ATE372306T1 - Quarzglaselemente für excimer-laser und verfahren zu deren herstellung - Google Patents

Quarzglaselemente für excimer-laser und verfahren zu deren herstellung

Info

Publication number
ATE372306T1
ATE372306T1 AT00305786T AT00305786T ATE372306T1 AT E372306 T1 ATE372306 T1 AT E372306T1 AT 00305786 T AT00305786 T AT 00305786T AT 00305786 T AT00305786 T AT 00305786T AT E372306 T1 ATE372306 T1 AT E372306T1
Authority
AT
Austria
Prior art keywords
excimer laser
quartz glass
production
glass elements
transmittance
Prior art date
Application number
AT00305786T
Other languages
English (en)
Inventor
Hisatoshi Otsuka
Kazuoshi Shirota
Akira Fujinoki
Original Assignee
Shinetsu Chemical Co
Shinetsu Quartz Prod
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=16306505&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=ATE372306(T1) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by Shinetsu Chemical Co, Shinetsu Quartz Prod filed Critical Shinetsu Chemical Co
Application granted granted Critical
Publication of ATE372306T1 publication Critical patent/ATE372306T1/de

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/7095—Materials, e.g. materials for housing, stage or other support having particular properties, e.g. weight, strength, conductivity, thermal expansion coefficient
    • G03F7/70958—Optical materials or coatings, e.g. with particular transmittance, reflectance or anti-reflection properties
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B19/00—Other methods of shaping glass
    • C03B19/14—Other methods of shaping glass by gas- or vapour- phase reaction processes
    • C03B19/1415—Reactant delivery systems
    • C03B19/1423—Reactant deposition burners
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B19/00—Other methods of shaping glass
    • C03B19/14—Other methods of shaping glass by gas- or vapour- phase reaction processes
    • C03B19/1453—Thermal after-treatment of the shaped article, e.g. dehydrating, consolidating, sintering
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C3/00—Glass compositions
    • C03C3/04—Glass compositions containing silica
    • C03C3/06—Glass compositions containing silica with more than 90% silica by weight, e.g. quartz
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C4/00—Compositions for glass with special properties
    • C03C4/0085—Compositions for glass with special properties for UV-transmitting glass
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2201/00—Type of glass produced
    • C03B2201/06—Doped silica-based glasses
    • C03B2201/20—Doped silica-based glasses doped with non-metals other than boron or fluorine
    • C03B2201/21—Doped silica-based glasses doped with non-metals other than boron or fluorine doped with molecular hydrogen
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2207/00—Glass deposition burners
    • C03B2207/04—Multi-nested ports
    • C03B2207/06—Concentric circular ports
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2207/00—Glass deposition burners
    • C03B2207/20—Specific substances in specified ports, e.g. all gas flows specified
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2207/00—Glass deposition burners
    • C03B2207/30—For glass precursor of non-standard type, e.g. solid SiH3F
    • C03B2207/32—Non-halide
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2207/00—Glass deposition burners
    • C03B2207/36—Fuel or oxidant details, e.g. flow rate, flow rate ratio, fuel additives
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2207/00—Glass deposition burners
    • C03B2207/80—Feeding the burner or the burner-heated deposition site
    • C03B2207/85—Feeding the burner or the burner-heated deposition site with vapour generated from liquid glass precursors, e.g. directly by heating the liquid
    • C03B2207/86—Feeding the burner or the burner-heated deposition site with vapour generated from liquid glass precursors, e.g. directly by heating the liquid by bubbling a gas through the liquid
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2201/00—Glass compositions
    • C03C2201/06—Doped silica-based glasses
    • C03C2201/20—Doped silica-based glasses containing non-metals other than boron or halide
    • C03C2201/21—Doped silica-based glasses containing non-metals other than boron or halide containing molecular hydrogen
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2203/00—Production processes
    • C03C2203/40—Gas-phase processes

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Organic Chemistry (AREA)
  • Materials Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Physics & Mathematics (AREA)
  • Geochemistry & Mineralogy (AREA)
  • General Chemical & Material Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Manufacturing & Machinery (AREA)
  • Epidemiology (AREA)
  • Environmental & Geological Engineering (AREA)
  • Thermal Sciences (AREA)
  • Public Health (AREA)
  • Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Glass Compositions (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Glass Melting And Manufacturing (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
AT00305786T 1999-07-07 2000-07-07 Quarzglaselemente für excimer-laser und verfahren zu deren herstellung ATE372306T1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP19335399A JP2001019465A (ja) 1999-07-07 1999-07-07 エキシマレーザ用合成石英ガラス部材及びその製造方法

Publications (1)

Publication Number Publication Date
ATE372306T1 true ATE372306T1 (de) 2007-09-15

Family

ID=16306505

Family Applications (1)

Application Number Title Priority Date Filing Date
AT00305786T ATE372306T1 (de) 1999-07-07 2000-07-07 Quarzglaselemente für excimer-laser und verfahren zu deren herstellung

Country Status (5)

