ATE196481T1 - Acetalpolymere und verwendung derselben in lichtempfindlichen zusammensetzungen und für lithographische druckplatten - Google Patents
Acetalpolymere und verwendung derselben in lichtempfindlichen zusammensetzungen und für lithographische druckplattenInfo
- Publication number
- ATE196481T1 ATE196481T1 AT96110895T AT96110895T ATE196481T1 AT E196481 T1 ATE196481 T1 AT E196481T1 AT 96110895 T AT96110895 T AT 96110895T AT 96110895 T AT96110895 T AT 96110895T AT E196481 T1 ATE196481 T1 AT E196481T1
- Authority
- AT
- Austria
- Prior art keywords
- mole
- chem
- formula
- amount
- present
- Prior art date
Links
- 239000000203 mixture Substances 0.000 title abstract 2
- 229920006324 polyoxymethylene Polymers 0.000 title 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 abstract 2
- 125000001931 aliphatic group Chemical group 0.000 abstract 2
- 125000003118 aryl group Chemical group 0.000 abstract 2
- 239000011230 binding agent Substances 0.000 abstract 2
- 229910052739 hydrogen Inorganic materials 0.000 abstract 2
- 239000001257 hydrogen Substances 0.000 abstract 2
- 125000006850 spacer group Chemical group 0.000 abstract 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 abstract 1
- 125000000217 alkyl group Chemical group 0.000 abstract 1
- 229910052799 carbon Inorganic materials 0.000 abstract 1
- 229920006395 saturated elastomer Polymers 0.000 abstract 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
- G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F8/00—Chemical modification by after-treatment
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F8/00—Chemical modification by after-treatment
- C08F8/12—Hydrolysis
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F8/00—Chemical modification by after-treatment
- C08F8/28—Condensation with aldehydes or ketones
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F8/00—Chemical modification by after-treatment
- C08F8/30—Introducing nitrogen atoms or nitrogen-containing groups
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/016—Diazonium salts or compounds
- G03F7/021—Macromolecular diazonium compounds; Macromolecular additives, e.g. binders
- G03F7/0212—Macromolecular diazonium compounds; Macromolecular additives, e.g. binders characterised by the polymeric binder or the macromolecular additives other than the diazo resins or the polymeric diazonium compounds
- G03F7/0215—Natural gums; Proteins, e.g. gelatins; Macromolecular carbohydrates, e.g. cellulose; Polyvinyl alcohol and derivatives thereof, e.g. polyvinylacetals
Landscapes
- Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Chemical & Material Sciences (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- General Physics & Mathematics (AREA)
- Life Sciences & Earth Sciences (AREA)
- General Health & Medical Sciences (AREA)
- Molecular Biology (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Materials For Photolithography (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE19524851A DE19524851C2 (de) | 1995-07-07 | 1995-07-07 | Acetalpolymere und Verwendung derselben in lichtempfindlichen Zusammensetzungen und für lithographische Druckplatten |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| ATE196481T1 true ATE196481T1 (de) | 2000-10-15 |
Family
ID=7766308
