ATE400838T1 - Lichtaushärtbare und hitzehärtbare harzzusammensetzung - Google Patents
Lichtaushärtbare und hitzehärtbare harzzusammensetzungInfo
- Publication number
- ATE400838T1 ATE400838T1 AT01999859T AT01999859T ATE400838T1 AT E400838 T1 ATE400838 T1 AT E400838T1 AT 01999859 T AT01999859 T AT 01999859T AT 01999859 T AT01999859 T AT 01999859T AT E400838 T1 ATE400838 T1 AT E400838T1
- Authority
- AT
- Austria
- Prior art keywords
- curing
- group
- resin composition
- heat
- light
- Prior art date
Links
- 239000011342 resin composition Substances 0.000 title abstract 2
- 238000001723 curing Methods 0.000 title 1
- 238000013007 heat curing Methods 0.000 title 1
- 125000000217 alkyl group Chemical group 0.000 abstract 2
- 125000004432 carbon atom Chemical group C* 0.000 abstract 2
- 125000004435 hydrogen atom Chemical group [H]* 0.000 abstract 2
- 229920001187 thermosetting polymer Polymers 0.000 abstract 2
- 125000004018 acid anhydride group Chemical group 0.000 abstract 1
- 125000003710 aryl alkyl group Chemical group 0.000 abstract 1
- 125000003118 aryl group Chemical group 0.000 abstract 1
- 125000004093 cyano group Chemical group *C#N 0.000 abstract 1
- 239000003085 diluting agent Substances 0.000 abstract 1
- 229910052731 fluorine Inorganic materials 0.000 abstract 1
- 125000001153 fluoro group Chemical group F* 0.000 abstract 1
- 125000002541 furyl group Chemical group 0.000 abstract 1
- 239000003999 initiator Substances 0.000 abstract 1
- 150000007519 polyprotic acids Polymers 0.000 abstract 1
- 239000011347 resin Substances 0.000 abstract 1
- 229920005989 resin Polymers 0.000 abstract 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F20/00—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride, ester, amide, imide or nitrile thereof
- C08F20/02—Monocarboxylic acids having less than ten carbon atoms, Derivatives thereof
- C08F20/10—Esters
- C08F20/26—Esters containing oxygen in addition to the carboxy oxygen
- C08F20/28—Esters containing oxygen in addition to the carboxy oxygen containing no aromatic rings in the alcohol moiety
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F283/00—Macromolecular compounds obtained by polymerising monomers on to polymers provided for in subclass C08G
- C08F283/10—Macromolecular compounds obtained by polymerising monomers on to polymers provided for in subclass C08G on to polymers containing more than one epoxy radical per molecule
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F290/00—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups
- C08F290/02—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups on to polymers modified by introduction of unsaturated end groups
- C08F290/06—Polymers provided for in subclass C08G
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F290/00—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups
- C08F290/02—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups on to polymers modified by introduction of unsaturated end groups
- C08F290/06—Polymers provided for in subclass C08G
- C08F290/061—Polyesters; Polycarbonates
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G65/00—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule
