ATE483040T1 - Beschichtungsgerät mit einem reinigungsgerät für substrat und beschichtungsverfahren, das ein solches beschichtungsgerät benutzt - Google Patents

Beschichtungsgerät mit einem reinigungsgerät für substrat und beschichtungsverfahren, das ein solches beschichtungsgerät benutzt

Info

Publication number
ATE483040T1
ATE483040T1 AT03800298T AT03800298T ATE483040T1 AT E483040 T1 ATE483040 T1 AT E483040T1 AT 03800298 T AT03800298 T AT 03800298T AT 03800298 T AT03800298 T AT 03800298T AT E483040 T1 ATE483040 T1 AT E483040T1
Authority
AT
Austria
Prior art keywords
substrate
cleaning device
coating
substrate cleaning
coating apparatus
Prior art date
Application number
AT03800298T
Other languages
English (en)
Inventor
Klaus Hartig
Original Assignee
Cardinal Cg Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Cardinal Cg Co filed Critical Cardinal Cg Co
Application granted granted Critical
Publication of ATE483040T1 publication Critical patent/ATE483040T1/de

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/562—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks for coating elongated substrates
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/001—General methods for coating; Devices therefor
    • C03C17/002—General methods for coating; Devices therefor for flat glass, e.g. float glass
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C23/00—Other surface treatment of glass not in the form of fibres or filaments
    • C03C23/0075—Cleaning of glass
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/02—Pretreatment of the material to be coated
    • C23C14/021—Cleaning or etching treatments
    • C23C14/022—Cleaning or etching treatments by means of bombardment with energetic particles or radiation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/568—Transferring the substrates through a series of coating stations
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2218/00—Methods for coating glass
    • C03C2218/30—Aspects of methods for coating glass not covered above
    • C03C2218/31—Pre-treatment

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • General Chemical & Material Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Physical Vapour Deposition (AREA)
  • Catalysts (AREA)
  • Cleaning By Liquid Or Steam (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Manufacturing Of Magnetic Record Carriers (AREA)
  • Chemical Vapour Deposition (AREA)
AT03800298T 2002-12-31 2003-12-31 Beschichtungsgerät mit einem reinigungsgerät für substrat und beschichtungsverfahren, das ein solches beschichtungsgerät benutzt ATE483040T1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US43751802P 2002-12-31 2002-12-31
PCT/US2003/041511 WO2004061151A1 (en) 2002-12-31 2003-12-31 Coater having substrate cleaning device and coating deposition methods employing such coater

Publications (1)

Publication Number Publication Date
ATE483040T1 true ATE483040T1 (de) 2010-10-15

Family

ID=32713194

Family Applications (1)

Application Number Title Priority Date Filing Date
AT03800298T ATE483040T1 (de) 2002-12-31 2003-12-31 Beschichtungsgerät mit einem reinigungsgerät für substrat und beschichtungsverfahren, das ein solches beschichtungsgerät benutzt

Country Status (8)

Country Link
US (2) US7264741B2 (de)
EP (1) EP1579025B1 (de)
JP (1) JP2006521461A (de)
AT (1) ATE483040T1 (de)
AU (1) AU2003300037A1 (de)
CA (1) CA2512010C (de)
DE (1) DE60334407D1 (de)
WO (1) WO2004061151A1 (de)

