ATE194872T1 - Fotoerzeugung von aminen aus alpha- aminoacetophenonen - Google Patents

Fotoerzeugung von aminen aus alpha- aminoacetophenonen

Info

Publication number
ATE194872T1
ATE194872T1 AT97810948T AT97810948T ATE194872T1 AT E194872 T1 ATE194872 T1 AT E194872T1 AT 97810948 T AT97810948 T AT 97810948T AT 97810948 T AT97810948 T AT 97810948T AT E194872 T1 ATE194872 T1 AT E194872T1
Authority
AT
Austria
Prior art keywords
formula
radical
phenyl
inter alia
aminoacetophenones
Prior art date
Application number
AT97810948T
Other languages
English (en)
Inventor
Jean-Luc Birbaum
Martin Kunz
Akira Kimura
Hisatoshi Kura
Hidetaka Oka
Hiroko Nakashima
Original Assignee
Ciba Sc Holding Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ciba Sc Holding Ag filed Critical Ciba Sc Holding Ag
Application granted granted Critical
Publication of ATE194872T1 publication Critical patent/ATE194872T1/de

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Epoxy Resins (AREA)
  • Paints Or Removers (AREA)
  • Catalysts (AREA)
  • Low-Molecular Organic Synthesis Reactions Using Catalysts (AREA)
AT97810948T 1997-08-22 1997-12-04 Fotoerzeugung von aminen aus alpha- aminoacetophenonen ATE194872T1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
EP97810593 1997-08-22

Publications (1)

Publication Number Publication Date
ATE194872T1 true ATE194872T1 (de) 2000-08-15

Family

ID=8230353

Family Applications (1)

Application Number Title Priority Date Filing Date
AT97810948T ATE194872T1 (de) 1997-08-22 1997-12-04 Fotoerzeugung von aminen aus alpha- aminoacetophenonen

Country Status (13)

Country Link
US (1) US6057380A (de)
JP (1) JP3250072B2 (de)
KR (1) KR100264256B1 (de)
CN (1) CN1086399C (de)
AT (1) ATE194872T1 (de)
AU (1) AU750819B2 (de)
BR (1) BR9706264A (de)
CA (1) CA2224441C (de)
DE (1) DE69702605T2 (de)
RU (1) RU2210798C2 (de)
SG (1) SG63787A1 (de)
TW (1) TW436491B (de)
ZA (1) ZA9710985B (de)

