ATE352526T1 - Optische gläser die unter betriebsbedingungen bei uv-belichtung in bezug auf ihren brechungsindex möglichst stabil sind - Google Patents
Optische gläser die unter betriebsbedingungen bei uv-belichtung in bezug auf ihren brechungsindex möglichst stabil sindInfo
- Publication number
- ATE352526T1 ATE352526T1 AT01113373T AT01113373T ATE352526T1 AT E352526 T1 ATE352526 T1 AT E352526T1 AT 01113373 T AT01113373 T AT 01113373T AT 01113373 T AT01113373 T AT 01113373T AT E352526 T1 ATE352526 T1 AT E352526T1
- Authority
- AT
- Austria
- Prior art keywords
- refractive index
- radiation
- exposure
- respect
- operating conditions
- Prior art date
Links
- 239000005304 optical glass Substances 0.000 title abstract 4
- 230000005855 radiation Effects 0.000 abstract 4
- 239000004615 ingredient Substances 0.000 abstract 3
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 abstract 1
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 abstract 1
- 229910000413 arsenic oxide Inorganic materials 0.000 abstract 1
- 229960002594 arsenic trioxide Drugs 0.000 abstract 1
- KTTMEOWBIWLMSE-UHFFFAOYSA-N diarsenic trioxide Chemical compound O1[As](O2)O[As]3O[As]1O[As]2O3 KTTMEOWBIWLMSE-UHFFFAOYSA-N 0.000 abstract 1
- 229910052731 fluorine Inorganic materials 0.000 abstract 1
- 239000011737 fluorine Substances 0.000 abstract 1
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 abstract 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C3/00—Glass compositions
- C03C3/04—Glass compositions containing silica
- C03C3/076—Glass compositions containing silica with 40% to 90% silica, by weight
- C03C3/089—Glass compositions containing silica with 40% to 90% silica, by weight containing boron
- C03C3/091—Glass compositions containing silica with 40% to 90% silica, by weight containing boron containing aluminium
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C3/00—Glass compositions
- C03C3/04—Glass compositions containing silica
- C03C3/076—Glass compositions containing silica with 40% to 90% silica, by weight
- C03C3/102—Glass compositions containing silica with 40% to 90% silica, by weight containing lead
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C3/00—Glass compositions
- C03C3/12—Silica-free oxide glass compositions
- C03C3/23—Silica-free oxide glass compositions containing halogen and at least one oxide, e.g. oxide of boron
- C03C3/247—Silica-free oxide glass compositions containing halogen and at least one oxide, e.g. oxide of boron containing fluorine and phosphorus
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C4/00—Compositions for glass with special properties
- C03C4/0071—Compositions for glass with special properties for laserable glass
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C4/00—Compositions for glass with special properties
- C03C4/0085—Compositions for glass with special properties for UV-transmitting glass
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S501/00—Compositions: ceramic
- Y10S501/90—Optical glass, e.g. silent on refractive index and/or ABBE number
