ATE403237T1 - Methode zur herstellung eines piezoelektrischen bauteils - Google Patents

Methode zur herstellung eines piezoelektrischen bauteils

Info

Publication number
ATE403237T1
ATE403237T1 AT03293044T AT03293044T ATE403237T1 AT E403237 T1 ATE403237 T1 AT E403237T1 AT 03293044 T AT03293044 T AT 03293044T AT 03293044 T AT03293044 T AT 03293044T AT E403237 T1 ATE403237 T1 AT E403237T1
Authority
AT
Austria
Prior art keywords
acoustic wave
surface acoustic
wave element
producing
resin film
Prior art date
Application number
AT03293044T
Other languages
English (en)
Inventor
Masato Higuchi
Nobushige Araki
Hideki Shinkai
Original Assignee
Murata Manufacturing Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Murata Manufacturing Co filed Critical Murata Manufacturing Co
Application granted granted Critical
Publication of ATE403237T1 publication Critical patent/ATE403237T1/de

Links

Classifications

    • HELECTRICITY
    • H03ELECTRONIC CIRCUITRY
    • H03HIMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
    • H03H3/00Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators
    • H03H3/007Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks
    • H03H3/08Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks for the manufacture of resonators or networks using surface acoustic waves
    • HELECTRICITY
    • H03ELECTRONIC CIRCUITRY
    • H03HIMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
    • H03H9/00Networks comprising electromechanical or electro-acoustic elements; Electromechanical resonators
    • H03H9/02Details
    • H03H9/05Holders or supports
    • H03H9/10Mounting in enclosures
    • H03H9/1064Mounting in enclosures for surface acoustic wave [SAW] devices
    • H03H9/1085Mounting in enclosures for surface acoustic wave [SAW] devices the enclosure being defined by a non-uniform sealing mass covering the non-active sides of the SAW device
    • HELECTRICITY
    • H03ELECTRONIC CIRCUITRY
    • H03HIMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
    • H03H9/00Networks comprising electromechanical or electro-acoustic elements; Electromechanical resonators
    • H03H9/02Details
    • H03H9/05Holders or supports
    • H03H9/058Holders or supports for surface acoustic wave devices
    • H03H9/059Holders or supports for surface acoustic wave devices consisting of mounting pads or bumps
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10NELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N30/00Piezoelectric or electrostrictive devices
    • H10N30/01Manufacture or treatment
    • H10N30/07Forming of piezoelectric or electrostrictive parts or bodies on an electrical element or another base
    • H10N30/072Forming of piezoelectric or electrostrictive parts or bodies on an electrical element or another base by laminating or bonding of piezoelectric or electrostrictive bodies
    • H10N30/073Forming of piezoelectric or electrostrictive parts or bodies on an electrical element or another base by laminating or bonding of piezoelectric or electrostrictive bodies by fusion of metals or by adhesives
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00Interconnections or connectors in packages
    • H10W72/01Manufacture or treatment
    • H10W72/0198Manufacture or treatment batch processes
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00Interconnections or connectors in packages
    • H10W72/071Connecting or disconnecting
    • H10W72/072Connecting or disconnecting of bump connectors
    • H10W72/07251Connecting or disconnecting of bump connectors characterised by changes in properties of the bump connectors during connecting
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00Interconnections or connectors in packages
    • H10W72/20Bump connectors, e.g. solder bumps or copper pillars; Dummy bumps; Thermal bumps
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W74/00Encapsulations, e.g. protective coatings
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W90/00Package configurations
    • H10W90/701Package configurations characterised by the relative positions of pads or connectors relative to package parts
    • H10W90/721Package configurations characterised by the relative positions of pads or connectors relative to package parts of bump connectors
    • H10W90/724Package configurations characterised by the relative positions of pads or connectors relative to package parts of bump connectors between a chip and a stacked insulating package substrate, interposer or RDL
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T156/00Adhesive bonding and miscellaneous chemical manufacture
    • Y10T156/10Methods of surface bonding and/or assembly therefor
    • Y10T156/1052Methods of surface bonding and/or assembly therefor with cutting, punching, tearing or severing
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T156/00Adhesive bonding and miscellaneous chemical manufacture
    • Y10T156/10Methods of surface bonding and/or assembly therefor
    • Y10T156/1089Methods of surface bonding and/or assembly therefor of discrete laminae to single face of additional lamina
    • Y10T156/1092All laminae planar and face to face
    • Y10T156/1093All laminae planar and face to face with covering of discrete laminae with additional lamina

Landscapes

  • Physics & Mathematics (AREA)
  • Acoustics & Sound (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Surface Acoustic Wave Elements And Circuit Networks Thereof (AREA)
  • Encapsulation Of And Coatings For Semiconductor Or Solid State Devices (AREA)
  • Structures Or Materials For Encapsulating Or Coating Semiconductor Devices Or Solid State Devices (AREA)
  • Compositions Of Oxide Ceramics (AREA)
  • Transition And Organic Metals Composition Catalysts For Addition Polymerization (AREA)
AT03293044T 2002-12-06 2003-12-05 Methode zur herstellung eines piezoelektrischen bauteils ATE403237T1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2002354712 2002-12-06
JP2003378190A JP2004201285A (ja) 2002-12-06 2003-11-07 圧電部品の製造方法および圧電部品

Publications (1)

Publication Number Publication Date
ATE403237T1 true ATE403237T1 (de) 2008-08-15

Family

ID=32314128

Family Applications (1)

Application Number Title Priority Date Filing Date
AT03293044T ATE403237T1 (de) 2002-12-06 2003-12-05 Methode zur herstellung eines piezoelektrischen bauteils

Country Status (7)

