ATE304279T1 - Keramischer heizer. - Google Patents

Keramischer heizer.

Info

Publication number
ATE304279T1
ATE304279T1 AT00948352T AT00948352T ATE304279T1 AT E304279 T1 ATE304279 T1 AT E304279T1 AT 00948352 T AT00948352 T AT 00948352T AT 00948352 T AT00948352 T AT 00948352T AT E304279 T1 ATE304279 T1 AT E304279T1
Authority
AT
Austria
Prior art keywords
ceramic heater
ceramic
heater
ceramic substrate
rmax
Prior art date
Application number
AT00948352T
Other languages
English (en)
Inventor
Yasutaka Ito
Yasuji Hiramatsu
Original Assignee
Ibiden Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ibiden Co Ltd filed Critical Ibiden Co Ltd
Application granted granted Critical
Publication of ATE304279T1 publication Critical patent/ATE304279T1/de

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/04—Apparatus for manufacture or treatment
    • H10P72/0431—Apparatus for thermal treatment
    • H10P72/0434—Apparatus for thermal treatment mainly by convection
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B3/00—Ohmic-resistance heating
    • H05B3/10—Heating elements characterised by the composition or nature of the materials or by the arrangement of the conductor
    • H05B3/12—Heating elements characterised by the composition or nature of the materials or by the arrangement of the conductor characterised by the composition or nature of the conductive material
    • H05B3/14—Heating elements characterised by the composition or nature of the materials or by the arrangement of the conductor characterised by the composition or nature of the conductive material the material being non-metallic
    • H05B3/141—Conductive ceramics, e.g. metal oxides, metal carbides, barium titanate, ferrites, zirconia, vitrous compounds
    • H05B3/143—Conductive ceramics, e.g. metal oxides, metal carbides, barium titanate, ferrites, zirconia, vitrous compounds applied to semiconductors, e.g. wafers heating
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B3/00—Ohmic-resistance heating
    • H05B3/20—Heating elements having extended surface area substantially in a two-dimensional [2D] plane, e.g. plate-heater
    • H05B3/22—Heating elements having extended surface area substantially in a two-dimensional [2D] plane, e.g. plate-heater non-flexible
    • H05B3/26—Heating elements having extended surface area substantially in a two-dimensional [2D] plane, e.g. plate-heater non-flexible heating conductor mounted on insulating base
    • H05B3/265—Heating elements having extended surface area substantially in a two-dimensional [2D] plane, e.g. plate-heater non-flexible heating conductor mounted on insulating base the insulating base being an inorganic material, e.g. ceramic
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B3/00—Ohmic-resistance heating
    • H05B3/20—Heating elements having extended surface area substantially in a two-dimensional [2D] plane, e.g. plate-heater
    • H05B3/22—Heating elements having extended surface area substantially in a two-dimensional [2D] plane, e.g. plate-heater non-flexible
    • H05B3/28—Heating elements having extended surface area substantially in a two-dimensional [2D] plane, e.g. plate-heater non-flexible heating conductor embedded in insulating material
    • H05B3/283—Heating elements having extended surface area substantially in a two-dimensional [2D] plane, e.g. plate-heater non-flexible heating conductor embedded in insulating material the insulating material being an inorganic material, e.g. ceramic
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B3/00—Ohmic-resistance heating
    • H05B3/68—Heating arrangements specially adapted for cooking plates or analogous hot-plates
    • H05B3/74—Non-metallic plates, e.g. vitroceramic, ceramic or glassceramic hobs, also including power or control circuits
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/04—Apparatus for manufacture or treatment
    • H10P72/0431—Apparatus for thermal treatment
    • H10P72/0432—Apparatus for thermal treatment mainly by conduction

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Ceramic Engineering (AREA)
  • Inorganic Chemistry (AREA)
  • Resistance Heating (AREA)
  • Surface Heating Bodies (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
AT00948352T 1999-08-09 2000-08-01 Keramischer heizer. ATE304279T1 (de)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP22569699 1999-08-09
JP2000131210A JP2001118664A (ja) 1999-08-09 2000-04-28 セラミックヒータ
PCT/JP2000/005156 WO2001011923A1 (en) 1999-08-09 2000-08-01 Ceramic heater

Publications (1)

Publication Number Publication Date
ATE304279T1 true ATE304279T1 (de) 2005-09-15

Family

ID=26526784

Family Applications (1)

Application Number Title Priority Date Filing Date
AT00948352T ATE304279T1 (de) 1999-08-09 2000-08-01 Keramischer heizer.

