ATE233836T1 - Verfahren zur herstellung volumeneinkristallen aus silizium-karbid - Google Patents

Verfahren zur herstellung volumeneinkristallen aus silizium-karbid

Info

Publication number
ATE233836T1
ATE233836T1 AT99954808T AT99954808T ATE233836T1 AT E233836 T1 ATE233836 T1 AT E233836T1 AT 99954808 T AT99954808 T AT 99954808T AT 99954808 T AT99954808 T AT 99954808T AT E233836 T1 ATE233836 T1 AT E233836T1
Authority
AT
Austria
Prior art keywords
silicon
vapor
carbon
single crystals
source
Prior art date
Application number
AT99954808T
Other languages
English (en)
Inventor
Charles Eric Hunter
Original Assignee
Cree Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Cree Inc filed Critical Cree Inc
Application granted granted Critical
Publication of ATE233836T1 publication Critical patent/ATE233836T1/de

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C30—CRYSTAL GROWTH
    • C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B23/00—Single-crystal growth by condensing evaporated or sublimed materials
    • C—CHEMISTRY; METALLURGY
    • C30—CRYSTAL GROWTH
    • C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B25/00—Single-crystal growth by chemical reaction of reactive gases, e.g. chemical vapour-deposition growth
    • C—CHEMISTRY; METALLURGY
    • C30—CRYSTAL GROWTH
    • C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B29/00—Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
    • C30B29/10—Inorganic compounds or compositions
    • C30B29/36—Carbides

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
  • Chemical Vapour Deposition (AREA)
AT99954808T 1998-10-09 1999-10-08 Verfahren zur herstellung volumeneinkristallen aus silizium-karbid ATE233836T1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US09/169,399 US6045613A (en) 1998-10-09 1998-10-09 Production of bulk single crystals of silicon carbide
PCT/US1999/023547 WO2000022195A2 (en) 1998-10-09 1999-10-08 Production of bulk single crystals of silicon carbide

Publications (1)

Publication Number Publication Date
ATE233836T1 true ATE233836T1 (de) 2003-03-15

Family

ID=22615516

Family Applications (1)

Application Number Title Priority Date Filing Date
AT99954808T ATE233836T1 (de) 1998-10-09 1999-10-08 Verfahren zur herstellung volumeneinkristallen aus silizium-karbid

Country Status (13)

Country Link
US (1) US6045613A (de)
EP (1) EP1129238B1 (de)
JP (1) JP4553489B2 (de)
KR (1) KR100723610B1 (de)
CN (1) CN101426965B (de)
AT (1) ATE233836T1 (de)
AU (1) AU1106600A (de)
CA (1) CA2346290C (de)
DE (1) DE69905749T2 (de)
ES (1) ES2193757T3 (de)
MY (1) MY116048A (de)
TW (1) TW473565B (de)
WO (1) WO2000022195A2 (de)

