ATE194872T1 - Fotoerzeugung von aminen aus alpha- aminoacetophenonen - Google Patents

Fotoerzeugung von aminen aus alpha- aminoacetophenonen

Info

Publication number
ATE194872T1
ATE194872T1 AT97810948T AT97810948T ATE194872T1 AT E194872 T1 ATE194872 T1 AT E194872T1 AT 97810948 T AT97810948 T AT 97810948T AT 97810948 T AT97810948 T AT 97810948T AT E194872 T1 ATE194872 T1 AT E194872T1
Authority
AT
Austria
Prior art keywords
formula
radical
phenyl
inter alia
aminoacetophenones
Prior art date
Application number
AT97810948T
Other languages
English (en)
Inventor
Jean-Luc Birbaum
Martin Kunz
Akira Kimura
Hisatoshi Kura
Hidetaka Oka
Hiroko Nakashima
Original Assignee
Ciba Sc Holding Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ciba Sc Holding Ag filed Critical Ciba Sc Holding Ag
Application granted granted Critical
Publication of ATE194872T1 publication Critical patent/ATE194872T1/de

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Epoxy Resins (AREA)
  • Paints Or Removers (AREA)
  • Catalysts (AREA)
  • Low-Molecular Organic Synthesis Reactions Using Catalysts (AREA)
AT97810948T 1997-08-22 1997-12-04 Fotoerzeugung von aminen aus alpha- aminoacetophenonen ATE194872T1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
EP97810593 1997-08-22

Publications (1)

Publication Number Publication Date
ATE194872T1 true ATE194872T1 (de) 2000-08-15

Family

ID=8230353

Family Applications (1)

Application Number Title Priority Date Filing Date
AT97810948T ATE194872T1 (de) 1997-08-22 1997-12-04 Fotoerzeugung von aminen aus alpha- aminoacetophenonen

Country Status (13)

Country Link
US (1) US6057380A (de)
JP (1) JP3250072B2 (de)
KR (1) KR100264256B1 (de)
CN (1) CN1086399C (de)
AT (1) ATE194872T1 (de)
AU (1) AU750819B2 (de)
BR (1) BR9706264A (de)
CA (1) CA2224441C (de)
DE (1) DE69702605T2 (de)
RU (1) RU2210798C2 (de)
SG (1) SG63787A1 (de)
TW (1) TW436491B (de)
ZA (1) ZA9710985B (de)

