ATE114826T1 - Beugungsgitter und herstellungsverfahren dafür. - Google Patents

Beugungsgitter und herstellungsverfahren dafür.

Info

Publication number
ATE114826T1
ATE114826T1 AT88400664T AT88400664T ATE114826T1 AT E114826 T1 ATE114826 T1 AT E114826T1 AT 88400664 T AT88400664 T AT 88400664T AT 88400664 T AT88400664 T AT 88400664T AT E114826 T1 ATE114826 T1 AT E114826T1
Authority
AT
Austria
Prior art keywords
facets
manufacturing
diffraction gratings
propagative
oriented
Prior art date
Application number
AT88400664T
Other languages
English (en)
Inventor
Jean-Pierre Laude
Original Assignee
Instruments Sa
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=8200363&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=ATE114826(T1) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by Instruments Sa filed Critical Instruments Sa
Application granted granted Critical
Publication of ATE114826T1 publication Critical patent/ATE114826T1/de

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/18—Diffraction gratings
    • G02B5/1866—Transmission gratings characterised by their structure, e.g. step profile, contours of substrate or grooves, pitch variations, materials
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S359/00—Optical: systems and elements
    • Y10S359/90—Methods

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Diffracting Gratings Or Hologram Optical Elements (AREA)
  • Optical Head (AREA)
  • Optical Integrated Circuits (AREA)
AT88400664T 1988-03-18 1988-03-18 Beugungsgitter und herstellungsverfahren dafür. ATE114826T1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
EP88400664A EP0332790B1 (de) 1988-03-18 1988-03-18 Beugungsgitter und Herstellungsverfahren dafür

Publications (1)

Publication Number Publication Date
ATE114826T1 true ATE114826T1 (de) 1994-12-15

Family

ID=8200363

Family Applications (1)

Application Number Title Priority Date Filing Date
AT88400664T ATE114826T1 (de) 1988-03-18 1988-03-18 Beugungsgitter und herstellungsverfahren dafür.

Country Status (6)

Country Link
US (1) US5080465A (de)
EP (1) EP0332790B1 (de)
JP (1) JP2852757B2 (de)
AT (1) ATE114826T1 (de)
CA (1) CA1323516C (de)
DE (1) DE3852296T2 (de)

