ATE252276T1 - Phononenresonator - Google Patents
PhononenresonatorInfo
- Publication number
- ATE252276T1 ATE252276T1 AT96908469T AT96908469T ATE252276T1 AT E252276 T1 ATE252276 T1 AT E252276T1 AT 96908469 T AT96908469 T AT 96908469T AT 96908469 T AT96908469 T AT 96908469T AT E252276 T1 ATE252276 T1 AT E252276T1
- Authority
- AT
- Austria
- Prior art keywords
- phonon
- phonons
- phonon resonator
- resonator
- present
- Prior art date
Links
- 230000003993 interaction Effects 0.000 abstract 1
- 230000003287 optical effect Effects 0.000 abstract 1
- 229910052710 silicon Inorganic materials 0.000 abstract 1
- 239000010703 silicon Substances 0.000 abstract 1
- 230000007704 transition Effects 0.000 abstract 1
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10H—INORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
- H10H20/00—Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
- H10H20/80—Constructional details
- H10H20/81—Bodies
- H10H20/811—Bodies having quantum effect structures or superlattices, e.g. tunnel junctions
- H10H20/812—Bodies having quantum effect structures or superlattices, e.g. tunnel junctions within the light-emitting regions, e.g. having quantum confinement structures
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/10—Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
- H01S5/12—Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region the resonator having a periodic structure, e.g. in distributed feedback [DFB] lasers
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F77/00—Constructional details of devices covered by this subclass
- H10F77/10—Semiconductor bodies
- H10F77/14—Shape of semiconductor bodies; Shapes, relative sizes or dispositions of semiconductor regions within semiconductor bodies
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/015—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on semiconductor elements having potential barriers, e.g. having a PN or PIN junction
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/06—Arrangements for controlling the laser output parameters, e.g. by operating on the active medium
- H01S5/062—Arrangements for controlling the laser output parameters, e.g. by operating on the active medium by varying the potential of the electrodes
- H01S5/06203—Transistor-type lasers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/10—Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
- H01S5/18—Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities
- H01S5/183—Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities having only vertical cavities, e.g. vertical cavity surface-emitting lasers [VCSEL]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/30—Structure or shape of the active region; Materials used for the active region
- H01S5/3027—IV compounds
- H01S5/3031—Si
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/30—Structure or shape of the active region; Materials used for the active region
- H01S5/32—Structure or shape of the active region; Materials used for the active region comprising PN junctions, e.g. hetero- or double- heterostructures
- H01S5/3223—IV compounds
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/30—Structure or shape of the active region; Materials used for the active region
- H01S5/32—Structure or shape of the active region; Materials used for the active region comprising PN junctions, e.g. hetero- or double- heterostructures
- H01S5/3223—IV compounds
- H01S5/3224—Si
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/50—Amplifier structures not provided for in groups H01S5/02 - H01S5/30
Landscapes
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Electromagnetism (AREA)
- Optics & Photonics (AREA)
- Semiconductor Lasers (AREA)
- Insulated Gate Type Field-Effect Transistor (AREA)
- Lasers (AREA)
- Saccharide Compounds (AREA)
- Compounds Of Alkaline-Earth Elements, Aluminum Or Rare-Earth Metals (AREA)
- Oxygen, Ozone, And Oxides In General (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US08/393,380 US5917195A (en) | 1995-02-17 | 1995-02-17 | Phonon resonator and method for its production |