Families Citing this family (52)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
AU5620499A (en) 1998-08-21 2000-03-14 Ciba Specialty Chemicals Holding Inc. Photoactivatable bases containing nitrogen
US6673850B1 (en) * 1999-05-10 2004-01-06 Ciba Specialty Chemicals Corporation Photoinitiators and their applications
SG97168A1 (en) * 1999-12-15 2003-07-18 Ciba Sc Holding Ag Photosensitive resin composition
DE10018918C2 (de) * 2000-04-17 2002-07-18 3M Espe Ag Katalysatorkomponente
RU2265035C2 (ru) * 2000-05-26 2005-11-27 Акцо Нобель Н.В. Фотоактивируемая композиция покрытия
DE10237950A1 (de) * 2002-08-20 2004-03-11 Tesa Ag UV-initiiert thermisch vernetzte Acrylathaftklebemassen
JP2005208562A (ja) * 2003-12-25 2005-08-04 Kansai Paint Co Ltd 光導波路の形成方法及びその方法により得られた光導波路
JP4843955B2 (ja) * 2004-02-16 2011-12-21 三菱瓦斯化学株式会社 光塩基発生剤
KR100590881B1 (ko) * 2004-05-14 2006-06-19 삼성전자주식회사 광경화성 수지 조성물 및 그의 패터닝 방법
RU2008114052A (ru) * 2005-09-15 2009-10-20 Циба Спешиалти Кемикэлз Холдинг Инк. (Ch) Композиции покрытий для маркировки подложек, содержащие латентный активатор
CN101278028A (zh) * 2005-10-03 2008-10-01 三井化学株式会社 平板显示器用密封材料
EP2000299A4 (de) 2006-03-24 2009-08-05 Konica Minolta Med & Graphic Transparente sperrfolie und verfahren zur herstellung einer transparenten sperrfolie
US7910768B2 (en) * 2006-05-17 2011-03-22 American Dye Source, Inc. Materials for lithographic plates coatings, lithographic plates and coatings containing same, methods of preparation and use
ATE547440T1 (de) 2006-06-09 2012-03-15 Dentsply Int Inc Fotopolymerisierbare zusammensetzungen mit neuem aminbeschleuniger für erhöhte farbstabilität und reduzierte polymerisationsspannung dadurch
CN101522745B (zh) * 2006-09-29 2013-06-19 西巴控股有限公司 以封闭异氰酸酯为基础的体系的光潜碱
US8217096B2 (en) * 2007-06-14 2012-07-10 Sekisui Chemical Co., Ltd. Photocurable pressure-sensitive adhesive composition
CN101755019A (zh) * 2007-07-18 2010-06-23 巴斯夫欧洲公司 涂料组合物
CN101801676B (zh) * 2007-07-18 2012-10-03 巴斯夫欧洲公司 激光敏感涂料制剂
TWI409280B (zh) * 2007-07-31 2013-09-21 American Dye Source Inc 聚合物染料、塗覆層組合物及熱微影印刷板
JP5697992B2 (ja) * 2008-01-28 2015-04-08 ビーエーエスエフ ソシエタス・ヨーロピアＢａｓｆ Ｓｅ ラジカル硬化性配合物のレドックス硬化のための光潜在性アミジン塩基
EP2340276B1 (de) 2008-10-23 2020-11-25 DataLase Ltd Wärmeabsorbierende additive
EP2342295A1 (de) 2008-10-27 2011-07-13 DataLase Ltd Beschichtungszusammensetzung zur kennzeichnung von substraten
KR101637213B1 (ko) 2008-12-02 2016-07-07 와코 쥰야꾸 고교 가부시키가이샤 광염기 발생제
EP2428199A1 (de) 2010-09-09 2012-03-14 3M Innovative Properties Company Härtbare Zusammensetzung, derer Herstellungsverfahren und Verwendung
JP5956452B2 (ja) * 2010-11-12 2016-07-27 コロプラスト アクティーゼルスカブ 新規のポリマー光開始剤
CN103987754B (zh) 2011-12-16 2016-06-15 三键精密化学有限公司 固化性树脂组合物
DE102012205951B4 (de) * 2012-04-12 2016-09-01 Chemetall Gmbh Dichtmassen-System, ungehärtete Grundmasse und Mischung, Härter, Verfahren zum Beschichten eines Substrates und Verwendung eines Dichtmassen-Systems
JP5949123B2 (ja) * 2012-05-11 2016-07-06 住友化学株式会社 偏光板
KR102073440B1 (ko) * 2012-05-17 2020-02-04 다이요 잉키 세이조 가부시키가이샤 알칼리 현상형의 열경화성 수지 조성물, 프린트 배선판
JP6105858B2 (ja) * 2012-05-17 2017-03-29 太陽インキ製造株式会社 パターン形成方法、アルカリ現像型の熱硬化性樹脂組成物、及びプリント配線板
WO2013171888A1 (ja) * 2012-05-17 2013-11-21 太陽インキ製造株式会社 アルカリ現像型の熱硬化性樹脂組成物、プリント配線板
CN102660190A (zh) * 2012-05-23 2012-09-12 江苏海田技术有限公司 一种uv印铁底油
JP6306296B2 (ja) * 2013-07-09 2018-04-04 太陽インキ製造株式会社 感光性熱硬化性樹脂組成物およびフレキシブルプリント配線板
WO2015008709A1 (ja) 2013-07-18 2015-01-22 セメダイン株式会社 光硬化性組成物
JP2015043793A (ja) * 2013-08-27 2015-03-12 ディーダブルエス エス・アール・エル 人工歯の製造方法
US9718999B2 (en) 2013-12-13 2017-08-01 Cemedine Co., Ltd Photocurable composition having adhesive properties
EP3176153B1 (de) * 2014-08-01 2020-04-08 Adeka Corporation Neuartiger polymerisierungsinitiator und radikalisch polymerisierbare zusammensetzungen damit
CN104371518A (zh) * 2014-11-13 2015-02-25 青岛厚科信息工程有限公司 一种耐候性好的涂料
CN104371389A (zh) * 2014-11-17 2015-02-25 青岛厚科信息工程有限公司 一种含有新型光引发剂的涂料
CN104449373A (zh) * 2014-11-17 2015-03-25 青岛厚科信息工程有限公司 一种转化形油漆
CN104403563A (zh) * 2014-11-24 2015-03-11 青岛市市南区隆德中医药研究所 一种保光性好的涂料
JP6520134B2 (ja) * 2015-01-16 2019-05-29 セメダイン株式会社 光硬化性組成物
CN107531886B (zh) * 2015-04-29 2020-08-07 3M创新有限公司 由多硫醇和聚环氧化合物制备聚合物网络的方法
CN109952349A (zh) * 2016-11-03 2019-06-28 3M创新有限公司 将密封剂施用到飞机部件的方法
EP3535621A1 (de) 2016-11-03 2019-09-11 3M Innovative Properties Company Zusammensetzungen mit einem fotolatenten amin, camphorquinon und einem coumarin und zugehörige verfahren
WO2018085190A1 (en) 2016-11-03 2018-05-11 3M Innovative Properties Company Polythiol sealant compositions
TWI774931B (zh) 2018-03-02 2022-08-21 日商日本化藥股份有限公司 新穎化合物、含有該化合物的光聚合起始劑及含有該光聚合起始劑的感光性樹脂組成物
US11286400B2 (en) * 2018-07-12 2022-03-29 Ppg Industries Ohio, Inc. Curable compositions containing reactive functional compounds and polysiloxane resins, articles of manufacture and coated articles prepared therefrom, and a method of mitigating dirt build-up on a substrate
US20210371667A1 (en) 2018-09-27 2021-12-02 3M Innovative Properties Company Composition including amino-functional silanes and method of applying a sealant to a substrate
WO2020202076A1 (en) 2019-04-04 2020-10-08 3M Innovative Properties Company Method of irradiating a composition through a substrate
CN110105799B (zh) * 2019-05-07 2021-10-01 广东华润涂料有限公司 木器用涂料组合物以及由其制成的木制品
WO2024053609A1 (ja) * 2022-09-05 2024-03-14 株式会社日本触媒 アルカリ可溶性樹脂及びその製造方法、感光性樹脂組成物、硬化物、表示装置用部材、及び、表示装置

