ATE392709T1 - Verfahren und vorrichtung zur reinigung von einem einzigem substrat - Google Patents

Verfahren und vorrichtung zur reinigung von einem einzigem substrat

Info

Publication number
ATE392709T1
ATE392709T1 AT01120516T AT01120516T ATE392709T1 AT E392709 T1 ATE392709 T1 AT E392709T1 AT 01120516 T AT01120516 T AT 01120516T AT 01120516 T AT01120516 T AT 01120516T AT E392709 T1 ATE392709 T1 AT E392709T1
Authority
AT
Austria
Prior art keywords
wafer
cleaning
supplied
face
inert gas
Prior art date
Application number
AT01120516T
Other languages
English (en)
Inventor
Yuji Ono
Ryoichi Ohkura
Original Assignee
S E S Company Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by S E S Company Ltd filed Critical S E S Company Ltd
Application granted granted Critical
Publication of ATE392709T1 publication Critical patent/ATE392709T1/de

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P52/00—Grinding, lapping or polishing of wafers, substrates or parts of devices
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/50—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for positioning, orientation or alignment
    • H10P72/53—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for positioning, orientation or alignment using optical controlling means
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/04—Apparatus for manufacture or treatment
    • H10P72/0402—Apparatus for fluid treatment
    • H10P72/0406—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
    • H10P72/0408—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for drying
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/04—Apparatus for manufacture or treatment
    • H10P72/0402—Apparatus for fluid treatment
    • H10P72/0406—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
    • H10P72/0411—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
    • H10P72/0414—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing using mainly spraying means, e.g. nozzles
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S134/00—Cleaning and liquid contact with solids
    • Y10S134/902—Semiconductor wafer

Landscapes

  • Cleaning Or Drying Semiconductors (AREA)
  • Cleaning By Liquid Or Steam (AREA)
AT01120516T 2000-12-05 2001-08-28 Verfahren und vorrichtung zur reinigung von einem einzigem substrat ATE392709T1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2000370718A JP2002176026A (ja) 2000-12-05 2000-12-05 枚葉式基板洗浄方法および枚葉式基板洗浄装置

Publications (1)

Publication Number Publication Date
ATE392709T1 true ATE392709T1 (de) 2008-05-15

Family

ID=18840556

Family Applications (1)

Application Number Title Priority Date Filing Date
AT01120516T ATE392709T1 (de) 2000-12-05 2001-08-28 Verfahren und vorrichtung zur reinigung von einem einzigem substrat

Country Status (10)

Country Link
US (2) US7029538B2 (de)
EP (1) EP1213746B1 (de)
JP (1) JP2002176026A (de)
KR (1) KR100812482B1 (de)
CN (1) CN1217386C (de)
AT (1) ATE392709T1 (de)
DE (1) DE60133618T2 (de)
IL (1) IL145118A0 (de)
SG (1) SG101461A1 (de)
TW (1) TW518684B (de)

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KR100897547B1 (ko) * 2007-11-05 2009-05-15 세메스 주식회사 기판 처리 장치 및 방법
CN101673062B (zh) * 2008-09-09 2011-10-26 中芯国际集成电路制造(北京)有限公司 一种全湿法去胶的装置
CN102410711B (zh) * 2010-09-21 2014-02-26 如皋市大昌电子有限公司 一种二极管脱水机
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US20130068264A1 (en) * 2011-09-21 2013-03-21 Nanya Technology Corporation Wafer scrubber apparatus
US20130171832A1 (en) * 2011-12-28 2013-07-04 Intermolecular Inc. Enhanced Isolation For Combinatorial Atomic Layer Deposition (ALD)
US20130269612A1 (en) * 2012-04-16 2013-10-17 Hermes-Epitek Corporation Gas Treatment Apparatus with Surrounding Spray Curtains
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JP6010398B2 (ja) * 2012-08-31 2016-10-19 株式会社Ｓｃｒｅｅｎホールディングス 基板処理装置
JP5973299B2 (ja) * 2012-09-25 2016-08-23 株式会社Ｓｃｒｅｅｎホールディングス 基板処理装置
CN102915909A (zh) * 2012-10-08 2013-02-06 上海华力微电子有限公司 一种改进酸槽式硅片清洗设备内环境的方法
KR101925581B1 (ko) * 2012-11-23 2018-12-05 주식회사 원익아이피에스 챔버 세정 방법
KR101536718B1 (ko) * 2013-01-31 2015-07-15 세메스 주식회사 지지 유닛, 이송 유닛, 기판 처리 장치, 그리고 기판 처리 장치를 이용한 기판 처리 방법
US10707099B2 (en) 2013-08-12 2020-07-07 Veeco Instruments Inc. Collection chamber apparatus to separate multiple fluids during the semiconductor wafer processing cycle
CN110060925B (zh) 2014-03-28 2023-02-17 株式会社斯库林集团 基板处理方法
CN104438201A (zh) * 2014-11-26 2015-03-25 乐山新天源太阳能科技有限公司 一种硅料清洗工艺及其设备
TWI582886B (zh) * 2016-01-12 2017-05-11 弘塑科技股份有限公司 單晶圓溼式處理裝置
CN106824884A (zh) * 2017-03-31 2017-06-13 贵州大学 一种硅片翻转冲洗装置
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JP2019054112A (ja) * 2017-09-15 2019-04-04 株式会社Ｓｃｒｅｅｎホールディングス 基板乾燥方法および基板乾燥装置
JP6442018B2 (ja) * 2017-10-04 2018-12-19 株式会社Ｓｃｒｅｅｎホールディングス 基板処理方法
JP6990602B2 (ja) * 2018-02-27 2022-01-12 東京エレクトロン株式会社 基板処理装置、基板処理方法及びコンピュータ読み取り可能な記録媒体
US11742232B2 (en) * 2018-08-22 2023-08-29 Tokyo Electron Limited Substrate processing method and substrate processing apparatus
CN110148573B (zh) * 2019-04-17 2020-12-04 湖州达立智能设备制造有限公司 一种半导体设备工艺腔的晶圆升降装置
JP7315389B2 (ja) * 2019-06-28 2023-07-26 株式会社Ｓｃｒｅｅｎホールディングス 基板処理装置および基板処理方法
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CN115143746B (zh) * 2022-07-25 2023-05-12 广东技术师范大学 一种大功率模组生产堆叠式热烘除湿装置
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Also Published As

Publication number Publication date
IL145118A0 (en) 2002-06-30
SG101461A1 (en) 2004-01-30
KR20020044536A (ko) 2002-06-15
DE60133618D1 (de) 2008-05-29
US6807974B2 (en) 2004-10-26
EP1213746A3 (de) 2006-04-05
US7029538B2 (en) 2006-04-18
CN1217386C (zh) 2005-08-31
US20020074020A1 (en) 2002-06-20
US20030047192A1 (en) 2003-03-13
JP2002176026A (ja) 2002-06-21
CN1357907A (zh) 2002-07-10
EP1213746A2 (de) 2002-06-12
DE60133618T2 (de) 2008-08-07
EP1213746B1 (de) 2008-04-16
TW518684B (en) 2003-01-21
KR100812482B1 (ko) 2008-03-10

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