ATE201791T1 - Herstellungsverfahren einer oberflächenleitenden elektronenemittierenden vorrichtung und bilderzeugungsgerät - Google Patents

Herstellungsverfahren einer oberflächenleitenden elektronenemittierenden vorrichtung und bilderzeugungsgerät

Info

Publication number
ATE201791T1
ATE201791T1 AT94120340T AT94120340T ATE201791T1 AT E201791 T1 ATE201791 T1 AT E201791T1 AT 94120340 T AT94120340 T AT 94120340T AT 94120340 T AT94120340 T AT 94120340T AT E201791 T1 ATE201791 T1 AT E201791T1
Authority
AT
Austria
Prior art keywords
emitting device
production method
producing apparatus
electron emitting
surface conductive
Prior art date
Application number
AT94120340T
Other languages
English (en)
Inventor
Yoshinori Tomida
Hisaaki Kawade
Masahito Niibe
Toshikazu Ohnishi
Yoshimasa Okamura
Original Assignee
Canon Kk
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP34547793A external-priority patent/JP2961485B2/ja
Priority claimed from JP34547893A external-priority patent/JP3185080B2/ja
Application filed by Canon Kk filed Critical Canon Kk
Application granted granted Critical
Publication of ATE201791T1 publication Critical patent/ATE201791T1/de

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J9/00—Apparatus or processes specially adapted for the manufacture, installation, removal, maintenance of electric discharge tubes, discharge lamps, or parts thereof; Recovery of material from discharge tubes or lamps
    • H01J9/02—Manufacture of electrodes or electrode systems
    • H01J9/022—Manufacture of electrodes or electrode systems of cold cathodes
    • H01J9/027—Manufacture of electrodes or electrode systems of cold cathodes of thin film cathodes
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J1/00—Details of electrodes, of magnetic control means, of screens, or of the mounting or spacing thereof, common to two or more basic types of discharge tubes or lamps
    • H01J1/02—Main electrodes
    • H01J1/30—Cold cathodes, e.g. field-emissive cathode
    • H01J1/316—Cold cathodes, e.g. field-emissive cathode having an electric field parallel to the surface, e.g. thin film cathodes
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2201/00—Electrodes common to discharge tubes
    • H01J2201/30—Cold cathodes
    • H01J2201/316—Cold cathodes having an electric field parallel to the surface thereof, e.g. thin film cathodes
    • H01J2201/3165—Surface conduction emission type cathodes

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Cold Cathode And The Manufacture (AREA)
AT94120340T 1993-12-22 1994-12-21 Herstellungsverfahren einer oberflächenleitenden elektronenemittierenden vorrichtung und bilderzeugungsgerät ATE201791T1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP34547793A JP2961485B2 (ja) 1993-12-22 1993-12-22 電子放出素子及び画像形成装置の製造方法並びに電子放出素子の製造に用いる転写体
JP34547893A JP3185080B2 (ja) 1993-12-22 1993-12-22 電子放出素子、電子源及びそれを用いた画像形成装置の製造方法

Publications (1)

Publication Number Publication Date
ATE201791T1 true ATE201791T1 (de) 2001-06-15

Family

ID=26578029

Family Applications (2)

Application Number Title Priority Date Filing Date
AT94120340T ATE201791T1 (de) 1993-12-22 1994-12-21 Herstellungsverfahren einer oberflächenleitenden elektronenemittierenden vorrichtung und bilderzeugungsgerät
AT96112543T ATE179276T1 (de) 1993-12-22 1994-12-21 Herstellungsverfahren einer elektronemittierenden vorrichtung

Family Applications After (1)

Application Number Title Priority Date Filing Date
AT96112543T ATE179276T1 (de) 1993-12-22 1994-12-21 Herstellungsverfahren einer elektronemittierenden vorrichtung

Country Status (5)

Country Link
US (1) US6063453A (de)
EP (2) EP0740324B1 (de)
AT (2) ATE201791T1 (de)
CA (1) CA2138736C (de)
DE (2) DE69427340T2 (de)