Families Citing this family (52)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6489374B1 (en) 1998-08-21 2002-12-03 Ciba Specialty Chemicals Corporation Photoactivatable bases containing nitrogen
JP2002544205A (ja) * 1999-05-10 2002-12-24 チバ スペシャルティ ケミカルズ ホールディング インコーポレーテッド 新規な光開始剤及びその応用
SG97168A1 (en) * 1999-12-15 2003-07-18 Ciba Sc Holding Ag Photosensitive resin composition
DE10018918C2 (de) * 2000-04-17 2002-07-18 3M Espe Ag Katalysatorkomponente
CN1187388C (zh) * 2000-05-26 2005-02-02 阿克佐诺贝尔股份有限公司 光敏涂料组合物
DE10237950A1 (de) * 2002-08-20 2004-03-11 Tesa Ag UV-initiiert thermisch vernetzte Acrylathaftklebemassen
JP2005208562A (ja) * 2003-12-25 2005-08-04 Kansai Paint Co Ltd 光導波路の形成方法及びその方法により得られた光導波路
JP4843955B2 (ja) * 2004-02-16 2011-12-21 三菱瓦斯化学株式会社 光塩基発生剤
KR100590881B1 (ko) * 2004-05-14 2006-06-19 삼성전자주식회사 광경화성 수지 조성물 및 그의 패터닝 방법
KR20080046736A (ko) * 2005-09-15 2008-05-27 시바 스페셜티 케미칼스 홀딩 인크. 기질 마킹을 위한 잠복 활성제를 포함하는 피복 조성물
CN101278028A (zh) * 2005-10-03 2008-10-01 三井化学株式会社 平板显示器用密封材料
WO2007111092A1 (ja) 2006-03-24 2007-10-04 Konica Minolta Medical & Graphic, Inc. 透明バリア性シートおよび透明バリア性シートの製造方法
EP2018365B1 (de) * 2006-05-17 2014-11-19 American Dye Source, Inc. Neue materialien für die beschichtung lithographischer platten, lithographische platten und beschichtungen, die diese enthalten, herstellungsverfahren und verwendung
ES2383085T3 (es) * 2006-06-09 2012-06-18 Dentsply International Inc. Composiciones fotopolimerizables caracterizadas por un nuevo acelerador amina para mejorar la estabilidad del color y reducir de este modo el estrés de polimerización
US20090298962A1 (en) * 2006-09-29 2009-12-03 Katia Studer Photolatent bases for systems based on blocked isocyanates
JP5339907B2 (ja) * 2007-06-14 2013-11-13 積水化学工業株式会社 光硬化型粘接着剤組成物
KR20100063014A (ko) * 2007-07-18 2010-06-10 바스프 에스이 피복 조성물
JP5581208B2 (ja) * 2007-07-18 2014-08-27 データレース リミテッド レーザー感受性被覆配合物
TWI409280B (zh) * 2007-07-31 2013-09-21 American Dye Source Inc 聚合物染料、塗覆層組合物及熱微影印刷板
JP5697992B2 (ja) * 2008-01-28 2015-04-08 ビーエーエスエフ ソシエタス・ヨーロピアＢａｓｆ Ｓｅ ラジカル硬化性配合物のレドックス硬化のための光潜在性アミジン塩基
CN102197076A (zh) 2008-10-23 2011-09-21 巴斯夫欧洲公司 吸热添加剂
US9267042B2 (en) 2008-10-27 2016-02-23 Datalase Ltd. Coating composition for marking substrates
CN102232065B (zh) * 2008-12-02 2014-11-05 和光纯药工业株式会社 光产碱剂
EP2428199A1 (de) 2010-09-09 2012-03-14 3M Innovative Properties Company Härtbare Zusammensetzung, derer Herstellungsverfahren und Verwendung
WO2012062332A2 (en) * 2010-11-12 2012-05-18 Coloplast A/S Novel photoinitiators
EP2792694A4 (de) 2011-12-16 2015-07-15 Three Bond Fine Chemical Co Ltd Härtbare harzzusammensetzung
DE102012205951B4 (de) * 2012-04-12 2016-09-01 Chemetall Gmbh Dichtmassen-System, ungehärtete Grundmasse und Mischung, Härter, Verfahren zum Beschichten eines Substrates und Verwendung eines Dichtmassen-Systems
JP5949123B2 (ja) * 2012-05-11 2016-07-06 住友化学株式会社 偏光板
JP6105858B2 (ja) * 2012-05-17 2017-03-29 太陽インキ製造株式会社 パターン形成方法、アルカリ現像型の熱硬化性樹脂組成物、及びプリント配線板
WO2013171888A1 (ja) * 2012-05-17 2013-11-21 太陽インキ製造株式会社 アルカリ現像型の熱硬化性樹脂組成物、プリント配線板
WO2013172432A1 (ja) * 2012-05-17 2013-11-21 太陽インキ製造株式会社 アルカリ現像型の熱硬化性樹脂組成物、プリント配線板
CN102660190A (zh) * 2012-05-23 2012-09-12 江苏海田技术有限公司 一种uv印铁底油
JP6306296B2 (ja) * 2013-07-09 2018-04-04 太陽インキ製造株式会社 感光性熱硬化性樹脂組成物およびフレキシブルプリント配線板
US20160152783A1 (en) 2013-07-18 2016-06-02 Cemedine Co., Ltd. Photocurable composition
JP2015043793A (ja) * 2013-08-27 2015-03-12 ディーダブルエス エス・アール・エル 人工歯の製造方法
WO2015088021A1 (ja) 2013-12-13 2015-06-18 セメダイン株式会社 接着性を有する光硬化性組成物
CN106470971B (zh) * 2014-08-01 2020-03-03 株式会社艾迪科 新型聚合引发剂及含有该聚合引发剂的自由基聚合性组合物
CN104371518A (zh) * 2014-11-13 2015-02-25 青岛厚科信息工程有限公司 一种耐候性好的涂料
CN104449373A (zh) * 2014-11-17 2015-03-25 青岛厚科信息工程有限公司 一种转化形油漆
CN104371389A (zh) * 2014-11-17 2015-02-25 青岛厚科信息工程有限公司 一种含有新型光引发剂的涂料
CN104403563A (zh) * 2014-11-24 2015-03-11 青岛市市南区隆德中医药研究所 一种保光性好的涂料
JP6520134B2 (ja) * 2015-01-16 2019-05-29 セメダイン株式会社 光硬化性組成物
BR112017023446A2 (pt) * 2015-04-29 2018-07-31 3M Innovative Properties Co método para a fabricação de uma rede polimérica a partir de um politiol e um poliepóxido
WO2018085190A1 (en) 2016-11-03 2018-05-11 3M Innovative Properties Company Polythiol sealant compositions
WO2018085534A1 (en) 2016-11-03 2018-05-11 3M Innovative Properties Company Compositions including a photolatent amine, camphorquinone, and a coumarin and related methods
EP3535332A1 (de) * 2016-11-03 2019-09-11 3M Innovative Properties Company Verfahren zum aufbringen eines dichtungsmittels an einer flugzeugkomponente
TWI774931B (zh) 2018-03-02 2022-08-21 日商日本化藥股份有限公司 新穎化合物、含有該化合物的光聚合起始劑及含有該光聚合起始劑的感光性樹脂組成物
US11286400B2 (en) * 2018-07-12 2022-03-29 Ppg Industries Ohio, Inc. Curable compositions containing reactive functional compounds and polysiloxane resins, articles of manufacture and coated articles prepared therefrom, and a method of mitigating dirt build-up on a substrate
EP3856849A1 (de) 2018-09-27 2021-08-04 3M Innovative Properties Company Zusammensetzung mit aminofunktionellen silanen und verfahren zum auftragen eines dichtungsmittels auf ein substrat
WO2020202076A1 (en) 2019-04-04 2020-10-08 3M Innovative Properties Company Method of irradiating a composition through a substrate
CN110105799B (zh) * 2019-05-07 2021-10-01 广东华润涂料有限公司 木器用涂料组合物以及由其制成的木制品
WO2024053609A1 (ja) * 2022-09-05 2024-03-14 株式会社日本触媒 アルカリ可溶性樹脂及びその製造方法、感光性樹脂組成物、硬化物、表示装置用部材、及び、表示装置

