ATE349286T1 - Zerstäubung eines vorläufers in einen anregungsmittel zur beschichtung eines entfernten substrats - Google Patents

Zerstäubung eines vorläufers in einen anregungsmittel zur beschichtung eines entfernten substrats

Info

Publication number
ATE349286T1
ATE349286T1 AT03732642T AT03732642T ATE349286T1 AT E349286 T1 ATE349286 T1 AT E349286T1 AT 03732642 T AT03732642 T AT 03732642T AT 03732642 T AT03732642 T AT 03732642T AT E349286 T1 ATE349286 T1 AT E349286T1
Authority
AT
Austria
Prior art keywords
coating
substrate
stimulant
atomization
precursor
Prior art date
Application number
AT03732642T
Other languages
English (en)
Inventor
Luke John Ward
Original Assignee
Surface Innovations Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=9936882&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=ATE349286(T1) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by Surface Innovations Ltd filed Critical Surface Innovations Ltd
Application granted granted Critical
Publication of ATE349286T1 publication Critical patent/ATE349286T1/de

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D1/00—Processes for applying liquids or other fluent materials
    • B05D1/62—Plasma-deposition of organic layers
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/448—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials
    • C23C16/4486—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials by producing an aerosol and subsequent evaporation of the droplets or particles
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/448—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials
    • C23C16/452—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials by activating reactive gas streams before their introduction into the reaction chamber, e.g. by ionisation or addition of reactive species

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Metallurgy (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • General Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Dispersion Chemistry (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Polymers With Sulfur, Phosphorus Or Metals In The Main Chain (AREA)
  • Physical Vapour Deposition (AREA)
  • Macromolecular Compounds Obtained By Forming Nitrogen-Containing Linkages In General (AREA)
AT03732642T 2002-05-17 2003-05-16 Zerstäubung eines vorläufers in einen anregungsmittel zur beschichtung eines entfernten substrats ATE349286T1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GBGB0211354.6A GB0211354D0 (en) 2002-05-17 2002-05-17 Atomisation of a precursor into an excitation medium for coating a remote substrate

Publications (1)

Publication Number Publication Date
ATE349286T1 true ATE349286T1 (de) 2007-01-15

Family

ID=9936882

Family Applications (1)

Application Number Title Priority Date Filing Date
AT03732642T ATE349286T1 (de) 2002-05-17 2003-05-16 Zerstäubung eines vorläufers in einen anregungsmittel zur beschichtung eines entfernten substrats

Country Status (7)

Country Link
US (1) US7968154B2 (de)
EP (1) EP1506063B1 (de)
AT (1) ATE349286T1 (de)
AU (1) AU2003239670A1 (de)
DE (1) DE60310705D1 (de)
GB (1) GB0211354D0 (de)
WO (1) WO2003097245A2 (de)

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DE102012220986B4 (de) * 2012-11-16 2015-04-02 Innovent E.V. Technologieentwicklung Dosiereinheit und ihre Verwendung
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EP3799542A1 (de) 2015-06-09 2021-03-31 P2i Ltd Verfahren zur herstellung einer beschichtung auf einer elektronischen oder elektrischen vorrichtung
TW201710411A (zh) 2015-06-09 2017-03-16 P2I有限公司 塗層
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US20170358445A1 (en) 2016-06-13 2017-12-14 Gvd Corporation Methods for plasma depositing polymers comprising cyclic siloxanes and related compositions and articles
US11679412B2 (en) 2016-06-13 2023-06-20 Gvd Corporation Methods for plasma depositing polymers comprising cyclic siloxanes and related compositions and articles
CN109308987A (zh) * 2017-07-26 2019-02-05 东芝存储器株式会社 等离子体处理装置、半导体制造装置及半导体装置的制造方法
JP2019029333A (ja) * 2017-07-26 2019-02-21 東芝メモリ株式会社 プラズマ処理装置および半導体装置の製造方法
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GB2579871B (en) 2019-02-22 2021-07-14 P2I Ltd Coatings
US11898248B2 (en) 2019-12-18 2024-02-13 Jiangsu Favored Nanotechnology Co., Ltd. Coating apparatus and coating method
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Also Published As

Publication number Publication date
WO2003097245A2 (en) 2003-11-27
EP1506063B1 (de) 2006-12-27
DE60310705D1 (de) 2007-02-08
AU2003239670A8 (en) 2003-12-02
WO2003097245A3 (en) 2004-09-10
US20060177598A1 (en) 2006-08-10
EP1506063A2 (de) 2005-02-16
US7968154B2 (en) 2011-06-28
AU2003239670A1 (en) 2003-12-02
GB0211354D0 (en) 2002-06-26

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