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| AT96110895T ATE196481T1 (de) | 1995-07-07 | 1996-07-05 | Acetalpolymere und verwendung derselben in lichtempfindlichen zusammensetzungen und für lithographische druckplatten |
Country Status (7)
| Country | Link |
|---|---|
| US (2) | US5700619A (de) |
| EP (1) | EP0752430B1 (de) |
| AT (1) | ATE196481T1 (de) |
| CA (1) | CA2180581A1 (de) |
| DE (2) | DE19524851C2 (de) |
| ES (1) | ES2151625T3 (de) |
| ZA (1) | ZA965647B (de) |
Families Citing this family (59)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE19525050C2 (de) * | 1995-07-10 | 1999-11-11 | Kodak Polychrome Graphics Llc | Sulfonamidsubstituierte Acetalpolymere und Verwendung derselben in lichtempfindlichen Zusammensetzungen und lithographischen Druckplatten |
| DE19639897A1 (de) * | 1996-09-27 | 1998-04-02 | Sun Chemical Corp | Wasserlösliche und sauerstoffsperrende Polymerschichten und deren Verwendung für lichtempfindliche Materialien |
| DE19644515A1 (de) * | 1996-10-25 | 1998-06-25 | Sun Chemical Corp | Amidosubstituierte Acetalpolymere und Verwendung derselben in photoempfindlichen Zusammensetzungen und lithographischen Druckplatten |
| DE69815622T2 (de) | 1997-10-17 | 2004-04-29 | Fuji Photo Film Co., Ltd., Fujinomiya | Positiv arbeitendes photoempfindliches Aufzeichnungsmaterial für Infrarotlaser |
| DE19825244A1 (de) * | 1998-06-05 | 1999-12-16 | Kodak Polychrome Graphics Gmbh | Offsetdruckplatte mit hoher Auflagenstabilität |
| US6534238B1 (en) | 1998-06-23 | 2003-03-18 | Kodak Polychrome Graphics, Llc | Thermal digital lithographic printing plate |
| EP1046958B1 (de) * | 1998-07-10 | 2006-04-12 | AZ Electronic Materials USA Corp. | Benutzung einer zusammensetzung für eine antireflexunterschicht |
| AU6079500A (en) * | 1999-07-08 | 2001-01-30 | Lee Angros | Antigen recovery and/or staining apparatus and method |
| US6255033B1 (en) | 1999-07-30 | 2001-07-03 | Creo, Ltd. | Positive acting photoresist compositions and imageable element |
| US6238833B1 (en) * | 1999-09-01 | 2001-05-29 | Xerox Corporation | Binder resin with reduced hydroxyl content |
| US6391524B2 (en) | 1999-11-19 | 2002-05-21 | Kodak Polychrome Graphics Llc | Article having imagable coatings |
| DE10011096A1 (de) * | 2000-03-09 | 2001-10-11 | Clariant Gmbh | Verwendung von carboxylgruppenhaltigen Acetalpolymeren in lichtempfindlichen Zusammensetzungen und lithographischen Druckplatten |
| US6458511B1 (en) | 2000-06-07 | 2002-10-01 | Kodak Polychrome Graphics Llc | Thermally imageable positive-working lithographic printing plate precursor and method for imaging |
| US6555283B1 (en) | 2000-06-07 | 2003-04-29 | Kodak Polychrome Graphics Llc | Imageable element and waterless printing plate |
| US6270938B1 (en) * | 2000-06-09 | 2001-08-07 | Kodak Polychrome Graphics Llc | Acetal copolymers and use thereof in photosensitive compositions |
| US6451505B1 (en) | 2000-08-04 | 2002-09-17 | Kodak Polychrome Graphics Llc | Imageable element and method of preparation thereof |
| US6555291B1 (en) | 2000-08-14 | 2003-04-29 | Kodak Polychrome Graphics, Llc | Thermal digital lithographic printing plate |
| US6777155B2 (en) * | 2000-10-03 | 2004-08-17 | Fuji Photo Film Co., Ltd. | Photosensitive lithographic printing plate |
| JP4248137B2 (ja) * | 2000-11-22 | 2009-04-02 | 富士フイルム株式会社 | ネガ型感光性平版印刷版 |
