ATE354687T1 - Verwendung von unter atmosphärischem druck erzeugten dichten plasmen zur behandlung von abgasen - Google Patents

Verwendung von unter atmosphärischem druck erzeugten dichten plasmen zur behandlung von abgasen

Info

Publication number
ATE354687T1
ATE354687T1 AT02738277T AT02738277T ATE354687T1 AT E354687 T1 ATE354687 T1 AT E354687T1 AT 02738277 T AT02738277 T AT 02738277T AT 02738277 T AT02738277 T AT 02738277T AT E354687 T1 ATE354687 T1 AT E354687T1
Authority
AT
Austria
Prior art keywords
atmospheric pressure
plasms
dense
exhaust gases
under atmospheric
Prior art date
Application number
AT02738277T
Other languages
English (en)
Inventor
Jean-Christophe Rostaing
Daniel Guerin
Christian Larquet
Chun-Hao Ly
Michel Moisan
Herve Dulphy
Original Assignee
Air Liquide
Air Liquide Electronics Sys
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=8863824&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=ATE354687(T1) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by Air Liquide, Air Liquide Electronics Sys filed Critical Air Liquide
Application granted granted Critical
Publication of ATE354687T1 publication Critical patent/ATE354687T1/de

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
    • B01D53/34—Chemical or biological purification of waste gases
    • B01D53/46—Removing components of defined structure
    • B01D53/68—Halogens or halogen compounds
    • B01D53/70—Organic halogen compounds
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
    • B01D53/32—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols by electrical effects other than those provided for in group B01D61/00
    • B01D53/323—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols by electrical effects other than those provided for in group B01D61/00 by electrostatic effects or by high-voltage electric fields
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/4412—Details relating to the exhausts, e.g. pumps, filters, scrubbers, particle traps
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D2259/00—Type of treatment
    • B01D2259/80—Employing electric, magnetic, electromagnetic or wave energy, or particle radiation
    • B01D2259/818—Employing electrical discharges or the generation of a plasma
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J2219/08—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
    • B01J2219/0873—Materials to be treated
    • B01J2219/0875—Gas
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J2219/08—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
    • B01J2219/0894—Processes carried out in the presence of a plasma
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02C—CAPTURE, STORAGE, SEQUESTRATION OR DISPOSAL OF GREENHOUSE GASES [GHG]
    • Y02C20/00—Capture or disposal of greenhouse gases
    • Y02C20/30—Capture or disposal of greenhouse gases of perfluorocarbons [PFC], hydrofluorocarbons [HFC] or sulfur hexafluoride [SF6]

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Oil, Petroleum & Natural Gas (AREA)
  • Analytical Chemistry (AREA)
  • Metallurgy (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Organic Chemistry (AREA)
  • Biomedical Technology (AREA)
  • Health & Medical Sciences (AREA)
  • Environmental & Geological Engineering (AREA)
  • Treating Waste Gases (AREA)
  • Drying Of Semiconductors (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
  • Chemical Vapour Deposition (AREA)
  • Sampling And Sample Adjustment (AREA)
  • Treatments Of Macromolecular Shaped Articles (AREA)
AT02738277T 2001-05-31 2002-05-21 Verwendung von unter atmosphärischem druck erzeugten dichten plasmen zur behandlung von abgasen ATE354687T1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR0107150A FR2825295B1 (fr) 2001-05-31 2001-05-31 Application des plasmas denses crees a pression atmospherique au traitement d'effluents gazeux

Publications (1)

Publication Number Publication Date
ATE354687T1 true ATE354687T1 (de) 2007-03-15

Family

ID=8863824

Family Applications (1)

Application Number Title Priority Date Filing Date
AT02738277T ATE354687T1 (de) 2001-05-31 2002-05-21 Verwendung von unter atmosphärischem druck erzeugten dichten plasmen zur behandlung von abgasen

Country Status (9)

