ATE365382T1 - Halbleiterstruktur für infrarotbereich und herstellungsverfahren - Google Patents

Halbleiterstruktur für infrarotbereich und herstellungsverfahren

Info

Publication number
ATE365382T1
ATE365382T1 AT02026698T AT02026698T ATE365382T1 AT E365382 T1 ATE365382 T1 AT E365382T1 AT 02026698 T AT02026698 T AT 02026698T AT 02026698 T AT02026698 T AT 02026698T AT E365382 T1 ATE365382 T1 AT E365382T1
Authority
AT
Austria
Prior art keywords
active zone
base layer
semiconductor structure
production process
conductivity type
Prior art date
Application number
AT02026698T
Other languages
English (en)
Inventor
George Cirlin
Viatchesla Egorov
Vadim Dr Talalaev
Peter Werner
Nikolai Zakharov
Original Assignee
Max Planck Gesellschaft
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Max Planck Gesellschaft filed Critical Max Planck Gesellschaft
Application granted granted Critical
Publication of ATE365382T1 publication Critical patent/ATE365382T1/de

Links

Classifications

    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10HINORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
    • H10H20/00Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
    • H10H20/80Constructional details
    • H10H20/81Bodies
    • H10H20/822Materials of the light-emitting regions
    • H10H20/826Materials of the light-emitting regions comprising only Group IV materials
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B82NANOTECHNOLOGY
    • B82YSPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10HINORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
    • H10H20/00Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
    • H10H20/80Constructional details
    • H10H20/81Bodies
    • H10H20/811Bodies having quantum effect structures or superlattices, e.g. tunnel junctions
    • H10H20/812Bodies having quantum effect structures or superlattices, e.g. tunnel junctions within the light-emitting regions, e.g. having quantum confinement structures

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Nanotechnology (AREA)
  • Physics & Mathematics (AREA)
  • Mathematical Physics (AREA)
  • Theoretical Computer Science (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Led Devices (AREA)
  • Light Receiving Elements (AREA)
  • Recrystallisation Techniques (AREA)
AT02026698T 2002-11-29 2002-11-29 Halbleiterstruktur für infrarotbereich und herstellungsverfahren ATE365382T1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
EP02026698A EP1424736B1 (de) 2002-11-29 2002-11-29 Halbleiterstruktur für Infrarotbereich und Herstellungsverfahren

Publications (1)

Publication Number Publication Date
ATE365382T1 true ATE365382T1 (de) 2007-07-15

Family

ID=32241315

Family Applications (1)

Application Number Title Priority Date Filing Date
AT02026698T ATE365382T1 (de) 2002-11-29 2002-11-29 Halbleiterstruktur für infrarotbereich und herstellungsverfahren

Country Status (4)

Country Link
US (1) US7119358B2 (de)
EP (1) EP1424736B1 (de)
AT (1) ATE365382T1 (de)
DE (1) DE60220803T2 (de)

Families Citing this family (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102004001823B3 (de) * 2004-01-08 2005-09-01 Humboldt-Universität Zu Berlin Licht emittierende Halbleitervorrichtungen mit veränderbarer Emissionswellenlänge
US7247546B2 (en) * 2004-08-05 2007-07-24 International Business Machines Corporation Method of forming strained silicon materials with improved thermal conductivity
FR2874285B1 (fr) * 2004-08-13 2006-10-13 Commissariat Energie Atomique Procede de realisation d'empilements d'ilots de materiau semi-conducteur encapsules dans un autre materiau semi-conducteur
US20060043395A1 (en) * 2004-08-26 2006-03-02 National Inst Of Adv Industrial Science And Tech Semiconductor light-emitting element and method of producing the same
WO2006125272A1 (en) * 2005-05-27 2006-11-30 Newsouth Innovations Pty Limited Resonant defect enhancement of current transport in semiconducting superlattices
US20070154637A1 (en) * 2005-12-19 2007-07-05 Rohm And Haas Electronic Materials Llc Organometallic composition
TWI557936B (zh) 2010-04-30 2016-11-11 美國波士頓大學信託會 具能帶結構位變動之高效率紫外光發光二極體
DE112011103431T5 (de) * 2010-10-11 2013-09-05 Ud Holdings, Llc Übergitter-Quantentopf-lnfrarotdetektor
US10411156B2 (en) 2011-08-11 2019-09-10 Sensor Electronic Technology, Inc. Device with transparent and higher conductive regions in lateral cross section of semiconductor layer
US8879598B2 (en) 2011-08-11 2014-11-04 Sensor Electronic Technology, Inc. Emitting device with compositional and doping inhomogeneities in semiconductor layers
US9595634B2 (en) 2011-08-11 2017-03-14 Sensor Electronic Technology, Inc. Device with transparent and higher conductive regions in lateral cross section of semiconductor layer
US9385271B2 (en) 2011-08-11 2016-07-05 Sensor Electronic Technology, Inc. Device with transparent and higher conductive regions in lateral cross section of semiconductor layer
US8787418B2 (en) 2011-08-11 2014-07-22 Sensor Electronic Technology, Inc. Emitting device with compositional and doping inhomogeneities in semiconductor layers
US8723189B1 (en) * 2012-01-06 2014-05-13 Trustees Of Boston University Ultraviolet light emitting diode structures and methods of manufacturing the same
DE102015108402B4 (de) 2015-05-28 2021-03-18 Infineon Technologies Ag Halbleiterbauelemente, ein Fluidsensor und ein Verfahren zum Bilden eines Halbleiterbauelements
KR102553841B1 (ko) 2017-07-19 2023-07-10 삼성전자주식회사 광전 변환 소자, 광 센서
KR102629160B1 (ko) * 2018-01-29 2024-01-29 어플라이드 머티어리얼스, 인코포레이티드 광학 디바이스 향상을 위한 습윤 층들
CN119730464B (zh) * 2025-02-25 2025-05-16 湖南汇思光电科技有限公司 基于自组装生长技术的量子点及其制备方法

