ATE329069T1 - Plattierungsbad und verfahren zur plattierung von zinn-zink legierungen - Google Patents

Plattierungsbad und verfahren zur plattierung von zinn-zink legierungen

Info

Publication number: ATE329069T1
Authority: AT; Austria
Prior art keywords: quaternary ammonium; bath; plating; ammonium polymer; salts
Prior art date: 2000-10-19

Application number

AT01124311T

Other languages

English (en)

Inventor

Vincent C Opaskar

Lee Desmond Capper

Original Assignee

Atotech Deutschland Gmbh

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

2000-10-19

Filing date

2001-10-19

Publication date

2006-06-15

2001-10-19 Application filed by Atotech Deutschland Gmbh filed Critical Atotech Deutschland Gmbh

2006-06-15 Application granted granted Critical

2006-06-15 Publication of ATE329069T1 publication Critical patent/ATE329069T1/de

Links

238000007747 plating Methods 0.000 title abstract 5
229910001297 Zn alloy Inorganic materials 0.000 title abstract 2
GZCWPZJOEIAXRU-UHFFFAOYSA-N tin zinc Chemical compound [Zn].[Sn] GZCWPZJOEIAXRU-UHFFFAOYSA-N 0.000 title abstract 2
238000000034 method Methods 0.000 title 1
229920000642 polymer Polymers 0.000 abstract 5
KRKNYBCHXYNGOX-UHFFFAOYSA-N citric acid Chemical compound OC(=O)CC(O)(C(O)=O)CC(O)=O KRKNYBCHXYNGOX-UHFFFAOYSA-N 0.000 abstract 3
125000001453 quaternary ammonium group Chemical group 0.000 abstract 3
150000003839 salts Chemical class 0.000 abstract 3
ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 abstract 1
239000002253 acid Substances 0.000 abstract 1
150000007513 acids Chemical class 0.000 abstract 1
239000000654 additive Substances 0.000 abstract 1
-1 aliphatic amines Chemical class 0.000 abstract 1
229910045601 alloy Inorganic materials 0.000 abstract 1
239000000956 alloy Substances 0.000 abstract 1
150000003863 ammonium salts Chemical class 0.000 abstract 1
239000008139 complexing agent Substances 0.000 abstract 1
150000001875 compounds Chemical class 0.000 abstract 1
150000004985 diamines Chemical class 0.000 abstract 1
238000004070 electrodeposition Methods 0.000 abstract 1
125000004356 hydroxy functional group Chemical group O* 0.000 abstract 1
125000002768 hydroxyalkyl group Chemical group 0.000 abstract 1
239000002184 metal Substances 0.000 abstract 1
229910052751 metal Inorganic materials 0.000 abstract 1
150000003751 zinc Chemical class 0.000 abstract 1

Classifications

- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/56—Electroplating: Baths therefor from solutions of alloys
- C25D3/60—Electroplating: Baths therefor from solutions of alloys containing more than 50% by weight of tin

Landscapes

Chemical & Material Sciences (AREA)
Engineering & Computer Science (AREA)
Chemical Kinetics & Catalysis (AREA)
Electrochemistry (AREA)
Materials Engineering (AREA)
Metallurgy (AREA)
Organic Chemistry (AREA)
Electroplating And Plating Baths Therefor (AREA)

AT01124311T 2000-10-19 2001-10-19 Plattierungsbad und verfahren zur plattierung von zinn-zink legierungen ATE329069T1 (de)

Applications Claiming Priority (1)

Application Number	Priority Date	Filing Date	Title
US09/691,985 US6436269B1 (en)	2000-10-19	2000-10-19	Plating bath and method for electroplating tin-zinc alloys

Publications (1)

Publication Number	Publication Date
ATE329069T1 true ATE329069T1 (de)	2006-06-15

Family

ID=24778800

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
AT01124311T ATE329069T1 (de)	2000-10-19	2001-10-19	Plattierungsbad und verfahren zur plattierung von zinn-zink legierungen

Country Status (6)

Country	Link
US (1)	US6436269B1 (de)
EP (1)	EP1201789B9 (de)
AT (1)	ATE329069T1 (de)
CA (1)	CA2359444C (de)
DE (1)	DE60120322T2 (de)
ES (1)	ES2263539T3 (de)

