ATE271698T1 - Festbildzusammensetzungen für die herstellung polypropylenähnlicher gegenstände - Google Patents

Festbildzusammensetzungen für die herstellung polypropylenähnlicher gegenstände

Info

Publication number
ATE271698T1
ATE271698T1 AT01918000T AT01918000T ATE271698T1 AT E271698 T1 ATE271698 T1 AT E271698T1 AT 01918000 T AT01918000 T AT 01918000T AT 01918000 T AT01918000 T AT 01918000T AT E271698 T1 ATE271698 T1 AT E271698T1
Authority
AT
Austria
Prior art keywords
objects
solid image
producing polypropylene
image compositions
compositions
Prior art date
Application number
AT01918000T
Other languages
English (en)
Inventor
John Alan Lawton
Chander Prakash Chawla
Original Assignee
Dsm Ip Assets Bv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=24149086&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=ATE271698(T1) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by Dsm Ip Assets Bv filed Critical Dsm Ip Assets Bv
Application granted granted Critical
Publication of ATE271698T1 publication Critical patent/ATE271698T1/de

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0037—Production of three-dimensional images
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B33—ADDITIVE MANUFACTURING TECHNOLOGY
    • B33Y—ADDITIVE MANUFACTURING, i.e. MANUFACTURING OF THREE-DIMENSIONAL [3D] OBJECTS BY ADDITIVE DEPOSITION, ADDITIVE AGGLOMERATION OR ADDITIVE LAYERING, e.g. BY 3D PRINTING, STEREOLITHOGRAPHY OR SELECTIVE LASER SINTERING
    • B33Y70/00—Materials specially adapted for additive manufacturing
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Materials Engineering (AREA)
  • Epoxy Resins (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Manufacture Of Macromolecular Shaped Articles (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
AT01918000T 2000-03-31 2001-03-29 Festbildzusammensetzungen für die herstellung polypropylenähnlicher gegenstände ATE271698T1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US09/538,940 US6379866B2 (en) 2000-03-31 2000-03-31 Solid imaging compositions for preparing polypropylene-like articles
PCT/NL2001/000261 WO2001075524A2 (en) 2000-03-31 2001-03-29 Solid imaging compositions for preparing polypropylene-like articles

Publications (1)

Publication Number Publication Date
ATE271698T1 true ATE271698T1 (de) 2004-08-15

Family

ID=24149086

Family Applications (1)

Application Number Title Priority Date Filing Date
AT01918000T ATE271698T1 (de) 2000-03-31 2001-03-29 Festbildzusammensetzungen für die herstellung polypropylenähnlicher gegenstände

Country Status (10)

Country Link
US (3) US6379866B2 (de)
EP (2) EP1269261B1 (de)
JP (1) JP2003529674A (de)
KR (1) KR100796409B1 (de)
CN (1) CN1322371C (de)
AT (1) ATE271698T1 (de)
AU (1) AU2001244872A1 (de)
DE (1) DE60104408T2 (de)
ES (1) ES2223811T3 (de)
WO (1) WO2001075524A2 (de)

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US11097531B2 (en) 2015-12-17 2021-08-24 Bridgestone Americas Tire Operations, Llc Additive manufacturing cartridges and processes for producing cured polymeric products by additive manufacturing
CN107300831B (zh) * 2016-04-15 2021-01-15 常州强力电子新材料股份有限公司 一种应用于led光固化的可固化组合物
US11453161B2 (en) 2016-10-27 2022-09-27 Bridgestone Americas Tire Operations, Llc Processes for producing cured polymeric products by additive manufacturing
CN107236096B (zh) * 2017-07-19 2020-05-26 中山大简科技有限公司 一种透明sla光敏树脂组合物
EP3813764A2 (de) 2018-06-29 2021-05-05 3M Innovative Properties Company Unter verwendung eines polycarbonatdiols hergestellte kieferorthopädische artikel, polymerisierbare zusammensetzungen und verfahren zur herstellung der artikel
KR102302706B1 (ko) 2018-06-29 2021-09-15 쓰리엠 이노베이티브 프로퍼티즈 캄파니 폴리카르보네이트 다이올을 사용하여 제조된 폴리우레탄 메타크릴레이트 중합체를 포함하는 광중합성 조성물, 물품, 및 방법
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Also Published As

Publication number Publication date
EP1269261A2 (de) 2003-01-02
ES2223811T3 (es) 2005-03-01
EP1473593B1 (de) 2017-07-05
KR100796409B1 (ko) 2008-01-21
HK1057260A1 (en) 2004-03-19
CN1322371C (zh) 2007-06-20
EP1473593A2 (de) 2004-11-03
US6749976B2 (en) 2004-06-15
KR20030051420A (ko) 2003-06-25
US20020018959A1 (en) 2002-02-14
WO2001075524A2 (en) 2001-10-11
AU2001244872A1 (en) 2001-10-15
JP2003529674A (ja) 2003-10-07
DE60104408D1 (de) 2004-08-26
US20040091799A1 (en) 2004-05-13
US20020081505A1 (en) 2002-06-27
WO2001075524A3 (en) 2002-03-14
EP1269261B1 (de) 2004-07-21
EP1473593A3 (de) 2009-09-23
DE60104408T2 (de) 2005-08-25
US6379866B2 (en) 2002-04-30
CN1432140A (zh) 2003-07-23

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