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4679061A (en) * 1985-06-14 1987-07-07 American Telephone And Telegraph Company, At&T Bell Laboratories Superlattice photoconductor
JP2740029B2 (ja) * 1987-12-23 1998-04-15 ブリテツシユ・テレコミユニケイシヨンズ・パブリツク・リミテツド・カンパニー 半導体ヘテロ構造
US5198682A (en) * 1991-11-12 1993-03-30 Hughes Aircraft Company Multiple quantum well superlattice infrared detector with graded conductive band
US5399880A (en) * 1993-08-10 1995-03-21 At&T Corp. Phototransistor with quantum well base structure
US5917195A (en) * 1995-02-17 1999-06-29 B.A. Painter, Iii Phonon resonator and method for its production
US6403975B1 (en) 1996-04-09 2002-06-11 Max-Planck Gesellschaft Zur Forderung Der Wissenschafteneev Semiconductor components, in particular photodetectors, light emitting diodes, optical modulators and waveguides with multilayer structures grown on silicon substrates
US6154475A (en) * 1997-12-04 2000-11-28 The United States Of America As Represented By The Secretary Of The Air Force Silicon-based strain-symmetrized GE-SI quantum lasers
FR2812763B1 (fr) * 2000-08-04 2002-10-31 St Microelectronics Sa Formation de boites quantiques
DE10207952A1 (de) 2002-02-25 2003-09-04 Max Planck Gesellschaft Verfahren zur Erzeugung von porösem Material mit periodischer Porenanordnung
US6621841B1 (en) * 2002-04-23 2003-09-16 The United States Of America As Represented By The Secretary Of The Air Force Phonon-pumped semiconductor lasers

Also Published As

Publication number Publication date
DE60220803T2 (de) 2008-03-06
DE60220803D1 (de) 2007-08-02
US7119358B2 (en) 2006-10-10
EP1424736B1 (de) 2007-06-20
EP1424736A1 (de) 2004-06-02
US20040140531A1 (en) 2004-07-22

Similar Documents

Publication Publication Date Title
ATE365382T1 (de) Halbleiterstruktur für infrarotbereich und herstellungsverfahren
ATE512490T1 (de) Verfahren zur herstellung von halbleitervorrichtungen mit mesastruktur und mehreren passivierungsschichten
ATE488625T1 (de) Halbleiter-nanokristallheterostrukturen
SG169394A1 (en) Method for producing partial soi structures comprising zones connecting a superficial layer and a substrate
SG139701A1 (en) Lift installation with a belt, belt for such a lift installation, method of producing such a belt, composite of such belts and method for assembly of such a composite in a lift installation
DE60235129D1 (de) Atmosphärenverbesserndes Zipverschlussband
BR0103841A (pt) Artigo absorvente, e, processo para a fabricação do mesmo
MY141147A (en) Method of fabricating a magnetic discrete track recording disk
BRPI0506541A (pt) célula solar com material de ponto quántico epitaxialmente crescido
ATE514463T1 (de) Laufband mit einer schicht aus thermoplastischem schaum
EP1968104A3 (de) Halbleiterbauelement und Verfahren zu seiner Herstellung
FR2757183B1 (fr) Fils atomiques de grande longueur et de grande stabilite, procede de fabrication de ces fils, application en nano-electronique
FR2827209B1 (fr) Article, notamment cosmetique, et son procede de fabrication
TW200504812A (en) Semiconductor device, method of manufacturing a quantum well structure and a semiconductor device comprising such a quantum well structure
DE3852180D1 (de) Halbleiterheterostruktur.
DE602005025375D1 (de) Strukturen für mikroelektronik und mikrosystem sowie herstellungsverfahren
EP1794815A4 (de) Halbleiter-heterostruktur
ATE320783T1 (de) Oberste schicht für einen absorbierenden artikel und zugehöriges herstellungsverfahren
ATE474476T1 (de) Matratze mit stepplage und herstellungsverfahren dafür
WO2004042801A3 (en) Quantum well intermixing in semiconductor photonic devices
EP1727213A3 (de) Lichtemittierende Halbleitervorrichtung aus einer Gruppe IV Verbindung mit verbesserter Trägerbegrenzung und dessen Herstellungsverfahren
WO2003061025A1 (fr) Structure multicouches a compose semi-conducteur, dispositif a effet hall, et procede de fabrication de ce dispositif
JP2004235628A5 (de)
Chen et al. Coordinated and simultaneous formation of paired Ge quantum dots by thermal oxidation of designer poly-SiGe spacer structures
TW200515486A (en) A manufacturing method and structure for relation strained SiGe

Legal Events

Date Code Title Description
RER Ceased as to paragraph 5 lit. 3 law introducing patent treaties