ATE145092T1 - Lawinen-photodioden-struktur - Google Patents
Lawinen-photodioden-strukturInfo
- Publication number
- ATE145092T1 ATE145092T1 AT89909025T AT89909025T ATE145092T1 AT E145092 T1 ATE145092 T1 AT E145092T1 AT 89909025 T AT89909025 T AT 89909025T AT 89909025 T AT89909025 T AT 89909025T AT E145092 T1 ATE145092 T1 AT E145092T1
- Authority
- AT
- Austria
- Prior art keywords
- pct
- date feb
- avalanche photodiode
- cyclopentadienyl
- sec
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F77/00—Constructional details of devices covered by this subclass
- H10F77/10—Semiconductor bodies
- H10F77/12—Active materials
- H10F77/124—Active materials comprising only Group III-V materials, e.g. GaAs
- H10F77/1243—Active materials comprising only Group III-V materials, e.g. GaAs characterised by the dopants
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F30/00—Individual radiation-sensitive semiconductor devices in which radiation controls the flow of current through the devices, e.g. photodetectors
- H10F30/20—Individual radiation-sensitive semiconductor devices in which radiation controls the flow of current through the devices, e.g. photodetectors the devices having potential barriers, e.g. phototransistors
- H10F30/21—Individual radiation-sensitive semiconductor devices in which radiation controls the flow of current through the devices, e.g. photodetectors the devices having potential barriers, e.g. phototransistors the devices being sensitive to infrared, visible or ultraviolet radiation
- H10F30/22—Individual radiation-sensitive semiconductor devices in which radiation controls the flow of current through the devices, e.g. photodetectors the devices having potential barriers, e.g. phototransistors the devices being sensitive to infrared, visible or ultraviolet radiation the devices having only one potential barrier, e.g. photodiodes
- H10F30/225—Individual radiation-sensitive semiconductor devices in which radiation controls the flow of current through the devices, e.g. photodetectors the devices having potential barriers, e.g. phototransistors the devices being sensitive to infrared, visible or ultraviolet radiation the devices having only one potential barrier, e.g. photodiodes the potential barrier working in avalanche mode, e.g. avalanche photodiodes
- H10F30/2255—Individual radiation-sensitive semiconductor devices in which radiation controls the flow of current through the devices, e.g. photodetectors the devices having potential barriers, e.g. phototransistors the devices being sensitive to infrared, visible or ultraviolet radiation the devices having only one potential barrier, e.g. photodiodes the potential barrier working in avalanche mode, e.g. avalanche photodiodes in which the active layers form heterostructures, e.g. SAM structures
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P32/00—Diffusion of dopants within, into or out of wafers, substrates or parts of devices
- H10P32/10—Diffusion of dopants within, into or out of semiconductor bodies or layers
- H10P32/12—Diffusion of dopants within, into or out of semiconductor bodies or layers between a solid phase and a gaseous phase
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P32/00—Diffusion of dopants within, into or out of wafers, substrates or parts of devices
- H10P32/10—Diffusion of dopants within, into or out of semiconductor bodies or layers
- H10P32/17—Diffusion of dopants within, into or out of semiconductor bodies or layers characterised by the semiconductor material
- H10P32/174—Diffusion of dopants within, into or out of semiconductor bodies or layers characterised by the semiconductor material being Group III-V material
