ATE358119T1 - Verfahren zur entfernung von spurlösungsmittel von einem hygroskopischen material - Google Patents

Verfahren zur entfernung von spurlösungsmittel von einem hygroskopischen material

Info

Publication number: ATE358119T1
Authority: AT; Austria
Prior art keywords: solvent; track; removal; hygroscopic material; suramin
Prior art date: 1999-12-17

Application number

AT00985741T

Other languages

English (en)

Inventor

William Tully

Original Assignee

Pfizer Science & Tech Ltd

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

1999-12-17

Filing date

2000-12-18

Publication date

2007-04-15

2000-12-18 Application filed by Pfizer Science & Tech Ltd filed Critical Pfizer Science & Tech Ltd

2007-04-15 Application granted granted Critical

2007-04-15 Publication of ATE358119T1 publication Critical patent/ATE358119T1/de

Links

239000000463 material Substances 0.000 title abstract 2
238000000034 method Methods 0.000 title abstract 2
239000002904 solvent Substances 0.000 title abstract 2
238000001035 drying Methods 0.000 abstract 1
FIAFUQMPZJWCLV-UHFFFAOYSA-N suramin Chemical compound OS(=O)(=O)C1=CC(S(O)(=O)=O)=C2C(NC(=O)C3=CC=C(C(=C3)NC(=O)C=3C=C(NC(=O)NC=4C=C(C=CC=4)C(=O)NC=4C(=CC=C(C=4)C(=O)NC=4C5=C(C=C(C=C5C(=CC=4)S(O)(=O)=O)S(O)(=O)=O)S(O)(=O)=O)C)C=CC=3)C)=CC=C(S(O)(=O)=O)C2=C1 FIAFUQMPZJWCLV-UHFFFAOYSA-N 0.000 abstract 1
229960005314 suramin Drugs 0.000 abstract 1
XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 abstract 1

Classifications

- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C303/00—Preparation of esters or amides of sulfuric acids; Preparation of sulfonic acids or of their esters, halides, anhydrides or amides
- C07C303/42—Separation; Purification; Stabilisation; Use of additives
- C07C303/44—Separation; Purification

Landscapes

Chemical & Material Sciences (AREA)
Organic Chemistry (AREA)
Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
Drying Of Solid Materials (AREA)
Detergent Compositions (AREA)
Mechanical Treatment Of Semiconductor (AREA)
Manufacture Of Porous Articles, And Recovery And Treatment Of Waste Products (AREA)
Separation, Recovery Or Treatment Of Waste Materials Containing Plastics (AREA)
Pharmaceuticals Containing Other Organic And Inorganic Compounds (AREA)

AT00985741T 1999-12-17 2000-12-18 Verfahren zur entfernung von spurlösungsmittel von einem hygroskopischen material ATE358119T1 (de)

Applications Claiming Priority (1)

Application Number	Priority Date	Filing Date	Title
IE9900138		1999-12-17

Publications (1)

Publication Number	Publication Date
ATE358119T1 true ATE358119T1 (de)	2007-04-15

Family

ID=11042531

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
AT00985741T ATE358119T1 (de)	1999-12-17	2000-12-18	Verfahren zur entfernung von spurlösungsmittel von einem hygroskopischen material

Country Status (14)

Country	Link
US (1)	US6684526B2 (de)
EP (1)	EP1237853B1 (de)
JP (1)	JP2003517036A (de)
AT (1)	ATE358119T1 (de)
AU (1)	AU2214901A (de)
CA (1)	CA2389571A1 (de)
CY (1)	CY1106555T1 (de)
DE (1)	DE60034144T2 (de)
DK (1)	DK1237853T3 (de)
ES (1)	ES2282157T3 (de)
GB (1)	GB2370037B (de)
MX (1)	MXPA02004080A (de)
PT (1)	PT1237853E (de)
WO (1)	WO2001044173A1 (de)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
US7096600B2 (en) *	2002-12-13	2006-08-29	Holtec International, Inc.	Forced gas flow canister dehydration
US7707741B2 (en) *	2005-06-06	2010-05-04	Holtec International, Inc.	Method and apparatus for dehydrating high level waste based on dew point temperature measurements
EP3364136B1 (de) *	2007-12-21	2019-10-09	Holtec International, Inc.	Verfahren zur vorbereitung eines mit feuchten radioaktiven elementen beladenen containers für die trockenlagerung
AU2021319064A1 (en) *	2020-07-29	2023-03-23	Perfect Daylight Limited	Methods of manufacture of suramin

