ATE240833T1 - Infrarotstrahlungs- und wärme-empfindliche zusammensetzung, und lithographische druckplatte, die mit dieser zusammensetzung beschichtet ist - Google Patents
Infrarotstrahlungs- und wärme-empfindliche zusammensetzung, und lithographische druckplatte, die mit dieser zusammensetzung beschichtet istInfo
- Publication number
- ATE240833T1 ATE240833T1 AT00202653T AT00202653T ATE240833T1 AT E240833 T1 ATE240833 T1 AT E240833T1 AT 00202653 T AT00202653 T AT 00202653T AT 00202653 T AT00202653 T AT 00202653T AT E240833 T1 ATE240833 T1 AT E240833T1
- Authority
- AT
- Austria
- Prior art keywords
- composition
- printing plate
- infrared radiation
- lithographic printing
- heat sensitive
- Prior art date
Links
- 230000005855 radiation Effects 0.000 title 1
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 abstract 2
- 239000003112 inhibitor Substances 0.000 abstract 2
- 229920006243 acrylic copolymer Polymers 0.000 abstract 1
- 239000011230 binding agent Substances 0.000 abstract 1
- 150000001732 carboxylic acid derivatives Chemical class 0.000 abstract 1
- 125000002887 hydroxy group Chemical group [H]O* 0.000 abstract 1
- 229920000058 polyacrylate Polymers 0.000 abstract 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
- B41C1/00—Forme preparation
- B41C1/10—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme
- B41C1/1008—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme by removal or destruction of lithographic material on the lithographic support, e.g. by laser or spark ablation; by the use of materials rendered soluble or insoluble by heat exposure, e.g. by heat produced from a light to heat transforming system; by on-the-press exposure or on-the-press development, e.g. by the fountain of photolithographic materials
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
- B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
- B41C2210/02—Positive working, i.e. the exposed (imaged) areas are removed
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
- B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
- B41C2210/06—Developable by an alkaline solution
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
- B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
- B41C2210/22—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation characterised by organic non-macromolecular additives, e.g. dyes, UV-absorbers, plasticisers
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
- B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
- B41C2210/24—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation characterised by a macromolecular compound or binder obtained by reactions involving carbon-to-carbon unsaturated bonds, e.g. acrylics, vinyl polymers
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
- B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
- B41C2210/26—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation characterised by a macromolecular compound or binder obtained by reactions not involving carbon-to-carbon unsaturated bonds
- B41C2210/262—Phenolic condensation polymers, e.g. novolacs, resols
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/106—Binder containing
- Y10S430/111—Polymer of unsaturated acid or ester
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/145—Infrared
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/165—Thermal imaging composition
Landscapes
- Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Thermal Sciences (AREA)
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Paints Or Removers (AREA)
- Materials For Photolithography (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Compositions Of Macromolecular Compounds (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| EP99830489 | 1999-07-30 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| ATE240833T1 true ATE240833T1 (de) | 2003-06-15 |
Family
ID=8243525
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| AT00202653T ATE240833T1 (de) | 1999-07-30 | 2000-07-24 | Infrarotstrahlungs- und wärme-empfindliche zusammensetzung, und lithographische druckplatte, die mit dieser zusammensetzung beschichtet ist |
Country Status (4)
| Country | Link |
|---|---|
| US (1) | US6500600B1 (de) |
| AT (1) | ATE240833T1 (de) |
| DE (1) | DE60002791T2 (de) |
| ES (1) | ES2199119T3 (de) |
Family Cites Families (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5085972A (en) | 1990-11-26 | 1992-02-04 | Minnesota Mining And Manufacturing Company | Alkoxyalkyl ester solubility inhibitors for phenolic resins |