Families Citing this family (36)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CA2483260C (en) * 2002-05-06 2008-12-09 Guardian Industries Corp. Sputter coating apparatus including ion beam source(s), and corresponding method
EP1579025B1 (de) * 2002-12-31 2010-09-29 Cardinal CG Company Beschichtungsgerät mit einem reinigungsgerät für substrat und beschichtungsverfahren, das ein solches beschichtungsgerät benutzt
US8153281B2 (en) * 2003-06-23 2012-04-10 Superpower, Inc. Metalorganic chemical vapor deposition (MOCVD) process and apparatus to produce multi-layer high-temperature superconducting (HTS) coated tape
EP1765740B1 (de) 2004-07-12 2007-11-07 Cardinal CG Company Wartungsarme beschichtungen
DE102004036170B4 (de) * 2004-07-26 2007-10-11 Schott Ag Vakuumbeschichtungsanlage und Verfahren zur Vakuumbeschichtung und deren Verwendung
EP2253732A2 (de) * 2004-09-03 2010-11-24 Cardinal CG Company Beschichtungsgerät mit unterbrochener Förderanlage
FI20051120A0 (fi) * 2005-02-23 2005-11-04 Fortion Designit Oy Irrotettavia optisia tuotteita sisältävä työkappale ja menetelmä tämän valmistamiseksi
US7342716B2 (en) 2005-10-11 2008-03-11 Cardinal Cg Company Multiple cavity low-emissivity coatings
US7339728B2 (en) 2005-10-11 2008-03-04 Cardinal Cg Company Low-emissivity coatings having high visible transmission and low solar heat gain coefficient
US7572511B2 (en) 2005-10-11 2009-08-11 Cardinal Cg Company High infrared reflection coatings
US20070125304A1 (en) * 2005-12-01 2007-06-07 Cardinal Cg Company Transport rollers
JP5222281B2 (ja) * 2006-04-06 2013-06-26 アプライド マテリアルズ インコーポレイテッド ラージエリア基板への酸化亜鉛透明導電性酸化物の反応性スパッタリング
US20070235320A1 (en) * 2006-04-06 2007-10-11 Applied Materials, Inc. Reactive sputtering chamber with gas distribution tubes
WO2007121211A2 (en) 2006-04-11 2007-10-25 Cardinal Cg Company Photocatalytic coatings having improved low-maintenance properties
US7989094B2 (en) * 2006-04-19 2011-08-02 Cardinal Cg Company Opposed functional coatings having comparable single surface reflectances
US20080011599A1 (en) 2006-07-12 2008-01-17 Brabender Dennis M Sputtering apparatus including novel target mounting and/or control
US7674662B2 (en) * 2006-07-19 2010-03-09 Applied Materials, Inc. Process for making thin film field effect transistors using zinc oxide
US7927713B2 (en) 2007-04-27 2011-04-19 Applied Materials, Inc. Thin film semiconductor material produced through reactive sputtering of zinc target using nitrogen gases
CA2664368A1 (en) 2007-09-14 2009-03-19 Cardinal Cg Company Low-maintenance coating technology
DE102007058052B4 (de) * 2007-11-30 2013-12-05 Von Ardenne Anlagentechnik Gmbh Vakuumbeschichtungsanlage
US20090218214A1 (en) * 2008-02-28 2009-09-03 Applied Materials, Inc. Backside coating prevention device, coating chamber comprising a backside coating prevention device, and method of coating
WO2009117438A2 (en) * 2008-03-20 2009-09-24 Applied Materials, Inc. Process to make metal oxide thin film transistor array with etch stopping layer
US7879698B2 (en) * 2008-03-24 2011-02-01 Applied Materials, Inc. Integrated process system and process sequence for production of thin film transistor arrays using doped or compounded metal oxide semiconductor
US8763682B2 (en) * 2008-06-20 2014-07-01 Orbital Technologies Corporation Condensing heat exchanger with hydrophilic antimicrobial coating
US8258511B2 (en) 2008-07-02 2012-09-04 Applied Materials, Inc. Thin film transistors using multiple active channel layers
JP5336151B2 (ja) * 2008-10-31 2013-11-06 キヤノンアネルバ株式会社 薄膜形成装置及び磁気記録媒体の製造方法
US20100203242A1 (en) * 2009-02-06 2010-08-12 Applied Materials, Inc. self-cleaning susceptor for solar cell processing
WO2011037829A2 (en) * 2009-09-24 2011-03-31 Applied Materials, Inc. Methods of fabricating metal oxide or metal oxynitride tfts using wet process for source-drain metal etch
US8840763B2 (en) * 2009-09-28 2014-09-23 Applied Materials, Inc. Methods for stable process in a reactive sputtering process using zinc or doped zinc target
KR101242986B1 (ko) * 2010-03-22 2013-03-12 현대하이스코 주식회사 연료전지용 금속 분리판 제조 방법
CN102899625B (zh) * 2012-10-28 2014-08-13 东北石油大学 卷绕磁控溅射镀膜系统边框效应克服机构
KR101990555B1 (ko) * 2012-12-24 2019-06-19 삼성디스플레이 주식회사 박막봉지 제조장치 및 박막봉지 제조방법
KR101446411B1 (ko) * 2013-01-22 2014-10-07 (주)제이 앤 엘 테크 스테인레스스틸을 모재로 한 내식성 및 전도성 나노 카본 코팅 방법 및 그에 따른 연료전지분리판
WO2018093985A1 (en) 2016-11-17 2018-05-24 Cardinal Cg Company Static-dissipative coating technology
DE102018215100A1 (de) 2018-05-28 2019-11-28 Sms Group Gmbh Vakuumbeschichtungsanlage, und Verfahren zum Beschichten eines bandförmigen Materials
TW202023989A (zh) * 2018-09-14 2020-07-01 美商康寧公司 玻璃邊緣處理設備及方法