| PCT/US1996/002052 WO1996025767A2 (en) | 1995-02-17 | 1996-02-14 | Phonon resonator and method for its production |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| ATE252276T1 true ATE252276T1 (de) | 2003-11-15 |
Family
ID=23554464
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| AT96908469T ATE252276T1 (de) | 1995-02-17 | 1996-02-14 | Phononenresonator |
Country Status (9)
| Country | Link |
|---|---|
| US (1) | US5917195A (de) |
| EP (1) | EP0838093B1 (de) |
| JP (1) | JP3974654B2 (de) |
| AT (1) | ATE252276T1 (de) |
| AU (1) | AU5170096A (de) |
| CA (1) | CA2213210A1 (de) |
| DE (1) | DE69630387T2 (de) |
| ES (1) | ES2208732T3 (de) |
| WO (1) | WO1996025767A2 (de) |
Families Citing this family (63)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0895292A1 (de) * | 1997-07-29 | 1999-02-03 | Hitachi Europe Limited | Elektrolumineszentes Bauteil |
| FR2789496B1 (fr) * | 1999-02-10 | 2002-06-07 | Commissariat Energie Atomique | Dispositif emetteur et guide de lumiere, avec une region active de silicium contenant des centres radiatifs, et procede de fabrication d'un tel dispositif |
| US6146601A (en) * | 1999-10-28 | 2000-11-14 | Eagle-Picher Industries, Inc. | Enrichment of silicon or germanium isotopes |
| US6678305B1 (en) * | 1999-05-04 | 2004-01-13 | Noekismet, L.L.C. | Surface catalyst infra red laser |
| US7371962B2 (en) | 1999-05-04 | 2008-05-13 | Neokismet, Llc | Diode energy converter for chemical kinetic electron energy transfer |
| US6649823B2 (en) * | 1999-05-04 | 2003-11-18 | Neokismet, L.L.C. | Gas specie electron-jump chemical energy converter |
| US7223914B2 (en) | 1999-05-04 | 2007-05-29 | Neokismet Llc | Pulsed electron jump generator |
| EP1107044A1 (de) * | 1999-11-30 | 2001-06-13 | Hitachi Europe Limited | Photonisches Bauelement |
| JP3422482B2 (ja) * | 2000-02-17 | 2003-06-30 | 日本電気株式会社 | 単一光子発生装置 |
| US6734453B2 (en) | 2000-08-08 | 2004-05-11 | Translucent Photonics, Inc. | Devices with optical gain in silicon |
| WO2002015279A1 (en) * | 2000-08-15 | 2002-02-21 | Silex Systems Limited | A semiconductor isotope superlattice |
| AUPR083300A0 (en) * | 2000-10-17 | 2000-11-09 | Silex Systems Limited | An isotope structure formed in an indriect band gap semiconductor material |
| WO2002058219A2 (en) | 2001-01-17 | 2002-07-25 | Neokismet, L.L.C. | Electron-jump chemical energy converter |
| WO2003003469A1 (en) * | 2001-06-29 | 2003-01-09 | Neokismet, L.L.C. | Quantum well energizing method and apparatus |
| US20040171226A1 (en) * | 2001-07-05 | 2004-09-02 | Burden Stephen J. | Isotopically pure silicon-on-insulator wafers and method of making same |
| US6653658B2 (en) * | 2001-07-05 | 2003-11-25 | Isonics Corporation | Semiconductor wafers with integrated heat spreading layer |
| US6867459B2 (en) * | 2001-07-05 | 2005-03-15 | Isonics Corporation | Isotopically pure silicon-on-insulator wafers and method of making same |
| US7119400B2 (en) * | 2001-07-05 | 2006-10-10 | Isonics Corporation | Isotopically pure silicon-on-insulator wafers and method of making same |
| US6917727B2 (en) * | 2001-09-10 | 2005-07-12 | California Institute Of Technology | Strip loaded waveguide integrated with electronics components |
| US7120338B2 (en) * | 2001-09-10 | 2006-10-10 | California Institute Of Technology | Tuning the index of a waveguide structure |
| JP2003292398A (ja) * | 2002-03-29 | 2003-10-15 | Canon Inc | 単結晶シリコンウェファの製造方法 |
| US6829269B2 (en) | 2002-05-21 | 2004-12-07 | University Of Massachusetts | Systems and methods using phonon mediated intersubband laser |
| ATE365382T1 (de) * | 2002-11-29 | 2007-07-15 | Max Planck Gesellschaft | Halbleiterstruktur für infrarotbereich und herstellungsverfahren |
| WO2004051761A2 (en) * | 2002-12-02 | 2004-06-17 | Institute For Scientific Research, Inc. | Isotopically enriched piezoelectric devices and method for making the same |
| US7209618B2 (en) * | 2003-03-25 | 2007-04-24 | Hewlett-Packard Development Company, L.P. | Scanner transparent media adapter using fiber optic face plate |
