ATE339460T1 - Strahlenhärtbare zusammensetzung um gefärbte dreidimensionale objekte anzufertigen - Google Patents

Strahlenhärtbare zusammensetzung um gefärbte dreidimensionale objekte anzufertigen

Info

Publication number
ATE339460T1
ATE339460T1 AT02783838T AT02783838T ATE339460T1 AT E339460 T1 ATE339460 T1 AT E339460T1 AT 02783838 T AT02783838 T AT 02783838T AT 02783838 T AT02783838 T AT 02783838T AT E339460 T1 ATE339460 T1 AT E339460T1
Authority
AT
Austria
Prior art keywords
dimensional objects
cured composition
color
radiation cured
producing colored
Prior art date
Application number
AT02783838T
Other languages
English (en)
Inventor
Glen Anthony Thommes
John Alan Lawton
Xiaorong You
Original Assignee
Dsm Ip Assets Bv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=23301454&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=ATE339460(T1) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by Dsm Ip Assets Bv filed Critical Dsm Ip Assets Bv
Application granted granted Critical
Publication of ATE339460T1 publication Critical patent/ATE339460T1/de

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G65/00—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule
    • C08G65/02—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from cyclic ethers by opening of the heterocyclic ring
    • C08G65/04—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from cyclic ethers by opening of the heterocyclic ring from cyclic ethers only
    • C08G65/06—Cyclic ethers having no atoms other than carbon and hydrogen outside the ring
    • C08G65/08—Saturated oxiranes
    • C08G65/10—Saturated oxiranes characterised by the catalysts used
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
    • C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
    • C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
    • C08G59/68—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the catalysts used
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G65/00—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule
    • C08G65/02—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from cyclic ethers by opening of the heterocyclic ring
    • C08G65/04—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from cyclic ethers by opening of the heterocyclic ring from cyclic ethers only
    • C08G65/06—Cyclic ethers having no atoms other than carbon and hydrogen outside the ring
    • C08G65/08—Saturated oxiranes
    • C08G65/10—Saturated oxiranes characterised by the catalysts used
    • C08G65/105—Onium compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0037—Production of three-dimensional images
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/105—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G2650/00—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule
    • C08G2650/02—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule characterized by the type of post-polymerisation functionalisation
    • C08G2650/16—Photopolymerisation

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Epoxy Resins (AREA)
  • Polymerisation Methods In General (AREA)
  • Paints Or Removers (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
AT02783838T 2001-11-27 2002-11-27 Strahlenhärtbare zusammensetzung um gefärbte dreidimensionale objekte anzufertigen ATE339460T1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US33313801P 2001-11-27 2001-11-27

Publications (1)

Publication Number Publication Date
ATE339460T1 true ATE339460T1 (de) 2006-10-15

Family

ID=23301454

Family Applications (1)

Application Number Title Priority Date Filing Date
AT02783838T ATE339460T1 (de) 2001-11-27 2002-11-27 Strahlenhärtbare zusammensetzung um gefärbte dreidimensionale objekte anzufertigen

Country Status (10)

Country Link
US (4) US20030149124A1 (de)
EP (1) EP1448654B1 (de)
JP (1) JP2005510603A (de)
KR (1) KR20040066846A (de)
CN (1) CN1283685C (de)
AT (1) ATE339460T1 (de)
AU (1) AU2002347659A1 (de)
DE (1) DE60214754T2 (de)
ES (1) ES2272787T3 (de)
WO (1) WO2003046042A1 (de)