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Geochemistry & Mineralogy (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Organic Chemistry (AREA)
- Materials Engineering (AREA)
- General Chemical & Material Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Physics & Mathematics (AREA)
- Environmental & Geological Engineering (AREA)
- Epidemiology (AREA)
- Optics & Photonics (AREA)
- Health & Medical Sciences (AREA)
- General Physics & Mathematics (AREA)
- Public Health (AREA)
- Glass Compositions (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2000167377 | 2000-06-05 | ||
| JP2000330066 | 2000-10-30 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| ATE352526T1 true ATE352526T1 (de) | 2007-02-15 |
Family
ID=26593304
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| AT01113373T ATE352526T1 (de) | 2000-06-05 | 2001-06-01 | Optische gläser die unter betriebsbedingungen bei uv-belichtung in bezug auf ihren brechungsindex möglichst stabil sind |
Country Status (4)
| Country | Link |
|---|---|
| US (3) | US7196027B2 (de) |
| EP (1) | EP1162180B1 (de) |
| AT (1) | ATE352526T1 (de) |
| DE (1) | DE60126186T2 (de) |
Families Citing this family (25)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7989376B2 (en) | 2001-06-26 | 2011-08-02 | Afo Research, Inc. | Fluorophosphate glass and method for making thereof |
| DE10238930C1 (de) * | 2002-08-24 | 2003-11-20 | Schott Glas | Borosilicatglas und seine Verwendungen |
| US20040198581A1 (en) * | 2003-04-02 | 2004-10-07 | Infrared Fiber Systems, Inc. | Heavy-metal oxyfluoride glasses for high energy laser applications |
| US7572746B2 (en) * | 2003-09-09 | 2009-08-11 | Kabushiki Kaisha Ohara | Optical glass |
| US7531473B2 (en) * | 2004-08-23 | 2009-05-12 | Kigre, Inc. | Ytterbium-phosphate glass |
| DE102005023702B4 (de) * | 2005-05-23 | 2012-01-26 | Schott Ag | Hydrolysebeständiges Glas, ein Verfahren zu seiner Herstellung sowie dessen Verwendung |
| JP5123487B2 (ja) * | 2005-09-30 | 2013-01-23 | Hoya株式会社 | 精密プレス成形用光学ガラス、精密プレス成形用プリフォームおよびその製造方法、光学素子およびその製造方法 |
| US20090286058A1 (en) * | 2006-05-19 | 2009-11-19 | Noriaki Shibata | Crystal Glass Article |
| US8361914B2 (en) * | 2008-10-31 | 2013-01-29 | Margaryan Alfred A | Optical components for use in high energy environment with improved optical characteristics |
| WO2010055700A1 (ja) * | 2008-11-14 | 2010-05-20 | 株式会社フジクラ | イッテルビウム添加光ファイバ、ファイバレーザ及びファイバアンプ |
| CN101514079B (zh) * | 2009-03-27 | 2012-05-02 | 成都光明光电股份有限公司 | 氟磷酸盐光学玻璃 |
| CZ2009373A3 (cs) * | 2009-06-10 | 2010-10-13 | Preciosa, A. S. | Vysoceolovnaté sklo |
| CN102557430B (zh) * | 2011-12-16 | 2014-04-23 | 中国科学院西安光学精密机械研究所 | 一种高损伤阈值激光窗口材料的制备方法 |
| CN103265173B (zh) * | 2013-05-30 | 2015-07-15 | 中国科学院西安光学精密机械研究所 | 一种高损伤阈值二倍频光吸收材料的制备方法 |
| CN105585245B (zh) * | 2014-10-22 | 2019-08-23 | 成都光明光电股份有限公司 | 硼硅酸盐光学玻璃和光学元件 |
| US10393887B2 (en) | 2015-07-19 | 2019-08-27 | Afo Research, Inc. | Fluorine resistant, radiation resistant, and radiation detection glass systems |
| JP6497407B2 (ja) * | 2017-03-31 | 2019-04-10 | Agc株式会社 | 無アルカリガラス基板 |
| CN106966600B (zh) * | 2017-04-18 | 2019-05-24 | 济南大学 | 一种牙科纳米级微晶玻璃及其生产方法 |