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3365773D1 (en) * 1982-02-26 1986-10-09 Ciba Geigy Ag Coloured photo-hardenable composition
DE3471486D1 (de) * 1983-08-15 1988-06-30 Ciba Geigy Ag Photocurable compositions
DE3880868D1 (en) * 1987-03-26 1993-06-17 Ciba Geigy Ag Neue alpha-aminoacetophenone als photoinitiatoren.
JPH0717737B2 (ja) * 1987-11-30 1995-03-01 太陽インキ製造株式会社 感光性熱硬化性樹脂組成物及びソルダーレジストパターン形成方法
EP0555749B1 (de) * 1992-02-14 1999-05-19 Shipley Company Inc. Strahlungsempfindliche Zusammensetzungen und Verfahren
TW434456B (en) * 1994-12-30 2001-05-16 Novartis Ag A compound as functionalized photoinitiator, its production process, its corresponding oligomers or polymers and its application in coating a substrate
JP3190251B2 (ja) * 1995-06-06 2001-07-23 太陽インキ製造株式会社 アルカリ現像型のフレキシブルプリント配線板用光硬化性・熱硬化性樹脂組成物
DE10139936B4 (de) * 2001-08-14 2005-04-28 Siemens Ag Verfahren und Anordnung zur Steuerung von Datenpaketen