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JPH04211202A (ja) * 1990-03-19 1992-08-03 Canon Inc 反射型回折格子および該回折格子を用いた装置
US5902034A (en) * 1992-04-08 1999-05-11 Anthony's Manufacturing Company, Inc. Display case with lens lighting system
US5895111A (en) * 1992-04-08 1999-04-20 Anthony's Manufacturing Company, Inc. Display case with lens lighting system
EP0637925B1 (de) * 1992-04-08 1998-06-03 Anthony's Manufacturing Company, Inc. Schauschrank und ein mit linsen ausgerüstetes lichtsystem dafür
JPH06194123A (ja) * 1992-12-24 1994-07-15 Canon Inc 変位検出装置
US5471372A (en) * 1993-12-06 1995-11-28 Ardco, Inc. Lighting system for commercial refrigerator doors
US5801889A (en) * 1995-08-16 1998-09-01 Eastman Kodak Company Technique to eliminate scattered light in diffractive optical elements
EP0953161B1 (de) * 1997-01-17 2004-11-17 Cymer, Inc. Reflektierender überzug für wiederholtes beugungsgitter
US6330261B1 (en) 1997-07-18 2001-12-11 Cymer, Inc. Reliable, modular, production quality narrow-band high rep rate ArF excimer laser
US6162495A (en) 1997-09-29 2000-12-19 Cymer, Inc. Protective overcoat for replicated diffraction gratings
US6511703B2 (en) * 1997-09-29 2003-01-28 Cymer, Inc. Protective overcoat for replicated diffraction gratings
US6424407B1 (en) 1998-03-09 2002-07-23 Otm Technologies Ltd. Optical translation measurement
JPH11326617A (ja) 1998-05-13 1999-11-26 Olympus Optical Co Ltd 回折光学素子を含む光学系及びその設計方法
JP3559710B2 (ja) 1998-05-25 2004-09-02 キヤノン株式会社 回折光学素子及びそれを用いた走査光学装置
US6795473B1 (en) * 1999-06-23 2004-09-21 Lambda Physik Ag Narrow band excimer laser with a prism-grating as line-narrowing optical element
FR2779534B1 (fr) * 1998-06-09 2000-07-07 Commissariat Energie Atomique Procede de fabrication de composants optiques par replication
US6608679B1 (en) * 1998-12-21 2003-08-19 Xerox Corporation Spectrophotometric analysis of input light
US6539149B1 (en) * 1999-08-10 2003-03-25 Lucent Technologies Inc. Waveguide grating router employing transmissive Echelle gratings
JP2001156393A (ja) * 1999-11-29 2001-06-08 Ando Electric Co Ltd Ｖ溝格子ミラー及びこれを用いた外部共振器型波長可変光源
US6400509B1 (en) * 2000-04-07 2002-06-04 Zolo Technologies, Inc. Apparatus and method for the reduction of polarization sensitivity in diffraction gratings used in fiber optic communications devices
US20040196556A1 (en) * 2000-06-02 2004-10-07 Cappiello Gregory G. Diffraction grating for wavelength division multiplexing/demultiplexing devices
US6577786B1 (en) 2000-06-02 2003-06-10 Digital Lightwave, Inc. Device and method for optical performance monitoring in an optical communications network
US6517734B1 (en) * 2000-07-13 2003-02-11 Network Photonics, Inc. Grating fabrication process using combined crystalline-dependent and crystalline-independent etching
WO2002010803A2 (en) * 2000-08-01 2002-02-07 James Cowan Directional diffuser
JP2002148115A (ja) * 2000-11-09 2002-05-22 Mitsubishi Gas Chem Co Inc 分光器およびそれを用いた光波長多重器
US6597452B1 (en) 2000-11-17 2003-07-22 Jobin Yvon, Inc. Compact littrow-type scanning spectrometer
US7245432B2 (en) * 2001-03-28 2007-07-17 Main Street Ventures, Llc Dual diffraction-grating device
JP2003240931A (ja) * 2001-12-13 2003-08-27 Canon Inc 回折光学素子及びその製造方法
DE10304551A1 (de) * 2003-02-04 2004-08-12 Mann + Hummel Gmbh Stellelement mit Lageerkennung
US20040183220A1 (en) * 2003-03-18 2004-09-23 Avinash Dalmia Ultra thin layer coating using self-assembled molecules as a separating layer for diffraction grating application
JP4475501B2 (ja) * 2003-10-09 2010-06-09 インターナショナル・ビジネス・マシーンズ・コーポレーション 分光素子、回折格子、複合回折格子、カラー表示装置、および分波器
US7561611B2 (en) * 2005-02-03 2009-07-14 Corning Incorporated Extended-lifetime elements for excimer lasers
US20060268418A1 (en) * 2005-05-05 2006-11-30 Kim Jong M Optical films, method of making and method of using
US8314989B1 (en) 2006-12-29 2012-11-20 Lightsmyth Technologies Inc. Decorative, ornamental, or jewelry articles having arrays of diffraction gratings
DE102007032371A1 (de) * 2007-07-06 2009-01-15 Carl Zeiss Laser Optics Gmbh Verfahren zum Beschichten eines optischen Bauelements für eine Laseranordnung
US8233218B1 (en) 2007-07-18 2012-07-31 Lightsmyth Technologies Inc. Decorative, ornamental, or jewelry articles having diffraction gratings
US8270079B1 (en) 2007-11-15 2012-09-18 Lightsmyth Technologies Inc. Decorative, ornamental, or jewelry articles having diffraction gratings
US8593732B1 (en) 2010-01-23 2013-11-26 Lightsmyth Technologies, Inc. Partially metallized total internal reflection immersion grating
JP5522448B2 (ja) * 2010-02-09 2014-06-18 株式会社ニコン 回折光学素子
GB201005964D0 (en) * 2010-04-09 2010-05-26 The Technology Partnership Plc Embedded grating structure
WO2013096974A1 (en) * 2011-12-21 2013-06-27 THE UNITED STATES OF AMERICA, as represented by THE SECRETARY DEPT. OF HEALTH AND HUMAN SERVICES Multilayer-coated micro grating array for x-ray phase sensitive and scattering sensitive imaging
TWI440833B (zh) * 2011-12-30 2014-06-11 Oto Photonics Inc 混合式繞射光柵、模具及繞射光柵及其模具的製造方法
US10422934B2 (en) * 2013-01-08 2019-09-24 Bae Systems Plc Diffraction gratings and the manufacture thereof
CN105765421B (zh) * 2013-10-29 2019-07-09 瑞士Csem电子显微技术研发中心 光栅耦合结构
JP2015169862A (ja) * 2014-03-10 2015-09-28 キヤノン株式会社 回折格子、レーザ装置、および回折格子の製造方法
US10802184B2 (en) 2014-04-28 2020-10-13 Ii-Vi Delaware Inc. Reflective diffraction gratings employing efficiency enhancement or etch barrier layers
TWI715599B (zh) 2016-07-12 2021-01-11 台灣超微光學股份有限公司 光譜儀模組及其製作方法
US10234694B2 (en) * 2016-07-15 2019-03-19 Canon U.S.A., Inc. Spectrally encoded probes
CN106547146A (zh) * 2017-01-22 2017-03-29 京东方科技集团股份有限公司 像素结构及其制造方法、阵列基板和显示装置
US10690831B2 (en) * 2018-11-20 2020-06-23 Facebook Technologies, Llc Anisotropically formed diffraction grating device
US11399709B2 (en) * 2019-03-18 2022-08-02 Welch Allyn, Inc. Speculum tip element and method for optimizing light efficiency/emission of a speculum tip element
CN112965228B (zh) * 2021-03-19 2023-01-31 重庆京东方显示照明有限公司 一种防窥膜、显示面板及显示装置
JP2025083177A (ja) * 2023-11-20 2025-05-30 キヤノン株式会社 光学素子、光学素子の製造方法および光学機器