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
- Y02E10/544—Solar cells from Group III-V materials
Landscapes
- Light Receiving Elements (AREA)
- Acyclic And Carbocyclic Compounds In Medicinal Compositions (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| GB888817886A GB8817886D0 (en) | 1988-07-27 | 1988-07-27 | Avalanche photodiode structure |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| ATE145092T1 true ATE145092T1 (de) | 1996-11-15 |
Family
ID=10641197
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| AT89909025T ATE145092T1 (de) | 1988-07-27 | 1989-07-27 | Lawinen-photodioden-struktur |
Country Status (8)
| Country | Link |
|---|---|
| US (1) | US5343055A (de) |
| EP (1) | EP0426747B1 (de) |
| JP (1) | JP2718797B2 (de) |
| AT (1) | ATE145092T1 (de) |
| CA (1) | CA1331650C (de) |
| DE (1) | DE68927439T2 (de) |
| GB (1) | GB8817886D0 (de) |
| WO (1) | WO1990001217A1 (de) |
Families Citing this family (15)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH03270277A (ja) * | 1990-03-20 | 1991-12-02 | Fujitsu Ltd | 半導体受光素子 |
| US5150176A (en) * | 1992-02-13 | 1992-09-22 | Motorola, Inc. | PN junction surge suppressor structure with moat |
| US5446308A (en) * | 1994-04-04 | 1995-08-29 | General Electric Company | Deep-diffused planar avalanche photodiode |
| US5438217A (en) * | 1994-04-29 | 1995-08-01 | General Electric Company | Planar avalanche photodiode array with sidewall segment |
| US5610416A (en) * | 1995-02-16 | 1997-03-11 | Hewlett-Packard Company | Avalanche photodiode with epitaxially regrown guard rings |
| US5650198A (en) * | 1995-08-18 | 1997-07-22 | The Regents Of The University Of California | Defect reduction in the growth of group III nitrides |
| DE19531369A1 (de) | 1995-08-25 | 1997-02-27 | Siemens Ag | Halbleiterbauelement auf Siliciumbasis mit hochsperrendem Randabschluß |
| KR19980058393A (ko) * | 1996-12-30 | 1998-10-07 | 김영환 | 애벌런치 포토 다이오드 및 그의 제조방법 |
| US5866936A (en) * | 1997-04-01 | 1999-02-02 | Hewlett-Packard Company | Mesa-structure avalanche photodiode having a buried epitaxial junction |
| US5831322A (en) * | 1997-06-25 | 1998-11-03 | Advanced Photonix, Inc. | Active large area avalanche photodiode array |
| US5757057A (en) * | 1997-06-25 | 1998-05-26 | Advanced Photonix, Inc. | Large area avalanche photodiode array |
| DE10141352A1 (de) * | 2001-08-23 | 2003-06-05 | Osram Opto Semiconductors Gmbh | Verfahren zur Oberflächenbehandlung eines Halbleiters |
| TWI240370B (en) * | 2004-08-26 | 2005-09-21 | Airoha Tech Corp | Substrate structure underlying a pad and pad structure |
| US20060121683A1 (en) * | 2004-12-08 | 2006-06-08 | Finisar Corporation | Point source diffusion for avalanche photodiodes |
| US8368159B2 (en) * | 2011-07-08 | 2013-02-05 | Excelitas Canada, Inc. | Photon counting UV-APD |
Family Cites Families (16)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3838439A (en) * | 1970-03-18 | 1974-09-24 | Texas Instruments Inc | Phototransistor having a buried base |
| US4126930A (en) * | 1975-06-19 | 1978-11-28 | Varian Associates, Inc. | Magnesium doping of AlGaAs |
| US4564720A (en) * | 1983-05-13 | 1986-01-14 | The United States Of America As Represented By The United States Department Of Energy | Pure silver ohmic contacts to N- and P- type gallium arsenide materials |
| US4525429A (en) * | 1983-06-08 | 1985-06-25 | Kennecott Corporation | Porous semiconductor dopant carriers |
| JPH0824199B2 (ja) * | 1984-05-31 | 1996-03-06 | 富士通株式会社 | 半導体受光素子の製造方法 |
| NL8403017A (nl) * | 1984-10-04 | 1986-05-01 | Philips Nv | Werkwijze voor het vervaardigen van een halfgeleiderinrichting waarbij op een halfgeleiderlichaam een met mg gedoteerde epitaxiale laag wordt afgezet. |
