ATE321627T1 - Verfahren zum polieren eines wafers und verfahren zur herstellung eines integrierten schaltkreises - Google Patents

Verfahren zum polieren eines wafers und verfahren zur herstellung eines integrierten schaltkreises

Info

Publication number
ATE321627T1
ATE321627T1 AT96908448T AT96908448T ATE321627T1 AT E321627 T1 ATE321627 T1 AT E321627T1 AT 96908448 T AT96908448 T AT 96908448T AT 96908448 T AT96908448 T AT 96908448T AT E321627 T1 ATE321627 T1 AT E321627T1
Authority
AT
Austria
Prior art keywords
pad
manufacturing
wafer
pads
polyurethane
Prior art date
Application number
AT96908448T
Other languages
English (en)
Inventor
Scott G Meikle
Guy F Hudson
Original Assignee
Micron Technology Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Micron Technology Inc filed Critical Micron Technology Inc
Application granted granted Critical
Publication of ATE321627T1 publication Critical patent/ATE321627T1/de

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/62—Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light
    • G01N21/63—Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light optically excited
    • G01N21/64—Fluorescence; Phosphorescence
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00—Lapping machines or devices; Accessories
    • B24B37/11—Lapping tools
    • B24B37/20—Lapping pads for working plane surfaces
    • B24B37/24—Lapping pads for working plane surfaces characterised by the composition or properties of the pad materials
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B49/00—Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation
    • B24B49/12—Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation involving optical means
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B53/00—Devices or means for dressing or conditioning abrasive surfaces
    • B24B53/017—Devices or means for dressing, cleaning or otherwise conditioning lapping tools
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24D—TOOLS FOR GRINDING, BUFFING OR SHARPENING
    • B24D18/00—Manufacture of grinding tools or other grinding devices, e.g. wheels, not otherwise provided for

Landscapes

  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Health & Medical Sciences (AREA)
  • General Health & Medical Sciences (AREA)
  • Pathology (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • Nuclear Medicine, Radiotherapy & Molecular Imaging (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Physics & Mathematics (AREA)
  • Mechanical Treatment Of Semiconductor (AREA)
  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
  • Grinding-Machine Dressing And Accessory Apparatuses (AREA)
  • Polyurethanes Or Polyureas (AREA)
  • Investigating, Analyzing Materials By Fluorescence Or Luminescence (AREA)
  • Encapsulation Of And Coatings For Semiconductor Or Solid State Devices (AREA)
AT96908448T 1995-02-09 1996-01-30 Verfahren zum polieren eines wafers und verfahren zur herstellung eines integrierten schaltkreises ATE321627T1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US08/386,023 US5698455A (en) 1995-02-09 1995-02-09 Method for predicting process characteristics of polyurethane pads

Publications (1)

Publication Number Publication Date
ATE321627T1 true ATE321627T1 (de) 2006-04-15

Family

ID=23523837

Family Applications (1)

Application Number Title Priority Date Filing Date
AT96908448T ATE321627T1 (de) 1995-02-09 1996-01-30 Verfahren zum polieren eines wafers und verfahren zur herstellung eines integrierten schaltkreises

Country Status (8)

Country Link
US (3) US5698455A (de)
EP (1) EP0809798B1 (de)
JP (1) JP3203254B2 (de)
KR (1) KR100236499B1 (de)
AT (1) ATE321627T1 (de)
AU (1) AU5168396A (de)
DE (1) DE69635984T2 (de)
WO (1) WO1996024839A2 (de)