Country Status (7)

Country Link
US (3) US6465763B1 (de)
EP (2) EP1185145B1 (de)
JP (1) JP2001118664A (de)
AT (1) ATE304279T1 (de)
DE (1) DE60022495T2 (de)
TW (1) TW480895B (de)
WO (1) WO2001011923A1 (de)

Families Citing this family (77)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2000069219A1 (en) * 1999-05-07 2000-11-16 Ibiden Co., Ltd. Hot plate and method of producing the same
JP2001118664A (ja) * 1999-08-09 2001-04-27 Ibiden Co Ltd セラミックヒータ
JP2001118662A (ja) 1999-08-09 2001-04-27 Ibiden Co Ltd セラミックヒータ
US6835916B2 (en) 1999-08-09 2004-12-28 Ibiden, Co., Ltd Ceramic heater
US6717116B1 (en) * 1999-08-10 2004-04-06 Ibiden Co., Ltd. Semiconductor production device ceramic plate
JP3381909B2 (ja) * 1999-08-10 2003-03-04 イビデン株式会社 半導体製造・検査装置用セラミックヒータ
JP3273773B2 (ja) * 1999-08-12 2002-04-15 イビデン株式会社 半導体製造・検査装置用セラミックヒータ、半導体製造・検査装置用静電チャックおよびウエハプローバ用チャックトップ
US6900149B1 (en) * 1999-09-06 2005-05-31 Ibiden Co., Ltd. Carbon-containing aluminum nitride sintered compact and ceramic substrate for use in equipment for manufacturing or inspecting semiconductor
EP1383167A1 (de) 1999-12-09 2004-01-21 Ibiden Co., Ltd. Keramische scheibe für ein halbleitererzeugungs/inspektionsgerät
JP2001237053A (ja) * 1999-12-14 2001-08-31 Ibiden Co Ltd 半導体製造・検査装置用セラミックヒータおよび支持ピン
US20040222211A1 (en) * 1999-12-28 2004-11-11 Ibiden Co., Ltd. Carbon-containing aluminum nitride sintered body, and ceramic substrate for a semiconductor producing/examining device
US20040016746A1 (en) * 1999-12-29 2004-01-29 Ibiden Co., Ltd. Ceramic heater
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EP1193233A1 (de) 2000-02-07 2002-04-03 Ibiden Co., Ltd. Keramisches substrat zur herstellung von halbleitern/inspektions vorrichtung
US7011874B2 (en) * 2000-02-08 2006-03-14 Ibiden Co., Ltd. Ceramic substrate for semiconductor production and inspection devices
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WO2001066488A1 (en) 2000-03-07 2001-09-13 Ibiden Co., Ltd. Ceramic substrate for manufacture/inspection of semiconductor
JP2001253777A (ja) * 2000-03-13 2001-09-18 Ibiden Co Ltd セラミック基板
US20040149718A1 (en) * 2000-04-07 2004-08-05 Yasutaka Ito Ceramic heater
EP1233651A1 (de) * 2000-04-07 2002-08-21 Ibiden Co., Ltd. Keramisches heizelement
JP3565496B2 (ja) * 2000-04-13 2004-09-15 イビデン株式会社 セラミックヒータ、静電チャックおよびウエハプローバ
JP2001302330A (ja) 2000-04-24 2001-10-31 Ibiden Co Ltd セラミック基板
JP2002025758A (ja) * 2000-05-02 2002-01-25 Ibiden Co Ltd ホットプレートユニット
EP1225790A1 (de) * 2000-05-02 2002-07-24 Ibiden Co., Ltd. Keramisches heizelement
WO2001086717A1 (en) 2000-05-10 2001-11-15 Ibiden Co., Ltd. Electrostatic chuck
US7071551B2 (en) * 2000-05-26 2006-07-04 Ibiden Co., Ltd. Device used to produce or examine semiconductors
