ATE253533T1 - Harte kratzfeste beschichtungen für substrate - Google Patents

Harte kratzfeste beschichtungen für substrate

Info

Publication number
ATE253533T1
ATE253533T1 AT99942018T AT99942018T ATE253533T1 AT E253533 T1 ATE253533 T1 AT E253533T1 AT 99942018 T AT99942018 T AT 99942018T AT 99942018 T AT99942018 T AT 99942018T AT E253533 T1 ATE253533 T1 AT E253533T1
Authority
AT
Austria
Prior art keywords
substrate
silicon
glass
protective coating
substrates
Prior art date
Application number
AT99942018T
Other languages
English (en)
Inventor
Annette Krisko
Original Assignee
Cardinal Cg Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Cardinal Cg Co filed Critical Cardinal Cg Co
Application granted granted Critical
Publication of ATE253533T1 publication Critical patent/ATE253533T1/de

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/22—Surface treatment of glass, not in the form of fibres or filaments, by coating with other inorganic material
    • C03C17/225—Nitrides
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
    • C03C17/3411—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials
    • C03C17/3429—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials at least one of the coatings being a non-oxide coating
    • C03C17/3435—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials at least one of the coatings being a non-oxide coating comprising a nitride, oxynitride, boronitride or carbonitride
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00—Coatings on glass
    • C03C2217/20—Materials for coating a single layer on glass
    • C03C2217/28—Other inorganic materials
    • C03C2217/281—Nitrides
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2218/00—Methods for coating glass
    • C03C2218/10—Deposition methods
    • C03C2218/15—Deposition methods from the vapour phase
    • C03C2218/152—Deposition methods from the vapour phase by cvd
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2218/00—Methods for coating glass
    • C03C2218/10—Deposition methods
    • C03C2218/15—Deposition methods from the vapour phase
    • C03C2218/154—Deposition methods from the vapour phase by sputtering
    • C03C2218/156—Deposition methods from the vapour phase by sputtering by magnetron sputtering
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/8305—Miscellaneous [e.g., treated surfaces, etc.]

Landscapes

  • Chemical & Material Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Surface Treatment Of Glass (AREA)
  • Laminated Bodies (AREA)
  • Paints Or Removers (AREA)
AT99942018T 1999-05-18 1999-08-05 Harte kratzfeste beschichtungen für substrate ATE253533T1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US13470699P 1999-05-18 1999-05-18
PCT/US1999/017784 WO2000069784A1 (en) 1999-05-18 1999-08-05 Hard, scratch-resistant coatings for substrates

Publications (1)

Publication Number Publication Date
ATE253533T1 true ATE253533T1 (de) 2003-11-15

Family

ID=22464602

Family Applications (1)

Application Number Title Priority Date Filing Date
AT99942018T ATE253533T1 (de) 1999-05-18 1999-08-05 Harte kratzfeste beschichtungen für substrate

Country Status (10)

Country Link
US (1) US6652974B1 (de)
EP (1) EP1198430B1 (de)
JP (1) JP3570966B2 (de)
KR (1) KR20020005038A (de)
AT (1) ATE253533T1 (de)
AU (1) AU761382B2 (de)
CA (1) CA2373441C (de)
DE (1) DE69912647T2 (de)
MX (1) MXPA01011771A (de)
WO (1) WO2000069784A1 (de)