Families Citing this family (30)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5698455A (en) 1995-02-09 1997-12-16 Micron Technologies, Inc. Method for predicting process characteristics of polyurethane pads
US6075606A (en) 1996-02-16 2000-06-13 Doan; Trung T. Endpoint detector and method for measuring a change in wafer thickness in chemical-mechanical polishing of semiconductor wafers and other microelectronic substrates
KR100524510B1 (ko) 1996-06-25 2006-01-12 가부시키가이샤 에바라 세이사꾸쇼 연마포를드레싱하는방법과장치
US6408220B1 (en) * 1999-06-01 2002-06-18 Applied Materials, Inc. Semiconductor processing techniques
US6361409B1 (en) * 1999-09-28 2002-03-26 Rodel Holdings Inc. Polymeric polishing pad having improved surface layer and method of making same
US6560503B1 (en) * 1999-10-05 2003-05-06 Advanced Micro Devices, Inc. Method and apparatus for monitoring controller performance using statistical process control
US20020068516A1 (en) * 1999-12-13 2002-06-06 Applied Materials, Inc Apparatus and method for controlled delivery of slurry to a region of a polishing device
US6449524B1 (en) * 2000-01-04 2002-09-10 Advanced Micro Devices, Inc. Method and apparatus for using equipment state data for run-to-run control of manufacturing tools
US6498101B1 (en) 2000-02-28 2002-12-24 Micron Technology, Inc. Planarizing pads, planarizing machines and methods for making and using planarizing pads in mechanical and chemical-mechanical planarization of microelectronic device substrate assemblies
US6313038B1 (en) 2000-04-26 2001-11-06 Micron Technology, Inc. Method and apparatus for controlling chemical interactions during planarization of microelectronic substrates
US6612901B1 (en) 2000-06-07 2003-09-02 Micron Technology, Inc. Apparatus for in-situ optical endpointing of web-format planarizing machines in mechanical or chemical-mechanical planarization of microelectronic-device substrate assemblies
US6520834B1 (en) 2000-08-09 2003-02-18 Micron Technology, Inc. Methods and apparatuses for analyzing and controlling performance parameters in mechanical and chemical-mechanical planarization of microelectronic substrates
US6838382B1 (en) 2000-08-28 2005-01-04 Micron Technology, Inc. Method and apparatus for forming a planarizing pad having a film and texture elements for planarization of microelectronic substrates
US6736869B1 (en) 2000-08-28 2004-05-18 Micron Technology, Inc. Method for forming a planarizing pad for planarization of microelectronic substrates
US6609947B1 (en) 2000-08-30 2003-08-26 Micron Technology, Inc. Planarizing machines and control systems for mechanical and/or chemical-mechanical planarization of micro electronic substrates
US6592443B1 (en) * 2000-08-30 2003-07-15 Micron Technology, Inc. Method and apparatus for forming and using planarizing pads for mechanical and chemical-mechanical planarization of microelectronic substrates
US6623329B1 (en) 2000-08-31 2003-09-23 Micron Technology, Inc. Method and apparatus for supporting a microelectronic substrate relative to a planarization pad
US6652764B1 (en) 2000-08-31 2003-11-25 Micron Technology, Inc. Methods and apparatuses for making and using planarizing pads for mechanical and chemical-mechanical planarization of microelectronic substrates
US6764574B1 (en) * 2001-03-06 2004-07-20 Psiloquest Polishing pad composition and method of use
US7101799B2 (en) 2001-06-19 2006-09-05 Applied Materials, Inc. Feedforward and feedback control for conditioning of chemical mechanical polishing pad
US6866566B2 (en) 2001-08-24 2005-03-15 Micron Technology, Inc. Apparatus and method for conditioning a contact surface of a processing pad used in processing microelectronic workpieces
US6666749B2 (en) 2001-08-30 2003-12-23 Micron Technology, Inc. Apparatus and method for enhanced processing of microelectronic workpieces
US7341502B2 (en) 2002-07-18 2008-03-11 Micron Technology, Inc. Methods and systems for planarizing workpieces, e.g., microelectronic workpieces
TWI286964B (en) * 2003-03-25 2007-09-21 Neopad Technologies Corp Customized polish pads for chemical mechanical planarization
US7030603B2 (en) 2003-08-21 2006-04-18 Micron Technology, Inc. Apparatuses and methods for monitoring rotation of a conductive microfeature workpiece
US7294049B2 (en) 2005-09-01 2007-11-13 Micron Technology, Inc. Method and apparatus for removing material from microfeature workpieces
US8388614B2 (en) * 2009-09-29 2013-03-05 Covidien Lp Return electrode temperature prediction
JP5479189B2 (ja) * 2010-03-31 2014-04-23 富士紡ホールディングス株式会社 シート材の選択方法
US11260495B2 (en) * 2018-07-27 2022-03-01 Taiwan Semiconductor Manufacturing Company Ltd. Apparatus and methods for chemical mechanical polishing
KR102277418B1 (ko) 2019-05-21 2021-07-14 에스케이씨솔믹스 주식회사 가교 밀도가 향상된 연마패드 및 이의 제조방법

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5081796A (en) * 1990-08-06 1992-01-21 Micron Technology, Inc. Method and apparatus for mechanical planarization and endpoint detection of a semiconductor wafer
US5036015A (en) * 1990-09-24 1991-07-30 Micron Technology, Inc. Method of endpoint detection during chemical/mechanical planarization of semiconductor wafers
DE4102767A1 (de) * 1991-01-31 1992-08-06 Metallgesellschaft Ag Verfahren zur qualitativen analyse von kunststoffteilchen
US5483568A (en) * 1994-11-03 1996-01-09 Kabushiki Kaisha Toshiba Pad condition and polishing rate monitor using fluorescence
US5698455A (en) * 1995-02-09 1997-12-16 Micron Technologies, Inc. Method for predicting process characteristics of polyurethane pads

Also Published As

Publication number Publication date
DE69635984T2 (de) 2007-01-11
WO1996024839A2 (en) 1996-08-15
US6440319B1 (en) 2002-08-27
JPH10508799A (ja) 1998-09-02
EP0809798A2 (de) 1997-12-03
US5698455A (en) 1997-12-16
KR19980702034A (ko) 1998-07-15
US6114706A (en) 2000-09-05
WO1996024839A3 (en) 1996-09-26
DE69635984D1 (de) 2006-05-18
EP0809798B1 (de) 2006-03-29
AU5168396A (en) 1996-08-27
JP3203254B2 (ja) 2001-08-27
KR100236499B1 (ko) 2000-01-15

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