BR9706264A - Fotogeração de aminas a partir de alfa-aminoacetofenonas - Google Patents

Fotogeração de aminas a partir de alfa-aminoacetofenonas

Info

Publication number
BR9706264A
BR9706264A BR9706264A BR9706264A BR9706264A BR 9706264 A BR9706264 A BR 9706264A BR 9706264 A BR9706264 A BR 9706264A BR 9706264 A BR9706264 A BR 9706264A BR 9706264 A BR9706264 A BR 9706264A
Authority
BR
Brazil
Prior art keywords
formula
radical
phenyl
inter alia
aminoacetophenones
Prior art date
Application number
BR9706264A
Other languages
English (en)
Inventor
Jean-Luc Birbaum
Martin Kunz
Akira Kimura
Hisatoshi Kura
Hidetaka Oka
Hiroko Nakashima
Original Assignee
Ciba Sc Holding Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ciba Sc Holding Ag filed Critical Ciba Sc Holding Ag
Publication of BR9706264A publication Critical patent/BR9706264A/pt

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/038Macromolecular compounds which are rendered insoluble or differentially wettable

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Epoxy Resins (AREA)
  • Paints Or Removers (AREA)
  • Catalysts (AREA)
  • Low-Molecular Organic Synthesis Reactions Using Catalysts (AREA)
BR9706264A 1997-08-22 1997-12-23 Fotogeração de aminas a partir de alfa-aminoacetofenonas BR9706264A (pt)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
EP97810593 1997-08-22

Publications (1)

Publication Number Publication Date
BR9706264A true BR9706264A (pt) 1999-07-27

Family

ID=8230353

Family Applications (1)

Application Number Title Priority Date Filing Date
BR9706264A BR9706264A (pt) 1997-08-22 1997-12-23 Fotogeração de aminas a partir de alfa-aminoacetofenonas

Country Status (13)

Country Link
US (1) US6057380A (pt)
JP (1) JP3250072B2 (pt)
KR (1) KR100264256B1 (pt)
CN (1) CN1086399C (pt)
AT (1) ATE194872T1 (pt)
AU (1) AU750819B2 (pt)
BR (1) BR9706264A (pt)
CA (1) CA2224441C (pt)
DE (1) DE69702605T2 (pt)
RU (1) RU2210798C2 (pt)
SG (1) SG63787A1 (pt)
TW (1) TW436491B (pt)
ZA (1) ZA9710985B (pt)