Families Citing this family (30)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6680489B1 (en) * 1995-12-20 2004-01-20 Advanced Technology Materials, Inc. Amorphous silicon carbide thin film coating
US6027766A (en) 1997-03-14 2000-02-22 Ppg Industries Ohio, Inc. Photocatalytically-activated self-cleaning article and method of making same
KR100506127B1 (ko) * 2002-10-28 2005-08-17 이경인 필름을 이용한 단열창호
ATE483040T1 (de) * 2002-12-31 2010-10-15 Cardinal Cg Co Beschichtungsgerät mit einem reinigungsgerät für substrat und beschichtungsverfahren, das ein solches beschichtungsgerät benutzt
US20070029186A1 (en) * 2005-08-02 2007-02-08 Alexey Krasnov Method of thermally tempering coated article with transparent conductive oxide (TCO) coating using inorganic protective layer during tempering and product made using same
JP5002290B2 (ja) * 2006-03-10 2012-08-15 キヤノン株式会社 液体吐出ヘッド基体の製造方法
US20080011599A1 (en) * 2006-07-12 2008-01-17 Brabender Dennis M Sputtering apparatus including novel target mounting and/or control
DE102007019994A1 (de) * 2007-04-27 2008-10-30 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Transparente Barrierefolie und Verfahren zum Herstellen derselben
ITGE20070054A1 (it) * 2007-06-15 2008-12-16 Nantech S R L Metodo per la deposizione di ag su supporti in vetro o simili
DE102007033338B4 (de) * 2007-07-16 2010-06-02 Schott Ag Hartstoffbeschichteter Glas- oder Glaskeramik-Artikel und Verfahren zu dessen Herstellung sowie Verwendung des Glas- oder Glaskeramik-Artikels
US7807248B2 (en) * 2007-08-14 2010-10-05 Cardinal Cg Company Solar control low-emissivity coatings
US9782949B2 (en) 2008-05-30 2017-10-10 Corning Incorporated Glass laminated articles and layered articles
PL2419386T3 (pl) * 2008-11-04 2020-05-18 Apogee Enterprises, Inc. Powlekane powierzchnie szklane i sposób powlekania podłoża szklanego
US8842357B2 (en) 2008-12-31 2014-09-23 View, Inc. Electrochromic device and method for making electrochromic device
US9664974B2 (en) 2009-03-31 2017-05-30 View, Inc. Fabrication of low defectivity electrochromic devices
CN102134155B (zh) * 2010-09-13 2012-10-03 河北联合大学 一种用超声波制备金属基表面耐高温的高辐射率涂层的方法
RU2637382C2 (ru) 2011-12-12 2017-12-04 Вью, Инк. Тонкопленочные устройства и их изготовление
US9110230B2 (en) 2013-05-07 2015-08-18 Corning Incorporated Scratch-resistant articles with retained optical properties
US9366784B2 (en) 2013-05-07 2016-06-14 Corning Incorporated Low-color scratch-resistant articles with a multilayer optical film
US9335444B2 (en) 2014-05-12 2016-05-10 Corning Incorporated Durable and scratch-resistant anti-reflective articles
US11267973B2 (en) 2014-05-12 2022-03-08 Corning Incorporated Durable anti-reflective articles
CN206654950U (zh) * 2014-05-15 2017-11-21 应用材料公司 用于涂布基板的溅射沉积装置
US9790593B2 (en) 2014-08-01 2017-10-17 Corning Incorporated Scratch-resistant materials and articles including the same
EP3770649A1 (de) 2015-09-14 2021-01-27 Corning Incorporated Kratzfeste antireflexionsartikel mit hoher lichttransmission
WO2017058887A1 (en) 2015-09-28 2017-04-06 Tru Vue, Inc. Near infrared reflective coatings
US10578782B2 (en) 2016-04-19 2020-03-03 Apogee Enterprises, Inc. Coated glass surfaces and method for coating a glass substrate
WO2018093985A1 (en) 2016-11-17 2018-05-24 Cardinal Cg Company Static-dissipative coating technology
AU2018261218B2 (en) 2017-05-04 2023-05-18 Apogee Enterprises, Inc. Low emissivity coatings, glass surfaces including the same, and methods for making the same
KR102591065B1 (ko) 2018-08-17 2023-10-19 코닝 인코포레이티드 얇고, 내구성 있는 반사-방지 구조를 갖는 무기산화물 물품
US12386101B2 (en) 2020-07-09 2025-08-12 Corning Incorporated Textured region of a substrate to reduce specular reflectance incorporating surface features with an elliptical perimeter or segments thereof, and method of making the same

