ATE281753T1 - Verfahren zur erzeugung einer extrem-ultraviolett-strahlungsquelle und deren anwendung in der lithographie - Google Patents
Verfahren zur erzeugung einer extrem-ultraviolett-strahlungsquelle und deren anwendung in der lithographieInfo
- Publication number
- ATE281753T1 ATE281753T1 AT00979727T AT00979727T ATE281753T1 AT E281753 T1 ATE281753 T1 AT E281753T1 AT 00979727 T AT00979727 T AT 00979727T AT 00979727 T AT00979727 T AT 00979727T AT E281753 T1 ATE281753 T1 AT E281753T1
- Authority
- AT
- Austria
- Prior art keywords
- extreme ultraviolet
- ultraviolet radiation
- lithography
- application
- generating
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05G—X-RAY TECHNIQUE
- H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70008—Production of exposure light, i.e. light sources
- G03F7/70033—Production of exposure light, i.e. light sources by plasma extreme ultraviolet [EUV] sources
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05G—X-RAY TECHNIQUE
- H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
- H05G2/001—Production of X-ray radiation generated from plasma
- H05G2/009—Auxiliary arrangements not involved in the plasma generation
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Optics & Photonics (AREA)
- General Physics & Mathematics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- X-Ray Techniques (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Electron Beam Exposure (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| FR9914285A FR2801113B1 (fr) | 1999-11-15 | 1999-11-15 | Procede d'obtention et source de rayonnement extreme ultra violet, application en lithographie |
| PCT/FR2000/003163 WO2001037618A1 (fr) | 1999-11-15 | 2000-11-14 | Procede d'obtention et source de rayonnement extreme ultraviolet, application en lithographie |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| ATE281753T1 true ATE281753T1 (de) | 2004-11-15 |
Family
ID=9552094
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| AT00979727T ATE281753T1 (de) | 1999-11-15 | 2000-11-14 | Verfahren zur erzeugung einer extrem-ultraviolett-strahlungsquelle und deren anwendung in der lithographie |
Country Status (12)
| Country | Link |
|---|---|
| US (1) | US6927405B1 (de) |
| EP (1) | EP1230828B1 (de) |
| JP (1) | JP2003515109A (de) |
| KR (1) | KR100745704B1 (de) |
| CN (1) | CN100373993C (de) |
| AT (1) | ATE281753T1 (de) |
| AU (1) | AU1712301A (de) |
| DE (1) | DE60015593T2 (de) |
| FR (1) | FR2801113B1 (de) |
| RU (1) | RU2249926C2 (de) |
| TW (1) | TW473822B (de) |
| WO (1) | WO2001037618A1 (de) |
Families Citing this family (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE10205189B4 (de) * | 2002-02-06 | 2012-06-28 | Xtreme Technologies Gmbh | Verfahren zur Erzeugung von extrem ultravioletter Strahlung auf Basis eines strahlungsemittierenden Plasmas |
| DE10219173A1 (de) * | 2002-04-30 | 2003-11-20 | Philips Intellectual Property | Verfahren zur Erzeugung von Extrem-Ultraviolett-Strahlung |
| DE10359464A1 (de) * | 2003-12-17 | 2005-07-28 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Verfahren und Vorrichtung zum Erzeugen von insbesondere EUV-Strahlung und/oder weicher Röntgenstrahlung |
| WO2006075535A1 (ja) * | 2005-01-12 | 2006-07-20 | Nikon Corporation | レーザプラズマeuv光源、ターゲット部材、テープ部材、ターゲット部材の製造方法、ターゲットの供給方法、及びeuv露光装置 |
| US20060233309A1 (en) * | 2005-04-14 | 2006-10-19 | Joerg Kutzner | Laser x-ray source apparatus and target used therefore |
| US8019046B1 (en) | 2009-04-15 | 2011-09-13 | Eran & Jan, Inc | Apparatus for generating shortwave radiation |
| NL2004706A (nl) * | 2009-07-22 | 2011-01-25 | Asml Netherlands Bv | Radiation source. |
| KR101104996B1 (ko) * | 2009-08-31 | 2012-01-16 | 한국원자력연구원 | 다공성 금속 타겟, 그 제조 방법 및 그를 이용한 극자외선 생성 방법 |
| JP5573255B2 (ja) * | 2010-03-11 | 2014-08-20 | 富士ゼロックス株式会社 | 定着装置及び画像形成装置 |
| WO2013020758A1 (en) * | 2011-08-05 | 2013-02-14 | Asml Netherlands B.V. | Radiation source and method for lithographic apparatus and device manufacturing method |
| HUE057042T2 (hu) * | 2014-05-22 | 2022-04-28 | Australian Nuclear Science & Tech Organisation | Röntgensugaras képalkotás |