Family Cites Families (33)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3968018A (en) 1969-09-29 1976-07-06 Warner-Lambert Company Sputter coating method
US3904506A (en) 1972-11-13 1975-09-09 Shatterproof Glass Corp Apparatus for continuous production of sputter-coated glass products
US3925182A (en) * 1973-09-25 1975-12-09 Shatterproof Glass Corp Method for continuous production of sputter-coated glass products
US4214972A (en) 1978-07-19 1980-07-29 Shatterproof Glass Corporation Sheet handling apparatus
US4604181A (en) 1984-09-14 1986-08-05 The United States Of America As Represented By The Administrator Of The National Aeronautics And Space Administration Apparatus for producing oxidation protection coatings for polymers
KR900005118B1 (ko) 1986-07-14 1990-07-19 미쓰비시전기주식회사 박막 형성장치
US5618388A (en) 1988-02-08 1997-04-08 Optical Coating Laboratory, Inc. Geometries and configurations for magnetron sputtering apparatus
US5616532A (en) 1990-12-14 1997-04-01 E. Heller & Company Photocatalyst-binder compositions
JPH04297560A (ja) 1991-03-26 1992-10-21 Nisshin Steel Co Ltd 鋼帯の連続溶融めっき方法及び装置
US5424130A (en) 1991-05-13 1995-06-13 Toyota Jidosha Kabushiki Kaisha Water repellent glass and process for producing the same
US5874701A (en) 1992-10-11 1999-02-23 Toto Co., Ltd. Photocatalytic air treatment process under room light
EP0630679B1 (de) 1992-11-10 1999-04-21 Toto Ltd. Luftbehandlungsverfahren mit hilfe von einem photokatalysator und innenbeleuchtung
KR100357482B1 (ko) 1993-12-10 2003-03-10 도토기키 가부시키가이샤 광촉매기능을갖는다기능재료및그의제조방법
ATE240649T1 (de) 1994-10-05 2003-06-15 Toto Ltd Antimikrobielles feststoffmaterial,verfahren zu seiner herstellung und verwendung
DE69529420T2 (de) 1994-11-16 2003-08-14 Toto Ltd., Kita-Kyushu Photokatalytisch funktionelles material und methode zu dessen herstellung
DK0816466T3 (da) 1995-03-20 2006-06-12 Toto Ltd Anvendelse af materiale, der har en ultrahydrofil og en fotokatalytisk overflade
US5958134A (en) * 1995-06-07 1999-09-28 Tokyo Electron Limited Process equipment with simultaneous or sequential deposition and etching capabilities
US6090489A (en) 1995-12-22 2000-07-18 Toto, Ltd. Method for photocatalytically hydrophilifying surface and composite material with photocatalytically hydrophilifiable surface
US5939194A (en) 1996-12-09 1999-08-17 Toto Ltd. Photocatalytically hydrophilifying and hydrophobifying material
BE1010420A3 (fr) 1996-07-12 1998-07-07 Cockerill Rech & Dev Procede pour la formation d'un revetement sur un substrat et installation pour la mise en oeuvre de ce procede.
US6165256A (en) 1996-07-19 2000-12-26 Toto Ltd. Photocatalytically hydrophilifiable coating composition
US5969470A (en) 1996-11-08 1999-10-19 Veeco Instruments, Inc. Charged particle source
US5982101A (en) 1997-06-27 1999-11-09 Veeco Instruments, Inc. Charged-particle source, control system, and process using gating to extract the ion beam
EP1144328B1 (de) 1998-12-21 2002-10-23 Cardinal CG Company Schmutzabweisende beschichtung mit niedrigem emissionsvermögen für glasoberflächen
US6660365B1 (en) * 1998-12-21 2003-12-09 Cardinal Cg Company Soil-resistant coating for glass surfaces
KR20010108181A (ko) 1998-12-21 2001-12-07 카디날 아이지 컴퍼니 유리면을 위한 오염 방지 코팅
US6368664B1 (en) 1999-05-03 2002-04-09 Guardian Industries Corp. Method of ion beam milling substrate prior to depositing diamond like carbon layer thereon
MXPA01011771A (es) 1999-05-18 2002-11-04 Cardinal Cg Co Recubrimientos duros, resistentes a rayaduras para sustratos.
US6224718B1 (en) 1999-07-14 2001-05-01 Veeco Instruments, Inc. Target assembly for ion beam sputter deposition with multiple paddles each having targets on both sides
JP3477148B2 (ja) 1999-12-02 2003-12-10 カーディナル・シージー・カンパニー 耐曇り性透明フィルム積層体
US6638249B1 (en) 2000-07-17 2003-10-28 Wisconsin Alumni Research Foundation Ultrasonically actuated needle pump system
CA2483260C (en) * 2002-05-06 2008-12-09 Guardian Industries Corp. Sputter coating apparatus including ion beam source(s), and corresponding method
EP1579025B1 (de) 2002-12-31 2010-09-29 Cardinal CG Company Beschichtungsgerät mit einem reinigungsgerät für substrat und beschichtungsverfahren, das ein solches beschichtungsgerät benutzt

Also Published As

Publication number Publication date
EP1579025B1 (de) 2010-09-29
US20070234963A1 (en) 2007-10-11
AU2003300037A1 (en) 2004-07-29
CA2512010A1 (en) 2004-07-22
EP1579025A1 (de) 2005-09-28
US7264741B2 (en) 2007-09-04
US7695598B2 (en) 2010-04-13
DE60334407D1 (de) 2010-11-11
CA2512010C (en) 2013-04-16
US20040175511A1 (en) 2004-09-09
JP2006521461A (ja) 2006-09-21
WO2004061151A1 (en) 2004-07-22

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