| CN107628749B (zh) * | 2017-09-27 | 2020-09-04 | 湖北新华光信息材料有限公司 | 氟磷酸盐光学玻璃及其制备方法和光学元件 |
| CN108821569B (zh) * | 2018-04-13 | 2021-08-27 | 苏州东辉光学有限公司 | 激光全息记录玻璃、衍射光学器件或全息图案制品及制备方法 |
| KR102752872B1 (ko) | 2018-11-26 | 2025-01-09 | 오웬스 코닝 인텔렉츄얼 캐피탈 엘엘씨 | 향상된 탄성 계수를 갖는 고성능 섬유 유리 조성물 |
| EP3887328A2 (de) | 2018-11-26 | 2021-10-06 | Owens Corning Intellectual Capital, LLC | Hochleistungsglasfaserzusammensetzung mit verbessertem spezifischen modul |
| CN109650716B (zh) * | 2019-01-22 | 2021-12-07 | 成都光明光电股份有限公司 | 一种无色光学玻璃及其玻璃预制件、元件和仪器 |
| CN111533446B (zh) * | 2020-05-26 | 2022-04-15 | 成都光明光电股份有限公司 | 光学玻璃、玻璃预制件、光学元件和光学仪器 |
| CN111533443B (zh) * | 2020-05-27 | 2022-04-15 | 成都光明光电股份有限公司 | 光学玻璃 |
Family Cites Families (37)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US2431980A (en) * | 1944-10-11 | 1947-12-02 | Corning Glass Works | Glass having low power factor |
| US3138561A (en) * | 1953-11-23 | 1964-06-23 | Johns Manville Fiber Glass Inc | Radiation resisting glass composition |
| US2762713A (en) * | 1953-12-03 | 1956-09-11 | Bausch & Lomb | Flint glasses for multifocal lenses |
| NL238504A (de) * | 1958-04-23 | |||
| DE1696064B2 (de) * | 1968-03-08 | 1972-03-09 | Jenaer Glaswerk Schott & Gen | Glaeser fuer ultraschallverzoegerungsleitungen mit geringerer innerer daempfung und transformationentemperaturen zwischen 550 und 620 grad c |
| FR2011703A6 (de) * | 1968-06-27 | 1970-03-06 | Leitz Ernst Gmbh | |
| US3671277A (en) * | 1968-10-08 | 1972-06-20 | Nippon Kogaku Kk | Ultraviolet ray cutting pink glass for color photography |
| US3769277A (en) * | 1970-01-23 | 1973-10-30 | Glaxo Lab Ltd | Preparation of delta3-4 carboxy cephalosporins having a 3-vinyl or substituted 3-vinyl group |
| DE2205844C3 (de) * | 1972-02-08 | 1975-08-14 | Jenaer Glaswerk Schott & Gen., 6500 Mainz | Durch Alkaliionenaustausch chemisch gehärtetes Brillen-Fernteilglas |
| DE2435555C2 (de) * | 1974-07-24 | 1976-08-26 | Jenaer Glaswerk Schott & Gen | Optisches glas des systems sio tief 2 -b tief 2 o tief 3 -bao-la tief 2 o tief 3 -zro tief 2 mit der optischen lage nd=(1,650+-2)x10 hoch -3 und vd=55,5+-1,0, das sich durch hohe chemische bestaendigkeit und geringe kristallisationsneigung auszeichnet |
| US3949335A (en) * | 1975-04-21 | 1976-04-06 | Corning Glass Works | Reed switch construction |
| JPS53105517A (en) * | 1977-02-28 | 1978-09-13 | Hoya Glass Works Ltd | Fluorophosphate laser glass |
| DE2717916C3 (de) * | 1977-04-22 | 1980-06-12 | Jenaer Glaswerk Schott & Gen., 6500 Mainz | Gläser mit kleiner nichtlinearer Brechzahl, insbesondere für die Lasertechnik |
| EP0015794B1 (de) * | 1979-02-22 | 1984-05-30 | Rhone-Poulenc Chimie De Base | Verfahren zur Herstellung einer Glaszusammensetzung mit niedrigem Schmelzpunkt und verbesserten Läuterungseigenschaften auf Basis metallischer Silikate |
| JPS5842138B2 (ja) * | 1979-10-04 | 1983-09-17 | 株式会社 小原光学硝子製造所 | 弗化物ガラスの製造方法 |
| JPS57200247A (en) * | 1981-05-30 | 1982-12-08 | Toshiba Corp | Glass fiber of multi-component system for optical communication |
| DE3228826C2 (de) * | 1982-08-02 | 1986-09-25 | Schott Glaswerke, 6500 Mainz | Hochabsorbierendes Pb-haltige Gläser für Kathodenstrahlröhrenbildschirme |