Families Citing this family (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5831387A (en) 1994-05-20 1998-11-03 Canon Kabushiki Kaisha Image forming apparatus and a method for manufacturing the same
JP3267464B2 (ja) * 1994-05-20 2002-03-18 キヤノン株式会社 画像形成装置
EP1124247A1 (de) * 1995-04-04 2001-08-16 Canon Kabushiki Kaisha Metallenthaltende Zusammensetzung zum Erzeugen einer elektronenemittierenden Vorrichtung und Verfahren zur Herstellung einer elektronenemittierenden Vorrichtung, einer Elektronenquelle und eines Bilderzeugungsgerätes
US6123876A (en) 1995-04-04 2000-09-26 Canon Kabushiki Kaisha Metal-containing composition for forming electron-emitting device
JP3302278B2 (ja) * 1995-12-12 2002-07-15 キヤノン株式会社 電子放出素子の製造方法並びに該製造方法を用いた電子源及び画像形成装置の製造方法
CN1115708C (zh) 1996-04-26 2003-07-23 佳能株式会社 电子发射器件、电子源和图像形成装置的制造方法
US5810980A (en) * 1996-11-06 1998-09-22 Borealis Technical Limited Low work-function electrode
US6416374B1 (en) 1997-09-16 2002-07-09 Canon Kabushiki Kaisha Electron source manufacturing method, and image forming apparatus method
DE69820945T2 (de) * 1997-09-16 2004-10-21 Canon Kk Verfahren zur Herstellung einer Elektronenquelle und Vorrichtung zur Herstellung einer Elektronenquelle
JP2000309734A (ja) 1999-02-17 2000-11-07 Canon Inc インクジェット用インク、導電性膜、電子放出素子、電子源および画像形成装置の製造方法
JP3437519B2 (ja) 1999-02-25 2003-08-18 キヤノン株式会社 電子放出素子の製造方法および調整方法
TW476073B (en) * 1999-12-09 2002-02-11 Ebara Corp Solution containing metal component, method of and apparatus for forming thin metal film
KR100448663B1 (ko) * 2000-03-16 2004-09-13 캐논 가부시끼가이샤 화상표시장치의 제조방법 및 제조장치
US6743395B2 (en) * 2000-03-22 2004-06-01 Ebara Corporation Composite metallic ultrafine particles and process for producing the same
WO2002027063A2 (en) 2000-09-28 2002-04-04 President And Fellows Of Harward College Vapor deposition of oxides, silicates and phosphates
JP3703448B2 (ja) * 2001-09-27 2005-10-05 キヤノン株式会社 電子放出素子、電子源基板、表示装置及び電子放出素子の製造方法
JP2003109494A (ja) 2001-09-28 2003-04-11 Canon Inc 電子源の製造方法
JP3902998B2 (ja) * 2001-10-26 2007-04-11 キヤノン株式会社 電子源及び画像形成装置の製造方法
US7138157B2 (en) * 2002-07-30 2006-11-21 Canon Kabushiki Kaisha Electron emitting device manufacture method and image display apparatus manufacture method
US7858145B2 (en) * 2004-08-31 2010-12-28 Canon Kabushiki Kaisha Method of manufacturing electroconductive member pattern, and methods of manufacturing electron source and image displaying apparatus each using the same
CN102466822B (zh) * 2010-11-04 2013-09-04 中国石油天然气集团公司 一种海洋电磁勘探四极互组合布极方法

Family Cites Families (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2083740A5 (en) * 1970-03-20 1971-12-17 Thomson Csf Laser applied surface film
US3978247A (en) * 1974-01-28 1976-08-31 Rca Corporation Transfer recording process
US4543270A (en) * 1984-06-20 1985-09-24 Gould Inc. Method for depositing a micron-size metallic film on a transparent substrate utilizing a visible laser
US4957851A (en) * 1985-04-16 1990-09-18 Canon Kabushiki Kaisha Image recording medium comprising a diacetylene derivative compound film and a radiation absorbing layer
US4743463A (en) * 1986-02-21 1988-05-10 Eastman Kodak Company Method for forming patterns on a substrate or support
JPS6382788A (ja) * 1986-09-26 1988-04-13 Matsushita Electric Ind Co Ltd 通電転写記録体
US4970196A (en) * 1987-01-15 1990-11-13 The Johns Hopkins University Method and apparatus for the thin film deposition of materials with a high power pulsed laser
US4948623A (en) * 1987-06-30 1990-08-14 International Business Machines Corporation Method of chemical vapor deposition of copper, silver, and gold using a cyclopentadienyl/metal complex
US5136212A (en) * 1988-02-18 1992-08-04 Canon Kabushiki Kaisha Electron emitting device, electron generator employing said electron emitting device, and method for driving said generator
JP2630988B2 (ja) * 1988-05-26 1997-07-16 キヤノン株式会社 電子線発生装置
JP2805326B2 (ja) * 1989-03-22 1998-09-30 キヤノン株式会社 電子源及びそれを用いた画像形成装置
JP3000467B2 (ja) * 1990-03-09 2000-01-17 キヤノン株式会社 マルチ電子源及び画像形成装置
US4987006A (en) * 1990-03-26 1991-01-22 Amp Incorporated Laser transfer deposition
JPH0465050A (ja) * 1990-07-03 1992-03-02 Canon Inc 表面伝導形電子放出素子の製造方法
JPH04147888A (ja) * 1990-10-11 1992-05-21 Fuji Xerox Co Ltd 通電昇華型記録媒体及び記録方法
US5139818A (en) * 1991-06-06 1992-08-18 General Motors Corporation Method for applying metal catalyst patterns onto ceramic for electroless copper deposition
GB9118721D0 (en) * 1991-09-02 1991-10-16 Era Patents Ltd Production of fine points
JPH0799791B2 (ja) * 1992-04-15 1995-10-25 インターナショナル・ビジネス・マシーンズ・コーポレイション 透明基板上の回路ライン接続方法
US5376409B1 (en) * 1992-12-21 1997-06-03 Univ New York State Res Found Process and apparatus for the use of solid precursor sources in liquid form for vapor deposition of materials