| JP2005083862A (ja) * | 2003-09-08 | 2005-03-31 | Canon Inc | 光学薄膜およびこれを用いたミラー |
| US7315679B2 (en) * | 2004-06-07 | 2008-01-01 | California Institute Of Technology | Segmented waveguide structures |
| US7176112B2 (en) * | 2004-09-21 | 2007-02-13 | Atmel Corporation | Non-thermal annealing with electromagnetic radiation in the terahertz range of doped semiconductor material |
| JP4550613B2 (ja) * | 2005-02-21 | 2010-09-22 | 古河電気工業株式会社 | 異方熱伝導材料 |
| US7826688B1 (en) | 2005-10-21 | 2010-11-02 | Luxtera, Inc. | Enhancing the sensitivity of resonant optical modulating and switching devices |
| US7619238B2 (en) * | 2006-02-04 | 2009-11-17 | Sensor Electronic Technology, Inc. | Heterostructure including light generating structure contained in potential well |
| JP2007238862A (ja) * | 2006-03-10 | 2007-09-20 | Denso Corp | 熱輸送媒体 |
| JP5004072B2 (ja) * | 2006-05-17 | 2012-08-22 | 学校法人慶應義塾 | イオン照射効果評価方法、プロセスシミュレータ及びデバイスシミュレータ |
| JP2008063411A (ja) * | 2006-09-06 | 2008-03-21 | Denso Corp | 熱輸送流体、熱輸送構造、及び熱輸送方法 |
| US20100247884A1 (en) | 2007-10-03 | 2010-09-30 | National Institute Of Advanced Industrial Science | Stacked body of isotope diamond |
| US8450704B2 (en) * | 2009-12-04 | 2013-05-28 | Massachusetts Institute Of Technology | Phonon-enhanced crystal growth and lattice healing |
| RU2425793C1 (ru) * | 2010-01-19 | 2011-08-10 | Учреждение Российской Академии Наук Институт Ядерных Исследований Ран (Ияи Ран) | Нанокомпозит на основе фононных резонаторов и способ его получения |
| US8927959B2 (en) | 2010-06-18 | 2015-01-06 | Sensor Electronic Technology, Inc. | Deep ultraviolet light emitting diode |
| US9806226B2 (en) | 2010-06-18 | 2017-10-31 | Sensor Electronic Technology, Inc. | Deep ultraviolet light emitting diode |
| US8907322B2 (en) | 2010-06-18 | 2014-12-09 | Sensor Electronic Technology, Inc. | Deep ultraviolet light emitting diode |
| US8739859B2 (en) | 2010-10-04 | 2014-06-03 | Toyota Motor Engineering & Manufacturing North America, Inc. | Reversible thermal rectifiers, temperature control systems and vehicles incorporating the same |
| KR101265178B1 (ko) | 2011-12-23 | 2013-05-15 | 서울대학교산학협력단 | 간접 밴드갭 반도체를 이용한 전기발광소자 |
| AU2012363075C1 (en) * | 2011-12-30 | 2015-07-30 | James Dalton Bell | Isotopically altered optical fiber |
| US9059388B2 (en) * | 2012-03-21 | 2015-06-16 | University Of Maryland College Park | Phoniton systems, devices, and methods |
| US9817153B2 (en) | 2012-05-22 | 2017-11-14 | Nxt Energy Solutions, Inc. | Gravity transducer system and method including a junction with a first metal and a second metal |
| US9437892B2 (en) | 2012-07-26 | 2016-09-06 | Quswami, Inc. | System and method for converting chemical energy into electrical energy using nano-engineered porous network materials |
| JP5677385B2 (ja) | 2012-08-24 | 2015-02-25 | 株式会社東芝 | フォノン誘導放出装置 |
| US9291297B2 (en) | 2012-12-19 | 2016-03-22 | Elwha Llc | Multi-layer phononic crystal thermal insulators |
| US8847204B2 (en) | 2013-02-26 | 2014-09-30 | Seoul National University R&Db Foundation | Germanium electroluminescence device and fabrication method of the same |
| US9268092B1 (en) * | 2013-03-14 | 2016-02-23 | Sandia Corporation | Guided wave opto-acoustic device |
| US8975617B2 (en) * | 2013-06-03 | 2015-03-10 | Dan Berco | Quantum interference device |
| US10304535B2 (en) * | 2015-03-30 | 2019-05-28 | Yeda Research And Development Co. Ltd. | All-optical single-atom photon router controlled by a single photon |
| JP2017092075A (ja) * | 2015-11-02 | 2017-05-25 | 株式会社ソディック | 発光素子 |
| US10097281B1 (en) | 2015-11-18 | 2018-10-09 | Hypres, Inc. | System and method for cryogenic optoelectronic data link |
| KR102181323B1 (ko) * | 2016-04-06 | 2020-11-23 | 한국전자통신연구원 | 레이저 장치 및 이의 제조방법 |
| JP6278423B2 (ja) * | 2016-06-30 | 2018-02-14 | 株式会社ソディック | 発光素子 |
| TWI806553B (zh) * | 2021-04-21 | 2023-06-21 | 美商安托梅拉公司 | 包含超晶格及富集矽28磊晶層之半導體元件及相關方法 |
| US11810784B2 (en) | 2021-04-21 | 2023-11-07 | Atomera Incorporated | Method for making semiconductor device including a superlattice and enriched silicon 28 epitaxial layer |