Family Cites Families (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2254810C2 (de) 1972-11-09 1985-12-12 Basf Ag, 6700 Ludwigshafen Verfahren zur Verbesserung der magnetischen Eigenschaften von Gamma-Eisen (III)oxiden
US4060660A (en) 1976-01-15 1977-11-29 Rca Corporation Deposition of transparent amorphous carbon films
USRE34035E (en) 1982-02-27 1992-08-18 U.S. Philips Corp. Carbon containing layer
US4704339A (en) 1982-10-12 1987-11-03 The Secretary Of State For Defence In Her Britannic Majesty's Government Of The United Kingdom Of Great Britain And Northern Ireland Infra-red transparent optical components
DE3245500A1 (de) 1982-12-09 1984-06-14 Licentia Patent-Verwaltungs-Gmbh, 6000 Frankfurt Elektrofotografisches aufzeichnungsmaterial und verfahren zu seiner herstellung
JPS6011849A (ja) 1983-06-21 1985-01-22 Sanyo Electric Co Ltd 静電潜像担持体
US4859493A (en) 1987-03-31 1989-08-22 Lemelson Jerome H Methods of forming synthetic diamond coatings on particles using microwaves
US4849081A (en) 1988-06-22 1989-07-18 The Boc Group, Inc. Formation of oxide films by reactive sputtering
US5209996A (en) 1989-07-26 1993-05-11 Shin-Etsu Chemical Co., Ltd. Membrane consisting of silicon carbide and silicon nitride, method for the preparation thereof and mask for X-ray lithography utilizing the same
US5047131A (en) 1989-11-08 1991-09-10 The Boc Group, Inc. Method for coating substrates with silicon based compounds
JPH03187039A (ja) * 1989-12-15 1991-08-15 Shin Etsu Chem Co Ltd 光磁気記録媒体
JPH07116588B2 (ja) * 1990-08-08 1995-12-13 信越化学工業株式会社 Ｘ線リソグラフィ用マスクの透過体の製造方法
JP3178025B2 (ja) 1990-11-07 2001-06-18 ソニー株式会社 光磁気記録媒体及びその製造方法
JP3221892B2 (ja) 1991-09-20 2001-10-22 帝国ピストンリング株式会社 ピストンリング及びその製造法
US5346600A (en) 1992-08-14 1994-09-13 Hughes Aircraft Company Plasma-enhanced magnetron-sputtered deposition of materials
US5482602A (en) 1993-11-04 1996-01-09 United Technologies Corporation Broad-beam ion deposition coating methods for depositing diamond-like-carbon coatings on dynamic surfaces
US5723172A (en) * 1994-03-11 1998-03-03 Dan Sherman Method for forming a protective coating on glass
US5415756A (en) 1994-03-28 1995-05-16 University Of Houston Ion assisted deposition process including reactive source gassification
US5820994A (en) 1996-02-16 1998-10-13 Mitsui Chemicals, Inc. Laminate and method for preparing same
JPH1048805A (ja) * 1996-07-30 1998-02-20 Toppan Printing Co Ltd ハーフトーン型位相シフトマスクブランク及びハーフトーン型位相シフトマスク

Also Published As

Publication number Publication date
WO2000069784A1 (en) 2000-11-23
EP1198430B1 (de) 2003-11-05
DE69912647D1 (de) 2003-12-11
EP1198430A1 (de) 2002-04-24
AU5548499A (en) 2000-12-05
KR20020005038A (ko) 2002-01-16
MXPA01011771A (es) 2002-11-04
CA2373441C (en) 2007-11-13
CA2373441A1 (en) 2000-11-23
DE69912647T2 (de) 2004-05-13
JP2001011619A (ja) 2001-01-16
JP3570966B2 (ja) 2004-09-29
AU761382B2 (en) 2003-06-05
US6652974B1 (en) 2003-11-25

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Legal Events

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