Families Citing this family (17)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
KR100470674B1 (ko) *	2000-11-18	2005-03-07	주식회사 포스코	주석-아연 합금전기도금용액용 첨가제, 주석-아연합금전기도금용액 및 이 도금용액을 이용한 주석-아연합금전기도금강판의 제조방법
JP4758614B2 (ja) *	2003-04-07	2011-08-31	ローム・アンド・ハース・エレクトロニック・マテリアルズ，エル．エル．シー．	電気めっき組成物および方法
JP2005060822A (ja) *	2003-08-08	2005-03-10	Rohm & Haas Electronic Materials Llc	複合基体の電気メッキ
US7964083B2 (en) *	2004-03-04	2011-06-21	Taskem, Inc.	Polyamine brightening agent
EP2085502A1 (de)	2008-01-29	2009-08-05	Enthone, Incorporated	Elektrolytzusammensetzung und Verfahren zur Abscheidung einer Zinn-Zink-Legierung
EP2175048A1 (de)	2008-10-13	2010-04-14	Atotech Deutschland Gmbh	Metallplattierungszusammensetzung zur Beschichtung von Blechzinklegierungen auf einem Substrat
EP2292679B1 (de) *	2009-09-08	2020-03-11	ATOTECH Deutschland GmbH	Polymere mit Aminoendgruppen und deren Verwendung als Additive für galvanische Zink- und Zinklegierungsbäder
EP2698449B1 (de) *	2012-08-13	2019-10-02	ATOTECH Deutschland GmbH	Plattierungsbadzusammensetzung für die Tauchplattierung von Gold
CN103757672B (zh) *	2014-01-20	2016-06-29	广州市海科顺表面处理有限公司	一种锌锡合金电镀方法
US9273407B2 (en)	2014-03-17	2016-03-01	Hong Kong Applied Science and Technology Research Institute Company Limited	Additive for electrodeposition
CN104562090A (zh) *	2014-12-30	2015-04-29	昆明理工大学	一种低共熔型离子液体原位电解制备纳米多孔铜的方法
US9783905B2 (en)	2014-12-30	2017-10-10	Rohm and Haas Electronic Mateirals LLC	Reaction products of amino acids and epoxies
US9725816B2 (en)	2014-12-30	2017-08-08	Rohm And Haas Electronic Materials Llc	Amino sulfonic acid based polymers for copper electroplating
US9611560B2 (en)	2014-12-30	2017-04-04	Rohm And Haas Electronic Materials Llc	Sulfonamide based polymers for copper electroplating
CN104894630A (zh) *	2015-05-06	2015-09-09	哈尔滨工业大学	一种离子液体电沉积制备三维锗/碳纳米复合薄膜的方法
CN105063690A (zh) *	2015-08-21	2015-11-18	无锡桥阳机械制造有限公司	一种Sn-Zn合金电镀液
US9809892B1 (en) *	2016-07-18	2017-11-07	Rohm And Haas Electronic Materials Llc	Indium electroplating compositions containing 1,10-phenanthroline compounds and methods of electroplating indium

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
US4157388A (en)	1977-06-23	1979-06-05	The Miranol Chemical Company, Inc.	Hair and fabric conditioning compositions containing polymeric ionenes
JPS6015716B2 (ja)	1977-10-21	1985-04-20	デイツプソ−ル株式会社	錫または錫合金電気めつき用浴の安定化方法
GB2013241B (en)	1977-11-16	1982-03-24	Dipsol Chem	Electroplating bath for depositing tin or tin alloy with brightness
US4614568A (en) *	1983-06-14	1986-09-30	Nihon Kogyo Kabushiki Kaisha	High-speed silver plating and baths therefor
US4717458A (en) *	1986-10-20	1988-01-05	Omi International Corporation	Zinc and zinc alloy electrolyte and process
JP3279353B2 (ja)	1992-09-25	2002-04-30	ディップソール株式会社	錫−亜鉛合金電気めっき浴
US5405523A (en)	1993-12-15	1995-04-11	Taskem Inc.	Zinc alloy plating with quaternary ammonium polymer
US5435898A (en) *	1994-10-25	1995-07-25	Enthone-Omi Inc.	Alkaline zinc and zinc alloy electroplating baths and processes
DE4446329A1 (de) *	1994-12-23	1996-06-27	Basf Ag	Salze aromatischer Hydroxylverbindungen und deren Verwendung als Glanzbildner
US6143160A (en)	1998-09-18	2000-11-07	Pavco, Inc.	Method for improving the macro throwing power for chloride zinc electroplating baths

2000
- 2000-10-19 US US09/691,985 patent/US6436269B1/en not_active Expired - Lifetime
2001
- 2001-10-17 CA CA2359444A patent/CA2359444C/en not_active Expired - Fee Related
- 2001-10-19 ES ES01124311T patent/ES2263539T3/es not_active Expired - Lifetime
- 2001-10-19 AT AT01124311T patent/ATE329069T1/de not_active IP Right Cessation
- 2001-10-19 EP EP01124311A patent/EP1201789B9/de not_active Expired - Lifetime
- 2001-10-19 DE DE60120322T patent/DE60120322T2/de not_active Expired - Lifetime

Also Published As

Publication number	Publication date
US6436269B1 (en)	2002-08-20
ES2263539T3 (es)	2006-12-16
EP1201789A3 (de)	2002-05-08
CA2359444A1 (en)	2002-04-19
EP1201789A2 (de)	2002-05-02
DE60120322D1 (de)	2006-07-20
EP1201789B1 (de)	2006-06-07
DE60120322T2 (de)	2007-06-06
EP1201789B9 (de)	2006-11-15
CA2359444C (en)	2010-06-29

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Legal Events

Date	Code	Title	Description
2006-12-15	RER	Ceased as to paragraph 5 lit. 3 law introducing patent treaties