| US11923418B2 (en) | 2021-04-21 | 2024-03-05 | Atomera Incorporated | Semiconductor device including a superlattice and enriched silicon 28 epitaxial layer |
| CN117616434A (zh) | 2021-04-27 | 2024-02-27 | 量子源实验室有限公司 | 量子计算 |
| WO2022263933A2 (en) | 2021-04-27 | 2022-12-22 | Quantum Source Labs Ltd. | Quantum computation |
| EP4330866A2 (de) | 2021-04-27 | 2024-03-06 | Quantum Source Labs Ltd. | Quantenberechnung |
| CN121068027B (zh) * | 2025-11-06 | 2026-02-13 | 中国科学院上海技术物理研究所 | 一种基于声子注入的红外探测方法、装置、设备及介质 |
Family Cites Families (18)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5593256A (en) * | 1979-01-10 | 1980-07-15 | Sony Corp | Semiconductor device |
| JPS56164588A (en) * | 1980-05-23 | 1981-12-17 | Nippon Telegr & Teleph Corp <Ntt> | Semiconductor light amplifier |
| FR2485810A1 (fr) * | 1980-06-24 | 1981-12-31 | Thomson Csf | Procede de realisation d'une couche contenant du silicium et dispositif de conversion photo-electrique mettant en oeuvre ce procede |
| US4349796A (en) * | 1980-12-15 | 1982-09-14 | Bell Telephone Laboratories, Incorporated | Devices incorporating phonon filters |
| FR2511887A1 (fr) * | 1981-08-28 | 1983-03-04 | Commissariat Energie Atomique | Procede de separation isotopique par transfert d'energie vibrationnelle |
| US4469977A (en) * | 1982-10-19 | 1984-09-04 | The United States Of America As Represented By The Secretary Of The Navy | Superlattice ultrasonic wave generator |
| US4591889A (en) * | 1984-09-14 | 1986-05-27 | At&T Bell Laboratories | Superlattice geometry and devices |
| US4785340A (en) * | 1985-03-29 | 1988-11-15 | Director-General Of The Agency Of Industrial Science And Technology | Semiconductor device having doping multilayer structure |
| JPS61274322A (ja) * | 1985-05-29 | 1986-12-04 | Mitsubishi Electric Corp | 半導体素子の製造方法 |
| JPH0783029B2 (ja) * | 1986-11-04 | 1995-09-06 | ソニー株式会社 | 半導体装置 |
| JPS63269573A (ja) * | 1987-04-27 | 1988-11-07 | Nippon Telegr & Teleph Corp <Ntt> | ヘテロ接合を有する半導体装置 |
| JP2616926B2 (ja) * | 1987-07-09 | 1997-06-04 | 新日本製鐵株式会社 | 放射線検出素子 |
| JP2740029B2 (ja) * | 1987-12-23 | 1998-04-15 | ブリテツシユ・テレコミユニケイシヨンズ・パブリツク・リミテツド・カンパニー | 半導体ヘテロ構造 |
| US5012302A (en) * | 1990-03-30 | 1991-04-30 | Motorola, Inc. | Enhanced conductivity quantum well having resonant charge coupling |
| US5061970A (en) * | 1990-06-04 | 1991-10-29 | Motorola, Inc. | Energy band leveling modulation doped quantum well |
| US5144409A (en) * | 1990-09-05 | 1992-09-01 | Yale University | Isotopically enriched semiconductor devices |
| JPH0541355A (ja) * | 1991-08-05 | 1993-02-19 | Fujitsu Ltd | 変調半導体材料およびそれを用いた半導体装置 |
| US5436468A (en) * | 1992-03-17 | 1995-07-25 | Fujitsu Limited | Ordered mixed crystal semiconductor superlattice device |
-
1995
- 1995-02-17 US US08/393,380 patent/US5917195A/en not_active Expired - Fee Related
-
1996
- 1996-02-14 WO PCT/US1996/002052 patent/WO1996025767A2/en not_active Ceased
- 1996-02-14 AT AT96908469T patent/ATE252276T1/de not_active IP Right Cessation
- 1996-02-14 JP JP52513796A patent/JP3974654B2/ja not_active Expired - Fee Related
- 1996-02-14 DE DE69630387T patent/DE69630387T2/de not_active Expired - Fee Related
- 1996-02-14 EP EP96908469A patent/EP0838093B1/de not_active Expired - Lifetime
- 1996-02-14 CA CA002213210A patent/CA2213210A1/en not_active Abandoned
- 1996-02-14 ES ES96908469T patent/ES2208732T3/es not_active Expired - Lifetime
- 1996-02-14 AU AU51700/96A patent/AU5170096A/en not_active Abandoned
Also Published As
| Publication number | Publication date |
|---|---|
| WO1996025767A2 (en) | 1996-08-22 |
| JPH11500580A (ja) | 1999-01-12 |
| ES2208732T3 (es) | 2004-06-16 |
| US5917195A (en) | 1999-06-29 |
| AU5170096A (en) | 1996-09-04 |
| EP0838093B1 (de) | 2003-10-15 |
| EP0838093A2 (de) | 1998-04-29 |
| WO1996025767A3 (en) | 1996-09-26 |
| CA2213210A1 (en) | 1996-08-22 |
| DE69630387D1 (de) | 2003-11-20 |
| JP3974654B2 (ja) | 2007-09-12 |
| DE69630387T2 (de) | 2004-07-15 |
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