ATE394521T1 - Verfahren zur herstellung dünner polykristalliner mgo filme - Google Patents

Verfahren zur herstellung dünner polykristalliner mgo filme

Info

Publication number
ATE394521T1
ATE394521T1 AT01904365T AT01904365T ATE394521T1 AT E394521 T1 ATE394521 T1 AT E394521T1 AT 01904365 T AT01904365 T AT 01904365T AT 01904365 T AT01904365 T AT 01904365T AT E394521 T1 ATE394521 T1 AT E394521T1
Authority
AT
Austria
Prior art keywords
producing thin
thin polycrystalline
polycrystalline mgo
mgo films
substrate
Prior art date
Application number
AT01904365T
Other languages
English (en)
Inventor
Yasuhiro Iijima
Mariko Kimura
Takashi Saito
Original Assignee
Fujikura Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujikura Ltd filed Critical Fujikura Ltd
Application granted granted Critical
Publication of ATE394521T1 publication Critical patent/ATE394521T1/de

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/08—Oxides
    • C23C14/081—Oxides of aluminium, magnesium or beryllium
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/46—Sputtering by ion beam produced by an external ion source

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Superconductors And Manufacturing Methods Therefor (AREA)
  • Physical Vapour Deposition (AREA)
  • Compounds Of Alkaline-Earth Elements, Aluminum Or Rare-Earth Metals (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
AT01904365T 2000-02-09 2001-02-09 Verfahren zur herstellung dünner polykristalliner mgo filme ATE394521T1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2000032467 2000-02-09

Publications (1)

Publication Number Publication Date
ATE394521T1 true ATE394521T1 (de) 2008-05-15

Family

ID=18557065

Family Applications (1)

Application Number Title Priority Date Filing Date
AT01904365T ATE394521T1 (de) 2000-02-09 2001-02-09 Verfahren zur herstellung dünner polykristalliner mgo filme

Country Status (7)

Country Link
US (1) US6783636B2 (de)
EP (1) EP1184484B1 (de)
JP (1) JP4920158B2 (de)
AT (1) ATE394521T1 (de)
DE (1) DE60133863D1 (de)
ES (1) ES2305052T3 (de)
WO (1) WO2001059173A1 (de)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6899928B1 (en) * 2002-07-29 2005-05-31 The Regents Of The University Of California Dual ion beam assisted deposition of biaxially textured template layers
US20060003086A1 (en) * 2003-07-15 2006-01-05 Matsushita Electric Industrial Co., Ltd. Method for manufacturing plasma display panel
JP2006027958A (ja) * 2004-07-16 2006-02-02 Sumitomo Electric Ind Ltd 薄膜材料およびその製造方法
US20080152834A1 (en) * 2006-12-22 2008-06-26 Hitachi Global Storage Technologies Method for manufacturing a tunnel junction magnetic sensor using ion beam deposition
US20080210544A1 (en) * 2006-12-22 2008-09-04 Mustafa Michael Pinarbasi Method for manufacturing a magnetic tunnel junction sensor using ion beam deposition
US8463342B2 (en) * 2007-10-12 2013-06-11 Uchicago Argonne, Llc Nano-fabricated superconducting radio-frequency composites, method for producing nano-fabricated superconducting rf composites
JP4903124B2 (ja) * 2007-12-28 2012-03-28 株式会社日立製作所 プラズマディスプレイパネル
WO2010061426A1 (ja) * 2008-11-28 2010-06-03 日立プラズマディスプレイ株式会社 プラズマディスプレイパネルおよびその製造方法

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2996568B2 (ja) 1992-10-30 2000-01-11 株式会社フジクラ 多結晶薄膜の製造方法および酸化物超電導導体の製造方法
JP3353391B2 (ja) * 1993-06-28 2002-12-03 日新電機株式会社 荷電粒子ビーム照射装置
JPH1091958A (ja) 1996-09-19 1998-04-10 Kao Corp 磁気記録媒体の製造方法
JP3856878B2 (ja) 1996-10-15 2006-12-13 株式会社フジクラ 多結晶薄膜の製造方法
JP4059963B2 (ja) 1996-10-23 2008-03-12 株式会社フジクラ 酸化物超電導導体の製造方法
EP0872579B2 (de) * 1996-10-23 2014-11-26 Fujikura, Ltd. Verfahren zur herstellung von polykristallinem dünnen film, verfahren zur herstellung von oxidsupraleitern und vorrichtung dafür
JPH10316780A (ja) * 1997-05-16 1998-12-02 Plast Gijutsu Shinko Center プラスチック成形品への硬質薄膜形成方法およびその製品
JP3128573B2 (ja) * 1997-06-23 2001-01-29 工業技術院長 高純度薄膜の形成方法
JP3469512B2 (ja) 1999-08-16 2003-11-25 株式会社日立製作所 磁気記録媒体の製造方法

Also Published As

Publication number Publication date
DE60133863D1 (de) 2008-06-19
ES2305052T3 (es) 2008-11-01
US20020157601A1 (en) 2002-10-31
EP1184484A1 (de) 2002-03-06
EP1184484A4 (de) 2006-05-31
WO2001059173A1 (en) 2001-08-16
JP4920158B2 (ja) 2012-04-18
EP1184484B1 (de) 2008-05-07
US6783636B2 (en) 2004-08-31

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