ATE323132T1 - Eine zusammensetzung enthaltend einen vernetzbaren matrixpercursor und eine porenstruktur bildendes material und eine daraus hergestellte poröse matrix - Google Patents
Eine zusammensetzung enthaltend einen vernetzbaren matrixpercursor und eine porenstruktur bildendes material und eine daraus hergestellte poröse matrixInfo
- Publication number
- ATE323132T1 ATE323132T1 AT99962822T AT99962822T ATE323132T1 AT E323132 T1 ATE323132 T1 AT E323132T1 AT 99962822 T AT99962822 T AT 99962822T AT 99962822 T AT99962822 T AT 99962822T AT E323132 T1 ATE323132 T1 AT E323132T1
- Authority
- AT
- Austria
- Prior art keywords
- cross
- matrix
- percursor
- linkable
- porous
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L65/00—Compositions of macromolecular compounds obtained by reactions forming a carbon-to-carbon link in the main chain; Compositions of derivatives of such polymers
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J9/00—Working-up of macromolecular substances to porous or cellular articles or materials; After-treatment thereof
- C08J9/26—Working-up of macromolecular substances to porous or cellular articles or materials; After-treatment thereof by elimination of a solid phase from a macromolecular composition or article, e.g. leaching out
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P14/00—Formation of materials, e.g. in the shape of layers or pillars
- H10P14/60—Formation of materials, e.g. in the shape of layers or pillars of insulating materials
- H10P14/69—Inorganic materials
- H10P14/692—Inorganic materials composed of oxides, glassy oxides or oxide-based glasses
- H10P14/6921—Inorganic materials composed of oxides, glassy oxides or oxide-based glasses containing silicon
- H10P14/6922—Inorganic materials composed of oxides, glassy oxides or oxide-based glasses containing silicon the material containing Si, O and at least one of H, N, C, F or other non-metal elements, e.g. SiOC, SiOC:H or SiONC
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P14/00—Formation of materials, e.g. in the shape of layers or pillars
- H10P14/60—Formation of materials, e.g. in the shape of layers or pillars of insulating materials
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J2365/00—Characterised by the use of macromolecular compounds obtained by reactions forming a carbon-to-carbon link in the main chain; Derivatives of such polymers
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L25/00—Compositions of, homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an aromatic carbocyclic ring; Compositions of derivatives of such polymers
- C08L25/02—Homopolymers or copolymers of hydrocarbons
- C08L25/04—Homopolymers or copolymers of styrene
- C08L25/06—Polystyrene
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L2666/00—Composition of polymers characterized by a further compound in the blend, being organic macromolecular compounds, natural resins, waxes or and bituminous materials, non-macromolecular organic substances, inorganic substances or characterized by their function in the composition
- C08L2666/02—Organic macromolecular compounds, natural resins, waxes or and bituminous materials
- C08L2666/04—Macromolecular compounds according to groups C08L7/00 - C08L49/00, or C08L55/00 - C08L57/00; Derivatives thereof
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P14/00—Formation of materials, e.g. in the shape of layers or pillars
- H10P14/60—Formation of materials, e.g. in the shape of layers or pillars of insulating materials
- H10P14/63—Formation of materials, e.g. in the shape of layers or pillars of insulating materials characterised by the formation processes
- H10P14/6326—Deposition processes
- H10P14/6342—Liquid deposition, e.g. spin-coating, sol-gel techniques or spray coating
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P14/00—Formation of materials, e.g. in the shape of layers or pillars
- H10P14/60—Formation of materials, e.g. in the shape of layers or pillars of insulating materials
- H10P14/66—Formation of materials, e.g. in the shape of layers or pillars of insulating materials characterised by the type of materials
- H10P14/665—Porous materials