JP3618640B2 (ja) * 2000-06-15 2005-02-09 イビデン株式会社 半導体製造・検査装置用ホットプレート
JP3516392B2 (ja) * 2000-06-16 2004-04-05 イビデン株式会社 半導体製造・検査装置用ホットプレート
WO2002003434A1 (fr) * 2000-07-03 2002-01-10 Ibiden Co., Ltd. Radiateur ceramique pour appareil de fabrication ou de test de semi-conducteurs
WO2002003435A1 (en) * 2000-07-04 2002-01-10 Ibiden Co., Ltd. Hot plate for semiconductor manufacture and testing
US6967312B2 (en) * 2000-07-19 2005-11-22 Ibiden Co., Ltd. Semiconductor manufacturing/testing ceramic heater, production method for the ceramic heater and production system for the ceramic heater
WO2002009171A1 (en) * 2000-07-25 2002-01-31 Ibiden Co., Ltd. Ceramic substrate for semiconductor manufacture/inspection apparatus, ceramic heater, electrostatic clampless holder, and substrate for wafer prober
US6878906B2 (en) 2000-08-30 2005-04-12 Ibiden Co., Ltd. Ceramic heater for semiconductor manufacturing and inspecting equipment
JP2002076102A (ja) * 2000-08-31 2002-03-15 Ibiden Co Ltd セラミック基板
US20040035846A1 (en) * 2000-09-13 2004-02-26 Yasuji Hiramatsu Ceramic heater for semiconductor manufacturing and inspecting equipment
JP2002160974A (ja) * 2000-11-22 2002-06-04 Ibiden Co Ltd 窒化アルミニウム焼結体、窒化アルミニウム焼結体の製造方法、セラミック基板およびセラミック基板の製造方法
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WO2002047129A1 (en) * 2000-12-05 2002-06-13 Ibiden Co., Ltd. Ceramic substrate for semiconductor manufacturing and inspecting devices, and method of manufacturing the ceramic substrate
US20040206747A1 (en) * 2001-04-11 2004-10-21 Yasutaka Ito Ceramic heater for semiconductor manufacturing/inspecting apparatus
JP2002313890A (ja) * 2001-04-11 2002-10-25 Sumitomo Electric Ind Ltd 被加熱物搭載用ヒータ部材およびそれを用いた基板処理装置
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CN1473452A (zh) * 2001-07-09 2004-02-04 IBIDEN�ɷ����޹�˾ 陶瓷加热器与陶瓷接合体
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JP6401638B2 (ja) * 2015-03-17 2018-10-10 株式会社Kelk 加熱装置
JP6804828B2 (ja) * 2015-04-20 2020-12-23 日本特殊陶業株式会社 セラミックヒータ及び静電チャック
JP6758143B2 (ja) * 2016-09-29 2020-09-23 日本特殊陶業株式会社 加熱装置
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Also Published As

Publication number Publication date
WO2001011923A1 (en) 2001-02-15
US6465763B1 (en) 2002-10-15
EP1185145A1 (de) 2002-03-06
US6710307B2 (en) 2004-03-23
TW480895B (en) 2002-03-21
US20040045951A1 (en) 2004-03-11
EP1185145B1 (de) 2005-09-07
JP2001118664A (ja) 2001-04-27
DE60022495D1 (de) 2005-10-13
EP1437917A1 (de) 2004-07-14
US20020158061A1 (en) 2002-10-31
EP1185145A4 (de) 2003-01-15
DE60022495T2 (de) 2006-06-29
US6861620B2 (en) 2005-03-01

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