ATE315255T1 - Hochvakuum-mikromühle mit fokusiertem ionenstrahl und damit erzeugte artikel - Google Patents

Hochvakuum-mikromühle mit fokusiertem ionenstrahl und damit erzeugte artikel

Info

Publication number
ATE315255T1
ATE315255T1 AT96906225T AT96906225T ATE315255T1 AT E315255 T1 ATE315255 T1 AT E315255T1 AT 96906225 T AT96906225 T AT 96906225T AT 96906225 T AT96906225 T AT 96906225T AT E315255 T1 ATE315255 T1 AT E315255T1
Authority
AT
Austria
Prior art keywords
ion beam
focused ion
high vacuum
produced therefrom
articles produced
Prior art date
Application number
AT96906225T
Other languages
English (en)
Inventor
Bruce C Lamartine
Roger A Stutz
Original Assignee
Univ California
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Univ California filed Critical Univ California
Application granted granted Critical
Publication of ATE315255T1 publication Critical patent/ATE315255T1/de

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/305—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating, or etching
    • H01J37/3053—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating, or etching for evaporating or etching
    • H01J37/3056—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating, or etching for evaporating or etching for microworking, e. g. etching of gratings or trimming of electrical components
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/30—Electron or ion beam tubes for processing objects
    • H01J2237/304—Controlling tubes
    • H01J2237/30405—Details
    • H01J2237/30411—Details using digital signal processors [DSP]

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Welding Or Cutting Using Electron Beams (AREA)
  • Image Processing (AREA)
  • Physical Vapour Deposition (AREA)
  • Grinding And Polishing Of Tertiary Curved Surfaces And Surfaces With Complex Shapes (AREA)
  • Electron Beam Exposure (AREA)
  • Magnetic Record Carriers (AREA)
  • Polishing Bodies And Polishing Tools (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
  • Disintegrating Or Milling (AREA)
  • Sampling And Sample Adjustment (AREA)
AT96906225T 1995-02-01 1996-02-01 Hochvakuum-mikromühle mit fokusiertem ionenstrahl und damit erzeugte artikel ATE315255T1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US08/382,345 US5721687A (en) 1995-02-01 1995-02-01 Ultrahigh vacuum focused ion beam micromill and articles therefrom

Publications (1)

Publication Number Publication Date
ATE315255T1 true ATE315255T1 (de) 2006-02-15

Family

ID=23508546

Family Applications (1)

Application Number Title Priority Date Filing Date
AT96906225T ATE315255T1 (de) 1995-02-01 1996-02-01 Hochvakuum-mikromühle mit fokusiertem ionenstrahl und damit erzeugte artikel

Country Status (11)

Country Link
US (1) US5721687A (de)
EP (1) EP0755547B1 (de)
JP (1) JPH09511691A (de)
CN (1) CN1150482C (de)
AT (1) ATE315255T1 (de)
AU (1) AU708885B2 (de)
BR (1) BR9605801A (de)
CA (1) CA2186893A1 (de)
DE (1) DE69635701D1 (de)
MX (1) MX9604457A (de)
WO (1) WO1996024107A1 (de)

Families Citing this family (26)