Also Published As

Publication number Publication date
EP0660359A3 (de) 1995-07-26
ATE179276T1 (de) 1999-05-15
DE69427340D1 (de) 2001-07-05
EP0660359A2 (de) 1995-06-28
DE69418062D1 (de) 1999-05-27
CA2138736A1 (en) 1995-06-23
DE69418062T2 (de) 1999-12-09
EP0740324A3 (de) 1996-11-06
CA2138736C (en) 2000-05-23
EP0660359B1 (de) 2001-05-30
EP0740324B1 (de) 1999-04-21
EP0740324A2 (de) 1996-10-30
US6063453A (en) 2000-05-16
DE69427340T2 (de) 2001-10-31

Similar Documents

Publication Publication Date Title
DE69427340D1 (de) Herstellungsverfahren einer oberflächenleitenden elektronenemittierenden Vorrichtung und Bilderzeugungsgerät
DE69425230D1 (de) Herstellungsverfahren einer Elektronen emittierenden Vorrichtung, einer Elektronenquelle und eine Bilderzeugungsvorrichtung
CA2158886A1 (en) Electron-Emitting Device and Method of Manufacturing the Same as Well as Electron Source and Image Forming Apparatus Comprising Such Electron-Emitting Devices
ATE181620T1 (de) Verfahren zur herstellung einer elektronen- emittierenden vorrichtung und elektronenquelle sowie einer bilderzeugungsvorrichtung
CA2165409A1 (en) Electron-emitting device, electron source substrate, electron source, display panel and image-forming apparatus, and production method thereof
EP0756334A3 (de) Lichtemittierende Vorrichtung, elektrische Vorrichtung, die diese lichtemittierende Vorrichtung enthält, und Methode zu deren Herstellung
ES2096687T3 (es) Fuente de electrones de emision por un campo que emplea un recubrimiento de diamantes y metodo para su produccion.
CA2182647A1 (en) Electron-emitting device and electron source and image-forming apparatus using the same as well as method of manufacturing the same
DE69516945D1 (de) Vorrichtung zur Herstellung einer Elektronenquelle und Bilderzeugungsgerät
MY119247A (en) Manufacturing method and manufacturing apparatus for ceramic electronic components
CA2540606A1 (en) Electron-emitting device and method of manufacturing the same as well as electron source and image-forming apparatus
EP0828175A3 (de) Optische Wellenleitervorrichtungen, optische Wanderwellen-Modulatoren und Verfahren zur Herstellung optischer Wellenleitervorrichtungen
EP0255557A3 (de) Verfahren zur Bildung von metallischen Bildern
EP0465152A3 (en) Method for producing semiconductor device having alignment mark
EP0869531A3 (de) Apparat zur Bilderzeugung und Verfahren zur Herstellung
SG67550A1 (en) Field emission electron source method of producing the same and use of the same
ATE171562T1 (de) Elektronenquelle und bilderzeugungsvorrichtung und verfahren zur herstellung
ATE85454T1 (de) Herstellungsverfahren fuer einen duennschichttypwiderstand.
EP1003197A3 (de) Substrat für eine Elektronenquelle, Elektronenquelle und Bilderzeugungsgerät, und deren Herstellungsverfahren
DE69535550D1 (de) Verfahren zur Herstellung einer elektronenemittierende Vorrichtung, einer Elektronenquelle, und eines Bilderzeugungsgerätes
JPH0467290B2 (de)
CA2282898A1 (en) Electron-emitting device and method of manufacturing the same as well as electron source and image forming apparatus comprising such electron-emitting devices
CA2295377A1 (en) Electron-emitting device, electron source substrate, electron source, display panel and image-forming apparatus, and production method thereof
KR960012628B1 (en) Fabricating method of semiconductor device
ATE209395T1 (de) Halbleiteranordnung und verfahren zu ihrer herstellung

Legal Events

Date Code Title Description
RER Ceased as to paragraph 5 lit. 3 law introducing patent treaties