| US6548215B2 (en) | 2001-02-09 | 2003-04-15 | Kodak Polychrome Graphics Llc | Method for the production of a printing plate using the dual-feed technology |
| US6458503B1 (en) * | 2001-03-08 | 2002-10-01 | Kodak Polychrome Graphics Llc | Fluorinated aromatic acetal polymers and photosensitive compositions containing such polymers |
| US6596456B2 (en) * | 2001-05-29 | 2003-07-22 | Kodak Polychrome Graphics Llc | Use of cinnamic acid groups containing acetal polymers for radiation-sensitive compositions and lithographic printing plates |
| US6706454B2 (en) | 2001-07-05 | 2004-03-16 | Kodak Polychrome Graphics Llc | Method for the production of a printing plate using particle growing acceleration by an additive polymer |
| US6517988B1 (en) | 2001-07-12 | 2003-02-11 | Kodak Polychrome Graphics Llc | Radiation-sensitive, positive working coating composition based on carboxylic copolymers |
| US6562527B2 (en) | 2001-08-17 | 2003-05-13 | Kodak Polychrome Graphics Llc | Imaged members and method of preparation thereof |
| US6783913B2 (en) * | 2002-04-05 | 2004-08-31 | Kodak Polychrome Graphics Llc | Polymeric acetal resins containing free radical inhibitors and their use in lithographic printing |
| DE10233631B4 (de) * | 2002-07-24 | 2004-09-30 | Kodak Polychrome Graphics Gmbh | Lithographie-Druckplattenvorläufer mit zwei strahlungsempfindlichen Schichten |
| DE10239505B4 (de) * | 2002-08-28 | 2005-05-04 | Kodak Polychrome Graphics Gmbh | Wärmeempfindlicher positiv arbeitender Lithographie-Druckplattenvorläufer mit hoher Chemikalienbeständigkeit |
| US7045269B2 (en) * | 2003-03-10 | 2006-05-16 | Eastman Kodak Company | Method for forming images using negative working imageable elements |
| US6902861B2 (en) * | 2003-03-10 | 2005-06-07 | Kodak Polychrome Graphics, Llc | Infrared absorbing compounds and their use in photoimageable elements |
| US7060409B2 (en) * | 2003-03-10 | 2006-06-13 | Eastman Kodak Company | Imageable elements with improved dot stability |
| US7094503B2 (en) * | 2003-03-27 | 2006-08-22 | Kodak Graphics Communications Canada Company | Nanopastes for use as patterning compositions |
| US6921626B2 (en) * | 2003-03-27 | 2005-07-26 | Kodak Polychrome Graphics Llc | Nanopastes as patterning compositions for electronic parts |
| US7217502B2 (en) * | 2003-03-27 | 2007-05-15 | Eastman Kodak Company | Nanopastes for use as patterning compositions |
| US7081322B2 (en) * | 2003-03-27 | 2006-07-25 | Kodak Graphics Communications Canada Company | Nanopastes as ink-jet compositions for printing plates |
| US6908726B2 (en) * | 2003-04-07 | 2005-06-21 | Kodak Polychrome Graphics Llc | Thermally imageable elements imageable at several wavelengths |
| DE10345362A1 (de) * | 2003-09-25 | 2005-04-28 | Kodak Polychrome Graphics Gmbh | Verfahren zur Verhinderung von Beschichtungsdefekten |
| DE102004026609A1 (de) * | 2004-06-01 | 2006-01-12 | Wacker Polymer Systems Gmbh & Co. Kg | Aminofunktionelle Polyvinylacetale |
| ES2401701T3 (es) * | 2005-06-03 | 2013-04-23 | American Dye Source, Inc. | Copolímeros de acetal que absorben en el infrarrojo cercano térmicamente reactivos, métodos de preparación y métodos se uso |
| US7723013B2 (en) * | 2007-01-11 | 2010-05-25 | Southern Lithoplate, Inc. | Negative-acting photolithographic printing plate with improved pre-burn performance |
