ATE395406T1 - Verwendung von ozonwasser beim reinigen von halbleitersubstrat - Google Patents

Verwendung von ozonwasser beim reinigen von halbleitersubstrat

Info

Publication number
ATE395406T1
ATE395406T1 AT03788086T AT03788086T ATE395406T1 AT E395406 T1 ATE395406 T1 AT E395406T1 AT 03788086 T AT03788086 T AT 03788086T AT 03788086 T AT03788086 T AT 03788086T AT E395406 T1 ATE395406 T1 AT E395406T1
Authority
AT
Austria
Prior art keywords
ozone water
ozone
ultra
cleaning
pure
Prior art date
Application number
AT03788086T
Other languages
English (en)
Inventor
Makoto Takemura
Yasuo Fukuda
Kazuaki Hayata
Masaaki Kato
Eiji Suhara
Original Assignee
Sumco Corp
Chlorine Eng Corp Ltd
Echo Giken Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sumco Corp, Chlorine Eng Corp Ltd, Echo Giken Co Ltd filed Critical Sumco Corp
Application granted granted Critical
Publication of ATE395406T1 publication Critical patent/ATE395406T1/de

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
    • C11D7/22—Organic compounds
    • C11D7/26—Organic compounds containing oxygen
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
    • C11D7/50—Solvents
    • C11D7/5004—Organic solvents
    • C11D7/5022—Organic solvents containing oxygen
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/02—Cleaning by the force of jets or sprays
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/04—Cleaning involving contact with liquid
    • B08B3/08—Cleaning involving contact with liquid the liquid having chemical or dissolving effect
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00—Treatment of water, waste water, or sewage
    • C02F1/68—Treatment of water, waste water, or sewage by addition of specified substances, e.g. trace elements, for ameliorating potable water
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00—Treatment of water, waste water, or sewage
    • C02F1/72—Treatment of water, waste water, or sewage by oxidation
    • C02F1/78—Treatment of water, waste water, or sewage by oxidation with ozone
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D3/00—Other compounding ingredients of detergent compositions covered in group C11D1/00
    • C11D3/39—Organic or inorganic per-compounds
    • C11D3/3942—Inorganic per-compounds
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
    • C11D7/50—Solvents
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P52/00—Grinding, lapping or polishing of wafers, substrates or parts of devices
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P70/00—Cleaning of wafers, substrates or parts of devices
    • H10P70/10—Cleaning before device manufacture, i.e. Begin-Of-Line process
    • H10P70/15—Cleaning before device manufacture, i.e. Begin-Of-Line process by wet cleaning only
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B2203/00—Details of cleaning machines or methods involving the use or presence of liquid or steam
    • B08B2203/005—Details of cleaning machines or methods involving the use or presence of liquid or steam the liquid being ozonated
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F2103/00—Nature of the water, waste water, sewage or sludge to be treated
    • C02F2103/02—Non-contaminated water, e.g. for industrial water supply
    • C02F2103/04—Non-contaminated water, e.g. for industrial water supply for obtaining ultra-pure water
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F2103/00—Nature of the water, waste water, sewage or sludge to be treated
    • C02F2103/34—Nature of the water, waste water, sewage or sludge to be treated from industrial activities not provided for in groups C02F2103/12 - C02F2103/32
    • C02F2103/346—Nature of the water, waste water, sewage or sludge to be treated from industrial activities not provided for in groups C02F2103/12 - C02F2103/32 from semiconductor processing, e.g. waste water from polishing of wafers
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D2111/00—Cleaning compositions characterised by the objects to be cleaned; Cleaning compositions characterised by non-standard cleaning or washing processes
    • C11D2111/10—Objects to be cleaned
    • C11D2111/14—Hard surfaces
    • C11D2111/22—Electronic devices, e.g. PCBs or semiconductors

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Oil, Petroleum & Natural Gas (AREA)
  • Wood Science & Technology (AREA)
  • Health & Medical Sciences (AREA)
  • Environmental & Geological Engineering (AREA)
  • Water Supply & Treatment (AREA)
  • Hydrology & Water Resources (AREA)
  • Emergency Medicine (AREA)
  • Medicinal Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
  • Detergent Compositions (AREA)
  • Weting (AREA)
AT03788086T 2002-08-13 2003-08-11 Verwendung von ozonwasser beim reinigen von halbleitersubstrat ATE395406T1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2002235425A JP4039662B2 (ja) 2002-08-13 2002-08-13 半導体基板又は素子の洗浄方法

Publications (1)

Publication Number Publication Date
ATE395406T1 true ATE395406T1 (de) 2008-05-15

Family

ID=31884377

Family Applications (1)