Families Citing this family (27)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6336971B1 (en) * 1997-09-12 2002-01-08 Showa Denko Kabushiki Kaisha Method and apparatus for producing silicon carbide single crystal
EP0933450B1 (de) * 1998-01-19 2002-04-17 Sumitomo Electric Industries, Ltd. Verfahren und Vorrichtung zur Herstellung eines SiC-Einkristalles
JP4597285B2 (ja) * 1999-04-28 2010-12-15 昭和電工株式会社 炭化珪素単結晶の製造方法及び製造装置
US6406539B1 (en) * 1999-04-28 2002-06-18 Showa Denko K.K, Process for producing silicon carbide single crystal and production apparatus therefor
EP1200651B1 (de) * 1999-07-07 2004-04-07 Siemens Aktiengesellschaft Keimkristallhalter mit seitlicher einfassung eines sic-keimkristalls
US6514338B2 (en) * 1999-12-27 2003-02-04 Showa Denko Kabushiki Kaisha Method and apparatus for producing silicon carbide single crystal
US6706114B2 (en) 2001-05-21 2004-03-16 Cree, Inc. Methods of fabricating silicon carbide crystals
US20030017932A1 (en) * 2001-07-17 2003-01-23 Vandenbiesen Russell P. Method for making synthetic gems comprising elements recovered from complete or partial human or animal remains and the product thereof
US6903446B2 (en) * 2001-10-23 2005-06-07 Cree, Inc. Pattern for improved visual inspection of semiconductor devices
US6780243B1 (en) * 2001-11-01 2004-08-24 Dow Corning Enterprises, Inc. Method of silicon carbide monocrystalline boule growth
ITMI20031196A1 (it) * 2003-06-13 2004-12-14 Lpe Spa Sistema per crescere cristalli di carburo di silicio
US20070110657A1 (en) * 2005-11-14 2007-05-17 Hunter Charles E Unseeded silicon carbide single crystals
JP4469396B2 (ja) * 2008-01-15 2010-05-26 新日本製鐵株式会社 炭化珪素単結晶インゴット、これから得られる基板及びエピタキシャルウェハ
JP5779171B2 (ja) 2009-03-26 2015-09-16 トゥー‐シックス・インコーポレイテッド ＳｉＣ単結晶の昇華成長方法及び装置
JP4888548B2 (ja) * 2009-12-24 2012-02-29 株式会社デンソー 炭化珪素単結晶の製造装置および製造方法
RU2434083C1 (ru) * 2010-10-28 2011-11-20 Общество С Ограниченной Ответственностью "Гранник" Способ одновременного получения нескольких ограненных драгоценных камней из синтетического карбида кремния - муассанита
WO2012090268A1 (ja) * 2010-12-27 2012-07-05 株式会社エコトロン 単結晶炭化珪素エピタキシャル基板とその製造方法および単結晶ＳｉＣデバイス
CN104805504B (zh) * 2015-05-19 2017-12-05 山东大学 一种快速生长大尺寸碳化硅单晶的方法
CN106480503B (zh) * 2016-12-09 2018-11-20 河北同光晶体有限公司 一种颗粒状碳化硅单晶的生长方法
EP3382068B1 (de) 2017-03-29 2022-05-18 SiCrystal GmbH Siliciumcarbidsubstrat und verfahren zur züchtung von sic-einkristall-ingots
EP3382067B1 (de) * 2017-03-29 2021-08-18 SiCrystal GmbH Siliciumcarbidsubstrat und verfahren zur züchtung von sic-einkristallkörpern
CN109234804B (zh) * 2018-11-02 2020-01-14 山东天岳先进材料科技有限公司 一种碳化硅单晶生长方法
CN115279956A (zh) 2019-12-27 2022-11-01 沃孚半导体公司 大直径碳化硅晶片
CN113445122B (zh) * 2020-03-24 2022-11-22 芯恩（青岛）集成电路有限公司 提高SiC晶体生长效率及质量的方法及装置
US12125701B2 (en) 2020-12-15 2024-10-22 Wolfspeed, Inc. Large dimension silicon carbide single crystalline materials with reduced crystallographic stress
US12024794B2 (en) 2021-06-17 2024-07-02 Wolfspeed, Inc. Reduced optical absorption for silicon carbide crystalline materials
CN113502542A (zh) * 2021-09-10 2021-10-15 江苏超芯星半导体有限公司 一种htcvd法碳化硅晶体生长控制系统及方法

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US34861A (en) * 1862-04-01 Improved washing-machine
US4866005A (en) 1987-10-26 1989-09-12 North Carolina State University Sublimation of silicon carbide to produce large, device quality single crystals of silicon carbide
US5762896A (en) * 1995-08-31 1998-06-09 C3, Inc. Silicon carbide gemstones
JP3384242B2 (ja) * 1996-03-29 2003-03-10 株式会社豊田中央研究所 炭化珪素単結晶の製造方法
US5858086A (en) * 1996-10-17 1999-01-12 Hunter; Charles Eric Growth of bulk single crystals of aluminum nitride
WO1999014405A1 (en) * 1997-09-12 1999-03-25 Showa Denko Kabushiki Kaisha Method and apparatus for producing silicon carbide single crystal
US5985024A (en) * 1997-12-11 1999-11-16 Northrop Grumman Corporation Method and apparatus for growing high purity single crystal silicon carbide
EP0933450B1 (de) * 1998-01-19 2002-04-17 Sumitomo Electric Industries, Ltd. Verfahren und Vorrichtung zur Herstellung eines SiC-Einkristalles

Also Published As

Publication number Publication date
WO2000022195A2 (en) 2000-04-20
JP4553489B2 (ja) 2010-09-29
KR20010080078A (ko) 2001-08-22
EP1129238B1 (de) 2003-03-05
DE69905749D1 (de) 2003-04-10
CN101426965B (zh) 2010-06-02
AU1106600A (en) 2000-05-01
CA2346290C (en) 2008-07-08
WO2000022195A3 (en) 2000-09-21
CA2346290A1 (en) 2000-04-20
JP2002527339A (ja) 2002-08-27
MY116048A (en) 2003-10-31
EP1129238A2 (de) 2001-09-05
US6045613A (en) 2000-04-04
DE69905749T2 (de) 2003-12-24
KR100723610B1 (ko) 2007-06-04
ES2193757T3 (es) 2003-11-01
TW473565B (en) 2002-01-21
CN101426965A (zh) 2009-05-06

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