ATE284889T1 - Organosiliziumverbindungen und ihre verwendung als fotoinitiatoren - Google Patents

Organosiliziumverbindungen und ihre verwendung als fotoinitiatoren

Info

Publication number
ATE284889T1
ATE284889T1 AT00951704T AT00951704T ATE284889T1 AT E284889 T1 ATE284889 T1 AT E284889T1 AT 00951704 T AT00951704 T AT 00951704T AT 00951704 T AT00951704 T AT 00951704T AT E284889 T1 ATE284889 T1 AT E284889T1
Authority
AT
Austria
Prior art keywords
groups
organosilicon compounds
group
formula
different
Prior art date
Application number
AT00951704T
Other languages
English (en)
Inventor
Roger Edward Burrows
Shaun Lawrence Herlihy
Derek Ronald Illsley
Original Assignee
Coates Brothers Plc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Coates Brothers Plc filed Critical Coates Brothers Plc
Application granted granted Critical
Publication of ATE284889T1 publication Critical patent/ATE284889T1/de

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds
    • G03F7/0755—Non-macromolecular compounds containing Si-O, Si-C or Si-N bonds
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/46—Polymerisation initiated by wave energy or particle radiation
    • C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D4/00—Coating compositions, e.g. paints, varnishes or lacquers, based on organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond ; Coating compositions, based on monomers of macromolecular compounds of groups C09D183/00 - C09D183/16
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D4/00—Coating compositions, e.g. paints, varnishes or lacquers, based on organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond ; Coating compositions, based on monomers of macromolecular compounds of groups C09D183/00 - C09D183/16
    • C09D4/06—Organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond in combination with a macromolecular compound other than an unsaturated polymer of groups C09D159/00 - C09D187/00
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Organic Chemistry (AREA)
  • Wood Science & Technology (AREA)
  • General Physics & Mathematics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Health & Medical Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Paints Or Removers (AREA)
  • Polymerisation Methods In General (AREA)
  • Holo Graphy (AREA)
  • Adhesives Or Adhesive Processes (AREA)
  • Inks, Pencil-Leads, Or Crayons (AREA)
AT00951704T 1999-08-04 2000-08-04 Organosiliziumverbindungen und ihre verwendung als fotoinitiatoren ATE284889T1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
GB9918419A GB2352718A (en) 1999-08-04 1999-08-04 Photoinitiators
PCT/GB2000/003020 WO2001010872A1 (en) 1999-08-04 2000-08-04 Organo-silicon compounds and their use as photoinitiators

Publications (1)

Publication Number Publication Date
ATE284889T1 true ATE284889T1 (de) 2005-01-15

Family

ID=10858591

Family Applications (1)

Application Number Title Priority Date Filing Date
AT00951704T ATE284889T1 (de) 1999-08-04 2000-08-04 Organosiliziumverbindungen und ihre verwendung als fotoinitiatoren

Country Status (10)

Country Link
US (1) US6849668B1 (de)
EP (1) EP1200448B1 (de)
JP (1) JP2003506532A (de)
CN (1) CN1196705C (de)
AT (1) ATE284889T1 (de)
AU (1) AU6456200A (de)
DE (1) DE60016757T2 (de)
ES (1) ES2233419T3 (de)
GB (1) GB2352718A (de)
WO (1) WO2001010872A1 (de)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US11092890B2 (en) 2018-07-31 2021-08-17 Samsung Sdi Co., Ltd. Semiconductor resist composition, and method of forming patterns using the composition
KR102307977B1 (ko) 2018-07-31 2021-09-30 삼성에스디아이 주식회사 반도체 레지스트용 조성물 및 이를 이용한 패턴 형성 방법
US11092889B2 (en) 2018-07-31 2021-08-17 Samsung Sdi Co., Ltd. Semiconductor resist composition, and method of forming patterns using the composition
KR102446362B1 (ko) 2019-10-15 2022-09-21 삼성에스디아이 주식회사 반도체 포토 레지스트용 조성물 및 이를 이용한 패턴 형성 방법
CN114409902B (zh) * 2021-12-27 2023-04-25 北京化工大学 多功能型pdms基预聚体、基于该预聚体的膜及其制备

