ES2144836T3 - Composicion liquida reticulable por radiacion, en especial para estereolitografia. - Google Patents

Composicion liquida reticulable por radiacion, en especial para estereolitografia.

Info

Publication number
ES2144836T3
ES2144836T3 ES97810510T ES97810510T ES2144836T3 ES 2144836 T3 ES2144836 T3 ES 2144836T3 ES 97810510 T ES97810510 T ES 97810510T ES 97810510 T ES97810510 T ES 97810510T ES 2144836 T3 ES2144836 T3 ES 2144836T3
Authority
ES
Spain
Prior art keywords
weight
compositions
liquid
mixture
radical
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
ES97810510T
Other languages
English (en)
Inventor
Bettina Steinmann
Adrian Schulthess
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
BASF Schweiz AG
Original Assignee
Ciba Spezialitaetenchemie Holding AG
Ciba SC Holding AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=25688916&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=ES2144836(T3) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by Ciba Spezialitaetenchemie Holding AG, Ciba SC Holding AG filed Critical Ciba Spezialitaetenchemie Holding AG
Application granted granted Critical
Publication of ES2144836T3 publication Critical patent/ES2144836T3/es
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L63/00—Compositions of epoxy resins; Compositions of derivatives of epoxy resins
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B33—ADDITIVE MANUFACTURING TECHNOLOGY
    • B33Y—ADDITIVE MANUFACTURING, i.e. MANUFACTURING OF THREE-DIMENSIONAL [3D] OBJECTS BY ADDITIVE DEPOSITION, ADDITIVE AGGLOMERATION OR ADDITIVE LAYERING, e.g. BY 3D PRINTING, STEREOLITHOGRAPHY OR SELECTIVE LASER SINTERING
    • B33Y70/00—Materials specially adapted for additive manufacturing
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
    • C08G59/02—Polycondensates containing more than one epoxy group per molecule
    • C08G59/022—Polycondensates containing more than one epoxy group per molecule characterised by the preparation process or apparatus used
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
    • C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
    • C08G59/40—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the curing agents used
    • C08G59/62—Alcohols or phenols
    • C08G59/621—Phenols
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0037—Production of three-dimensional images
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L2205/00—Polymer mixtures characterised by other features
    • C08L2205/02—Polymer mixtures characterised by other features containing two or more polymers of the same C08L -group
    • C08L2205/025—Polymer mixtures characterised by other features containing two or more polymers of the same C08L -group containing two or more polymers of the same hierarchy C08L, and differing only in parameters such as density, comonomer content, molecular weight, structure

Landscapes

  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Health & Medical Sciences (AREA)
  • Materials Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Epoxy Resins (AREA)
  • Polymerisation Methods In General (AREA)
  • Materials For Photolithography (AREA)
  • Heating, Cooling, Or Curing Plastics Or The Like In General (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Paints Or Removers (AREA)

