ATE377036T1 - Siloxan-harz basierte anti- reflektionsbeschichtung mit hoher nassätzgeschwindigkeit - Google Patents
Siloxan-harz basierte anti- reflektionsbeschichtung mit hoher nassätzgeschwindigkeitInfo
- Publication number
- ATE377036T1 ATE377036T1 AT04753141T AT04753141T ATE377036T1 AT E377036 T1 ATE377036 T1 AT E377036T1 AT 04753141 T AT04753141 T AT 04753141T AT 04753141 T AT04753141 T AT 04753141T AT E377036 T1 ATE377036 T1 AT E377036T1
- Authority
- AT
- Austria
- Prior art keywords
- sub
- siloxane resin
- wet etching
- reflection coating
- resin based
- Prior art date
Links
- KPUWHANPEXNPJT-UHFFFAOYSA-N disiloxane Chemical class [SiH3]O[SiH3] KPUWHANPEXNPJT-UHFFFAOYSA-N 0.000 title abstract 4
- 239000011347 resin Substances 0.000 title abstract 2
- 229920005989 resin Polymers 0.000 title abstract 2
- 239000011248 coating agent Substances 0.000 title 1
- 238000000576 coating method Methods 0.000 title 1
- 238000001039 wet etching Methods 0.000 title 1
- 239000006117 anti-reflective coating Substances 0.000 abstract 2
- 238000000034 method Methods 0.000 abstract 2
- 239000011342 resin composition Substances 0.000 abstract 2
- 125000003118 aryl group Chemical group 0.000 abstract 1
- 239000000203 mixture Substances 0.000 abstract 1
- 239000000758 substrate Substances 0.000 abstract 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
- C08G77/04—Polysiloxanes
- C08G77/38—Polysiloxanes modified by chemical after-treatment
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
- C08G77/04—Polysiloxanes
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L83/00—Compositions of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon only; Compositions of derivatives of such polymers
- C08L83/04—Polysiloxanes
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D183/00—Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Coating compositions based on derivatives of such polymers
- C09D183/04—Polysiloxanes
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
- C08G77/04—Polysiloxanes
- C08G77/14—Polysiloxanes containing silicon bound to oxygen-containing groups
- C08G77/16—Polysiloxanes containing silicon bound to oxygen-containing groups to hydroxyl groups
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
- C08G77/04—Polysiloxanes
- C08G77/14—Polysiloxanes containing silicon bound to oxygen-containing groups
- C08G77/18—Polysiloxanes containing silicon bound to oxygen-containing groups to alkoxy or aryloxy groups
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
- C08G77/70—Siloxanes defined by use of the MDTQ nomenclature
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/31504—Composite [nonstructural laminate]
- Y10T428/31652—Of asbestos
- Y10T428/31663—As siloxane, silicone or silane
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Polymers & Plastics (AREA)
- Health & Medical Sciences (AREA)
- Medicinal Chemistry (AREA)
- Materials Engineering (AREA)
- Wood Science & Technology (AREA)
- Engineering & Computer Science (AREA)
- Life Sciences & Earth Sciences (AREA)
- General Chemical & Material Sciences (AREA)
- Silicon Polymers (AREA)
- Paints Or Removers (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US47366903P | 2003-05-23 | 2003-05-23 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| ATE377036T1 true ATE377036T1 (de) | 2007-11-15 |
Family
ID=33539053
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| AT04753141T ATE377036T1 (de) | 2003-05-23 | 2004-05-20 | Siloxan-harz basierte anti- reflektionsbeschichtung mit hoher nassätzgeschwindigkeit |
Country Status (9)
