ATE393840T1 - Verfahren zur temperaturgesteuerten dampfabscheidung auf einem substrat - Google Patents

Verfahren zur temperaturgesteuerten dampfabscheidung auf einem substrat

Info

Publication number
ATE393840T1
ATE393840T1 AT01923924T AT01923924T ATE393840T1 AT E393840 T1 ATE393840 T1 AT E393840T1 AT 01923924 T AT01923924 T AT 01923924T AT 01923924 T AT01923924 T AT 01923924T AT E393840 T1 ATE393840 T1 AT E393840T1
Authority
AT
Austria
Prior art keywords
substrate
vapor deposition
temperature
layer
substance
Prior art date
Application number
AT01923924T
Other languages
English (en)
Inventor
Dina Katsir
Zvi Finkelstein
Israel Tartakovsky
Original Assignee
Acktar Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Acktar Ltd filed Critical Acktar Ltd
Application granted granted Critical
Publication of ATE393840T1 publication Critical patent/ATE393840T1/de

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/54—Controlling or regulating the coating process
    • C23C14/541—Heating or cooling of the substrates
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/562—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks for coating elongated substrates

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Chemical Vapour Deposition (AREA)
AT01923924T 2000-04-09 2001-04-05 Verfahren zur temperaturgesteuerten dampfabscheidung auf einem substrat ATE393840T1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
IL13555000A IL135550A0 (en) 2000-04-09 2000-04-09 Method and apparatus for temperature controlled vapor deposition on a substrate
PCT/IL2001/000326 WO2001076768A1 (en) 2000-04-09 2001-04-05 Method and apparatus for temperature controlled vapor deposition on a substrate

Publications (1)

Publication Number Publication Date
ATE393840T1 true ATE393840T1 (de) 2008-05-15

Family

ID=11074035

Family Applications (1)

Application Number Title Priority Date Filing Date
AT01923924T ATE393840T1 (de) 2000-04-09 2001-04-05 Verfahren zur temperaturgesteuerten dampfabscheidung auf einem substrat

Country Status (7)

Country Link
EP (1) EP1390157B1 (de)
JP (1) JP4439156B2 (de)
AT (1) ATE393840T1 (de)
AU (1) AU2001250604A1 (de)
DE (1) DE60133838T2 (de)
IL (1) IL135550A0 (de)
WO (1) WO2001076768A1 (de)

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2418628B (en) 2004-10-01 2006-12-13 Acktar Ltd Improved laminates and the manufacture thereof
JP4747658B2 (ja) * 2005-04-22 2011-08-17 大日本印刷株式会社 成膜装置及び成膜方法
JP4747665B2 (ja) * 2005-05-11 2011-08-17 大日本印刷株式会社 成膜装置及び成膜方法
RU2436787C2 (ru) 2005-07-29 2011-12-20 Тиботек Фармасьютикалз Лтд. Макроциклические ингибиторы вируса гепатита с
KR20100126717A (ko) * 2008-03-04 2010-12-02 솔렉슨트 코포레이션 태양 전지의 제조 방법
JP5528727B2 (ja) * 2009-06-19 2014-06-25 富士フイルム株式会社 薄膜トランジスタ製造装置、酸化物半導体薄膜の製造方法、薄膜トランジスタの製造方法、酸化物半導体薄膜、薄膜トランジスタ及び発光デバイス
JP5278218B2 (ja) * 2009-07-15 2013-09-04 住友金属鉱山株式会社 長尺樹脂フィルム処理装置およびロール冷却装置と、ロール冷却方法および長尺樹脂フィルムとロールの冷却方法
JP5959099B2 (ja) 2011-07-29 2016-08-02 日東電工株式会社 積層体の製造方法
CN103628046B (zh) * 2012-08-24 2015-11-11 中微半导体设备(上海)有限公司 一种调节基片表面温度的控温系统和控温方法
US9380813B2 (en) * 2014-02-11 2016-07-05 Timothy McCullough Drug delivery system and method
US10821240B2 (en) 2014-02-11 2020-11-03 Vapor Cartridge Technology Llc Methods and drug delivery devices using cannabis
US9220294B2 (en) 2014-02-11 2015-12-29 Timothy McCullough Methods and devices using cannabis vapors
CN113454263A (zh) * 2019-02-20 2021-09-28 松下知识产权经营株式会社 制膜方法、制膜装置及电极箔的制造方法
US11497249B2 (en) 2019-09-16 2022-11-15 Vapor Cartridge Technology Llc Drug delivery system with stackable substrates

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59173266A (ja) * 1983-03-23 1984-10-01 Fuji Photo Film Co Ltd 薄膜形成装置
WO1989001230A1 (en) * 1987-07-30 1989-02-09 Matsushita Electric Industrial Co., Ltd. Electrolytic capacitor and production method thereof
US4844009A (en) * 1987-11-28 1989-07-04 Leybold Aktiengesellschaft Apparatus for coating webs of material having an open structure in depth
WO1989010430A1 (en) * 1988-04-27 1989-11-02 American Thin Film Laboratories, Inc. Vacuum coating system
US5239026A (en) * 1991-08-26 1993-08-24 Minnesota Mining And Manufacturing Company Low loss high numerical aperture cladded optical fibers
US5803976A (en) * 1993-11-09 1998-09-08 Imperial Chemical Industries Plc Vacuum web coating
TW289900B (de) * 1994-04-22 1996-11-01 Gould Electronics Inc
TW359688B (en) * 1995-02-28 1999-06-01 Nisshin Steel Co Ltd High anticorrosion Zn-Mg series-plated steel sheet and method of manufacture it
US5997956A (en) * 1995-08-04 1999-12-07 Microcoating Technologies Chemical vapor deposition and powder formation using thermal spray with near supercritical and supercritical fluid solutions

Also Published As

Publication number Publication date
WO2001076768A1 (en) 2001-10-18
EP1390157A1 (de) 2004-02-25
JP2005537385A (ja) 2005-12-08
DE60133838T2 (de) 2009-06-10
AU2001250604A1 (en) 2001-10-23
DE60133838D1 (de) 2008-06-12
JP4439156B2 (ja) 2010-03-24
EP1390157A4 (de) 2006-06-07
EP1390157B1 (de) 2008-04-30
IL135550A0 (en) 2001-05-20

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Legal Events

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