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Publication number Priority date Publication date Assignee Title
US5892235A (en) * 1996-05-15 1999-04-06 Semiconductor Energy Laboratory Co., Ltd. Apparatus and method for doping
US7118996B1 (en) 1996-05-15 2006-10-10 Semiconductor Energy Laboratory Co., Ltd. Apparatus and method for doping
US6230071B1 (en) 1996-05-24 2001-05-08 The Regents Of The University Of California Depth enhancement of ion sensitized data
IL124592A (en) 1997-05-23 2002-07-25 Gersan Ets Method of marking a gemstone or diamond
WO2000013916A1 (en) * 1998-09-08 2000-03-16 Commonwealth Scientific And Industrial Research Organisation Three-dimensional microstructure
US6442296B1 (en) * 1998-11-06 2002-08-27 Storage Technology Corporation Archival information storage on optical medium in human and machine readable format
US6629292B1 (en) 2000-10-06 2003-09-30 International Business Machines Corporation Method for forming graphical images in semiconductor devices
US6583933B2 (en) 2001-05-16 2003-06-24 The Regents Of The University Of California Reflective diffraction grating
US7141812B2 (en) * 2002-06-05 2006-11-28 Mikro Systems, Inc. Devices, methods, and systems involving castings
US7785098B1 (en) 2001-06-05 2010-08-31 Mikro Systems, Inc. Systems for large area micro mechanical systems
CA2448736C (en) * 2001-06-05 2010-08-10 Mikro Systems, Inc. Methods for manufacturing three-dimensional devices and devices created thereby
FR2823008A1 (fr) * 2001-08-06 2002-10-04 Centre Nat Rech Scient Procede de reglage d'un faisceau d'ions
US7294446B2 (en) * 2001-10-29 2007-11-13 Eastman Kodak Company Digital analog recording using near field optical imaging
FR2832546B1 (fr) * 2001-11-20 2008-04-04 Centre Nat Rech Scient Dispositif de reglage d'un appareil de generation d'un faisceau de particules chargees
US6624385B2 (en) * 2001-12-21 2003-09-23 Eastman Kodak Company Method for marking gemstones with a unique micro discrete indicia
JP2004171358A (ja) * 2002-11-21 2004-06-17 Mitsubishi Electric Corp 解析メッシュデータ生成方法、解析メッシュデータ生成装置およびその方法をコンピュータに実行させるプログラム
JP5101845B2 (ja) * 2006-08-21 2012-12-19 エスアイアイ・ナノテクノロジー株式会社 集束イオンビーム装置ならびにそれを用いた試料断面作製方法および薄片試料作製方法
JP2009088500A (ja) * 2007-09-14 2009-04-23 Semiconductor Energy Lab Co Ltd Ｓｏｉ基板の作製方法
US9315663B2 (en) * 2008-09-26 2016-04-19 Mikro Systems, Inc. Systems, devices, and/or methods for manufacturing castings
JP5397952B2 (ja) * 2010-03-17 2014-01-22 株式会社東京ユニーク 本玩具
US8813824B2 (en) 2011-12-06 2014-08-26 Mikro Systems, Inc. Systems, devices, and/or methods for producing holes
US8502172B1 (en) * 2012-06-26 2013-08-06 Fei Company Three dimensional fiducial
US9216144B2 (en) 2013-03-28 2015-12-22 The Procter & Gamble Company Hair treatment process providing dispersed colors by light diffraction
CN103495907B (zh) * 2013-09-24 2015-12-02 中国科学院高能物理研究所 一种利用离子束刻蚀技术抛光微结构侧壁的方法
CN103738915B (zh) * 2014-01-03 2015-10-28 中国科学院上海光学精密机械研究所 三维晶体光学回音壁微腔的制备方法
GB2600911A (en) * 2020-09-14 2022-05-18 Univ Surrey Apparatus for assessing touch sensitivity

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1804646B2 (de) * 1968-10-18 1973-03-22 Siemens AG, 1000 Berlin u. 8000 München Korpuskularstrahl-bearbeitungsgeraet
JPH0536128A (ja) * 1990-12-20 1993-02-12 Hitachi Ltd 高密度情報記録媒体及びそれを用いた記録装置
JP3192500B2 (ja) * 1992-11-19 2001-07-30 株式会社日立製作所 電子線描画方法および電子線描画装置
US5401972A (en) * 1993-09-02 1995-03-28 Schlumberger Technologies, Inc. Layout overlay for FIB operations
US5453594A (en) * 1993-10-06 1995-09-26 Electro Scientific Industries, Inc. Radiation beam position and emission coordination system

Also Published As

Publication number Publication date
CA2186893A1 (en) 1996-08-08
EP0755547A1 (de) 1997-01-29
BR9605801A (pt) 1997-08-05
MX9604457A (es) 1997-12-31
DE69635701D1 (de) 2006-03-30
EP0755547B1 (de) 2006-01-04
AU708885B2 (en) 1999-08-12
US5721687A (en) 1998-02-24
JPH09511691A (ja) 1997-11-25
CN1150482C (zh) 2004-05-19
CN1148436A (zh) 1997-04-23
WO1996024107A1 (en) 1996-08-08
EP0755547A4 (de) 2000-11-29
AU4967796A (en) 1996-08-21

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Legal Events

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