Also Published As

Publication number Publication date
CN1086399C (zh) 2002-06-19
AU750819B2 (en) 2002-07-25
KR19990022661A (ko) 1999-03-25
TW436491B (en) 2001-05-28
DE69702605T2 (de) 2001-03-29
KR100264256B1 (ko) 2000-09-01
JPH1171450A (ja) 1999-03-16
US6057380A (en) 2000-05-02
AU4765897A (en) 1999-03-04
BR9706264A (pt) 1999-07-27
JP3250072B2 (ja) 2002-01-28
SG63787A1 (en) 1999-03-30
CA2224441A1 (en) 1999-02-22
CA2224441C (en) 2003-01-21
CN1209442A (zh) 1999-03-03
RU2210798C2 (ru) 2003-08-20
ZA9710985B (en) 1999-02-22
DE69702605D1 (de) 2000-08-24

Similar Documents

Publication Publication Date Title
BR9706264A (pt) Fotogeração de aminas a partir de alfa-aminoacetofenonas
MY120488A (en) Oxime ester photoinitiators
MY119467A (en) (alpha)-aminoacetophenone photoinitiators
CA2200316A1 (en) Imidazole derivative
YU34896A (sh) Supstituisani n-(indol-2-karbonil)-glicinamidi, njihovi intermedijeri i farmaceutske kompozicije
CO4970713A1 (es) Derivados de carboxamidotiazoles, su preparacion, composiciones farmaceuticas que los contienen
ATE390404T1 (de) Aminderivate, ihre herstellung und verwendung als inhibitoren der produktion von amyloid-beta
ATE388426T1 (de) Photopolymerisierbare, wärmehärtbare harzzusammensetzungen
IS6257A (is) Frumuviðloðunartálmar
DK0900240T3 (da) Fremgangsmåde til fremstilling af polyalkenaminer
ATE236906T1 (de) Zyklische polyamine
CO5050332A1 (es) Composiciones fungicidas que comprenden 2-metoxibenzofenonas
SE0004565D0 (sv) Ljuskänslig hartskomposition
DE69433984D1 (de) Arylpiperazinderivate von indol als liganden der rezeptoren 5 ht1-like, 5 ht1b und 5 ht1d
RU2000100807A (ru) Простагландиновые фармацевтические композиции
DE3674216D1 (de) Neue kationtenside auf der basis von quartaeren ammoniumverbindungen und ihre verwendung in reinigungsmitteln.
EP1306369A4 (de) Neue schwefelverbindungen und intermolekulare verbindungen, die diese als komponente enthalten
ATE204846T1 (de) Entzündungshemmende benzoesäurederivate
DE69905173D1 (de) Heisshärtbare epoxidzusammensetzungen
TR199802163T2 (xx) 4'-Triflorometilbifenil-2-karboksilik asit
ES8406458A1 (es) Procedimiento para preparar derivados bencilidenicos sulfurados
DK0613896T3 (da) Fremgangsmåde til fremstilling af sulfonylurinstofderivater
ATE175664T1 (de) Kristalline, polymorphische form von (s,s,s)-n-(1-(2-carboxy-3-(n2-mesyllysylamino)p opyl>-1- cyclopentylcarbonyl)tyrosin
DK0782574T3 (da) Bicycliske carboxiamider som 5-HT1A-receptorligander
TW336288B (en) Phenylenediamine derivative and electrophotosensitive material using the same

Legal Events

Date Code Title Description
RER Ceased as to paragraph 5 lit. 3 law introducing patent treaties