ATE327997T1 - Photostabile, silylierte benzotriazol uv-absorber und zusammensetzungen, die mit diesen stabilisiert werden - Google Patents

Photostabile, silylierte benzotriazol uv-absorber und zusammensetzungen, die mit diesen stabilisiert werden

Info

Publication number
ATE327997T1
ATE327997T1 AT01974090T AT01974090T ATE327997T1 AT E327997 T1 ATE327997 T1 AT E327997T1 AT 01974090 T AT01974090 T AT 01974090T AT 01974090 T AT01974090 T AT 01974090T AT E327997 T1 ATE327997 T1 AT E327997T1
Authority
AT
Austria
Prior art keywords
photostable
absorbers
silylated
compositions stabilized
benzotriazole
Prior art date
Application number
AT01974090T
Other languages
English (en)
Inventor
Ramanathan Ravichandran
Joseph Suhadolnik
Mervin Gale Wood
Rong Xiong
Original Assignee
Ciba Sc Holding Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ciba Sc Holding Ag filed Critical Ciba Sc Holding Ag
Application granted granted Critical
Publication of ATE327997T1 publication Critical patent/ATE327997T1/de

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
    • C07F7/02—Silicon compounds
    • C07F7/08—Compounds having one or more C—Si linkages
    • C07F7/18—Compounds having one or more C—Si linkages as well as one or more C—O—Si linkages
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
    • C07F7/02—Silicon compounds
    • C07F7/08—Compounds having one or more C—Si linkages
    • C07F7/0803—Compounds with Si-C or Si-Si linkages
    • C07F7/081—Compounds with Si-C or Si-Si linkages comprising at least one atom selected from the elements N, O, halogen, S, Se or Te
    • C07F7/0812—Compounds with Si-C or Si-Si linkages comprising at least one atom selected from the elements N, O, halogen, S, Se or Te comprising a heterocyclic ring
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D249/00—Heterocyclic compounds containing five-membered rings having three nitrogen atoms as the only ring hetero atoms
    • C07D249/16—Heterocyclic compounds containing five-membered rings having three nitrogen atoms as the only ring hetero atoms condensed with carbocyclic rings or ring systems
    • C07D249/18—Benzotriazoles
    • C07D249/20—Benzotriazoles with aryl radicals directly attached in position 2
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
    • C07F7/02—Silicon compounds
    • C07F7/08—Compounds having one or more C—Si linkages
    • C07F7/18—Compounds having one or more C—Si linkages as well as one or more C—O—Si linkages
    • C07F7/1804—Compounds having Si-O-C linkages
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00—Use of organic ingredients
    • C08K5/16—Nitrogen-containing compounds
    • C08K5/34—Heterocyclic compounds having nitrogen in the ring
    • C08K5/3467—Heterocyclic compounds having nitrogen in the ring having more than two nitrogen atoms in the ring
    • C08K5/3472—Five-membered rings
    • C08K5/3475—Five-membered rings condensed with carbocyclic rings
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00—Use of organic ingredients
    • C08K5/54—Silicon-containing compounds
    • C08K5/544—Silicon-containing compounds containing nitrogen
    • C08K5/5477—Silicon-containing compounds containing nitrogen containing nitrogen in a heterocyclic ring

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Paints Or Removers (AREA)
  • Paper (AREA)
AT01974090T 2000-08-03 2001-07-26 Photostabile, silylierte benzotriazol uv-absorber und zusammensetzungen, die mit diesen stabilisiert werden ATE327997T1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US22278300P 2000-08-03 2000-08-03
US30304801P 2001-07-05 2001-07-05

Publications (1)

Publication Number Publication Date
ATE327997T1 true ATE327997T1 (de) 2006-06-15

Family

ID=26917137

Family Applications (1)

Application Number Title Priority Date Filing Date
AT01974090T ATE327997T1 (de) 2000-08-03 2001-07-26 Photostabile, silylierte benzotriazol uv-absorber und zusammensetzungen, die mit diesen stabilisiert werden

Country Status (9)

Country Link
US (1) US6677392B2 (de)
EP (1) EP1305320B1 (de)
JP (1) JP4912561B2 (de)
KR (1) KR20030022347A (de)
AT (1) ATE327997T1 (de)
AU (1) AU2001293708A1 (de)
DE (1) DE60120178T2 (de)
TW (1) TW548303B (de)
WO (1) WO2002012252A1 (de)