| JP3471990B2 (ja) * | 1995-09-27 | 2003-12-02 | 富士写真フイルム株式会社 | ポジ型感光性平版印刷版およびその製造方法 |
| CZ292739B6 (cs) | 1996-04-23 | 2003-12-17 | Horsell Graphic Industries Limited | Pozitivně pracující, oleofilní, tepelně citlivá kompozice, litografická výchozí tisková deska obsahující tuto kompozici a způsob výroby litografické výchozí tiskové desky |
| JP3814961B2 (ja) | 1996-08-06 | 2006-08-30 | 三菱化学株式会社 | ポジ型感光性印刷版 |
| US6060222A (en) | 1996-11-19 | 2000-05-09 | Kodak Polcyhrome Graphics Llc | 1Postitve-working imaging composition and element and method of forming positive image with a laser |
| US6022667A (en) * | 1997-05-27 | 2000-02-08 | Agfa-Gevaert, N.V. | Heat sensitive imaging element and a method for producing lithographic plates therewith |
| US6106996A (en) * | 1997-05-27 | 2000-08-22 | Agfa-Gevaert, N.V. | Heat sensitive imaging element and a method for producing lithographic plates therewith |
| US6093519A (en) * | 1997-06-05 | 2000-07-25 | Agfa-Gevaert, N.V. | Heat sensitive imaging element and a method for producing lithographic plates therewith |
| US6117613A (en) | 1997-09-12 | 2000-09-12 | Fuji Photo Film Co., Ltd. | Positive photosensitive composition for use with an infrared laser |
| JP3858374B2 (ja) * | 1997-09-18 | 2006-12-13 | コニカミノルタホールディングス株式会社 | 感光性組成物及び画像形成材料 |
| GB9722862D0 (en) | 1997-10-29 | 1997-12-24 | Horsell Graphic Ind Ltd | Pattern formation |
-
2000
- 2000-07-24 AT AT00202653T patent/ATE240833T1/de not_active IP Right Cessation
- 2000-07-24 DE DE60002791T patent/DE60002791T2/de not_active Expired - Lifetime
- 2000-07-24 ES ES00202653T patent/ES2199119T3/es not_active Expired - Lifetime
- 2000-07-28 US US09/628,361 patent/US6500600B1/en not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| HK1034697A1 (en) | 2001-11-02 |
| DE60002791D1 (de) | 2003-06-26 |
| DE60002791T2 (de) | 2004-03-18 |
| US6500600B1 (en) | 2002-12-31 |
| ES2199119T3 (es) | 2004-02-16 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| HUP9802361A2 (hu) | Folyékony poliol-poliészter bőrpuhító bőrápoló szert és egy immobilizáló szert tartalmazó nedvesített fedőrésszel ellátott pelenka | |
| DE69628996D1 (de) | Polymerzusammensetzung und Rezistmaterial | |
| AU2327297A (en) | Photoresist compositions comprising polycyclic polymers with acid labile pendant groups | |
| RU92016573A (ru) | Полимерная композиция и изделия | |
| WO1999014256A8 (en) | Photoresist compositions comprising polycyclic polymers with acid labile pendant groups | |
| FI925978A0 (fi) | Biosoenderfallande polymera kompositioner baserade pao staerkelse och termoplastiska polymerer | |
| TW259714B (de) | ||
| CA2220409A1 (en) | Pigmented, uv-cured, acrylic-based, pressure sensitive adhesives, and method for making same | |
| MY123980A (en) | Photoresist compositions comprising polycyclic polymers with acid labile pendant groups | |
| NO980981D0 (no) | Fremgangsmåte til fremstilling av antimikrobielle plaststoffer | |
| NO994026L (no) | Umettete polyesterharpiksblandinger omfattende metalliske monomerer | |
| PT980881E (pt) | Agente de revestimento aquoso, sua preparacao e utilizacao para tintas de cura em estufa | |
| MX9204452A (es) | Composiciones de revestimiento a base de polimeros de injerto y procedimiento para su preparacion. | |
| ES2175445T3 (es) | Pegamentos adhesivos con pequeñas cantidades de estireno. | |
| ATE148150T1 (de) | Pulverförmige überzugsmittel | |
| DK0999736T3 (da) | Aftagelig beskyttelsesbelægning | |
| DE60002791D1 (de) | Infrarotstrahlungs- und wärme-empfindliche Zusammensetzung, und lithographische Druckplatte, die mit dieser Zusammensetzung beschichtet ist | |
| ATE83259T1 (de) | Haftklebemasse, die wasserloesliches polyalkyloxazolin und ein wasserunloeschliches polymer enthaelt. | |
| CA2356272A1 (en) | Cement composition and process therewith | |
| ATE223197T1 (de) | Kosmetische oder pharmazeutische zusammensetzung enthaltend ein ester des dextrins und ein hydrophiles geliermittel | |
| ES2093296T3 (es) | Procedimiento para la fabricacion de copolimeros hidroxifuncionales. | |
| ATE263680T1 (de) | Ir- und uv-strahlungsempfindliche zusammensetzung und offsetdruckplatte | |
| DK0927198T3 (da) | Vandig polymerdispersion til anvendelse i blanke lakker på vandbasis | |
| ATE251647T1 (de) | Wärmeformbare acrylfolie | |
| DE69724519D1 (de) | Reinigungsmitteltabletten |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| RER | Ceased as to paragraph 5 lit. 3 law introducing patent treaties |