Country Link
US (1) US6541405B1 (de)
EP (1) EP1067096B1 (de)
JP (1) JP2001019465A (de)
AT (1) ATE372306T1 (de)
DE (1) DE60036252T2 (de)

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6410192B1 (en) 1999-11-15 2002-06-25 Corning Incorporated Photolithography method, photolithography mask blanks, and method of making
US6317209B1 (en) 1999-12-09 2001-11-13 Corning Incorporated Automated system for measurement of an optical property
JP3865039B2 (ja) * 2000-08-18 2007-01-10 信越化学工業株式会社 合成石英ガラスの製造方法および合成石英ガラス並びに合成石英ガラス基板
KR20040045015A (ko) * 2001-09-27 2004-05-31 코닝 인코포레이티드 고 내부 투과도 및 저 복굴절을 갖는 용융 실리카
US20040162211A1 (en) * 2001-09-27 2004-08-19 Domey Jeffrey J. Fused silica having high internal transmission and low birefringence
JP4158009B2 (ja) 2001-12-11 2008-10-01 信越化学工業株式会社 合成石英ガラスインゴット及び合成石英ガラスの製造方法
US6761951B2 (en) 2001-12-11 2004-07-13 Shin-Etsu Chemical Co., Ltd. Synthetic quartz glass blank
JP4017863B2 (ja) 2001-12-18 2007-12-05 信越石英株式会社 アニール炉及び光学用合成石英ガラスの製造方法
DE50312961D1 (de) * 2002-03-01 2010-09-23 Schott Ag Verfahren zu Herstellung von Quarzglas und einer Quarzglasvorform
EP1491513A1 (de) * 2002-03-25 2004-12-29 Nikon Corporation Synthetisches quarzglaselement und herstellungsverfahren dafür
JP2005255423A (ja) * 2004-03-09 2005-09-22 Asahi Glass Co Ltd 合成石英ガラス製フォトマスク基板およびフォトマスク
JP4692745B2 (ja) * 2005-02-25 2011-06-01 株式会社ニコン マスク基板、フォトマスク、露光方法、露光装置の管理方法、及びデバイス製造方法
JP2008063181A (ja) * 2006-09-07 2008-03-21 Shin Etsu Chem Co Ltd エキシマレーザー用合成石英ガラス基板及びその製造方法
KR101387071B1 (ko) * 2007-07-12 2014-04-18 칼 자이스 에스엠에스 엘티디 원자외선 투과 매핑을 위한 방법
JP2021067908A (ja) * 2019-10-28 2021-04-30 Hoya株式会社 マスクブランク、転写用マスク、及び半導体デバイスの製造方法

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS51102014A (en) 1974-11-01 1976-09-09 Komatsu Denshi Kinzoku Kk Kojundotomeigarasutaino seizohoho
US5086352A (en) 1989-06-09 1992-02-04 Shin-Etsu Quartz Products Co., Ltd. Optical members and blanks or synthetic silica glass and method for their production
JP2881930B2 (ja) * 1990-03-28 1999-04-12 三菱マテリアル株式会社 光伝送用石英ガラスの製造方法
JP3114979B2 (ja) 1990-04-05 2000-12-04 信越化学工業株式会社 合成石英ガラス部材およびその製造方法
JP3007510B2 (ja) 1993-04-27 2000-02-07 信越化学工業株式会社 合成石英ガラス部材の製造方法
EP0870737B1 (de) 1997-04-08 2002-07-24 Shin-Etsu Quartz Products Co., Ltd. Optisches synthetisches Quarzglas, Herstellungsverfahren davon, und optisches Element für Excimer-Laser mit dem synthetischen Quarzglas
TW440548B (en) 1997-05-14 2001-06-16 Nippon Kogaku Kk Synthetic silica glass optical member and method of manufacturing the same
US6143676A (en) * 1997-05-20 2000-11-07 Heraeus Quarzglas Gmbh Synthetic silica glass used with uv-rays and method producing the same
EP0978487A3 (de) 1998-08-07 2001-02-21 Corning Incorporated Brenner mit abgedichtetem Kopf und ohne Vormischung für die Abscheidung von Quarzglas
ES2248961T3 (es) 1998-12-28 2006-03-16 PIRELLI & C. S.P.A. Procedimieto para la produccion de silice mediante descomposicion de un organolsilano.
US6649268B1 (en) 1999-03-10 2003-11-18 Nikon Corporation Optical member made of silica glass, method for manufacturing silica glass, and reduction projection exposure apparatus using the optical member
JP2001010833A (ja) 1999-06-21 2001-01-16 Nikon Corp 石英ガラス部材

Also Published As

Publication number Publication date
JP2001019465A (ja) 2001-01-23
EP1067096A3 (de) 2001-10-17
DE60036252T2 (de) 2008-06-05
EP1067096A2 (de) 2001-01-10
EP1067096B1 (de) 2007-09-05
US6541405B1 (en) 2003-04-01
DE60036252D1 (de) 2007-10-18

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Legal Events

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