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US8053159B2 (en) * 2003-11-18 2011-11-08 Honeywell International Inc. Antireflective coatings for via fill and photolithography applications and methods of preparation thereof
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US20080009211A1 (en) * 2006-07-07 2008-01-10 Matthew Raymond Himes Assemblies useful for the preparation of electronic components and methods for making same
US20090246416A1 (en) * 2006-07-21 2009-10-01 Konica Minolta Opto, Inc. Optical film, method of manufacturing the same, polarizing plate, and liquid crystal display device
JP5190650B2 (ja) * 2007-02-14 2013-04-24 シプロ化成株式会社 ベンゾトリアゾール誘導体化合物
US8642246B2 (en) * 2007-02-26 2014-02-04 Honeywell International Inc. Compositions, coatings and films for tri-layer patterning applications and methods of preparation thereof
US7772355B2 (en) * 2008-01-28 2010-08-10 The United States Of America As Represented By The Secretary Of The Navy Divinylsilane-terminated aromatic ether-aromatic ketone-containing compounds
US8557877B2 (en) 2009-06-10 2013-10-15 Honeywell International Inc. Anti-reflective coatings for optically transparent substrates
JP5907588B2 (ja) * 2011-04-04 2016-04-26 関西ペイント株式会社 シルセスキオキサン化合物及びこれを含むコーティング組成物
US8864898B2 (en) 2011-05-31 2014-10-21 Honeywell International Inc. Coating formulations for optical elements
CN103827126B (zh) * 2011-11-18 2017-05-17 株式会社艾迪科 新型化合物和担载该新型化合物的担载体
JP5910478B2 (ja) * 2012-12-07 2016-04-27 信越化学工業株式会社 樹脂用コーティング剤組成物
US9085692B1 (en) 2014-02-25 2015-07-21 The Government Of The United States Of America, As Represented By The Secretary Of The Navy Synthesis of oligomeric divinyldialkylsilane containing compositions
BR112017010492B1 (pt) 2014-11-20 2022-04-26 Cytec Industries Inc Composição estabilizante, concentrado masterbatch,e, artigo de fabricação
JP6803842B2 (ja) 2015-04-13 2020-12-23 ハネウェル・インターナショナル・インコーポレーテッドＨｏｎｅｙｗｅｌｌ Ｉｎｔｅｒｎａｔｉｏｎａｌ Ｉｎｃ． オプトエレクトロニクス用途のためのポリシロキサン製剤及びコーティング
US10919867B2 (en) 2015-07-07 2021-02-16 3M Innovative Properties Company Substituted benzotriazole phenols
WO2017122503A1 (ja) 2016-01-12 2017-07-20 富士フイルム株式会社 組成物、膜、ガラス物品、化合物、高純度組成物、化合物の製造方法および膜の製造方法
WO2019091995A1 (en) 2017-11-10 2019-05-16 Merck Patent Gmbh Organic semiconducting compounds
EP3578599A1 (de) 2018-06-08 2019-12-11 Cytec Industries Inc. Granulare stabilisatorzusammensetzungen zur verwendung in polymerharzen und verfahren zur herstellung davon
JP7506663B2 (ja) * 2019-04-26 2024-06-26 ミヨシ油脂株式会社 耐熱性と長波長吸収に優れた紫外線吸収剤
CN111548659A (zh) * 2020-06-01 2020-08-18 烟台布莱特光电材料有限公司 一种新型的uv固化物及其制备的mini led荧光膜片
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WO2025056330A1 (en) 2023-09-13 2025-03-20 Cytec Industries Inc. Stabilized polymer compositions with improved color resistance
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Also Published As

Publication number Publication date
JP2004505984A (ja) 2004-02-26
DE60120178D1 (de) 2006-07-06
DE60120178T2 (de) 2007-04-26
AU2001293708A1 (en) 2002-02-18
US6677392B2 (en) 2004-01-13
EP1305320B1 (de) 2006-05-31
KR20030022347A (ko) 2003-03-15
TW548303B (en) 2003-08-21
JP4912561B2 (ja) 2012-04-11
US20020115753A1 (en) 2002-08-22
EP1305320A1 (de) 2003-05-02
WO2002012252A1 (en) 2002-02-14

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