- C08G65/02—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from cyclic ethers by opening of the heterocyclic ring
- C08G65/04—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from cyclic ethers by opening of the heterocyclic ring from cyclic ethers only
- C08G65/06—Cyclic ethers having no atoms other than carbon and hydrogen outside the ring
- C08G65/16—Cyclic ethers having four or more ring atoms
- C08G65/18—Oxetanes
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G65/00—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule
- C08G65/02—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from cyclic ethers by opening of the heterocyclic ring
- C08G65/32—Polymers modified by chemical after-treatment
- C08G65/329—Polymers modified by chemical after-treatment with organic compounds
- C08G65/331—Polymers modified by chemical after-treatment with organic compounds containing oxygen
- C08G65/332—Polymers modified by chemical after-treatment with organic compounds containing oxygen containing carboxyl groups, or halides, or esters thereof
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L63/00—Compositions of epoxy resins; Compositions of derivatives of epoxy resins
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L71/00—Compositions of polyethers obtained by reactions forming an ether link in the main chain; Compositions of derivatives of such polymers
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- General Chemical & Material Sciences (AREA)
- Materials For Photolithography (AREA)
- Macromonomer-Based Addition Polymer (AREA)
- Polymerisation Methods In General (AREA)
- Epoxy Resins (AREA)
- Non-Metallic Protective Coatings For Printed Circuits (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Graft Or Block Polymers (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Indole Compounds (AREA)
- Paints Or Removers (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2000368536A JP4382978B2 (ja) | 2000-12-04 | 2000-12-04 | 光硬化性・熱硬化性樹脂組成物 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| ATE400838T1 true ATE400838T1 (de) | 2008-07-15 |
Family
ID=18838748
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| AT01999859T ATE400838T1 (de) | 2000-12-04 | 2001-11-27 | Lichtaushärtbare und hitzehärtbare harzzusammensetzung |
Country Status (9)
| Country | Link |
|---|---|
| US (1) | US6867282B2 (de) |
| EP (1) | EP1341039B1 (de) |
| JP (1) | JP4382978B2 (de) |
| KR (1) | KR100830019B1 (de) |
| CN (1) | CN1217233C (de) |
| AT (1) | ATE400838T1 (de) |
| DE (1) | DE60134774D1 (de) |
| TW (1) | TWI278497B (de) |
| WO (1) | WO2002046840A1 (de) |
Families Citing this family (38)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP5016768B2 (ja) * | 2000-03-29 | 2012-09-05 | 学校法人神奈川大学 | 活性エネルギー線硬化性樹脂、その製造方法及び光硬化性・熱硬化性樹脂組成物 |
| WO2002064662A1 (en) * | 2001-02-15 | 2002-08-22 | Kanagawa University | Unsaturated polyester compound, resin curable with actinic energy ray, processes for producing these, and curable composition |
| CN100401189C (zh) * | 2001-10-22 | 2008-07-09 | 太阳油墨制造株式会社 | 光固化性·热固化性树脂组合物 |
| KR101121671B1 (ko) * | 2003-08-12 | 2012-03-14 | 미쓰이 가가쿠 가부시키가이샤 | 광경화형 수지 조성물 및 그것을 이용한 플랫 패널디스플레이용 실링제 |