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P14/00—Formation of materials, e.g. in the shape of layers or pillars
- H10P14/60—Formation of materials, e.g. in the shape of layers or pillars of insulating materials
- H10P14/68—Organic materials, e.g. photoresists
- H10P14/683—Organic materials, e.g. photoresists carbon-based polymeric organic materials, e.g. polyimides, poly cyclobutene or PVC
Landscapes
- Chemical & Material Sciences (AREA)
- Polymers & Plastics (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Organic Chemistry (AREA)
- Materials Engineering (AREA)
- Engineering & Computer Science (AREA)
- Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
- Formation Of Insulating Films (AREA)
- Manufacture Of Porous Articles, And Recovery And Treatment Of Waste Products (AREA)
- Organic Insulating Materials (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Solid-Sorbent Or Filter-Aiding Compositions (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US10971098P | 1998-11-24 | 1998-11-24 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| ATE323132T1 true ATE323132T1 (de) | 2006-04-15 |
Family
ID=22329136
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| AT99962822T ATE323132T1 (de) | 1998-11-24 | 1999-11-22 | Eine zusammensetzung enthaltend einen vernetzbaren matrixpercursor und eine porenstruktur bildendes material und eine daraus hergestellte poröse matrix |
Country Status (10)
| Country | Link |
|---|---|
| US (4) | US6630520B1 (de) |
| EP (1) | EP1141128B1 (de) |
| JP (2) | JP2002530505A (de) |
| KR (1) | KR100699712B1 (de) |
| CN (1) | CN1325560C (de) |
| AT (1) | ATE323132T1 (de) |
| DE (1) | DE69930874T2 (de) |
| IL (1) | IL143207A0 (de) |
| TW (1) | TWI253456B (de) |
| WO (1) | WO2000031183A1 (de) |
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| US20020022708A1 (en) * | 2000-07-19 | 2002-02-21 | Honeywell International Inc. | Compositions and methods for thermosetting molecules in organic compositions |
| WO2002006377A1 (en) * | 2000-07-19 | 2002-01-24 | Dow Global Technologies Inc. | Spin-on-dielectric compositions with coating enhancer |
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1999
- 1999-11-22 US US09/447,011 patent/US6630520B1/en not_active Expired - Lifetime
- 1999-11-22 DE DE69930874T patent/DE69930874T2/de not_active Expired - Lifetime
- 1999-11-22 IL IL14320799A patent/IL143207A0/xx unknown
- 1999-11-22 WO PCT/US1999/027674 patent/WO2000031183A1/en not_active Ceased
- 1999-11-22 AT AT99962822T patent/ATE323132T1/de not_active IP Right Cessation
- 1999-11-22 CN CNB998136492A patent/CN1325560C/zh not_active Expired - Lifetime
- 1999-11-22 JP JP2000584005A patent/JP2002530505A/ja active Pending
- 1999-11-22 KR KR1020017006529A patent/KR100699712B1/ko not_active Expired - Lifetime
- 1999-11-22 EP EP99962822A patent/EP1141128B1/de not_active Expired - Lifetime
-
2000
- 2000-02-16 TW TW088120449A patent/TWI253456B/zh not_active IP Right Cessation
-
2002
- 2002-10-29 US US10/283,552 patent/US6887910B2/en not_active Expired - Lifetime
- 2002-10-29 US US10/283,551 patent/US6653358B2/en not_active Expired - Lifetime
-
2004
- 2004-07-16 US US10/893,640 patent/US7109249B2/en not_active Expired - Lifetime
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2010
- 2010-08-13 JP JP2010181420A patent/JP5209679B2/ja not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| US6630520B1 (en) | 2003-10-07 |
| US6887910B2 (en) | 2005-05-03 |
| EP1141128A1 (de) | 2001-10-10 |
| JP2011012272A (ja) | 2011-01-20 |
| US6653358B2 (en) | 2003-11-25 |
| EP1141128B1 (de) | 2006-04-12 |
| WO2000031183A1 (en) | 2000-06-02 |
| KR100699712B1 (ko) | 2007-03-27 |
| US7109249B2 (en) | 2006-09-19 |
| US20030092785A1 (en) | 2003-05-15 |
| DE69930874D1 (de) | 2006-05-24 |
| IL143207A0 (en) | 2002-04-21 |
| JP5209679B2 (ja) | 2013-06-12 |
| JP2002530505A (ja) | 2002-09-17 |
| CN1325560C (zh) | 2007-07-11 |
| DE69930874T2 (de) | 2006-11-02 |
| US20050014855A1 (en) | 2005-01-20 |
| US20030083392A1 (en) | 2003-05-01 |
| CN1328589A (zh) | 2001-12-26 |
| KR20010107984A (ko) | 2001-12-07 |
| TWI253456B (en) | 2006-04-21 |
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