| DE3650287T2 (de) * | 1985-09-24 | 1995-08-10 | Toshiba Kawasaki Kk | Halbleiter-Photodetektor mit einem zweistufigen Verunreinigungsprofil. |
| JPS6269689A (ja) * | 1985-09-24 | 1987-03-30 | Toshiba Corp | 半導体受光素子 |
| JPS62205673A (ja) * | 1986-03-06 | 1987-09-10 | Toshiba Corp | アバランシエホトダイオ−ド |
| US4819039A (en) * | 1986-12-22 | 1989-04-04 | American Telephone And Telegraph Co. At&T Laboratories | Devices and device fabrication with borosilicate glass |
| JP2573201B2 (ja) * | 1987-02-26 | 1997-01-22 | 株式会社東芝 | 半導体素子の拡散層形成方法 |
| EP0304048B1 (de) * | 1987-08-19 | 1997-05-28 | Nec Corporation | Planare Avalanche-Photodiode mit Heterostruktur |
| JPH01184962A (ja) * | 1988-01-20 | 1989-07-24 | Toshiba Corp | 半導体受光素子及びその製造方法 |
| JPH02159775A (ja) * | 1988-12-14 | 1990-06-19 | Toshiba Corp | 半導体受光素子及びその製造方法 |
| US5114866A (en) * | 1989-02-10 | 1992-05-19 | Hitachi, Ltd. | Fabricating an avalanche photo diode having a step-like distribution |
| JP2970815B2 (ja) * | 1990-04-11 | 1999-11-02 | 株式会社東芝 | 半導体受光素子 |
-
1988
- 1988-07-27 GB GB888817886A patent/GB8817886D0/en active Pending
-
1989
- 1989-07-27 JP JP1508489A patent/JP2718797B2/ja not_active Expired - Lifetime
- 1989-07-27 CA CA000606774A patent/CA1331650C/en not_active Expired - Fee Related
- 1989-07-27 WO PCT/GB1989/000855 patent/WO1990001217A1/en not_active Ceased
- 1989-07-27 US US07/651,228 patent/US5343055A/en not_active Expired - Lifetime
- 1989-07-27 EP EP89909025A patent/EP0426747B1/de not_active Expired - Lifetime
- 1989-07-27 DE DE68927439T patent/DE68927439T2/de not_active Expired - Fee Related
- 1989-07-27 AT AT89909025T patent/ATE145092T1/de active
Also Published As
| Publication number | Publication date |
|---|---|
| US5343055A (en) | 1994-08-30 |
| DE68927439D1 (de) | 1996-12-12 |
| WO1990001217A1 (en) | 1990-02-08 |
| DE68927439T2 (de) | 1997-03-13 |
| GB8817886D0 (en) | 1988-09-01 |
| EP0426747B1 (de) | 1996-11-06 |
| CA1331650C (en) | 1994-08-23 |
| JP2718797B2 (ja) | 1998-02-25 |
| EP0426747A1 (de) | 1991-05-15 |
| JPH04500139A (ja) | 1992-01-09 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| DE68927439D1 (de) | Lawinen-photodioden-struktur | |
| ATE134941T1 (de) | Verbesserungen für unterschriftsstreifen | |
| TW197384B (de) | ||
| ES2030570T3 (es) | Plato giratorio. | |
| ATE143140T1 (de) | Gasmischeinrichtung | |
| FR2661714B1 (fr) | Dispositif d'alimentation en comburant d'une turbine a gaz. | |
| DK153225C (da) | Dieselbraendstof | |
| JPS5312288A (en) | Light emitting semiconductor device | |
| ES2133487T3 (es) | Monomeros de oxido de bisfosfina y policarbonatos preparados a partir de los mismos. | |
| ES454561A1 (es) | Reactor nuclear. | |
| ES293771Y (es) | Dispositivo antirrobo mediante el bloqueo del paso de combustible | |
| JPS5226786A (en) | Illuminating member | |
| JPS5424324A (en) | Liquid fuel combustion device | |
| JPS5221501A (en) | Combustor-loaded exhaust gas boiler | |
| Lynch et al. | Clearcutting in Pennsylvania | |
| JPS5353676A (en) | Novel polybenzimidazole containing quinozaline ring | |
| JPS5343134A (en) | Variable venturi type type carburettor | |
| JPS5424325A (en) | Liquid puel combustion device | |
| JPS5430321A (en) | Variable-stage carbureter | |
| JPS53127280A (en) | Semiconductor device | |
| JPS5355671A (en) | Process for thermally cracking wastes containing cyanides | |
| JPS534467A (en) | Doping method of group m# element into boron phosphide semiconductor | |
| JPS52113435A (en) | Carburetor | |
| JPS5272192A (en) | Production of light emitting diode | |
| JPS53102621A (en) | Light receiving unit |