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WO2009010393A1 (en) * 2007-07-18 2009-01-22 Basf Se Coating compositions
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TWI409280B (zh) * 2007-07-31 2013-09-21 American Dye Source Inc 聚合物染料、塗覆層組合物及熱微影印刷板
CN101925616A (zh) * 2008-01-28 2010-12-22 巴斯夫欧洲公司 用于氧化还原固化可自由基固化的配制剂的光潜脒碱
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US8957212B2 (en) * 2008-12-02 2015-02-17 Wako Pure Chemical Industries, Ltd. Photobase generator
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EP2792694A4 (en) 2011-12-16 2015-07-15 Three Bond Fine Chemical Co Ltd Curable resin composition
DE102012205951B4 (de) * 2012-04-12 2016-09-01 Chemetall Gmbh Dichtmassen-System, ungehärtete Grundmasse und Mischung, Härter, Verfahren zum Beschichten eines Substrates und Verwendung eines Dichtmassen-Systems
JP5949123B2 (ja) * 2012-05-11 2016-07-06 住友化学株式会社 偏光板
JP6078535B2 (ja) * 2012-05-17 2017-02-08 太陽インキ製造株式会社 アルカリ現像型の熱硬化性樹脂組成物、プリント配線板
WO2013171888A1 (ja) * 2012-05-17 2013-11-21 太陽インキ製造株式会社 アルカリ現像型の熱硬化性樹脂組成物、プリント配線板
JP6105858B2 (ja) * 2012-05-17 2017-03-29 太陽インキ製造株式会社 パターン形成方法、アルカリ現像型の熱硬化性樹脂組成物、及びプリント配線板
CN102660190A (zh) * 2012-05-23 2012-09-12 江苏海田技术有限公司 一种uv印铁底油
JP6306296B2 (ja) * 2013-07-09 2018-04-04 太陽インキ製造株式会社 感光性熱硬化性樹脂組成物およびフレキシブルプリント配線板
WO2015008709A1 (ja) 2013-07-18 2015-01-22 セメダイン株式会社 光硬化性組成物
JP2015043793A (ja) * 2013-08-27 2015-03-12 ディーダブルエス エス・アール・エル 人工歯の製造方法
CN105829485B (zh) 2013-12-13 2018-10-12 思美定株式会社 具有粘合性的光固化性组合物
WO2016017537A1 (ja) * 2014-08-01 2016-02-04 株式会社Adeka 新規重合開始剤及び該重合開始剤を含有するラジカル重合性組成物
CN104371518A (zh) * 2014-11-13 2015-02-25 青岛厚科信息工程有限公司 一种耐候性好的涂料
CN104371389A (zh) * 2014-11-17 2015-02-25 青岛厚科信息工程有限公司 一种含有新型光引发剂的涂料
CN104449373A (zh) * 2014-11-17 2015-03-25 青岛厚科信息工程有限公司 一种转化形油漆
CN104403563A (zh) * 2014-11-24 2015-03-11 青岛市市南区隆德中医药研究所 一种保光性好的涂料
JP6520134B2 (ja) * 2015-01-16 2019-05-29 セメダイン株式会社 光硬化性組成物
US10526440B2 (en) * 2015-04-29 2020-01-07 3M Innovative Properties Company Method of making a polymer network from a polythiol and a polyepoxide
US11198757B2 (en) * 2016-11-03 2021-12-14 3M Innovative Properties Company Compositions including a photolatent amine, camphorquinone, and coumarin and related methods
WO2018085546A1 (en) 2016-11-03 2018-05-11 3M Innovative Properties Company Composition including a polythiol, a polyepoxide, a photolatent base, and an amine and methods relating to the composition
CA3042860A1 (en) 2016-11-03 2018-05-11 3M Innovative Properties Company Polythiol sealant compositions
TWI774931B (zh) 2018-03-02 2022-08-21 日商日本化藥股份有限公司 新穎化合物、含有該化合物的光聚合起始劑及含有該光聚合起始劑的感光性樹脂組成物
US11286400B2 (en) * 2018-07-12 2022-03-29 Ppg Industries Ohio, Inc. Curable compositions containing reactive functional compounds and polysiloxane resins, articles of manufacture and coated articles prepared therefrom, and a method of mitigating dirt build-up on a substrate
WO2020065588A1 (en) 2018-09-27 2020-04-02 3M Innovative Properties Company Composition including amino-functional silanes and method of applying a sealant to a substrate
WO2020202076A1 (en) 2019-04-04 2020-10-08 3M Innovative Properties Company Method of irradiating a composition through a substrate
CN110105799B (zh) * 2019-05-07 2021-10-01 广东华润涂料有限公司 木器用涂料组合物以及由其制成的木制品
WO2024053609A1 (ja) * 2022-09-05 2024-03-14 株式会社日本触媒 アルカリ可溶性樹脂及びその製造方法、感光性樹脂組成物、硬化物、表示装置用部材、及び、表示装置

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EP0088050B1 (de) * 1982-02-26 1986-09-03 Ciba-Geigy Ag Photohärtbare gefärbte Massen
DE3471486D1 (de) * 1983-08-15 1988-06-30 Ciba Geigy Ag Photocurable compositions
EP0284561B1 (de) * 1987-03-26 1993-05-12 Ciba-Geigy Ag Neue alpha-Aminoacetophenone als Photoinitiatoren
JPH0717737B2 (ja) * 1987-11-30 1995-03-01 太陽インキ製造株式会社 感光性熱硬化性樹脂組成物及びソルダーレジストパターン形成方法
EP0555749B1 (en) * 1992-02-14 1999-05-19 Shipley Company Inc. Radiation sensitive compositions and processes
TW434456B (en) * 1994-12-30 2001-05-16 Novartis Ag A compound as functionalized photoinitiator, its production process, its corresponding oligomers or polymers and its application in coating a substrate
JP3190251B2 (ja) * 1995-06-06 2001-07-23 太陽インキ製造株式会社 アルカリ現像型のフレキシブルプリント配線板用光硬化性・熱硬化性樹脂組成物
DE10139936B4 (de) * 2001-08-14 2005-04-28 Siemens Ag Verfahren und Anordnung zur Steuerung von Datenpaketen

Also Published As

Publication number Publication date
ATE194872T1 (de) 2000-08-15
KR100264256B1 (ko) 2000-09-01
JP3250072B2 (ja) 2002-01-28
CN1086399C (zh) 2002-06-19
ZA9710985B (en) 1999-02-22
DE69702605D1 (de) 2000-08-24
SG63787A1 (en) 1999-03-30
DE69702605T2 (de) 2001-03-29
TW436491B (en) 2001-05-28
AU750819B2 (en) 2002-07-25
JPH1171450A (ja) 1999-03-16
KR19990022661A (ko) 1999-03-25
CN1209442A (zh) 1999-03-03
CA2224441A1 (en) 1999-02-22
AU4765897A (en) 1999-03-04
CA2224441C (en) 2003-01-21
RU2210798C2 (ru) 2003-08-20
US6057380A (en) 2000-05-02

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Legal Events

Date Code Title Description
B06A Patent application procedure suspended [chapter 6.1 patent gazette]
B11B Dismissal acc. art. 36, par 1 of ipl - no reply within 90 days to fullfil the necessary requirements