| Country | Link |
|---|---|
| US (1) | US7368173B2 (de) |
| EP (1) | EP1627007B1 (de) |
| JP (1) | JP4796498B2 (de) |
| KR (1) | KR101156200B1 (de) |
| CN (1) | CN100355813C (de) |
| AT (1) | ATE377036T1 (de) |
| DE (1) | DE602004009791T2 (de) |
| TW (1) | TWI359848B (de) |
| WO (1) | WO2004113417A1 (de) |
Families Citing this family (32)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7108958B2 (en) | 2002-07-31 | 2006-09-19 | Brewer Science Inc. | Photosensitive bottom anti-reflective coatings |
| JP5368674B2 (ja) | 2003-10-15 | 2013-12-18 | ブルーワー サイエンス アイ エヌ シー． | 現像液に可溶な材料および現像液に可溶な材料をビアファーストデュアルダマシン適用において用いる方法 |
| US20050255410A1 (en) | 2004-04-29 | 2005-11-17 | Guerrero Douglas J | Anti-reflective coatings using vinyl ether crosslinkers |
| EP1846479B1 (de) | 2004-12-17 | 2010-10-27 | Dow Corning Corporation | Siloxanharzbeschichtung |
| DE602005008100D1 (de) | 2004-12-17 | 2008-08-21 | Dow Corning | Verfahren zur ausbildung einer antireflexionsbeschichtung |
| US7816071B2 (en) | 2005-02-10 | 2010-10-19 | Az Electronic Materials Usa Corp. | Process of imaging a photoresist with multiple antireflective coatings |
| US20070015082A1 (en) | 2005-07-14 | 2007-01-18 | International Business Machines Corporation | Process of making a lithographic structure using antireflective materials |
| CN101371196B (zh) | 2006-02-13 | 2012-07-04 | 陶氏康宁公司 | 抗反射涂料 |
| US7704670B2 (en) * | 2006-06-22 | 2010-04-27 | Az Electronic Materials Usa Corp. | High silicon-content thin film thermosets |
| US7914974B2 (en) | 2006-08-18 | 2011-03-29 | Brewer Science Inc. | Anti-reflective imaging layer for multiple patterning process |
| US8026201B2 (en) | 2007-01-03 | 2011-09-27 | Az Electronic Materials Usa Corp. | Stripper for coating layer |
| US8026040B2 (en) | 2007-02-20 | 2011-09-27 | Az Electronic Materials Usa Corp. | Silicone coating composition |
| US7736837B2 (en) | 2007-02-20 | 2010-06-15 | Az Electronic Materials Usa Corp. | Antireflective coating composition based on silicon polymer |
| CN101622296B (zh) * | 2007-02-27 | 2013-10-16 | Az电子材料美国公司 | 硅基抗反射涂料组合物 |
| US20090162800A1 (en) * | 2007-12-20 | 2009-06-25 | David Abdallah | Process for Imaging a Photoresist Coated over an Antireflective Coating |
| WO2009088600A1 (en) | 2008-01-08 | 2009-07-16 | Dow Corning Toray Co., Ltd. | Silsesquioxane resins |
| CN101910253B (zh) * | 2008-01-15 | 2013-04-10 | 陶氏康宁公司 | 倍半硅氧烷树脂 |
| WO2009097436A2 (en) | 2008-01-29 | 2009-08-06 | Brewer Science Inc. | On-track process for patterning hardmask by multiple dark field exposures |
| JP5581225B2 (ja) | 2008-03-04 | 2014-08-27 | ダウ・コーニング・コーポレイション | シルセスキオキサン樹脂 |
| CN101970540B (zh) * | 2008-03-05 | 2014-07-23 | 陶氏康宁公司 | 倍半硅氧烷树脂 |
| EP2376584B1 (de) * | 2008-12-10 | 2014-07-16 | Dow Corning Corporation | Nassätzbare antireflexbeschichtungen |
| EP2373722A4 (de) | 2008-12-10 | 2013-01-23 | Dow Corning | Silsesquioxanharze |
| US9640396B2 (en) | 2009-01-07 | 2017-05-02 | Brewer Science Inc. | Spin-on spacer materials for double- and triple-patterning lithography |
| US20100291475A1 (en) * | 2009-05-12 | 2010-11-18 | Chenghong Li | Silicone Coating Compositions |
| SG11201703196WA (en) * | 2014-10-24 | 2017-05-30 | Versum Materials Us Llc | Compositions and methods using same for deposition of silicon-containing films |
| US9442377B1 (en) | 2015-06-15 | 2016-09-13 | Rohm And Haas Electronic Materials Llc | Wet-strippable silicon-containing antireflectant |
| US10410883B2 (en) * | 2016-06-01 | 2019-09-10 | Corning Incorporated | Articles and methods of forming vias in substrates |