| EP1698644B1 (de) * | 2003-11-21 | 2013-02-27 | DIC Corporation | Fluorhaltige photohärtende zusammensetzung |
| KR100845657B1 (ko) * | 2004-07-07 | 2008-07-10 | 다이요 잉키 세이조 가부시키가이샤 | 광 경화성·열 경화성 수지 조성물과 그것을 사용한 건식필름, 및 그의 경화물 |
| KR100842168B1 (ko) * | 2005-01-21 | 2008-06-30 | 주식회사 엘지화학 | 감광성 수지 조성물 및 이를 이용한 액정 표시 장치 |
| JP4621036B2 (ja) * | 2005-02-08 | 2011-01-26 | 太陽ホールディングス株式会社 | 感光性樹脂組成物、及びその硬化物並びに該硬化物からなる表示パネル用スペーサー |
| TW200710570A (en) * | 2005-05-31 | 2007-03-16 | Taiyo Ink Mfg Co Ltd | Composition for forming adhesive pattern, multilayer structure obtained by using same, and method for producing such multilayer structure |
| JP4470835B2 (ja) | 2005-08-08 | 2010-06-02 | ソニー株式会社 | 液体吐出型記録ヘッド及び液体吐出装置 |
| US7935471B2 (en) * | 2005-10-20 | 2011-05-03 | Hewlett-Packard Development Company, L.P. | NIR/IR curable coatings for light directed imaging |
| JP5256645B2 (ja) * | 2006-05-31 | 2013-08-07 | 三菱化学株式会社 | 保護膜用熱硬化性組成物、硬化物、及び液晶表示装置 |
| KR20090098837A (ko) * | 2006-11-29 | 2009-09-17 | 도요 보세키 가부시키가이샤 | 옥세탄 함유 수지, 이를 사용한 접착제 및 레지스트제 |
| CN101663617B (zh) * | 2007-04-24 | 2013-05-08 | 三井化学株式会社 | 感光性树脂组合物、干膜及使用它的加工品 |
| EP4079484A1 (de) | 2014-06-23 | 2022-10-26 | Carbon, Inc. | Verfahren zur herstellung dreidimensionaler gegenstände aus materialien mit mehreren mechanismen zum härten |
| TWI559082B (zh) | 2014-07-07 | 2016-11-21 | 財團法人工業技術研究院 | 生質材料與其形成方法與印刷電路板 |
| KR101871549B1 (ko) * | 2014-10-29 | 2018-07-03 | 삼성에스디아이 주식회사 | 디스플레이 밀봉재용 조성물, 이를 포함하는 유기보호층, 및 이를 포함하는 디스플레이 장치 |
| US10792855B2 (en) | 2015-02-05 | 2020-10-06 | Carbon, Inc. | Method of additive manufacturing by intermittent exposure |
| WO2016140886A1 (en) | 2015-03-05 | 2016-09-09 | Carbon3D, Inc. | Fabrication of three dimensional objects with multiple operating modes |
| JP6362272B2 (ja) * | 2015-03-13 | 2018-07-25 | 日本化薬株式会社 | カルボキシル基含有反応性化合物、それを用いた硬化型樹脂組成物、およびその用途。 |
| US10106643B2 (en) * | 2015-03-31 | 2018-10-23 | 3M Innovative Properties Company | Dual-cure nanostructure transfer film |
| EP3344676B1 (de) | 2015-09-04 | 2023-04-12 | Carbon, Inc. | Doppelhärtende cyanatesterharze zur generativen fertigung |
| CN108291011B (zh) * | 2015-09-09 | 2021-03-02 | 卡本有限公司 | 用于增材制造的环氧双重固化树脂 |
| US10647873B2 (en) | 2015-10-30 | 2020-05-12 | Carbon, Inc. | Dual cure article of manufacture with portions of differing solubility |
| WO2017079502A1 (en) | 2015-11-05 | 2017-05-11 | Carbon, Inc. | Silicone dual cure resins for additive manufacturing |
| US10343331B2 (en) | 2015-12-22 | 2019-07-09 | Carbon, Inc. | Wash liquids for use in additive manufacturing with dual cure resins |
| US10787583B2 (en) | 2015-12-22 | 2020-09-29 | Carbon, Inc. | Method of forming a three-dimensional object comprised of a silicone polymer or co-polymer |
| US10501572B2 (en) | 2015-12-22 | 2019-12-10 | Carbon, Inc. | Cyclic ester dual cure resins for additive manufacturing |
| WO2017112682A1 (en) | 2015-12-22 | 2017-06-29 | Carbon, Inc. | Fabrication of compound products from multiple intermediates by additive manufacturing with dual cure resins |
| EP3341792A1 (de) | 2015-12-22 | 2018-07-04 | Carbon, Inc. | Doppelvorläufer-harzsysteme zur generativen fertigung mit doppelhärtungsharzen |