| US7544462B2 (en) | 2007-02-22 | 2009-06-09 | Eastman Kodak Company | Radiation-sensitive composition and elements with basic development enhancers |
| US20110020751A1 (en) * | 2008-03-27 | 2011-01-27 | Fujifilm Corporation | Lithographic printing plate precursor and production process of lithographic printing plate using the precursor |
| EP2194429A1 (de) | 2008-12-02 | 2010-06-09 | Eastman Kodak Company | Gummierzusammensetzungen mit Nanoteilchen zur Verbesserung der Kratzempfindlichkeit in Bild- und Nicht-Bild-Bereichen von lithografischen Druckplatten |
| EP2284005B1 (de) | 2009-08-10 | 2012-05-02 | Eastman Kodak Company | Lithografische Druckplattenvorläufer mit Betahydroxy-Alkylamid-Vernetzern |
| EP2293144B1 (de) | 2009-09-04 | 2012-11-07 | Eastman Kodak Company | Verfahren zum Trocknen von Lithographiedruckplatten nach einer Einstufenverarbeitung |
| EP2366545B1 (de) | 2010-03-19 | 2012-12-05 | Agfa Graphics N.V. | Lithographiedruckplattenvorläufer |
| CN101813888B (zh) * | 2010-04-14 | 2012-02-01 | 东莞长联新材料科技有限公司 | 一种重氮感光胶热稳定性和光化学活性的调控方法 |
| EP2796928B1 (de) | 2011-03-31 | 2015-12-30 | Fujifilm Corporation | Lithographiedruckplattenvorläufer und Verfahren zur Herstellung davon |
| EP2796929B1 (de) | 2011-03-31 | 2015-12-30 | Fujifilm Corporation | Lithographiedruckplattenvorläufer und Verfahren zur Herstellung davon |
| EP2937733A4 (de) * | 2012-12-19 | 2016-09-14 | Ibf Indústria Brasileira De Filmes S A | Zusammensetzung mit empfindlichkeit gegenüber strahlung in elektromagnetischen spektren für druckzwecke, druckplatte mit dieser zusammensetzung und verwendung dieser zusammensetzung sowie bildentwicklungsverfahren |
| ES2642967T3 (es) | 2013-01-01 | 2017-11-20 | Agfa Graphics Nv | Copolímeros (de etileno, vinilacetal) y precursores de plancha de impresión litográfica que incluyen tales copolímeros |
| EP2933278B1 (de) | 2014-04-17 | 2018-08-22 | Agfa Nv | (Ethylen-,Vinylacetal-)Copolymere und ihre Verwendung in Lithographiedruckplattenvorläufern |
| EP2944657B1 (de) | 2014-05-15 | 2017-01-11 | Agfa Graphics Nv | (Ethylen-,Vinylacetal-)Copolymere und deren Verwendung in Lithographiedruckplattenvorläufern |
| EP2955198B8 (de) | 2014-06-13 | 2018-01-03 | Agfa Nv | Ethylenvinylacetal-Copolymere und deren Verwendung in lithographischen Druckplattenvorläufer |
| EP2963496B1 (de) | 2014-06-30 | 2017-04-05 | Agfa Graphics NV | Lithografiedruckplattenvorläufer mit (Ethylen-, Vinylacetal-) Copolymeren |
| MX389251B (es) | 2015-05-04 | 2025-03-20 | Flint Group Germany Gmbh | Placa de impresion con almohadilla grabable por laser. |
| JP2020064082A (ja) | 2017-02-17 | 2020-04-23 | 富士フイルム株式会社 | ポジ型平版印刷版原版、及び、平版印刷版の作製方法 |
| CN106896644B (zh) * | 2017-03-27 | 2020-05-08 | 青岛蓝帆新材料有限公司 | 一种感光性树脂组合物及其应用 |
| CN106909024B (zh) * | 2017-03-28 | 2020-03-13 | 辽宁靖帆新材料有限公司 | 一种感光性树脂组合物及其应用 |
Family Cites Families (40)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US2513190A (en) * | 1948-02-18 | 1950-06-27 | Du Pont | Polymeric color formers |
| US3627783A (en) * | 1964-02-01 | 1971-12-14 | Merck & Co Inc | 1-aroylindole-3-acetonitriles |
| DE2053364A1 (de) * | 1970-10-30 | 1972-05-04 | Kalle Ag, 6202 Wiesbaden-Biebrich | Lichtempfindliche Kopiermasse |
