ATE145092T1 - Lawinen-photodioden-struktur - Google Patents

Lawinen-photodioden-struktur

Info

Publication number
ATE145092T1
ATE145092T1 AT89909025T AT89909025T ATE145092T1 AT E145092 T1 ATE145092 T1 AT E145092T1 AT 89909025 T AT89909025 T AT 89909025T AT 89909025 T AT89909025 T AT 89909025T AT E145092 T1 ATE145092 T1 AT E145092T1
Authority
AT
Austria
Prior art keywords
pct
date feb
avalanche photodiode
cyclopentadienyl
sec
Prior art date
Application number
AT89909025T
Other languages
English (en)
Inventor
Lynn Davis
Myles Donald Angus Macbean
Original Assignee
British Telecomm
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by British Telecomm filed Critical British Telecomm
Application granted granted Critical
Publication of ATE145092T1 publication Critical patent/ATE145092T1/de

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F77/00—Constructional details of devices covered by this subclass
    • H10F77/10—Semiconductor bodies
    • H10F77/12—Active materials
    • H10F77/124—Active materials comprising only Group III-V materials, e.g. GaAs
    • H10F77/1243—Active materials comprising only Group III-V materials, e.g. GaAs characterised by the dopants
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F30/00—Individual radiation-sensitive semiconductor devices in which radiation controls the flow of current through the devices, e.g. photodetectors
    • H10F30/20—Individual radiation-sensitive semiconductor devices in which radiation controls the flow of current through the devices, e.g. photodetectors the devices having potential barriers, e.g. phototransistors
    • H10F30/21—Individual radiation-sensitive semiconductor devices in which radiation controls the flow of current through the devices, e.g. photodetectors the devices having potential barriers, e.g. phototransistors the devices being sensitive to infrared, visible or ultraviolet radiation
    • H10F30/22—Individual radiation-sensitive semiconductor devices in which radiation controls the flow of current through the devices, e.g. photodetectors the devices having potential barriers, e.g. phototransistors the devices being sensitive to infrared, visible or ultraviolet radiation the devices having only one potential barrier, e.g. photodiodes
    • H10F30/225—Individual radiation-sensitive semiconductor devices in which radiation controls the flow of current through the devices, e.g. photodetectors the devices having potential barriers, e.g. phototransistors the devices being sensitive to infrared, visible or ultraviolet radiation the devices having only one potential barrier, e.g. photodiodes the potential barrier working in avalanche mode, e.g. avalanche photodiodes
    • H10F30/2255—Individual radiation-sensitive semiconductor devices in which radiation controls the flow of current through the devices, e.g. photodetectors the devices having potential barriers, e.g. phototransistors the devices being sensitive to infrared, visible or ultraviolet radiation the devices having only one potential barrier, e.g. photodiodes the potential barrier working in avalanche mode, e.g. avalanche photodiodes in which the active layers form heterostructures, e.g. SAM structures
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P32/00—Diffusion of dopants within, into or out of wafers, substrates or parts of devices
    • H10P32/10—Diffusion of dopants within, into or out of semiconductor bodies or layers
    • H10P32/12—Diffusion of dopants within, into or out of semiconductor bodies or layers between a solid phase and a gaseous phase
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P32/00—Diffusion of dopants within, into or out of wafers, substrates or parts of devices
    • H10P32/10—Diffusion of dopants within, into or out of semiconductor bodies or layers
    • H10P32/17—Diffusion of dopants within, into or out of semiconductor bodies or layers characterised by the semiconductor material
    • H10P32/174—Diffusion of dopants within, into or out of semiconductor bodies or layers characterised by the semiconductor material being Group III-V material
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E10/00—Energy generation through renewable energy sources
    • Y02E10/50—Photovoltaic [PV] energy
    • Y02E10/544—Solar cells from Group III-V materials

Landscapes

  • Light Receiving Elements (AREA)
  • Acyclic And Carbocyclic Compounds In Medicinal Compositions (AREA)
AT89909025T 1988-07-27 1989-07-27 Lawinen-photodioden-struktur ATE145092T1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GB888817886A GB8817886D0 (en) 1988-07-27 1988-07-27 Avalanche photodiode structure

Publications (1)

Publication Number Publication Date
ATE145092T1 true ATE145092T1 (de) 1996-11-15

Family

ID=10641197

Family Applications (1)

Application Number Title Priority Date Filing Date
AT89909025T ATE145092T1 (de) 1988-07-27 1989-07-27 Lawinen-photodioden-struktur

Country Status (8)

Country Link
US (1) US5343055A (de)
EP (1) EP0426747B1 (de)
JP (1) JP2718797B2 (de)
AT (1) ATE145092T1 (de)
CA (1) CA1331650C (de)
DE (1) DE68927439T2 (de)
GB (1) GB8817886D0 (de)
WO (1) WO1990001217A1 (de)

