ATE483040T1 - Beschichtungsgerät mit einem reinigungsgerät für substrat und beschichtungsverfahren, das ein solches beschichtungsgerät benutzt - Google Patents

Beschichtungsgerät mit einem reinigungsgerät für substrat und beschichtungsverfahren, das ein solches beschichtungsgerät benutzt

Info

Publication number
ATE483040T1
ATE483040T1 AT03800298T AT03800298T ATE483040T1 AT E483040 T1 ATE483040 T1 AT E483040T1 AT 03800298 T AT03800298 T AT 03800298T AT 03800298 T AT03800298 T AT 03800298T AT E483040 T1 ATE483040 T1 AT E483040T1
Authority
AT
Austria
Prior art keywords
substrate
cleaning device
coating
substrate cleaning
coating apparatus
Prior art date
Application number
AT03800298T
Other languages
English (en)
Inventor
Klaus Hartig
Original Assignee
Cardinal Cg Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Cardinal Cg Co filed Critical Cardinal Cg Co
Application granted granted Critical
Publication of ATE483040T1 publication Critical patent/ATE483040T1/de

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/562—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks for coating elongated substrates
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/001—General methods for coating; Devices therefor
    • C03C17/002—General methods for coating; Devices therefor for flat glass, e.g. float glass
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C23/00—Other surface treatment of glass not in the form of fibres or filaments
    • C03C23/0075—Cleaning of glass
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/02—Pretreatment of the material to be coated
    • C23C14/021—Cleaning or etching treatments
    • C23C14/022—Cleaning or etching treatments by means of bombardment with energetic particles or radiation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/568—Transferring the substrates through a series of coating stations
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2218/00—Methods for coating glass
    • C03C2218/30—Aspects of methods for coating glass not covered above
    • C03C2218/31—Pre-treatment

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Mechanical Engineering (AREA)
  • General Chemical & Material Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Physical Vapour Deposition (AREA)
  • Catalysts (AREA)
  • Cleaning By Liquid Or Steam (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Manufacturing Of Magnetic Record Carriers (AREA)
  • Chemical Vapour Deposition (AREA)
AT03800298T 2002-12-31 2003-12-31 Beschichtungsgerät mit einem reinigungsgerät für substrat und beschichtungsverfahren, das ein solches beschichtungsgerät benutzt ATE483040T1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US43751802P 2002-12-31 2002-12-31
PCT/US2003/041511 WO2004061151A1 (en) 2002-12-31 2003-12-31 Coater having substrate cleaning device and coating deposition methods employing such coater

Publications (1)

Publication Number Publication Date
ATE483040T1 true ATE483040T1 (de) 2010-10-15

Family

ID=32713194

Family Applications (1)

Application Number Title Priority Date Filing Date
AT03800298T ATE483040T1 (de) 2002-12-31 2003-12-31 Beschichtungsgerät mit einem reinigungsgerät für substrat und beschichtungsverfahren, das ein solches beschichtungsgerät benutzt

Country Status (8)

Country Link
US (2) US7264741B2 (de)
EP (1) EP1579025B1 (de)
JP (1) JP2006521461A (de)
AT (1) ATE483040T1 (de)
AU (1) AU2003300037A1 (de)
CA (1) CA2512010C (de)
DE (1) DE60334407D1 (de)
WO (1) WO2004061151A1 (de)