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JP2005529200A (ja) * 2002-05-03 2005-09-29 ディーエスエム アイピー アセッツ ビー．ブイ． 照射硬化可能な樹脂組成物及びそれを用いるラピッドプロトタイピング法
US20040137368A1 (en) * 2003-01-13 2004-07-15 3D Systems, Inc. Stereolithographic resins containing selected oxetane compounds
DE112004001165T5 (de) * 2003-06-25 2006-05-04 Cmet Inc., Yokohama Durch aktinische Strahlung härtbare stereolithographische Harzzusammensetzung mit verbesserter Stabilität
EP1502922A1 (de) * 2003-07-30 2005-02-02 Loctite (R & D) Limited Vernetzbare Zusammensetzungen für Verkapselungen
US20050040562A1 (en) * 2003-08-19 2005-02-24 3D Systems Inc. Nanoparticle-filled stereolithographic resins
US7232850B2 (en) * 2003-10-03 2007-06-19 Huntsman Advanced Materials Americas Inc. Photocurable compositions for articles having stable tensile properties
CN102621814A (zh) * 2005-04-19 2012-08-01 日产化学工业株式会社 用于形成光交联固化的抗蚀剂下层膜的抗蚀剂下层膜形成组合物
US7691557B2 (en) * 2005-06-29 2010-04-06 Dymax Corporation Polymerizable composition exhibiting permanent color change as cure indicator
US20070178271A1 (en) * 2006-01-31 2007-08-02 Gore Makarand P Optical recording medium
US20080103226A1 (en) 2006-10-31 2008-05-01 Dsm Ip Assets B.V. Photo-curable resin composition
US20090004579A1 (en) * 2007-06-27 2009-01-01 Dsm Ip Assets B.V. Clear and colorless three-dimensional articles made via stereolithography and method of making said articles
US20100160484A1 (en) * 2008-12-19 2010-06-24 Macdonald John G Xanthene-based plasticizer of resins and polymers
CN101776846B (zh) * 2009-01-14 2012-07-18 北京光创物成材料科技有限公司 激光造型专用光固化组合物
CN102725689B (zh) 2010-01-22 2014-10-08 帝斯曼知识产权资产管理有限公司 能固化成具有选择性视觉效果的层的液体可辐射固化树脂及其使用方法
EP3122529A4 (de) * 2014-03-26 2017-11-22 DSM IP Assets B.V. Farb- und/oder opazitätsverändernde, flüssige strahlungshärtbare harze zur generativen fertigung
KR101853387B1 (ko) * 2015-03-27 2018-04-30 동우 화인켐 주식회사 플렉서블 디스플레이용 하드코팅 필름
JP6418065B2 (ja) * 2015-05-21 2018-11-07 オムロン株式会社 光デバイス
WO2018055609A1 (en) * 2016-09-21 2018-03-29 Massivit 3D Printing Technologies Ltd Method and apparatus for manufacturing 3d objects
US9920170B1 (en) * 2017-01-19 2018-03-20 International Business Machines Corporation Bio-derived cross-linkers
US9920171B1 (en) * 2017-01-27 2018-03-20 International Business Machines Corporation Crosslinkers from biorenewable resveratrol
US10160838B2 (en) 2017-03-27 2018-12-25 International Business Machines Corporation Crosslinking materials from biorenewable aconitic acid
EP3732021A1 (de) 2017-12-29 2020-11-04 DSM IP Assets B.V. Zusammensetzungen und artikel zur generativen fertigung und verfahren zur verwendung davon
CN114058289A (zh) * 2020-08-07 2022-02-18 宁波安特弗新材料科技有限公司 一种uv减粘胶及一种uv减粘胶带

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Also Published As

Publication number Publication date
US20030149124A1 (en) 2003-08-07
DE60214754T2 (de) 2007-09-13
CN1283685C (zh) 2006-11-08
KR20040066846A (ko) 2004-07-27
US20070054218A1 (en) 2007-03-08
JP2005510603A (ja) 2005-04-21
ES2272787T3 (es) 2007-05-01
US20080118666A1 (en) 2008-05-22
US20050142479A1 (en) 2005-06-30
EP1448654B1 (de) 2006-09-13
CN1617899A (zh) 2005-05-18
WO2003046042A1 (en) 2003-06-05
EP1448654A1 (de) 2004-08-25
AU2002347659A1 (en) 2003-06-10
DE60214754D1 (de) 2006-10-26

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