| US20170311429A1 (en) * | 2016-04-25 | 2017-10-26 | Asml Netherlands B.V. | Reducing the effect of plasma on an object in an extreme ultraviolet light source |
| CN114624959B (zh) * | 2020-12-11 | 2025-09-05 | 北京大学 | 一种高效率极紫外辐射产生方法及系统 |
Family Cites Families (16)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4504964A (en) * | 1982-09-20 | 1985-03-12 | Eaton Corporation | Laser beam plasma pinch X-ray system |
| DE3342531A1 (de) | 1983-11-24 | 1985-06-05 | Max Planck Gesellschaft | Verfahren und einrichtung zum erzeugen von kurz dauernden, intensiven impulsen elektromagnetischer strahlung im wellenlaengenbereich unter etwa 100 nm |
| US4700371A (en) * | 1984-11-08 | 1987-10-13 | Hampshire Instruments, Inc. | Long life x-ray source target |
| US5433988A (en) * | 1986-10-01 | 1995-07-18 | Canon Kabushiki Kaisha | Multi-layer reflection mirror for soft X-ray to vacuum ultraviolet ray |
| US4731786A (en) * | 1987-05-05 | 1988-03-15 | The United States Of America As Represented By The United States Department Of Energy | Method and apparatus for producing durationally short ultraviolet or X-ray laser pulses |
| JP2576278B2 (ja) * | 1990-08-31 | 1997-01-29 | 株式会社島津製作所 | X線発生装置 |
| RU2030826C1 (ru) * | 1991-04-15 | 1995-03-10 | Анатолий Васильевич Еньшин | Способ преобразования лазерного излучения |
| JPH0732073B2 (ja) * | 1991-07-19 | 1995-04-10 | 工業技術院長 | 極短波長レーザ用プラズマ発生装置 |
| AU7570694A (en) * | 1993-10-19 | 1995-05-11 | General Electric Company | Improved speed sensor |
| CA2194759C (en) * | 1994-07-12 | 1999-09-14 | Donald O. Smith | X-ray apparatus for applying a predetermined flux to an interior surface of a body cavity |
| JPH0850874A (ja) * | 1994-08-10 | 1996-02-20 | Hitachi Ltd | 荷電粒子投射方法および装置 |
| JPH10208998A (ja) * | 1997-01-17 | 1998-08-07 | Hitachi Ltd | レーザプラズマx線発生装置とそれを用いた微細パターン転写方法および装置 |
| US6339634B1 (en) * | 1998-10-01 | 2002-01-15 | Nikon Corporation | Soft x-ray light source device |
| JP2000348895A (ja) * | 1999-06-01 | 2000-12-15 | Kansai Tlo Kk | パルス状高輝度硬X線またはγ線の発生方法および装置 |
| US6931097B1 (en) * | 1999-07-22 | 2005-08-16 | Corning Incorporated | Extreme ultraviolet soft x-ray projection lithographic method system and lithographic elements |
| FR2802311B1 (fr) * | 1999-12-08 | 2002-01-18 | Commissariat Energie Atomique | Dispositif de lithographie utilisant une source de rayonnement dans le domaine extreme ultraviolet et des miroirs multicouches a large bande spectrale dans ce domaine |
-
1999
- 1999-11-15 FR FR9914285A patent/FR2801113B1/fr not_active Expired - Fee Related
-
2000
- 2000-11-14 DE DE60015593T patent/DE60015593T2/de not_active Expired - Fee Related
- 2000-11-14 RU RU2002115875/28A patent/RU2249926C2/ru not_active IP Right Cessation
- 2000-11-14 JP JP2001538459A patent/JP2003515109A/ja active Pending
- 2000-11-14 CN CNB008156735A patent/CN100373993C/zh not_active Expired - Fee Related
- 2000-11-14 EP EP00979727A patent/EP1230828B1/de not_active Expired - Lifetime
- 2000-11-14 AU AU17123/01A patent/AU1712301A/en not_active Abandoned
- 2000-11-14 KR KR1020027005991A patent/KR100745704B1/ko not_active Expired - Fee Related
- 2000-11-14 WO PCT/FR2000/003163 patent/WO2001037618A1/fr not_active Ceased
- 2000-11-14 AT AT00979727T patent/ATE281753T1/de not_active IP Right Cessation
- 2000-11-14 US US10/130,125 patent/US6927405B1/en not_active Expired - Fee Related
- 2000-11-15 TW TW089124223A patent/TW473822B/zh not_active IP Right Cessation
Also Published As
| Publication number | Publication date |
|---|---|
| WO2001037618A1 (fr) | 2001-05-25 |
| RU2249926C2 (ru) | 2005-04-10 |
| TW473822B (en) | 2002-01-21 |
| DE60015593T2 (de) | 2005-11-10 |
| KR20020052204A (ko) | 2002-07-02 |
| AU1712301A (en) | 2001-05-30 |
| EP1230828A1 (de) | 2002-08-14 |
| CN100373993C (zh) | 2008-03-05 |
| FR2801113B1 (fr) | 2003-05-09 |
| US6927405B1 (en) | 2005-08-09 |
| DE60015593D1 (de) | 2004-12-09 |
| JP2003515109A (ja) | 2003-04-22 |
| FR2801113A1 (fr) | 2001-05-18 |
| EP1230828B1 (de) | 2004-11-03 |
| CN1390435A (zh) | 2003-01-08 |
| KR100745704B1 (ko) | 2007-08-02 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| RER | Ceased as to paragraph 5 lit. 3 law introducing patent treaties |