Families Citing this family (36)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
PL204742B1 (pl) * 2002-05-06 2010-02-26 Guardian Industries Urządzenie powlekające do formowania pierwszej i drugiej powłoki na szklanym substracie
EP1579025B1 (de) * 2002-12-31 2010-09-29 Cardinal CG Company Beschichtungsgerät mit einem reinigungsgerät für substrat und beschichtungsverfahren, das ein solches beschichtungsgerät benutzt
US8153281B2 (en) * 2003-06-23 2012-04-10 Superpower, Inc. Metalorganic chemical vapor deposition (MOCVD) process and apparatus to produce multi-layer high-temperature superconducting (HTS) coated tape
ATE377580T1 (de) 2004-07-12 2007-11-15 Cardinal Cg Co Wartungsarme beschichtungen
DE102004036170B4 (de) * 2004-07-26 2007-10-11 Schott Ag Vakuumbeschichtungsanlage und Verfahren zur Vakuumbeschichtung und deren Verwendung
WO2006028774A2 (en) * 2004-09-03 2006-03-16 Cardinal Cg Company Coater having interrupted conveyor system
FI20051120A0 (fi) * 2005-02-23 2005-11-04 Fortion Designit Oy Irrotettavia optisia tuotteita sisältävä työkappale ja menetelmä tämän valmistamiseksi
US7572511B2 (en) 2005-10-11 2009-08-11 Cardinal Cg Company High infrared reflection coatings
US7339728B2 (en) 2005-10-11 2008-03-04 Cardinal Cg Company Low-emissivity coatings having high visible transmission and low solar heat gain coefficient
US7342716B2 (en) 2005-10-11 2008-03-11 Cardinal Cg Company Multiple cavity low-emissivity coatings
US20070125304A1 (en) * 2005-12-01 2007-06-07 Cardinal Cg Company Transport rollers
US20070235320A1 (en) 2006-04-06 2007-10-11 Applied Materials, Inc. Reactive sputtering chamber with gas distribution tubes
US20070261951A1 (en) * 2006-04-06 2007-11-15 Yan Ye Reactive sputtering zinc oxide transparent conductive oxides onto large area substrates
WO2007121215A1 (en) 2006-04-11 2007-10-25 Cardinal Cg Company Photocatalytic coatings having improved low-maintenance properties
JP2009534563A (ja) * 2006-04-19 2009-09-24 日本板硝子株式会社 同等の単独の表面反射率を有する対向機能コーティング
US20080011599A1 (en) 2006-07-12 2008-01-17 Brabender Dennis M Sputtering apparatus including novel target mounting and/or control
US7674662B2 (en) * 2006-07-19 2010-03-09 Applied Materials, Inc. Process for making thin film field effect transistors using zinc oxide
US7927713B2 (en) 2007-04-27 2011-04-19 Applied Materials, Inc. Thin film semiconductor material produced through reactive sputtering of zinc target using nitrogen gases
CA2664369A1 (en) 2007-09-14 2009-03-19 Cardinal Cg Company Low-maintenance coatings, and methods for producing low-maintenance coatings
DE102007058052B4 (de) * 2007-11-30 2013-12-05 Von Ardenne Anlagentechnik Gmbh Vakuumbeschichtungsanlage
US20090218214A1 (en) * 2008-02-28 2009-09-03 Applied Materials, Inc. Backside coating prevention device, coating chamber comprising a backside coating prevention device, and method of coating
WO2009117438A2 (en) * 2008-03-20 2009-09-24 Applied Materials, Inc. Process to make metal oxide thin film transistor array with etch stopping layer
US7879698B2 (en) * 2008-03-24 2011-02-01 Applied Materials, Inc. Integrated process system and process sequence for production of thin film transistor arrays using doped or compounded metal oxide semiconductor
US8763682B2 (en) * 2008-06-20 2014-07-01 Orbital Technologies Corporation Condensing heat exchanger with hydrophilic antimicrobial coating
US8258511B2 (en) 2008-07-02 2012-09-04 Applied Materials, Inc. Thin film transistors using multiple active channel layers
JP5336151B2 (ja) * 2008-10-31 2013-11-06 キヤノンアネルバ株式会社 薄膜形成装置及び磁気記録媒体の製造方法
US20100203242A1 (en) * 2009-02-06 2010-08-12 Applied Materials, Inc. self-cleaning susceptor for solar cell processing
CN102640294B (zh) 2009-09-24 2014-12-17 应用材料公司 将湿式处理用于源极-漏极金属蚀刻从而制造金属氧化物或金属氮氧化物tft的方法
US8840763B2 (en) * 2009-09-28 2014-09-23 Applied Materials, Inc. Methods for stable process in a reactive sputtering process using zinc or doped zinc target
KR101242986B1 (ko) * 2010-03-22 2013-03-12 현대하이스코 주식회사 연료전지용 금속 분리판 제조 방법
CN102899625B (zh) * 2012-10-28 2014-08-13 东北石油大学 卷绕磁控溅射镀膜系统边框效应克服机构
KR101990555B1 (ko) * 2012-12-24 2019-06-19 삼성디스플레이 주식회사 박막봉지 제조장치 및 박막봉지 제조방법
KR101446411B1 (ko) * 2013-01-22 2014-10-07 (주)제이 앤 엘 테크 스테인레스스틸을 모재로 한 내식성 및 전도성 나노 카본 코팅 방법 및 그에 따른 연료전지분리판
US10604442B2 (en) 2016-11-17 2020-03-31 Cardinal Cg Company Static-dissipative coating technology
DE102018215100A1 (de) 2018-05-28 2019-11-28 Sms Group Gmbh Vakuumbeschichtungsanlage, und Verfahren zum Beschichten eines bandförmigen Materials
TW202023989A (zh) * 2018-09-14 2020-07-01 美商康寧公司 玻璃邊緣處理設備及方法

