ATE356430T1 - Blitztempering - Google Patents

Blitztempering

Info

Publication number
ATE356430T1
ATE356430T1 AT02748190T AT02748190T ATE356430T1 AT E356430 T1 ATE356430 T1 AT E356430T1 AT 02748190 T AT02748190 T AT 02748190T AT 02748190 T AT02748190 T AT 02748190T AT E356430 T1 ATE356430 T1 AT E356430T1
Authority
AT
Austria
Prior art keywords
present
energy source
radiation
wafer
tempering
Prior art date
Application number
AT02748190T
Other languages
English (en)
Inventor
Woo Sik Yoo
Original Assignee
Wafermasters Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Wafermasters Inc filed Critical Wafermasters Inc
Application granted granted Critical
Publication of ATE356430T1 publication Critical patent/ATE356430T1/de

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P95/00—Generic processes or apparatus for manufacture or treatments not covered by the other groups of this subclass
    • H10P95/90—Thermal treatments, e.g. annealing or sintering
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/04—Apparatus for manufacture or treatment
    • H10P72/0431—Apparatus for thermal treatment
    • H10P72/0436—Apparatus for thermal treatment mainly by radiation
    • C—CHEMISTRY; METALLURGY
    • C30—CRYSTAL GROWTH
    • C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B31/00—Diffusion or doping processes for single crystals or homogeneous polycrystalline material with defined structure; Apparatus therefor
    • C30B31/06—Diffusion or doping processes for single crystals or homogeneous polycrystalline material with defined structure; Apparatus therefor by contacting with diffusion material in the gaseous state
    • C30B31/12—Heating of the reaction chamber
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B3/00—Ohmic-resistance heating
    • H05B3/0033—Heating devices using lamps
    • H05B3/0038—Heating devices using lamps for industrial applications
    • H05B3/0047—Heating devices using lamps for industrial applications for semiconductor manufacture

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Recrystallisation Techniques (AREA)
  • Physical Vapour Deposition (AREA)
  • Chemical Vapour Deposition (AREA)
  • Control Of Resistance Heating (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
  • Glass Compositions (AREA)
AT02748190T 2001-07-20 2002-07-18 Blitztempering ATE356430T1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US09/910,298 US6376806B2 (en) 2000-05-09 2001-07-20 Flash anneal

Publications (1)

Publication Number Publication Date
ATE356430T1 true ATE356430T1 (de) 2007-03-15

Family

ID=25428586

Family Applications (1)

Application Number Title Priority Date Filing Date
AT02748190T ATE356430T1 (de) 2001-07-20 2002-07-18 Blitztempering

Country Status (8)

Country Link
US (1) US6376806B2 (de)
EP (1) EP1410423B1 (de)
JP (2) JP2004536457A (de)
KR (1) KR100809240B1 (de)
AT (1) ATE356430T1 (de)
DE (1) DE60218690T2 (de)
TW (1) TWI270104B (de)
WO (1) WO2003009350A2 (de)

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US7811900B2 (en) * 2006-09-08 2010-10-12 Silicon Genesis Corporation Method and structure for fabricating solar cells using a thick layer transfer process
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US20090034072A1 (en) 2007-07-31 2009-02-05 Dean Jennings Method and apparatus for decorrelation of spatially and temporally coherent light
JP5465373B2 (ja) * 2007-09-12 2014-04-09 大日本スクリーン製造株式会社 熱処理装置
JP5221099B2 (ja) * 2007-10-17 2013-06-26 大日本スクリーン製造株式会社 熱処理装置および熱処理方法
US7800081B2 (en) * 2007-11-08 2010-09-21 Applied Materials, Inc. Pulse train annealing method and apparatus
US9498845B2 (en) * 2007-11-08 2016-11-22 Applied Materials, Inc. Pulse train annealing method and apparatus
JP4816634B2 (ja) * 2007-12-28 2011-11-16 ウシオ電機株式会社 基板加熱装置及び基板加熱方法
US8314368B2 (en) * 2008-02-22 2012-11-20 Applied Materials, Inc. Silver reflectors for semiconductor processing chambers
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US9018108B2 (en) 2013-01-25 2015-04-28 Applied Materials, Inc. Low shrinkage dielectric films
US9842753B2 (en) * 2013-04-26 2017-12-12 Applied Materials, Inc. Absorbing lamphead face
JP5718975B2 (ja) * 2013-05-23 2015-05-13 株式会社Ｓｃｒｅｅｎホールディングス 熱処理方法
JP5898258B2 (ja) * 2014-05-01 2016-04-06 株式会社Ｓｃｒｅｅｎホールディングス 熱処理装置
US9287148B1 (en) * 2014-12-18 2016-03-15 Varian Semiconductor Equipment Associates, Inc. Dynamic heating method and system for wafer processing
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JP6783571B2 (ja) * 2016-07-13 2020-11-11 日本碍子株式会社 放射装置及び放射装置を用いた処理装置
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JP7508303B2 (ja) 2020-07-31 2024-07-01 株式会社Ｓｃｒｅｅｎホールディングス 熱処理方法

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Also Published As

Publication number Publication date
EP1410423A2 (de) 2004-04-21
US20010047990A1 (en) 2001-12-06
JP2004536457A (ja) 2004-12-02
DE60218690T2 (de) 2007-12-06
JP4931833B2 (ja) 2012-05-16
EP1410423B1 (de) 2007-03-07
WO2003009350A2 (en) 2003-01-30
KR20030051631A (ko) 2003-06-25
JP2008153680A (ja) 2008-07-03
WO2003009350A3 (en) 2003-06-19
TWI270104B (en) 2007-01-01
US6376806B2 (en) 2002-04-23
KR100809240B1 (ko) 2008-02-29
DE60218690D1 (de) 2007-04-19

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Legal Events

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RER Ceased as to paragraph 5 lit. 3 law introducing patent treaties