| BE788679A (fr) * | 1971-09-13 | 1973-03-12 | Scott Paper Co | Composition de photopolymere |
| US4123276A (en) * | 1974-02-28 | 1978-10-31 | Fuji Photo Film Co., Ltd. | Photosensitive composition |
| JPS549619A (en) * | 1977-06-23 | 1979-01-24 | Oji Paper Co | Photosensitive composition |
| FR2401941A1 (fr) * | 1977-08-31 | 1979-03-30 | Saint Gobain | Procede de fabrication de polyvinyl butyral et polyvinyl butyral obtenu par ce procede |
| JPS564144A (en) * | 1979-06-23 | 1981-01-17 | Tokyo Ohka Kogyo Co Ltd | Photosensitive composition |
| DE3036077A1 (de) * | 1980-09-25 | 1982-05-06 | Hoechst Ag, 6000 Frankfurt | Lichthaertbares gemisch und damit hergestelltes lichtempfindliches kopiermaterial |
| EP0092901B1 (de) * | 1982-04-23 | 1987-10-14 | Autotype International Limited | Photopolymere |
| JPS5953836A (ja) * | 1982-09-21 | 1984-03-28 | Fuji Photo Film Co Ltd | 感光性平版印刷版 |
| US4511640A (en) * | 1983-08-25 | 1985-04-16 | American Hoechst Corporation | Aqueous developable diazo lithographic printing plates with admixture of polyvinyl acetate and styrene maleic acid ester copolymer |
| DE3404366A1 (de) * | 1984-02-08 | 1985-08-14 | Hoechst Ag, 6230 Frankfurt | Lichtempfindliches gemisch auf basis eines diazoniumsalz-polykondensationsprodukts und daraus hergestelltes lichtempfindliches aufzeichnungsmaterial |
| JPH0782236B2 (ja) * | 1984-10-12 | 1995-09-06 | 三菱化学株式会社 | 感光性組成物 |
| US4618562A (en) * | 1984-12-27 | 1986-10-21 | American Hoechst Corporation | Aqueous developable lithographic printing plates containing an admixture of diazonium salts and polymers and composition therefor |
| US4681245A (en) * | 1985-03-25 | 1987-07-21 | Harvey Robert D | Method and apparatus for dispensing oil well proppant additive |
| EP0208145B1 (de) * | 1985-06-07 | 1991-03-13 | Fuji Photo Film Co., Ltd. | Hörgerät mit einer schwenkbaren Klappe |
| US4665124A (en) * | 1985-08-02 | 1987-05-12 | American Hoechst Corporation | Resin |
| US4895788A (en) * | 1985-08-02 | 1990-01-23 | Hoechst Celanese Corporation | Water developable lithographic composition |
| US4652604A (en) * | 1985-08-02 | 1987-03-24 | American Hoechst Corporation | Radiation-polymerizable composition and element containing a photopolymer composition |
| US4670507A (en) * | 1985-08-02 | 1987-06-02 | American Hoechst Corporation | Resin |
| DE3528309A1 (de) * | 1985-08-07 | 1987-02-12 | Hoechst Ag | Lichtempfindliches gemisch und damit hergestelltes lichtempfindliches aufzeichnungsmaterial |
| CA1308595C (en) * | 1985-11-22 | 1992-10-13 | Toshiaki Aoai | Photosensitive composition |
| JPH0693116B2 (ja) * | 1986-01-21 | 1994-11-16 | 富士写真フイルム株式会社 | 感光性組成物 |
| US4877711A (en) * | 1986-05-19 | 1989-10-31 | Fuji Photo Film Co., Ltd. | Light-sensitive diazo photopolymerizable composition with polyurethane having carbon-carbon unsaturated and a carboxyl group |
| DE3644162A1 (de) * | 1986-12-23 | 1988-07-07 | Hoechst Ag | Polyvinylacetal, dieses enthaltendes lichtempfindliches gemisch und daraus hergestelltes aufzeichnungsmaterial |
| JPH0727208B2 (ja) * | 1987-04-20 | 1995-03-29 | 富士写真フイルム株式会社 | 感光性組成物 |
| US5260161A (en) * | 1989-05-06 | 1993-11-09 | Konica Corporation | Photosensitive composition and photosensitive lithographic printing plate comprising in admixture a tetrapolymer and a diazo resin |