Country Link
US (2) US20040195088A1 (de)
EP (1) EP1397529B1 (de)
JP (1) JP4880194B2 (de)
KR (1) KR100914575B1 (de)
CN (1) CN1301342C (de)
AT (1) ATE354687T1 (de)
DE (1) DE60218305T2 (de)
FR (1) FR2825295B1 (de)
WO (1) WO2002097158A1 (de)

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US20060162741A1 (en) * 2005-01-26 2006-07-27 Cerionx, Inc. Method and apparatus for cleaning and surface conditioning objects with plasma
US8366871B2 (en) * 2003-06-16 2013-02-05 Ionfield Holdings, Llc Method and apparatus for cleaning and surface conditioning objects using plasma
US8092643B2 (en) * 2003-06-16 2012-01-10 Ionfield Systems, Llc Method and apparatus for cleaning and surface conditioning objects using plasma
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US20060272675A1 (en) * 2005-06-02 2006-12-07 Cerionx, Inc. Method and apparatus for cleaning and surface conditioning objects using plasma
US20060272674A1 (en) * 2005-06-02 2006-12-07 Cerionx, Inc. Method and apparatus for cleaning and surface conditioning objects using plasma
US20060162740A1 (en) * 2005-01-21 2006-07-27 Cerionx, Inc. Method and apparatus for cleaning and surface conditioning objects using non-equilibrium atmospheric pressure plasma
FR2863103B1 (fr) * 2003-12-01 2006-07-14 Cit Alcatel Systeme de traitement des gaz par plasma integre dans une pompe a vide
US20080234530A1 (en) * 2004-07-13 2008-09-25 Yassine Kabouzi Atmospheric Pressure Plasma Treatment of Gaseous Effluents
KR20060095594A (ko) * 2005-02-28 2006-09-01 엄환섭 반도체 세정 폐가스 제거를 위한 플라즈마 스크러버
US20060237030A1 (en) * 2005-04-22 2006-10-26 Cerionx, Inc. Method and apparatus for cleaning and surface conditioning objects with plasma
FR2886866B1 (fr) * 2005-06-09 2007-07-20 Air Liquide Procede et dispositif de traitement d'effluents gazeux de procedes industriels
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DE102007013219A1 (de) * 2007-03-15 2008-09-18 Rev Renewable Energy Ventures, Inc. Plasmagestützte Synthese
JP2010533742A (ja) * 2007-07-17 2010-10-28 プラスコエナジー アイピー ホールデイングス，エス．エル．，ビルバオ，シャフハウゼン ブランチ ガス変換の効率を最適化するための手段を含むガス改質システム
JP5133013B2 (ja) * 2007-09-10 2013-01-30 東京エレクトロン株式会社 成膜装置の排気系構造、成膜装置、および排ガスの処理方法
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FR2981705B1 (fr) * 2011-10-19 2013-11-22 Adixen Vacuum Products Dispositif de pompage et de traitement des gaz
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CN108278641A (zh) * 2017-12-29 2018-07-13 林声坤 一种半导体微波发生器连接结构
CN109513351A (zh) * 2018-12-28 2019-03-26 武汉大学 大规模降解工业废气的装置
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Also Published As

Publication number Publication date
US20100155222A1 (en) 2010-06-24
FR2825295A1 (fr) 2002-12-06
DE60218305D1 (de) 2007-04-05
KR100914575B1 (ko) 2009-08-31
JP4880194B2 (ja) 2012-02-22
JP2004537396A (ja) 2004-12-16
US20040195088A1 (en) 2004-10-07
EP1397529B1 (de) 2007-02-21
EP1397529A1 (de) 2004-03-17
CN1301342C (zh) 2007-02-21
WO2002097158A1 (fr) 2002-12-05
DE60218305T2 (de) 2007-11-15
KR20040007619A (ko) 2004-01-24
CN1543515A (zh) 2004-11-03
FR2825295B1 (fr) 2004-05-28

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