| US10538031B2 (en) | 2015-12-22 | 2020-01-21 | Carbon, Inc. | Dual cure additive manufacturing of rigid intermediates that generate semi-rigid, flexible, or elastic final products |
| WO2017112483A2 (en) | 2015-12-22 | 2017-06-29 | Carbon, Inc. | Accelerants for additive manufacturing with dual cure resins |
| US10500786B2 (en) | 2016-06-22 | 2019-12-10 | Carbon, Inc. | Dual cure resins containing microwave absorbing materials and methods of using the same |
| CN110023056B (zh) | 2016-11-21 | 2021-08-24 | 卡本有限公司 | 通过递送反应性组分用于后续固化来制造三维物体的方法 |
| WO2018165090A1 (en) | 2017-03-09 | 2018-09-13 | Carbon, Inc. | Tough, high temperature polymers produced by stereolithography |
| US10316213B1 (en) | 2017-05-01 | 2019-06-11 | Formlabs, Inc. | Dual-cure resins and related methods |
| JP6894015B2 (ja) | 2017-06-21 | 2021-06-23 | カーボン，インコーポレイテッド | 積層造形の方法 |
| US11504903B2 (en) | 2018-08-28 | 2022-11-22 | Carbon, Inc. | 1K alcohol dual cure resins for additive manufacturing |
Family Cites Families (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0717737B2 (ja) * | 1987-11-30 | 1995-03-01 | 太陽インキ製造株式会社 | 感光性熱硬化性樹脂組成物及びソルダーレジストパターン形成方法 |
| US5853957A (en) * | 1995-05-08 | 1998-12-29 | Tamura Kaken Co., Ltd | Photosensitive resin compositions, cured films thereof, and circuit boards |
| JP3851366B2 (ja) * | 1995-10-30 | 2006-11-29 | ナショナル スターチ アンド ケミカル インベストメント ホールディング コーポレイション | 感光性樹脂組成物 |
| JP3933322B2 (ja) * | 1998-09-01 | 2007-06-20 | 学校法人神奈川大学 | 硬化性組成物 |
| DE60020762T2 (de) * | 1999-02-25 | 2006-05-04 | Dai Nippon Printing Co., Ltd. | Lichtempfindliche Harzzusammensetzung, Farbfilter und dafür geeignetes Copolymerharz |
| JP4218851B2 (ja) | 1999-02-25 | 2009-02-04 | 大日本印刷株式会社 | カラーフィルタ保護膜形成用感光性樹脂組成物 |
| JP5016768B2 (ja) * | 2000-03-29 | 2012-09-05 | 学校法人神奈川大学 | 活性エネルギー線硬化性樹脂、その製造方法及び光硬化性・熱硬化性樹脂組成物 |
-
2000
- 2000-12-04 JP JP2000368536A patent/JP4382978B2/ja not_active Expired - Lifetime
-
2001
- 2001-11-27 EP EP01999859A patent/EP1341039B1/de not_active Expired - Lifetime
- 2001-11-27 CN CN018200168A patent/CN1217233C/zh not_active Expired - Fee Related
- 2001-11-27 KR KR1020037007401A patent/KR100830019B1/ko not_active Expired - Fee Related
- 2001-11-27 AT AT01999859T patent/ATE400838T1/de not_active IP Right Cessation
- 2001-11-27 DE DE60134774T patent/DE60134774D1/de not_active Expired - Fee Related
- 2001-11-27 WO PCT/JP2001/010329 patent/WO2002046840A1/ja not_active Ceased
- 2001-12-03 TW TW090129864A patent/TWI278497B/zh not_active IP Right Cessation
-
2003
- 2003-06-03 US US10/452,516 patent/US6867282B2/en not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| CN1478219A (zh) | 2004-02-25 |
| KR20040024533A (ko) | 2004-03-20 |
| US20030216514A1 (en) | 2003-11-20 |
| JP4382978B2 (ja) | 2009-12-16 |
| DE60134774D1 (de) | 2008-08-21 |
| EP1341039B1 (de) | 2008-07-09 |
| KR100830019B1 (ko) | 2008-05-15 |
| US6867282B2 (en) | 2005-03-15 |
| WO2002046840A1 (en) | 2002-06-13 |
| JP2002169279A (ja) | 2002-06-14 |
| CN1217233C (zh) | 2005-08-31 |
| TWI278497B (en) | 2007-04-11 |
| EP1341039A1 (de) | 2003-09-03 |
| EP1341039A4 (de) | 2006-09-20 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| RER | Ceased as to paragraph 5 lit. 3 law introducing patent treaties |