ATE355546T1 - Belichtungsapparat und verfahren zu dessen herstellung - Google Patents

Belichtungsapparat und verfahren zu dessen herstellung

Info

Publication number
ATE355546T1
ATE355546T1 AT00911386T AT00911386T ATE355546T1 AT E355546 T1 ATE355546 T1 AT E355546T1 AT 00911386 T AT00911386 T AT 00911386T AT 00911386 T AT00911386 T AT 00911386T AT E355546 T1 ATE355546 T1 AT E355546T1
Authority
AT
Austria
Prior art keywords
exposure apparatus
production
optical system
optical
photomask
Prior art date
Application number
AT00911386T
Other languages
English (en)
Inventor
Tohru Ogawa
Hideo Hosono
Shinya Kikugawa
Yoshiaki Ikuta
Akio Masui
Noriaki Shimodaira
Shuhei Yoshizawa
Original Assignee
Asahi Glass Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asahi Glass Co Ltd filed Critical Asahi Glass Co Ltd
Application granted granted Critical
Publication of ATE355546T1 publication Critical patent/ATE355546T1/de

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P76/00—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70241—Optical aspects of refractive lens systems, i.e. comprising only refractive elements
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/7095—Materials, e.g. materials for housing, stage or other support having particular properties, e.g. weight, strength, conductivity, thermal expansion coefficient
    • G03F7/70958—Optical materials or coatings, e.g. with particular transmittance, reflectance or anti-reflection properties

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Public Health (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Health & Medical Sciences (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Glass Compositions (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Glass Melting And Manufacturing (AREA)
  • Prostheses (AREA)
AT00911386T 1999-03-25 2000-03-27 Belichtungsapparat und verfahren zu dessen herstellung ATE355546T1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP08206799A JP4051805B2 (ja) 1999-03-25 1999-03-25 露光装置およびフォトマスク

Publications (1)

Publication Number Publication Date
ATE355546T1 true ATE355546T1 (de) 2006-03-15

Family

ID=13764156

Family Applications (1)

Application Number Title Priority Date Filing Date
AT00911386T ATE355546T1 (de) 1999-03-25 2000-03-27 Belichtungsapparat und verfahren zu dessen herstellung

Country Status (8)

Country Link
US (1) US6611317B1 (de)
EP (1) EP1164629B1 (de)
JP (1) JP4051805B2 (de)
KR (1) KR100628015B1 (de)
AT (1) ATE355546T1 (de)
DE (1) DE60033642T2 (de)
TW (1) TW508477B (de)
WO (1) WO2000059013A1 (de)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6499317B1 (en) 1998-10-28 2002-12-31 Asahi Glass Company, Limited Synthetic quartz glass and method for production thereof
JP4701469B2 (ja) * 1999-03-25 2011-06-15 旭硝子株式会社 光学部材用合成石英ガラスの製造方法
KR100855038B1 (ko) * 2002-06-28 2008-08-29 매그나칩 반도체 유한회사 미세패턴 형성을 위한 노광장치
JP4470479B2 (ja) * 2003-12-17 2010-06-02 旭硝子株式会社 光学部材用合成石英ガラスおよびその製造方法
MY180533A (en) 2014-03-17 2020-12-01 Shinetsu Chemical Co Methods for working synthetic quartz glass substrate having a mirror-like surface and method for sensing synthetic quartz glass substrate
KR102515348B1 (ko) * 2015-05-28 2023-03-30 에이지씨 가부시키가이샤 유리 기판 및 적층 기판

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH05178632A (ja) 1991-12-26 1993-07-20 Asahi Glass Co Ltd 光学用高耐熱性石英ガラスとその製造方法
US5326729A (en) 1992-02-07 1994-07-05 Asahi Glass Company Ltd. Transparent quartz glass and process for its production
US5679125A (en) * 1994-07-07 1997-10-21 Nikon Corporation Method for producing silica glass for use with light in a vacuum ultraviolet wavelength range
US5707908A (en) * 1995-01-06 1998-01-13 Nikon Corporation Silica glass
JP3674793B2 (ja) 1995-10-31 2005-07-20 信越石英株式会社 紫外線レーザ用石英ガラス光学部材の製造方法
US6483639B2 (en) 1997-03-25 2002-11-19 Heraeus Quarzglas Gmbh Optical system for integrated circuit fabrication
JP2980094B2 (ja) * 1997-05-16 1999-11-22 住友電気工業株式会社 石英ガラス物品及びその製造方法
JPH10316445A (ja) 1997-05-16 1998-12-02 Sumitomo Electric Ind Ltd 光ファイバの使用前の処理方法
WO1999005708A1 (en) * 1997-07-22 1999-02-04 Nikon Corporation Projection exposure method, projection aligner, and methods of manufacturing and optically cleaning the aligner
AU9763998A (en) 1997-11-11 1999-05-31 Nikon Corporation Photomask, aberration correcting plate, exposure device and method of producing microdevice
EP1293830A1 (de) 1998-06-08 2003-03-19 Nikon Corporation Verfahren und Vorrichtung zur Projektionsbelichtung
US6499317B1 (en) * 1998-10-28 2002-12-31 Asahi Glass Company, Limited Synthetic quartz glass and method for production thereof
US6242136B1 (en) * 1999-02-12 2001-06-05 Corning Incorporated Vacuum ultraviolet transmitting silicon oxyfluoride lithography glass

Also Published As

Publication number Publication date
JP4051805B2 (ja) 2008-02-27
TW508477B (en) 2002-11-01
WO2000059013A1 (en) 2000-10-05
KR20010043714A (ko) 2001-05-25
EP1164629A4 (de) 2002-05-08
DE60033642T2 (de) 2007-10-31
DE60033642D1 (de) 2007-04-12
EP1164629A1 (de) 2001-12-19
KR100628015B1 (ko) 2006-09-26
US6611317B1 (en) 2003-08-26
JP2000277419A (ja) 2000-10-06
EP1164629B1 (de) 2007-02-28

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Legal Events

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