| US10794679B2 (en) | 2016-06-29 | 2020-10-06 | Corning Incorporated | Method and system for measuring geometric parameters of through holes |
| US10580725B2 (en) | 2017-05-25 | 2020-03-03 | Corning Incorporated | Articles having vias with geometry attributes and methods for fabricating the same |
| US11078112B2 (en) | 2017-05-25 | 2021-08-03 | Corning Incorporated | Silica-containing substrates with vias having an axially variable sidewall taper and methods for forming the same |
| US12180108B2 (en) | 2017-12-19 | 2024-12-31 | Corning Incorporated | Methods for etching vias in glass-based articles employing positive charge organic molecules |
| US11554984B2 (en) | 2018-02-22 | 2023-01-17 | Corning Incorporated | Alkali-free borosilicate glasses with low post-HF etch roughness |
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| US4183804A (en) * | 1977-11-04 | 1980-01-15 | Uop Inc. | Hydrocarbon conversion with an activated multimetallic catalytic composite |
| US4172805A (en) * | 1978-02-27 | 1979-10-30 | Dow Corning Corporation | Benzyloxy endblocked organosilicon dielectric fluids and electrical devices containing same |
| US4587138A (en) | 1984-11-09 | 1986-05-06 | Intel Corporation | MOS rear end processing |
| US5100503A (en) | 1990-09-14 | 1992-03-31 | Ncr Corporation | Silica-based anti-reflective planarizing layer |
| US5210168A (en) | 1992-04-02 | 1993-05-11 | Dow Corning Corporation | Process for forming siloxane bonds |
| US5441765A (en) | 1993-09-22 | 1995-08-15 | Dow Corning Corporation | Method of forming Si-O containing coatings |
| JP2739902B2 (ja) * | 1993-09-30 | 1998-04-15 | 東京応化工業株式会社 | 酸化ケイ素系被膜形成用塗布液 |
| JPH08130247A (ja) * | 1994-10-31 | 1996-05-21 | Nippon Zeon Co Ltd | シロキサン系ポリマー含有塗布液及びその製造方法 |
| JPH09124794A (ja) | 1995-11-06 | 1997-05-13 | Dow Corning Asia Ltd | 有機光機能材を含有するポリシロキサン樹脂組成物及びそれから得られる透明な光機能素子 |
| JP3694703B2 (ja) * | 1996-04-25 | 2005-09-14 | Ａｚエレクトロニックマテリアルズ株式会社 | 反射防止コーティング用組成物 |
| US5886102A (en) * | 1996-06-11 | 1999-03-23 | Shipley Company, L.L.C. | Antireflective coating compositions |
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| US6277485B1 (en) * | 1998-01-27 | 2001-08-21 | 3M Innovative Properties Company | Antisoiling coatings for antireflective surfaces and methods of preparation |
| US6344284B1 (en) | 1998-04-10 | 2002-02-05 | Organic Display Technology | Organic electroluminescent materials and devices made from such materials |
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| US6268457B1 (en) * | 1999-06-10 | 2001-07-31 | Allied Signal, Inc. | Spin-on glass anti-reflective coatings for photolithography |
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| US6982006B1 (en) * | 1999-10-19 | 2006-01-03 | Boyers David G | Method and apparatus for treating a substrate with an ozone-solvent solution |
| KR100355604B1 (ko) | 1999-12-23 | 2002-10-12 | 주식회사 하이닉스반도체 | 난반사 방지막용 중합체와 그 제조방법 |
| JP3795333B2 (ja) | 2000-03-30 | 2006-07-12 | 東京応化工業株式会社 | 反射防止膜形成用組成物 |
| US6420088B1 (en) | 2000-06-23 | 2002-07-16 | International Business Machines Corporation | Antireflective silicon-containing compositions as hardmask layer |
| US6368400B1 (en) | 2000-07-17 | 2002-04-09 | Honeywell International | Absorbing compounds for spin-on-glass anti-reflective coatings for photolithography |
| EP1197998A3 (de) | 2000-10-10 | 2005-12-21 | Shipley Company LLC | Antireflektiver Schaumstoff |
| TW538319B (en) | 2000-10-10 | 2003-06-21 | Shipley Co Llc | Antireflective composition, method for forming antireflective coating layer, and method for manufacturing electronic device |
