ATE265944T1 - Gerät und methode zur aufarbeitung von fotoresist-entwicklern und -entschichtern - Google Patents

Gerät und methode zur aufarbeitung von fotoresist-entwicklern und -entschichtern

Info

Publication number
ATE265944T1
ATE265944T1 AT97948116T AT97948116T ATE265944T1 AT E265944 T1 ATE265944 T1 AT E265944T1 AT 97948116 T AT97948116 T AT 97948116T AT 97948116 T AT97948116 T AT 97948116T AT E265944 T1 ATE265944 T1 AT E265944T1
Authority
AT
Austria
Prior art keywords
developing
decoaters
stripping
photoresist developers
filters
Prior art date
Application number
AT97948116T
Other languages
English (en)
Inventor
Julius James Jablonsky
Original Assignee
Atotech Deutschland Gmbh
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Atotech Deutschland Gmbh filed Critical Atotech Deutschland Gmbh
Application granted granted Critical
Publication of ATE265944T1 publication Critical patent/ATE265944T1/de

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B44—DECORATIVE ARTS
    • B44C—PRODUCING DECORATIVE EFFECTS; MOSAICS; TARSIA WORK; PAPERHANGING
    • B44C1/00—Processes, not specifically provided for elsewhere, for producing decorative surface effects
    • B44C1/22—Removing surface-material, e.g. by engraving, by etching
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/3092—Recovery of material; Waste processing
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/42—Stripping or agents therefor
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/0085—Apparatus for treatments of printed circuits with liquids not provided for in groups H05K3/02 - H05K3/46; conveyors and holding means therefor

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Separation Using Semi-Permeable Membranes (AREA)
  • Physical Water Treatments (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)
  • ing And Chemical Polishing (AREA)
  • Coating Apparatus (AREA)
AT97948116T 1996-10-23 1997-10-21 Gerät und methode zur aufarbeitung von fotoresist-entwicklern und -entschichtern ATE265944T1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US08/740,025 US5753135A (en) 1995-10-23 1996-10-23 Apparatus and method for recovering photoresist developers and strippers
PCT/US1997/019039 WO1998017483A1 (en) 1996-10-23 1997-10-21 Apparatus and method for recovering photoresist developers and strippers

Publications (1)

Publication Number Publication Date
ATE265944T1 true ATE265944T1 (de) 2004-05-15

Family

ID=24974734

Family Applications (1)

Application Number Title Priority Date Filing Date
AT97948116T ATE265944T1 (de) 1996-10-23 1997-10-21 Gerät und methode zur aufarbeitung von fotoresist-entwicklern und -entschichtern

Country Status (12)

Country Link
US (1) US5753135A (de)
EP (1) EP0944482B1 (de)
JP (1) JP2001502847A (de)
KR (1) KR100386438B1 (de)
AT (1) ATE265944T1 (de)
AU (1) AU5424998A (de)
BR (1) BR9712358A (de)
CA (1) CA2268903C (de)
DE (1) DE69728992T2 (de)
ES (1) ES2221074T3 (de)
IL (1) IL129454A (de)
WO (1) WO1998017483A1 (de)

Families Citing this family (20)

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US6074561A (en) * 1995-10-23 2000-06-13 Phoenankh Corp. Apparatus and method for recovering photoresist developers and strippers
SG76567A1 (en) * 1998-08-05 2000-11-21 Samsung Electronics Co Ltd Resist removing method and apparatus
KR20020094585A (ko) * 2001-06-12 2002-12-18 주식회사 퓨어테크 인쇄회로기판 제조용 현상액 리사이클링 시스템
KR100419669B1 (ko) * 2001-06-12 2004-02-25 주식회사 퓨어엔비텍 인쇄회로기판 제조용 현상액 리사이클링 시스템
JP2003167358A (ja) * 2001-11-29 2003-06-13 Nagase & Co Ltd レジスト剥離廃液の再生装置及び再生方法
CN100549837C (zh) * 2003-10-28 2009-10-14 凸版印刷株式会社 显影装置、显影方法及显影液循环方法
WO2005040930A1 (ja) * 2003-10-28 2005-05-06 Toppan Printing Co., Ltd. 現像装置、現像方法、及び現像液循環方法
JP3884440B2 (ja) * 2004-03-15 2007-02-21 株式会社東芝 フィルタおよび半導体処理装置
JP4393910B2 (ja) * 2004-04-08 2010-01-06 東京応化工業株式会社 ホトレジスト組成物の製造方法、ろ過装置、塗布装置及びホトレジスト組成物
JP5125038B2 (ja) * 2006-09-12 2013-01-23 カシオ計算機株式会社 レジスト剥離装置及びレジスト剥離方法
JP5165337B2 (ja) * 2007-10-26 2013-03-21 日本リファイン株式会社 剥離液廃液からの剥離液の再生方法と再生装置
DE102007063202A1 (de) * 2007-12-19 2009-06-25 Gebr. Schmid Gmbh & Co. Verfahren und Vorrichtung zur Behandlung von Silizium-Wafern
JP6045283B2 (ja) * 2012-10-11 2016-12-14 日本リファイン株式会社 レジスト剥離液の再生方法および再生装置
JP6012429B2 (ja) * 2012-11-20 2016-10-25 キヤノン株式会社 有機溶剤の再生方法、有機溶剤の使用方法及びインクジェット記録ヘッドの製造方法
JP6159651B2 (ja) * 2013-11-25 2017-07-05 東京エレクトロン株式会社 フィルタ洗浄方法、液処理装置及び記憶媒体
JP6723000B2 (ja) * 2015-11-16 2020-07-15 株式会社Ｓｃｒｅｅｎホールディングス 基板処理装置
CN109791374B (zh) * 2017-08-23 2022-05-17 深圳市柔宇科技股份有限公司 显影液回收系统
CN110668529A (zh) * 2018-07-02 2020-01-10 陈俊吉 显影液再生系统及其正负型光刻胶分离装置
US11189504B2 (en) * 2020-02-11 2021-11-30 Tcl China Star Optoelectronics Technology Co., Ltd. Photoresist stripping device and photoresist stripping method
US20250214004A1 (en) * 2024-01-03 2025-07-03 Goodrich Lighting Systems, Inc. Uv light sensitive solubility material filtration