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3365773D1 (en) * 1982-02-26 1986-10-09 Ciba Geigy Ag Coloured photo-hardenable composition
EP0138754B1 (de) * 1983-08-15 1988-05-25 Ciba-Geigy Ag Photohärtbare Gemische
ATE89262T1 (de) * 1987-03-26 1993-05-15 Ciba Geigy Ag Neue alpha-aminoacetophenone als photoinitiatoren.
JPH0717737B2 (ja) * 1987-11-30 1995-03-01 太陽インキ製造株式会社 感光性熱硬化性樹脂組成物及びソルダーレジストパターン形成方法
DE69324942T2 (de) * 1992-02-14 1999-10-07 Shipley Co., Inc. Strahlungsempfindliche Zusammensetzungen und Verfahren
TW434456B (en) * 1994-12-30 2001-05-16 Novartis Ag A compound as functionalized photoinitiator, its production process, its corresponding oligomers or polymers and its application in coating a substrate
JP3190251B2 (ja) * 1995-06-06 2001-07-23 太陽インキ製造株式会社 アルカリ現像型のフレキシブルプリント配線板用光硬化性・熱硬化性樹脂組成物
DE10139936B4 (de) * 2001-08-14 2005-04-28 Siemens Ag Verfahren und Anordnung zur Steuerung von Datenpaketen

Also Published As

Publication number Publication date
CN1086399C (zh) 2002-06-19
AU4765897A (en) 1999-03-04
JP3250072B2 (ja) 2002-01-28
KR100264256B1 (ko) 2000-09-01
CA2224441A1 (en) 1999-02-22
RU2210798C2 (ru) 2003-08-20
JPH1171450A (ja) 1999-03-16
DE69702605D1 (de) 2000-08-24
US6057380A (en) 2000-05-02
CN1209442A (zh) 1999-03-03
CA2224441C (en) 2003-01-21
SG63787A1 (en) 1999-03-30
ZA9710985B (en) 1999-02-22
AU750819B2 (en) 2002-07-25
KR19990022661A (ko) 1999-03-25
BR9706264A (pt) 1999-07-27
TW436491B (en) 2001-05-28
DE69702605T2 (de) 2001-03-29

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