導体装置、液晶表示装置
US6040201A (en) 1996-09-17 2000-03-21 Citizen Watch Co., Ltd. Method of manufacturing thin film diode
JP4497601B2 (ja) * 1999-11-01 2010-07-07 シャープ株式会社 液晶表示装置の製造方法
US7737357B2 (en) * 2006-05-04 2010-06-15 Sunpower Corporation Solar cell having doped semiconductor heterojunction contacts

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4838656A (en) * 1980-10-06 1989-06-13 Andus Corporation Transparent electrode fabrication
FR2505070B1 (fr) * 1981-01-16 1986-04-04 Suwa Seikosha Kk Dispositif non lineaire pour un panneau d'affichage a cristaux liquides et procede de fabrication d'un tel panneau d'affichage
AT371388B (de) * 1981-10-09 1983-06-27 Voest Alpine Ag Plattenkokille zum stranggiessen
JPS60149025A (ja) * 1984-01-13 1985-08-06 Seiko Epson Corp 液晶表示装置
EP0197991B1 (de) * 1984-10-17 1989-01-18 ETAT FRANCAIS représenté par le Ministre des PTT (Centre National d'Etudes des Télécommunications) Verfahren zum herstellen von elektrischen schaltkreisen mit dünnschichtigen transistoren und kondensatoren
US4828370A (en) * 1985-10-04 1989-05-09 Seiko Instruments & Electronics Ltd. Switching element with nonlinear resistive, nonstoichiometric material
JPH0754388B2 (ja) * 1986-08-04 1995-06-07 株式会社リコー Ｍｉｍアクテイブマトリツクス液晶表示素子
US4907040A (en) * 1986-09-17 1990-03-06 Konishiroku Photo Industry Co., Ltd. Thin film Schottky barrier device
JP2816549B2 (ja) * 1986-10-22 1998-10-27 セイコーインスツルメンツ株式会社 電気光学装置
JP2695635B2 (ja) * 1987-04-10 1998-01-14 シチズン時計株式会社 液晶表示装置

Also Published As

Publication number Publication date
JPH02226231A (ja) 1990-09-07
US5086009A (en) 1992-02-04
CA2006465A1 (en) 1990-06-27
DE68917450T2 (de) 1995-03-30
FR2641645B1 (fr) 1991-04-26
EP0376830A1 (de) 1990-07-04
FI896139A7 (fi) 1990-06-28
DE68917450D1 (de) 1994-09-15
EP0376830B1 (de) 1994-08-10
FR2641645A1 (fr) 1990-07-13
IL92771A0 (en) 1990-09-17
FI896139A0 (fi) 1989-12-20

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Legal Events

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