| JPS6077144A (ja) | 1983-10-03 | 1985-05-01 | Hoya Corp | 紫外線透過ガラス |
| JPS60155551A (ja) * | 1984-01-24 | 1985-08-15 | Toshiba Corp | 光フアイバ用被覆ガラス |
| DE3404363A1 (de) * | 1984-02-08 | 1985-08-14 | Schott Glaswerke, 6500 Mainz | Hoch pbo-haltige glaeser im system sio(pfeil abwaerts)2(pfeil abwaerts)pbo-m(pfeil abwaerts)2(pfeil abwaerts)o mit erhoehter chemischer bestaendigkeit |
| JPS60200842A (ja) | 1984-03-21 | 1985-10-11 | Hoya Corp | 紫外線透過用ガラス |
| DE3634676A1 (de) * | 1985-10-19 | 1987-04-23 | Leitz Ernst Gmbh | Optische fluorphosphatglaeser mit positiver anomaler teildispersion und verbesserten physiko-chemischen eigenschaften sowie verfahren zu ihrer herstellung |
| JPS63144141A (ja) * | 1986-12-08 | 1988-06-16 | Sumita Kogaku Glass Seizosho:Kk | 弗燐酸塩光学ガラス |
| DE3643421A1 (de) * | 1986-12-19 | 1988-06-23 | Schott Glaswerke | Solarisationsstabile uv-filterglaeser fuer den durchlassbereich von 280-500 nm |
| JPH02124740A (ja) * | 1988-10-06 | 1990-05-14 | Sumita Kogaku Glass Seizosho:Kk | フツリン酸塩光学ガラス |
| JP2616983B2 (ja) * | 1988-12-01 | 1997-06-04 | 株式会社住田光学ガラス | フツリン酸塩光学ガラス |
| US4920082A (en) * | 1989-01-30 | 1990-04-24 | Corning Incorporated | Glasses exhibiting controlled fluoride release |
| JPH0455337A (ja) | 1990-06-21 | 1992-02-24 | Ohara Inc | 紫外線透過性ガラス |
| US5192718A (en) * | 1991-10-24 | 1993-03-09 | Corning Incorporated | Lead silicate glasses |
| JP2529657B2 (ja) | 1992-05-08 | 1996-08-28 | 東芝硝子株式会社 | 近紫外線透過ガラス |
| JP3196952B2 (ja) * | 1993-06-08 | 2001-08-06 | キヤノン株式会社 | 光学ガラス素子およびその製造方法 |
| JP3194835B2 (ja) * | 1994-06-30 | 2001-08-06 | ホーヤ株式会社 | 光学ガラス |
| JP3575836B2 (ja) * | 1994-10-03 | 2004-10-13 | Hoya株式会社 | 高紫外線透過性弗燐酸塩ガラス及びその製造方法 |
| JPH08283038A (ja) * | 1995-04-07 | 1996-10-29 | Nippon Electric Glass Co Ltd | 紫外線透過黒色ガラス |
| JP3820486B2 (ja) * | 1995-09-18 | 2006-09-13 | Hoya株式会社 | ガラス光学素子の製造方法 |
| FR2758321A1 (fr) * | 1997-01-14 | 1998-07-17 | Corning Inc | Composition de verre et dispositif optique |
| DE19828992C1 (de) * | 1998-06-29 | 1999-10-07 | Schott Glas | Bleifreie optische Gläser |
-
2001
- 2001-06-01 US US09/872,842 patent/US7196027B2/en not_active Expired - Fee Related
- 2001-06-01 EP EP01113373A patent/EP1162180B1/de not_active Expired - Lifetime
- 2001-06-01 AT AT01113373T patent/ATE352526T1/de not_active IP Right Cessation
- 2001-06-01 DE DE60126186T patent/DE60126186T2/de not_active Expired - Lifetime
-
2003
- 2003-09-18 US US10/666,299 patent/US7217672B2/en not_active Expired - Fee Related
- 2003-09-18 US US10/666,232 patent/US7371703B2/en not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| US7217672B2 (en) | 2007-05-15 |
| DE60126186T2 (de) | 2007-11-15 |
| EP1162180A1 (de) | 2001-12-12 |
| EP1162180B1 (de) | 2007-01-24 |
| US7371703B2 (en) | 2008-05-13 |
| US20040063563A1 (en) | 2004-04-01 |
| US20040048730A1 (en) | 2004-03-11 |
| US20020010065A1 (en) | 2002-01-24 |
| DE60126186D1 (de) | 2007-03-15 |
| US7196027B2 (en) | 2007-03-27 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| RER | Ceased as to paragraph 5 lit. 3 law introducing patent treaties |