Family Cites Families (35)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3924520A (en) 1974-06-27 1975-12-09 Hercules Inc Preparing lithographic plates utilizing vinyl monomers containing hydrolyzable silane groups
US3905816A (en) * 1974-06-27 1975-09-16 Hercules Inc Preparing lithographic plates utilizing hydrolyzable azoand azido-silane compounds
US4477326A (en) * 1983-06-20 1984-10-16 Loctite Corporation Polyphotoinitiators and compositions thereof
IT1176018B (it) 1984-04-12 1987-08-12 Lamberti Flli Spa Chetoni aromatico alifatici polimerici o polimerizzabili adatti all'impiego come fotoiniziatori di polimerizzazione
US4536265A (en) 1984-04-19 1985-08-20 Loctite Corporation Siloxane polyphotoinitiators of the substituted acetophenone type
GB8414705D0 (en) * 1984-06-08 1984-07-11 Wiggins Teape Group Ltd Coating substrates
DE3512179A1 (de) * 1985-04-03 1986-12-04 Merck Patent Gmbh, 6100 Darmstadt Fotoinitiatoren fuer die fotopolymerisation in waessrigen systemen
DE3534645A1 (de) 1985-09-28 1987-04-02 Merck Patent Gmbh Copolymerisierbare fotoinitiatoren
DE3624858A1 (de) * 1986-07-23 1988-01-28 Merck Patent Gmbh Orientierte polymermaterialien
DE3738567A1 (de) 1987-03-12 1988-09-22 Merck Patent Gmbh Coreaktive fotoinitiatoren
JPH01230603A (ja) 1988-03-10 1989-09-14 Mitsubishi Rayon Co Ltd 光硬化性組成物
FR2630444B1 (fr) * 1988-04-21 1990-09-07 Rhone Poulenc Chimie Composes d'etain utilisables notamment comme catalyseurs latents pour la preparation de polyurethannes
US4922044A (en) 1988-11-04 1990-05-01 Allied-Signal Inc. Purification of chloroform
JP2716509B2 (ja) 1989-03-01 1998-02-18 三菱化学株式会社 ジチオカーバメート基含有ポリシロキサン
EP0401165B1 (de) * 1989-06-01 1994-11-30 Ciba-Geigy Ag Neue sauerstoffhaltige Titanocene und deren Verwendung
DE4007428A1 (de) * 1990-03-09 1991-09-12 Hoechst Ag Photopolymerisierbares gemisch und daraus hergestelltes aufzeichnungsmaterial
JP2801755B2 (ja) * 1990-08-29 1998-09-21 日本化薬株式会社 正帯電性電子写真用トナー
JP2826680B2 (ja) * 1990-10-09 1998-11-18 コニカ株式会社 プラスチックフィルム又はコート紙
US5086192A (en) * 1990-12-14 1992-02-04 Minnesota Mining And Manufacturing Company Photopolymerizable compositions and photoinitiators therefor
JPH06263813A (ja) 1993-03-12 1994-09-20 Toyo Ink Mfg Co Ltd 光開始剤組成物および光硬化性被覆組成物
JPH06263814A (ja) 1993-03-12 1994-09-20 Toyo Ink Mfg Co Ltd 光開始剤組成物および光硬化性被覆組成物
JPH06263811A (ja) 1993-03-12 1994-09-20 Toyo Ink Mfg Co Ltd 光開始剤組成物および光硬化性被覆組成物
JPH06263812A (ja) 1993-03-12 1994-09-20 Toyo Ink Mfg Co Ltd 共重合性光開始剤組成物および光硬化性被覆組成物
TW328535B (en) 1993-07-02 1998-03-21 Novartis Ag Functional photoinitiators and their manufacture
GB2280905A (en) 1993-08-06 1995-02-15 Coates Brothers Plc Ethylenically unsaturated photoinitiator
JP3413267B2 (ja) * 1993-12-01 2003-06-03 竹本油脂株式会社 ラジカル硬化性樹脂の硬化収縮及びその硬化物の強度低下防止方法
DE4435487A1 (de) * 1994-10-04 1996-04-11 Hoechst Ag Mit Silikonen kompatible Photoinitiatoren und diese enthaltende lichtempfindliche Gemische
TW434456B (en) 1994-12-30 2001-05-16 Novartis Ag A compound as functionalized photoinitiator, its production process, its corresponding oligomers or polymers and its application in coating a substrate
ATE225052T1 (de) * 1995-07-19 2002-10-15 Ciba Sc Holding Ag Heterogene photoinitiatoren, photopolymerisierbare zusammensetzungen und deren verwendung
US6369123B1 (en) 1995-08-14 2002-04-09 3M Innovative Properties Company Radiation-crosslinkable elastomers and photocrosslinkers therefor
GB9522683D0 (en) 1995-11-06 1996-01-10 Coates Brothers Plc Photoinitiator
EP0798599B9 (de) * 1996-03-27 2002-08-07 Canon Kabushiki Kaisha Elektrophotographisches photoempfindliches Element, elektrophotographischer Apparat und Prozesskassette unter Verwendung desselben
US6139770A (en) * 1997-05-16 2000-10-31 Chevron Chemical Company Llc Photoinitiators and oxygen scavenging compositions
JP4038600B2 (ja) * 1997-06-02 2008-01-30 日油株式会社 ヒドロキシアルキルフェノン誘導体及びその用途
JP3576862B2 (ja) * 1998-04-28 2004-10-13 キヤノン株式会社 インク、画像形成方法及び光重合開始剤

Also Published As

Publication number Publication date
CN1377362A (zh) 2002-10-30
EP1200448B1 (de) 2004-12-15
EP1200448A1 (de) 2002-05-02
US6849668B1 (en) 2005-02-01
AU6456200A (en) 2001-03-05
ES2233419T3 (es) 2005-06-16
GB2352718A (en) 2001-02-07
JP2003506532A (ja) 2003-02-18
DE60016757D1 (de) 2005-01-20
CN1196705C (zh) 2005-04-13
DE60016757T2 (de) 2005-12-01
WO2001010872A1 (en) 2001-02-15
GB9918419D0 (en) 1999-10-06

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Legal Events

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RER Ceased as to paragraph 5 lit. 3 law introducing patent treaties