| DE3920230A1 (de) * | 1989-06-21 | 1991-01-24 | Hoechst Ag | Lichtempfindliches gemisch und daraus hergestelltes lichtempfindliches aufzeichnungsmaterial |
| US5238772A (en) * | 1989-06-21 | 1993-08-24 | Hoechst Aktiengesellschaft | Photopolymerizable mixture and recording material containing free-radically polymerizable compound, photosensitive polymerization initiator and polyurethane binder grafted with vinyl alcohol and vinyl acetal units |
| DE3927632A1 (de) * | 1989-08-22 | 1991-02-28 | Basf Ag | Umsetzungsprodukt, verfahren zu dessen herstellung und damit erhaltenes strahlungsempfindliches material |
| DE3928825A1 (de) * | 1989-08-31 | 1991-03-07 | Hoechst Ag | Pfropfpolymerisat mit ungesaettigten seitenketten, dieses enthaltendes lichtempfindliches gemisch sowie daraus hergestelltes aufzeichnungsmaterial |
| JP2739390B2 (ja) * | 1990-11-21 | 1998-04-15 | 富士写真フイルム株式会社 | 平版印刷版の製造方法 |
| WO1993003068A1 (en) * | 1991-07-30 | 1993-02-18 | Eastman Kodak Company | Acid-substituted ternary acetal polymers and use thereof in photosensitive compositions and lithographic printing plates |
| US5169897A (en) * | 1991-07-30 | 1992-12-08 | Eastman Kodak Company | Binary acetal polymers useful in photosensitive compositions and lithographic printing plates |
| US5219699A (en) * | 1991-07-30 | 1993-06-15 | Eastman Kodak Company | Photosensitive compositions and lithographic printing plates containing acid-substituted ternary acetal polymers |
| US5262270A (en) * | 1991-07-30 | 1993-11-16 | Eastman Kodak Company | Photosensitive compositions and lithographic printing plates containing binary acetal polymers |
| US5316892A (en) * | 1992-07-23 | 1994-05-31 | Eastman Kodak Company | Method for developing lithographic printing plates |
| US5275907A (en) * | 1992-07-23 | 1994-01-04 | Eastman Kodak Company | Photosensitive compositions and lithographic printing plates containing acid-substituted ternary acetal polymer and copolyester with reduced propensity to blinding |
| US5534381A (en) * | 1995-07-06 | 1996-07-09 | Minnesota Mining And Manufacturing Company | Acetal polymers useful in photosensitive compositions |
-
1995
- 1995-07-07 DE DE19524851A patent/DE19524851C2/de not_active Expired - Fee Related
-
1996
- 1996-07-03 US US08/675,024 patent/US5700619A/en not_active Expired - Fee Related
- 1996-07-03 ZA ZA965647A patent/ZA965647B/xx unknown
- 1996-07-05 AT AT96110895T patent/ATE196481T1/de active
- 1996-07-05 CA CA002180581A patent/CA2180581A1/en not_active Abandoned
- 1996-07-05 DE DE69610373T patent/DE69610373T2/de not_active Expired - Fee Related
- 1996-07-05 ES ES96110895T patent/ES2151625T3/es not_active Expired - Lifetime
- 1996-07-05 EP EP96110895A patent/EP0752430B1/de not_active Expired - Lifetime
-
1997
- 1997-08-22 US US08/917,631 patent/US5985996A/en not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| DE69610373T2 (de) | 2001-05-23 |
| DE19524851A1 (de) | 1997-01-09 |
| EP0752430A3 (de) | 1998-04-15 |
| EP0752430B1 (de) | 2000-09-20 |
| ES2151625T3 (es) | 2001-01-01 |
| EP0752430A2 (de) | 1997-01-08 |
| US5700619A (en) | 1997-12-23 |
| DE69610373D1 (de) | 2000-10-26 |
| CA2180581A1 (en) | 1997-01-08 |
| DE19524851C2 (de) | 1998-05-07 |
| US5985996A (en) | 1999-11-16 |
| ZA965647B (en) | 1997-06-06 |
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