Family Cites Families (33)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3968018A (en) 1969-09-29 1976-07-06 Warner-Lambert Company Sputter coating method
US3904506A (en) 1972-11-13 1975-09-09 Shatterproof Glass Corp Apparatus for continuous production of sputter-coated glass products
US3925182A (en) * 1973-09-25 1975-12-09 Shatterproof Glass Corp Method for continuous production of sputter-coated glass products
US4214972A (en) 1978-07-19 1980-07-29 Shatterproof Glass Corporation Sheet handling apparatus
US4604181A (en) 1984-09-14 1986-08-05 The United States Of America As Represented By The Administrator Of The National Aeronautics And Space Administration Apparatus for producing oxidation protection coatings for polymers
KR900005118B1 (ko) 1986-07-14 1990-07-19 미쓰비시전기주식회사 박막 형성장치
US5618388A (en) * 1988-02-08 1997-04-08 Optical Coating Laboratory, Inc. Geometries and configurations for magnetron sputtering apparatus
US5616532A (en) 1990-12-14 1997-04-01 E. Heller & Company Photocatalyst-binder compositions
JPH04297560A (ja) 1991-03-26 1992-10-21 Nisshin Steel Co Ltd 鋼帯の連続溶融めっき方法及び装置
US5424130A (en) 1991-05-13 1995-06-13 Toyota Jidosha Kabushiki Kaisha Water repellent glass and process for producing the same
US5874701A (en) 1992-10-11 1999-02-23 Toto Co., Ltd. Photocatalytic air treatment process under room light
DE69324574T2 (de) 1992-11-10 1999-09-23 Toto Ltd., Kitakyushu Luftbehandlungsverfahren mit hilfe von einem photokatalysator und innenbeleuchtung
US5853866A (en) 1993-12-10 1998-12-29 Toto Ltd. Multi-functional material with photocalytic functions and method of manufacturing same
US5961843A (en) 1994-10-05 1999-10-05 Toto Ltd. Antimicrobial solid material, process for producing the same, and method of utilizing the same
KR970706901A (ko) 1994-11-16 1997-12-01 시게후치 마사토시 광촉매 기능재 및 이의 제조방법(Photocatalytic functional material and method of production thereof)
KR100342150B1 (ko) 1995-03-20 2002-10-25 도토기키 가부시키가이샤 기재의표면을광촉매적으로초친수성이되게하는방법,초친수성의광촉매성표면을갖는기재및그의제조방법
US5958134A (en) * 1995-06-07 1999-09-28 Tokyo Electron Limited Process equipment with simultaneous or sequential deposition and etching capabilities
US6090489A (en) 1995-12-22 2000-07-18 Toto, Ltd. Method for photocatalytically hydrophilifying surface and composite material with photocatalytically hydrophilifiable surface
US5939194A (en) 1996-12-09 1999-08-17 Toto Ltd. Photocatalytically hydrophilifying and hydrophobifying material
BE1010420A3 (fr) 1996-07-12 1998-07-07 Cockerill Rech & Dev Procede pour la formation d'un revetement sur un substrat et installation pour la mise en oeuvre de ce procede.
US6165256A (en) 1996-07-19 2000-12-26 Toto Ltd. Photocatalytically hydrophilifiable coating composition
US5969470A (en) 1996-11-08 1999-10-19 Veeco Instruments, Inc. Charged particle source
US5982101A (en) 1997-06-27 1999-11-09 Veeco Instruments, Inc. Charged-particle source, control system, and process using gating to extract the ion beam
ATE226562T1 (de) 1998-12-21 2002-11-15 Cardinal Cg Co Schmutzabweisende beschichtung mit niedrigem emissionsvermögen für glasoberflächen
US6660365B1 (en) 1998-12-21 2003-12-09 Cardinal Cg Company Soil-resistant coating for glass surfaces
EP1147065B1 (de) 1998-12-21 2003-04-09 Cardinal CG Company Schmutzabweisende beschichtung für glasoberflächen
US6368664B1 (en) 1999-05-03 2002-04-09 Guardian Industries Corp. Method of ion beam milling substrate prior to depositing diamond like carbon layer thereon
WO2000069784A1 (en) 1999-05-18 2000-11-23 Cardinal Ig Company Hard, scratch-resistant coatings for substrates
US6224718B1 (en) 1999-07-14 2001-05-01 Veeco Instruments, Inc. Target assembly for ion beam sputter deposition with multiple paddles each having targets on both sides
JP3477148B2 (ja) 1999-12-02 2003-12-10 カーディナル・シージー・カンパニー 耐曇り性透明フィルム積層体
US6638249B1 (en) 2000-07-17 2003-10-28 Wisconsin Alumni Research Foundation Ultrasonically actuated needle pump system
PL204742B1 (pl) 2002-05-06 2010-02-26 Guardian Industries Urządzenie powlekające do formowania pierwszej i drugiej powłoki na szklanym substracie
EP1579025B1 (de) 2002-12-31 2010-09-29 Cardinal CG Company Beschichtungsgerät mit einem reinigungsgerät für substrat und beschichtungsverfahren, das ein solches beschichtungsgerät benutzt