Family Cites Families (18)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
GB224849A (en) *	1923-11-14	1925-04-01	Ets Poulenc Freres	The manufacture of a symmetrical urea of meta-amino-benzoyl-meta - aminomethylbenzoyl- 1 - naphthylamino - 4-6-8-trisulphonate of sodium
US2302908A (en) *	1939-09-28	1942-11-24	Ind Rayon Corp	Method of drying thread or the like
US2634221A (en) *	1948-07-13	1953-04-07	Du Pont	Film washing process
US3270860A (en) *	1963-10-09	1966-09-06	Western Electric Co	Methods of and apparatus for processing articles
US3842515A (en) *	1972-11-20	1974-10-22	Helium A Ltd	Method for drying water-wet membranes
US4736758A (en) *	1985-04-15	1988-04-12	Wacom Co., Ltd.	Vapor drying apparatus
DE3600778A1 (de) *	1986-01-14	1987-07-16	Polygram Gmbh	Verfahren zum auffuellen und/oder aufbereiten von behandlungsfluessigkeiten
US4828760A (en) *	1987-03-09	1989-05-09	Rockwell International Corporation	Method of cleaning a spent fuel assembly
US5047153A (en) *	1989-10-31	1991-09-10	Resources Conservation Company	Method for removing amine from solids
FR2677983B1 (fr) *	1991-06-24	1995-03-03	Oreal	Composes alkylthiopoly(ethylimidazolium), procede de preparation et leur utilisation comme agents biocides.
US5597830A (en)	1994-12-20	1997-01-28	Warner-Lambert Company	Combination chemotherapy
JPH10114726A (ja) *	1996-10-15	1998-05-06	Mitsui Chem Inc	メチルアミン誘導体の乾燥方法
GB9717629D0 (en) *	1997-08-21	1997-10-22	Johnson Matthey Plc	Removal of residual organic solvents
US5913981A (en) *	1998-03-05	1999-06-22	Micron Technology, Inc.	Method of rinsing and drying semiconductor wafers in a chamber with a moveable side wall
US6045621A (en) *	1998-10-26	2000-04-04	Scd Mountain View, Inc.	Method for cleaning objects using a fluid charge
US6286231B1 (en) *	2000-01-12	2001-09-11	Semitool, Inc.	Method and apparatus for high-pressure wafer processing and drying
US6289605B1 (en) *	2000-02-18	2001-09-18	Macronix International Co. Ltd.	Method for drying a semiconductor wafer
JP2001291698A (ja) *	2000-04-10	2001-10-19	Nec Corp	処理装置および処理方法

2000
- 2000-12-18 DE DE60034144T patent/DE60034144T2/de not_active Expired - Fee Related
- 2000-12-18 GB GB0208187A patent/GB2370037B/en not_active Expired - Fee Related
- 2000-12-18 MX MXPA02004080A patent/MXPA02004080A/es active IP Right Grant
- 2000-12-18 AU AU22149/01A patent/AU2214901A/en not_active Abandoned
- 2000-12-18 EP EP00985741A patent/EP1237853B1/de not_active Expired - Lifetime
- 2000-12-18 PT PT00985741T patent/PT1237853E/pt unknown
- 2000-12-18 CA CA002389571A patent/CA2389571A1/en not_active Abandoned
- 2000-12-18 JP JP2001545261A patent/JP2003517036A/ja active Pending
- 2000-12-18 ES ES00985741T patent/ES2282157T3/es not_active Expired - Lifetime
- 2000-12-18 AT AT00985741T patent/ATE358119T1/de not_active IP Right Cessation
- 2000-12-18 DK DK00985741T patent/DK1237853T3/da active
- 2000-12-18 WO PCT/IE2000/000157 patent/WO2001044173A1/en not_active Ceased
2002
- 2002-06-14 US US10/172,617 patent/US6684526B2/en not_active Expired - Fee Related
2007
- 2007-04-30 CY CY20071100579T patent/CY1106555T1/el unknown

Also Published As

Publication number	Publication date
CA2389571A1 (en)	2001-06-21
GB2370037B (en)	2004-06-09
EP1237853B1 (de)	2007-03-28
EP1237853A1 (de)	2002-09-11
DE60034144D1 (de)	2007-05-10
MXPA02004080A (es)	2002-10-11
DE60034144T2 (de)	2008-01-03
US20020152629A1 (en)	2002-10-24
CY1106555T1 (el)	2012-01-25
GB0208187D0 (en)	2002-05-22
US6684526B2 (en)	2004-02-03
WO2001044173A1 (en)	2001-06-21
JP2003517036A (ja)	2003-05-20
GB2370037A (en)	2002-06-19
AU2214901A (en)	2001-06-25
DK1237853T3 (da)	2007-06-18
ES2282157T3 (es)	2007-10-16
PT1237853E (pt)	2007-05-31

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Legal Events

Date

Code

Title

Description

2007-09-15

UEP

Publication of translation of european patent specification

Ref document number: 1237853

Country of ref document: EP

2009-09-15

REN

Ceased due to non-payment of the annual fee