Application Number Title Priority Date Filing Date
AT03788086T ATE395406T1 (de) 2002-08-13 2003-08-11 Verwendung von ozonwasser beim reinigen von halbleitersubstrat

Country Status (8)

Country Link
US (1) US7678200B2 (de)
EP (1) EP1541667B1 (de)
JP (1) JP4039662B2 (de)
KR (1) KR100737877B1 (de)
AT (1) ATE395406T1 (de)
DE (1) DE60321015D1 (de)
TW (1) TWI224526B (de)
WO (1) WO2004016723A1 (de)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN100349266C (zh) * 2004-07-23 2007-11-14 王文 高效能臭氧水清洗半导体晶圆的系统及其方法
JP2006073747A (ja) 2004-09-01 2006-03-16 Sumco Corp 半導体ウェーハの処理方法およびその装置
JP5638193B2 (ja) * 2007-11-09 2014-12-10 倉敷紡績株式会社 洗浄方法および洗浄装置
CN101875048A (zh) * 2010-06-30 2010-11-03 国电光伏(江苏)有限公司 一种去除硅片表面杂质的方法
CN105340067B (zh) * 2013-04-30 2018-07-06 奥加诺株式会社 铜露出基板的清洗方法和清洗系统
JP6177381B2 (ja) * 2016-05-10 2017-08-09 ヤンマー産業株式会社 ノズル
WO2019229866A1 (ja) * 2018-05-30 2019-12-05 三菱電機株式会社 膜洗浄装置及び膜洗浄方法
TW202112452A (zh) * 2019-05-21 2021-04-01 日商東京威力科創股份有限公司 基板處理裝置及基板處理方法

Family Cites Families (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS645702A (en) * 1987-06-29 1989-01-10 Kobe Steel Ltd Turning tool
JPS6463685A (en) * 1987-09-04 1989-03-09 Toshiba Corp Scroll compressor
JPH0997440A (ja) * 1995-09-29 1997-04-08 Victor Co Of Japan Ltd 光学情報記録再生装置
JPH10116809A (ja) * 1996-10-11 1998-05-06 Tadahiro Omi 洗浄方法及び洗浄システム
JPH1129795A (ja) * 1997-07-08 1999-02-02 Kurita Water Ind Ltd 電子材料用洗浄水、その製造方法及び電子材料の洗浄方法
JPH11340182A (ja) * 1998-05-25 1999-12-10 Wako Pure Chem Ind Ltd 半導体表面洗浄剤及び洗浄方法
DE19825063A1 (de) * 1998-06-04 1999-12-09 Astex Sorbios Gmbh Verfahren zur Unterdrückung der Zerfallsgeschwindigkeit von Ozon in ultrareinem Wasser
JP2000037671A (ja) * 1998-07-24 2000-02-08 Mitsubishi Electric Corp 基板表面処理方法および装置
US6129849A (en) 1998-10-23 2000-10-10 Kansai Electric Power Co., Inc. Process for accelerating reaction of ozone with AM catalyst
JP2000147793A (ja) * 1998-11-12 2000-05-26 Mitsubishi Electric Corp フォトレジスト膜除去方法およびそのための装置
JP3509091B2 (ja) * 1998-12-10 2004-03-22 栗田工業株式会社 オゾン含有超純水の供給装置
JP2000331977A (ja) * 1999-05-20 2000-11-30 Kurita Water Ind Ltd 電子材料の洗浄方法
JP4354575B2 (ja) * 1999-06-15 2009-10-28 クロリンエンジニアズ株式会社 オゾン含有浄化液及びレジスト除去方法
JP2001035827A (ja) * 1999-07-16 2001-02-09 Memc Kk 高濃度オゾン水、同オゾン水の調製方法、および同オゾン水を使用した洗浄方法
JP3535820B2 (ja) * 2000-10-06 2004-06-07 エム・エフエスアイ株式会社 基板処理方法および基板処理装置
JP2002001243A (ja) * 2000-06-23 2002-01-08 Kurita Water Ind Ltd 電子材料の洗浄方法

Also Published As

Publication number Publication date
DE60321015D1 (de) 2008-06-26
JP2004079649A (ja) 2004-03-11
JP4039662B2 (ja) 2008-01-30
EP1541667A4 (de) 2005-11-30
TWI224526B (en) 2004-12-01
TW200403110A (en) 2004-03-01
US20060154837A1 (en) 2006-07-13
US7678200B2 (en) 2010-03-16
EP1541667A1 (de) 2005-06-15
EP1541667B1 (de) 2008-05-14
KR100737877B1 (ko) 2007-07-10
WO2004016723A1 (ja) 2004-02-26
KR20050075746A (ko) 2005-07-21

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