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Publication number Priority date Publication date Assignee Title
US3237508A (en) * 1962-04-12 1966-03-01 Bausch & Lomb Reflecting diffraction grating for minimizing anomalies
US3384756A (en) * 1965-04-21 1968-05-21 Applied Res Lab Inc Peaked monochromator having a sharply blazed diffraction grating which is always operated at the peak of the blaze
FR2172883B1 (de) * 1972-02-25 1974-12-13 Anvar
JPS5092148A (de) * 1973-12-14 1975-07-23
EP0007108B1 (de) * 1978-07-18 1983-04-13 Nippon Telegraph and Telephone Public Corporation Verfahren zur Herstellung einer Beugungsgitterstruktur
JPS5965810A (ja) * 1982-10-08 1984-04-14 Hitachi Ltd 回折格子の製作方法
JPS60230601A (ja) * 1984-05-01 1985-11-16 Masayasu Negishi 膜処理方法
NL8402304A (nl) * 1984-07-20 1986-02-17 Philips Nv Beeldbuis.

Also Published As

Publication number Publication date
JP2852757B2 (ja) 1999-02-03
DE3852296T2 (de) 1995-04-13
CA1323516C (en) 1993-10-26
EP0332790B1 (de) 1994-11-30
JPH0220802A (ja) 1990-01-24
DE3852296D1 (de) 1995-01-12
EP0332790A1 (de) 1989-09-20
US5080465A (en) 1992-01-14

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