Also Published As

Publication number Publication date
US20070234963A1 (en) 2007-10-11
WO2004061151A1 (en) 2004-07-22
AU2003300037A1 (en) 2004-07-29
EP1579025A1 (de) 2005-09-28
JP2006521461A (ja) 2006-09-21
US7264741B2 (en) 2007-09-04
US20040175511A1 (en) 2004-09-09
DE60334407D1 (de) 2010-11-11
US7695598B2 (en) 2010-04-13
CA2512010C (en) 2013-04-16
EP1579025B1 (de) 2010-09-29
CA2512010A1 (en) 2004-07-22

Similar Documents

Publication Publication Date Title
DE60334407D1 (de) Beschichtungsgerät mit einem reinigungsgerät für substrat und beschichtungsverfahren, das ein solches beschichtungsgerät benutzt
ATE446822T1 (de) Verfahren und vorrichtung zur elektromechanischen und/oder elektrisch-chemisch-mechanischen entfernung leitfähigen materials von einem mikroelektronischen substrat
WO2002016051A3 (en) Surface cleaning and modification processes, methods and apparatus using physicochemically modified dense fluid sprays
ATE510935T1 (de) Vorrichtung und verfahren zur beschichtung von halbleitermaterial
DE59508476D1 (de) Vorrichtung und verfahren zur behandlung von oberflächen
DE69909526D1 (de) Verfahren zur Beschichtung von beiden Seiten eines Glassubstrats
DE502006006950D1 (de) Vorrichtung, anlage und verfahren zur oberflächenbehandlung von substraten
ATE281277T1 (de) Verfahren und vorrichtung zum plattieren und polieren eines halbleiterbauelements
DE602004018643D1 (de) Einrichtung und verfahren zur nassbehandlung von scheibenartigen substraten
EP1644553A4 (de) Schnellabscheidung zur bildung von hochwertigen optischen beschichtungen
DE69943383D1 (de) Silanbeschichtungen für Metalle
TW200420355A (en) Method and apparatus for control of layer thicknesses
DE50212291D1 (de) Beschichtungsverfahren und beschichtungsmittel
DK1140366T3 (da) Apparat og fremgangsmåde til coating af tabletter
ATE335868T1 (de) Vorrichtung und verfahren zum gerichteten aufbringen von depositionsmaterial auf ein substrat
CN101316952A (zh) 用于容纳或支承多个基件的装置和电镀装置
ATE411407T1 (de) Verfahren zur beschichtung von metalloberflächen
TW200626247A (en) Coating apparatus, coating method and coating-film forming apparatus
DE50000751D1 (de) Verfahren und vorrichtung zum behandeln von substraten
ATE502137T1 (de) Gemeinsames gestell für galvanisierungs- und pvd- beschichtungsoperationen
DE60218797D1 (de) Vorrichtung und Verfahren zum Beschichten von lichtempfindlichem Substrat
ATE298272T1 (de) Elektrostatisch erregtes beschichtungsverfahren und vorrichtung mit fokussiertem elektrodenfeld
DE602006013768D1 (de) Verfahren zur Reinigung von Ätzkammern mit Schleif-Suspension
ATE367457T1 (de) Verfahren zur vermeidung von ablagerungen von verunreinigungsteilchen auf die oberfläche eines mikrobauteils, aufbewahrungsvorrichtung für ein mikrobauteil und vorrichtung zur abscheidung von dünnen schichten
EP1467935B8 (de) Vorrichtung und verfahren zur oberflächenbehandlung von teilen

Legal Events

Date Code Title Description
RER Ceased as to paragraph 5 lit. 3 law introducing patent treaties