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03270277A (ja) * 1990-03-20 1991-12-02 Fujitsu Ltd 半導体受光素子
US5150176A (en) * 1992-02-13 1992-09-22 Motorola, Inc. PN junction surge suppressor structure with moat
US5446308A (en) * 1994-04-04 1995-08-29 General Electric Company Deep-diffused planar avalanche photodiode
US5438217A (en) * 1994-04-29 1995-08-01 General Electric Company Planar avalanche photodiode array with sidewall segment
US5610416A (en) * 1995-02-16 1997-03-11 Hewlett-Packard Company Avalanche photodiode with epitaxially regrown guard rings
US5650198A (en) * 1995-08-18 1997-07-22 The Regents Of The University Of California Defect reduction in the growth of group III nitrides
DE19531369A1 (de) 1995-08-25 1997-02-27 Siemens Ag Halbleiterbauelement auf Siliciumbasis mit hochsperrendem Randabschluß
KR19980058393A (ko) * 1996-12-30 1998-10-07 김영환 애벌런치 포토 다이오드 및 그의 제조방법
US5866936A (en) * 1997-04-01 1999-02-02 Hewlett-Packard Company Mesa-structure avalanche photodiode having a buried epitaxial junction
US5831322A (en) * 1997-06-25 1998-11-03 Advanced Photonix, Inc. Active large area avalanche photodiode array
US5757057A (en) * 1997-06-25 1998-05-26 Advanced Photonix, Inc. Large area avalanche photodiode array
DE10141352A1 (de) * 2001-08-23 2003-06-05 Osram Opto Semiconductors Gmbh Verfahren zur Oberflächenbehandlung eines Halbleiters
TWI240370B (en) * 2004-08-26 2005-09-21 Airoha Tech Corp Substrate structure underlying a pad and pad structure
US20060121683A1 (en) * 2004-12-08 2006-06-08 Finisar Corporation Point source diffusion for avalanche photodiodes
US8368159B2 (en) * 2011-07-08 2013-02-05 Excelitas Canada, Inc. Photon counting UV-APD

Family Cites Families (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3838439A (en) * 1970-03-18 1974-09-24 Texas Instruments Inc Phototransistor having a buried base
US4126930A (en) * 1975-06-19 1978-11-28 Varian Associates, Inc. Magnesium doping of AlGaAs
US4564720A (en) * 1983-05-13 1986-01-14 The United States Of America As Represented By The United States Department Of Energy Pure silver ohmic contacts to N- and P- type gallium arsenide materials
US4525429A (en) * 1983-06-08 1985-06-25 Kennecott Corporation Porous semiconductor dopant carriers
JPH0824199B2 (ja) * 1984-05-31 1996-03-06 富士通株式会社 半導体受光素子の製造方法
NL8403017A (nl) * 1984-10-04 1986-05-01 Philips Nv Werkwijze voor het vervaardigen van een halfgeleiderinrichting waarbij op een halfgeleiderlichaam een met mg gedoteerde epitaxiale laag wordt afgezet.
DE3650287T2 (de) * 1985-09-24 1995-08-10 Toshiba Kawasaki Kk Halbleiter-Photodetektor mit einem zweistufigen Verunreinigungsprofil.
JPS6269689A (ja) * 1985-09-24 1987-03-30 Toshiba Corp 半導体受光素子
JPS62205673A (ja) * 1986-03-06 1987-09-10 Toshiba Corp アバランシエホトダイオ−ド
US4819039A (en) * 1986-12-22 1989-04-04 American Telephone And Telegraph Co. At&T Laboratories Devices and device fabrication with borosilicate glass
JP2573201B2 (ja) * 1987-02-26 1997-01-22 株式会社東芝 半導体素子の拡散層形成方法
EP0304048B1 (de) * 1987-08-19 1997-05-28 Nec Corporation Planare Avalanche-Photodiode mit Heterostruktur
JPH01184962A (ja) * 1988-01-20 1989-07-24 Toshiba Corp 半導体受光素子及びその製造方法
JPH02159775A (ja) * 1988-12-14 1990-06-19 Toshiba Corp 半導体受光素子及びその製造方法
US5114866A (en) * 1989-02-10 1992-05-19 Hitachi, Ltd. Fabricating an avalanche photo diode having a step-like distribution
JP2970815B2 (ja) * 1990-04-11 1999-11-02 株式会社東芝 半導体受光素子

Also Published As

Publication number Publication date
US5343055A (en) 1994-08-30
DE68927439D1 (de) 1996-12-12
WO1990001217A1 (en) 1990-02-08
DE68927439T2 (de) 1997-03-13
GB8817886D0 (en) 1988-09-01
EP0426747B1 (de) 1996-11-06
CA1331650C (en) 1994-08-23
JP2718797B2 (ja) 1998-02-25
EP0426747A1 (de) 1991-05-15
JPH04500139A (ja) 1992-01-09

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