Abstract

COMPOSICION LIQUIDA, ENDURECIBLE POR RADIACION, QUE JUNTO CON UN COMPONENTE LIQUIDO, POLIMERIZABLE POR RADICAL, CONTIENE ADEMAS LOS SIGUIENTES COMPONENTES COMO MINIMO: (A) DE UN 40 A UN 80 % EN PESO DE UNA RESINA EPOXIDO LIQUIDA DIFUNCIONAL O DE ELEVADA FUNCIONALIDAD O UNA MEZCLA LIQUIDA COMPUESTA DE RESINAS EPOXIDO LIQUIDAS DIFUNCIONALES O DE ELEVADA FUNCIONALIDAD; (B) DE UN 0,1 A UN 10 % EN PESO DE UN FOTOINICIADOR CATIONICO O UNA MEZCLA DE FOTOINICIADORES CATIONICOS; Y (C) DE UN 0,1 A UN 10 % EN PESO DE UN FOTOINICIADOR RADICAL O UNA MEZCLA DE FOTOINICIADORES RADICALES; Y (D) HASTA UN 40 % EN PESO DE UNA COMPOSICION DE HIDROXILO, CARACTERIZADA PORQUE EL COMPONENTE (D) HA SIDO SELECCIONADO DEL GRUPO COMPUESTO POR: (D1) COMPOSICIONES FENOLICAS CON 2 GRUPOS HIDROXILOS COMO MINIMO, (D2) COMPOSICIONES FENOLICAS CON 2 GRUPOS HIDROXILOS COMO MINIMO REACCIONADOS CON ETILENOXIDO, PROPILENOXIDO O CON ETILENOXIDO Y PROPILENOXIDO, (D3) COMPOSICIONES DE HIDROXILO ALIFATICAS CON 80 ATOMOS DE CARBONO COMO MAXIMO, (D4) COMPOSICIONES CON AL MENOS UN GRUPO HIDROXILO Y AL MENOS UN GRUPO EPOXIDO Y (D5) UNA MEZCLA CON AL MENOS 2 DE LAS COMPOSICIONES MENCIONADAS BAJO LOS APARTADOS (D1) A (D4), Y ESTA CONTENIDO EN LAS COMPOSICIONES EN UNA CANTIDAD DE UN 2 % EN PESO COMO MINIMO, CUYO COMPONENTE POLIMERIZABLE POR RADICAL CONTIENE AL MENOS: (E) DE UN 40 A UN 30 % EN PESO COMO MINIMO DE UN POLI(MET )ACRILATO LIQUIDO CON UNA FUNCIONALIDAD DE (MET OMPONENTES (A) O (D) CONTIENE SUSTANCIAS QUE MUESTRAN EN SU MOLECULA ANILLOS DE CARBONO AROMATICOS; DICHA COMPOSICION ES ESPECIALMENTE APTA PARA LA ESTEREOLITOGRAFIA, DESTACANDOSE DE MANERA PARTICULAR PORQUE DA LUGAR A UN MATERIAL ENDURECIDO QUE MUESTRA UN INDICE MINIMO DE ABSORCION DE AGUA.
ES97810510T 1996-07-29 1997-07-21 Composicion liquida reticulable por radiacion, en especial para estereolitografia. Expired - Lifetime ES2144836T3 (es)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
CH188596 1996-07-29
CH220196 1996-09-05

Publications (1)

Publication Number Publication Date
ES2144836T3 true ES2144836T3 (es) 2000-06-16

Family

ID=25688916

Family Applications (1)

Application Number Title Priority Date Filing Date
ES97810510T Expired - Lifetime ES2144836T3 (es) 1996-07-29 1997-07-21 Composicion liquida reticulable por radiacion, en especial para estereolitografia.

Country Status (10)

Country Link
US (1) US5972563A (es)
EP (1) EP0822445B2 (es)
JP (1) JP3564650B2 (es)
KR (1) KR100491736B1 (es)
AT (1) ATE191090T1 (es)
AU (1) AU716984B2 (es)
CA (1) CA2211628C (es)
DE (1) DE59701299D1 (es)
ES (1) ES2144836T3 (es)
TW (1) TW350863B (es)

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EP0646580B1 (de) * 1993-09-16 2000-05-31 Ciba SC Holding AG Vinyletherverbindungen mit zusätzlichen von Vinylethergruppen verschiedenen funktionellen Gruppen und deren Verwendung zur Formulierung härtbarer Zusammensetzungen
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JPH09268205A (ja) * 1996-03-29 1997-10-14 Asahi Denka Kogyo Kk 光学的立体造形用樹脂組成物および光学的立体造形法

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TW350863B (en) 1999-01-21
AU3157997A (en) 1998-02-05
EP0822445A1 (de) 1998-02-04
KR100491736B1 (ko) 2005-09-09
CA2211628C (en) 2007-03-13
JPH1087791A (ja) 1998-04-07
ATE191090T1 (de) 2000-04-15
EP0822445B1 (de) 2000-03-22
JP3564650B2 (ja) 2004-09-15
EP0822445B2 (de) 2005-02-09
US5972563A (en) 1999-10-26
KR980009381A (ko) 1998-04-30
CA2211628A1 (en) 1998-01-29
DE59701299D1 (de) 2000-04-27
AU716984B2 (en) 2000-03-16

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