| US6589711B1 (en) | 2001-04-04 | 2003-07-08 | Advanced Micro Devices, Inc. | Dual inlaid process using a bilayer resist |
| US6746530B2 (en) | 2001-08-02 | 2004-06-08 | Chunghwa Pictures Tubes, Ltd. | High contrast, moisture resistant antistatic/antireflective coating for CRT display screen |
| US20030096090A1 (en) | 2001-10-22 | 2003-05-22 | Boisvert Ronald Paul | Etch-stop resins |
| AU2002227106A1 (en) * | 2001-11-15 | 2003-06-10 | Honeywell International Inc. | Spin-on anti-reflective coatings for photolithography |
| WO2003044077A1 (en) | 2001-11-16 | 2003-05-30 | Honeywell International Inc. | Spin-on-glass anti-reflective coatings for photolithography |
| AU2002359387A1 (en) | 2001-11-15 | 2003-06-10 | Honeywell International Inc. | Anti-reflective coatings for photolithography and methods of preparation thereof |
| US6730454B2 (en) | 2002-04-16 | 2004-05-04 | International Business Machines Corporation | Antireflective SiO-containing compositions for hardmask layer |
| DE10227807A1 (de) * | 2002-06-21 | 2004-01-22 | Honeywell Specialty Chemicals Seelze Gmbh | Silylalkylester von Anthracen- und Phenanthrencarbonsäuren |
| AU2002329596A1 (en) * | 2002-07-11 | 2004-02-02 | International Business Machines Corporation | Antireflective silicon-containing compositions as hardmask layer |
| AU2003295517A1 (en) | 2002-11-12 | 2004-06-03 | Honeywell International Inc | Anti-reflective coatings for photolithography and methods of preparation thereof |
| WO2004051376A1 (ja) | 2002-12-02 | 2004-06-17 | Tokyo Ohka Kogyo Co., Ltd. | 反射防止膜形成用組成物 |
| WO2005035236A1 (en) | 2003-09-15 | 2005-04-21 | Sunco Products, Inc. | Sheeting system |
| EP1668698A1 (de) | 2003-09-29 | 2006-06-14 | Siemens Aktiengesellschaft | Plastisch verformbarer kühlkörper für elektrische und/oder elektronische bauelemente |
| GB2421710A (en) | 2003-10-08 | 2006-07-05 | High Voltage Graphics Inc | Processes for precutting laminated flocked articles |
| SG119201A1 (en) | 2003-10-13 | 2006-02-28 | Sportiv Tech Lab Pte Ltd | Utility garment |
-
2004
- 2004-05-20 JP JP2006533350A patent/JP4796498B2/ja not_active Expired - Fee Related
- 2004-05-20 US US10/552,432 patent/US7368173B2/en not_active Expired - Fee Related
- 2004-05-20 DE DE200460009791 patent/DE602004009791T2/de not_active Expired - Lifetime
- 2004-05-20 AT AT04753141T patent/ATE377036T1/de not_active IP Right Cessation
- 2004-05-20 CN CNB2004800113767A patent/CN100355813C/zh not_active Expired - Fee Related
- 2004-05-20 EP EP20040753141 patent/EP1627007B1/de not_active Expired - Lifetime
- 2004-05-20 WO PCT/US2004/016265 patent/WO2004113417A1/en not_active Ceased
- 2004-05-20 KR KR1020057021818A patent/KR101156200B1/ko not_active Expired - Fee Related
- 2004-05-21 TW TW93114541A patent/TWI359848B/zh not_active IP Right Cessation
Also Published As
| Publication number | Publication date |
|---|---|
| KR20060009939A (ko) | 2006-02-01 |
| JP2006528999A (ja) | 2006-12-28 |
| TW200427799A (en) | 2004-12-16 |
| US20060194916A1 (en) | 2006-08-31 |
| TWI359848B (en) | 2012-03-11 |
| EP1627007A1 (de) | 2006-02-22 |
| DE602004009791D1 (de) | 2007-12-13 |
| KR101156200B1 (ko) | 2012-06-18 |
| US7368173B2 (en) | 2008-05-06 |
| WO2004113417A1 (en) | 2004-12-29 |
| DE602004009791T2 (de) | 2008-10-30 |
| CN1780874A (zh) | 2006-05-31 |
| JP4796498B2 (ja) | 2011-10-19 |
| CN100355813C (zh) | 2007-12-19 |
| EP1627007B1 (de) | 2007-10-31 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| RER | Ceased as to paragraph 5 lit. 3 law introducing patent treaties |