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US4069157A (en) * 1975-11-20 1978-01-17 E. I. Du Pont De Nemours And Company Ultrafiltration device
DE3143106A1 (de) * 1981-10-30 1983-05-11 Basf Ag, 6700 Ludwigshafen Verfahren und vorrichtung zur regenerierung waessrigerauswaschloesungen von wasserentwickelbaren photosensitiven aufzeichnungsmaterialien
DE3782205T2 (de) * 1986-07-23 1993-02-25 Sumitomo Heavy Industries Behandlung einer photoresistmaterialien enthaltenden abfalloesung.
EP0332788B1 (de) * 1988-03-17 1992-07-22 Societe Des Ceramiques Techniques Verfahren zur Behandlung verunreinigter Öl-in-Wasser-Emulsionen oder-Mikroemulsionen
JPH0264646A (ja) * 1988-08-31 1990-03-05 Toshiba Corp レジストパターンの現像方法及びこの方法に使用する現像装置
DE3833242A1 (de) * 1988-09-30 1990-04-05 Hoellmueller Maschbau H Verfahren zum aetzen von kupferhaltigen werkstuecken sowie aetzanlage zur durchfuehrung des verfahrens
US5112491A (en) * 1991-03-01 1992-05-12 E. I. Du Pont De Nemours And Company Management of waste solution containing photoresist materials
US5354434A (en) * 1991-07-12 1994-10-11 Chlorine Engineers Corp. Ltd. Method for regenerating tetraalkylammonium hydroxide
US5366584A (en) * 1992-02-11 1994-11-22 Rayzist Photomask, Inc. Removing uncured emulsion from stencils during photomask production
US5205937A (en) * 1992-04-30 1993-04-27 U.S. Filter Membralox Recovery and reuse of water-based cleaners
US5536285A (en) * 1993-07-12 1996-07-16 Foster Wheeler Energia Oy Ceramic filtering of gases
JPH07171321A (ja) * 1993-12-17 1995-07-11 Toto Ltd セラミックフィルター
US5531889A (en) * 1994-03-08 1996-07-02 Atotech Usa, Inc. Method and apparatus for removing resist particles from stripping solutions for printed wireboards
JPH0844082A (ja) * 1994-07-28 1996-02-16 Konica Corp 感光性材料の処理方法及び装置
WO1996020434A1 (fr) * 1994-12-27 1996-07-04 Mitsubishi Chemical Corporation Procede et appareil pour traiter un revelateur pour materiau photosensible sans halogenure d'argent et contenant des pigments, et machine a developper automatique
DE29517588U1 (de) * 1995-11-06 1996-02-08 Cimatec GmbH Produkte für Leiterplatten, 67292 Kirchheimbolanden Maschine zur Flüssigkeitsbehandlung von Gegenständen, insbesondere Platinen in der Leiterplattenfertigung

Also Published As

Publication number Publication date
AU5424998A (en) 1998-05-15
EP0944482B1 (de) 2004-05-06
JP2001502847A (ja) 2001-02-27
KR100386438B1 (ko) 2003-06-09
BR9712358A (pt) 2005-04-12
CA2268903C (en) 2006-12-05
DE69728992T2 (de) 2005-04-07
KR20000052756A (ko) 2000-08-25
WO1998017483A1 (en) 1998-04-30
IL129454A (en) 2002-02-10
ES2221074T3 (es) 2004-12-16
EP0944482A1 (de) 1999-09-29
CA2268903A1 (en) 1998-04-30
US5753135A (en) 1998-05-19
IL129454A0 (en) 2000-02-29
DE69728992D1 (de) 2004-06-09
EP0944482A4 (de) 2000-01-12

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