ATE355546T1 - Belichtungsapparat und verfahren zu dessen herstellung - Google Patents
Belichtungsapparat und verfahren zu dessen herstellungInfo
- Publication number
- ATE355546T1 ATE355546T1 AT00911386T AT00911386T ATE355546T1 AT E355546 T1 ATE355546 T1 AT E355546T1 AT 00911386 T AT00911386 T AT 00911386T AT 00911386 T AT00911386 T AT 00911386T AT E355546 T1 ATE355546 T1 AT E355546T1
- Authority
- AT
- Austria
- Prior art keywords
- exposure apparatus
- production
- optical system
- optical
- photomask
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P76/00—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70241—Optical aspects of refractive lens systems, i.e. comprising only refractive elements
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/7095—Materials, e.g. materials for housing, stage or other support having particular properties, e.g. weight, strength, conductivity, thermal expansion coefficient
- G03F7/70958—Optical materials or coatings, e.g. with particular transmittance, reflectance or anti-reflection properties
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Epidemiology (AREA)
- Health & Medical Sciences (AREA)
- Public Health (AREA)
- Environmental & Geological Engineering (AREA)
- Engineering & Computer Science (AREA)
- Glass Compositions (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Glass Melting And Manufacturing (AREA)
- Prostheses (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP08206799A JP4051805B2 (ja) | 1999-03-25 | 1999-03-25 | 露光装置およびフォトマスク |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| ATE355546T1 true ATE355546T1 (de) | 2006-03-15 |
Family
ID=13764156
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| AT00911386T ATE355546T1 (de) | 1999-03-25 | 2000-03-27 | Belichtungsapparat und verfahren zu dessen herstellung |
Country Status (8)
| Country | Link |
|---|---|
| US (1) | US6611317B1 (de) |
| EP (1) | EP1164629B1 (de) |
| JP (1) | JP4051805B2 (de) |
| KR (1) | KR100628015B1 (de) |
| AT (1) | ATE355546T1 (de) |
| DE (1) | DE60033642T2 (de) |
| TW (1) | TW508477B (de) |
| WO (1) | WO2000059013A1 (de) |
Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2000024685A1 (fr) | 1998-10-28 | 2000-05-04 | Asahi Glass Company Ltd. | Verre en quartz synthetique et procede de fabrication |
| JP4701469B2 (ja) * | 1999-03-25 | 2011-06-15 | 旭硝子株式会社 | 光学部材用合成石英ガラスの製造方法 |
| KR100855038B1 (ko) * | 2002-06-28 | 2008-08-29 | 매그나칩 반도체 유한회사 | 미세패턴 형성을 위한 노광장치 |
| JP4470479B2 (ja) * | 2003-12-17 | 2010-06-02 | 旭硝子株式会社 | 光学部材用合成石英ガラスおよびその製造方法 |
| MY180533A (en) | 2014-03-17 | 2020-12-01 | Shinetsu Chemical Co | Methods for working synthetic quartz glass substrate having a mirror-like surface and method for sensing synthetic quartz glass substrate |
| CN107614452A (zh) | 2015-05-28 | 2018-01-19 | 旭硝子株式会社 | 玻璃基板及层叠基板 |
Family Cites Families (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH05178632A (ja) | 1991-12-26 | 1993-07-20 | Asahi Glass Co Ltd | 光学用高耐熱性石英ガラスとその製造方法 |
| US5326729A (en) | 1992-02-07 | 1994-07-05 | Asahi Glass Company Ltd. | Transparent quartz glass and process for its production |
| KR100298167B1 (ko) * | 1994-07-07 | 2001-10-24 | 오노 시게오 | 진공자외선파장대광선용실리카유리의제조방법,및그에의해제조된실리카유리및광학부재 |
| US5707908A (en) | 1995-01-06 | 1998-01-13 | Nikon Corporation | Silica glass |
| JP3674793B2 (ja) | 1995-10-31 | 2005-07-20 | 信越石英株式会社 | 紫外線レーザ用石英ガラス光学部材の製造方法 |
| US6483639B2 (en) | 1997-03-25 | 2002-11-19 | Heraeus Quarzglas Gmbh | Optical system for integrated circuit fabrication |
| JP2980094B2 (ja) * | 1997-05-16 | 1999-11-22 | 住友電気工業株式会社 | 石英ガラス物品及びその製造方法 |
| JPH10316445A (ja) | 1997-05-16 | 1998-12-02 | Sumitomo Electric Ind Ltd | 光ファイバの使用前の処理方法 |
| EP1011128A4 (de) * | 1997-07-22 | 2004-11-10 | Nikon Corp | Projektionsbelichtungsverfahren, projektionsausrichteinrichtung und verfahren zur herstellung und optischen reinigung der ausrichteinrichtung |
| AU9763998A (en) * | 1997-11-11 | 1999-05-31 | Nikon Corporation | Photomask, aberration correcting plate, exposure device and method of producing microdevice |
| EP1293832A1 (de) | 1998-06-08 | 2003-03-19 | Nikon Corporation | Verfahren und Vorrichtung zur Projektionsbelichtung |
| WO2000024685A1 (fr) * | 1998-10-28 | 2000-05-04 | Asahi Glass Company Ltd. | Verre en quartz synthetique et procede de fabrication |
| US6242136B1 (en) * | 1999-02-12 | 2001-06-05 | Corning Incorporated | Vacuum ultraviolet transmitting silicon oxyfluoride lithography glass |
-
1999
- 1999-03-25 JP JP08206799A patent/JP4051805B2/ja not_active Expired - Fee Related
-
2000
- 2000-03-24 TW TW089105618A patent/TW508477B/zh not_active IP Right Cessation
- 2000-03-27 DE DE60033642T patent/DE60033642T2/de not_active Expired - Lifetime
- 2000-03-27 KR KR1020007012958A patent/KR100628015B1/ko not_active Expired - Fee Related
- 2000-03-27 US US09/701,180 patent/US6611317B1/en not_active Expired - Fee Related
- 2000-03-27 AT AT00911386T patent/ATE355546T1/de not_active IP Right Cessation
- 2000-03-27 WO PCT/JP2000/001868 patent/WO2000059013A1/ja not_active Ceased
- 2000-03-27 EP EP00911386A patent/EP1164629B1/de not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| JP2000277419A (ja) | 2000-10-06 |
| EP1164629B1 (de) | 2007-02-28 |
| TW508477B (en) | 2002-11-01 |
| DE60033642T2 (de) | 2007-10-31 |
| EP1164629A4 (de) | 2002-05-08 |
| EP1164629A1 (de) | 2001-12-19 |
| JP4051805B2 (ja) | 2008-02-27 |
| WO2000059013A1 (en) | 2000-10-05 |
| DE60033642D1 (de) | 2007-04-12 |
| KR20010043714A (ko) | 2001-05-25 |
| KR100628015B1 (ko) | 2006-09-26 |
| US6611317B1 (en) | 2003-08-26 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| RER | Ceased as to paragraph 5 lit. 3 law introducing patent treaties |