Country Link
US (1) US7261792B2 (de)
EP (1) EP1427032B1 (de)
JP (1) JP2004201285A (de)
KR (1) KR100561319B1 (de)
CN (1) CN1323487C (de)
AT (1) ATE403237T1 (de)
DE (1) DE60322496D1 (de)

Families Citing this family (34)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3912348B2 (ja) * 2003-09-16 2007-05-09 エプソントヨコム株式会社 弾性表面波デバイスの製造方法
CN100477513C (zh) * 2004-06-28 2009-04-08 京瓷株式会社 声表面波装置的制造方法以及无线通信设备
JP4608993B2 (ja) * 2004-08-06 2011-01-12 ソニー株式会社 微小電気機械素子とその製造方法、及び電子機器
US7506813B2 (en) * 2005-01-06 2009-03-24 Quad/Graphics, Inc. Resonator use in the print field
US7651879B2 (en) 2005-12-07 2010-01-26 Honeywell International Inc. Surface acoustic wave pressure sensors
JP2007208568A (ja) * 2006-01-31 2007-08-16 Nippon Dempa Kogyo Co Ltd 表面実装水晶発振器
US7331236B2 (en) * 2006-03-21 2008-02-19 Radi Medical Systems Ab Pressure sensor
JP2009010942A (ja) * 2007-05-29 2009-01-15 Nippon Dempa Kogyo Co Ltd 圧電部品及びその製造方法
JP4324811B2 (ja) * 2007-06-28 2009-09-02 エプソントヨコム株式会社 圧電振動子及びその製造方法
JP5264281B2 (ja) * 2008-05-09 2013-08-14 日本電波工業株式会社 圧電部品の製造方法
JP4843012B2 (ja) * 2008-11-17 2011-12-21 日本電波工業株式会社 圧電デバイスとその製造方法
TWI485825B (zh) * 2009-07-28 2015-05-21 精材科技股份有限公司 晶片封裝體及其形成方法
JP2012010054A (ja) * 2010-06-24 2012-01-12 Ngk Insulators Ltd 複合基板及びそれを用いた弾性波デバイス
DE102010026843A1 (de) 2010-07-12 2012-01-12 Epcos Ag Modul-Package und Herstellungsverfahren
CN102097340A (zh) * 2010-12-14 2011-06-15 沈阳中光电子有限公司 用cob灌胶封装制作smd的方法
CN103370815B (zh) * 2011-02-16 2016-04-13 松下知识产权经营株式会社 电池及电池的制造方法
US20150131240A1 (en) * 2012-05-22 2015-05-14 Würth Elektronik Gmbh &Co. KG Method for Producing an Electronic Subassembly
US20150245475A1 (en) * 2012-09-10 2015-08-27 Meiko Electronics Co., Ltd. Component-embedded substrate and manufacturing method thereof
JP6205704B2 (ja) 2012-10-25 2017-10-04 セイコーエプソン株式会社 超音波測定装置、ヘッドユニット、プローブ及び診断装置
JP2014083281A (ja) * 2012-10-25 2014-05-12 Seiko Epson Corp 超音波測定装置、ヘッドユニット、プローブ及び診断装置
JP2017011592A (ja) * 2015-06-24 2017-01-12 株式会社ディスコ Sawデバイスの製造方法
JP2018085705A (ja) * 2016-11-25 2018-05-31 太陽誘電株式会社 電子部品およびその製造方法
JP6704359B2 (ja) * 2017-01-10 2020-06-03 三菱電機株式会社 電力用半導体装置
JP2019125871A (ja) 2018-01-12 2019-07-25 株式会社村田製作所 弾性波装置
CN108598254A (zh) * 2018-04-19 2018-09-28 嘉盛半导体(苏州)有限公司 滤波器封装方法及封装结构
JP7180555B2 (ja) * 2019-07-02 2022-11-30 株式会社村田製作所 電子部品の製造方法および電子部品製造装置
CN114868266B (zh) * 2020-01-10 2025-12-05 日本碍子株式会社 压电振动基板及压电振动元件
CN111327226B (zh) * 2020-03-11 2021-09-21 中国科学院兰州化学物理研究所 一种提高超声电机能量转换效率的方法
JP7508083B2 (ja) * 2020-03-25 2024-07-01 三安ジャパンテクノロジー株式会社 弾性波デバイスパッケージ、及び、弾性波デバイスを含むモジュール
CN115485980B (zh) * 2020-04-24 2025-03-25 株式会社村田制作所 高频模块以及通信装置
KR102459794B1 (ko) * 2020-05-25 2022-10-28 이주호 반도체 패키지의 전자파 차폐막 형성 방법
CN112583375A (zh) * 2020-12-15 2021-03-30 北京航天微电科技有限公司 一种对薄膜体声波滤波器进行封装的方法和封装器件
CN113436980A (zh) * 2021-06-23 2021-09-24 南昌黑鲨科技有限公司 一种器件封装方法以及应用该封装方法封装的封装结构
US11729915B1 (en) * 2022-03-22 2023-08-15 Tactotek Oy Method for manufacturing a number of electrical nodes, electrical node module, electrical node, and multilayer structure

Family Cites Families (37)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US11857A (en) * 1854-10-31 Apparatus for tempering and flattening saws
JPS5179342A (de) * 1974-12-26 1976-07-10 Fuji Photo Film Co Ltd
JPS61295025A (ja) * 1985-06-25 1986-12-25 Mitsubishi Petrochem Co Ltd 薄膜フイルムの接着方法
DE69201139T2 (de) * 1991-02-21 1995-06-22 Mitsui Toatsu Chemicals Hitzebeständiger Polyimid Klebstoff.
JP3207222B2 (ja) * 1991-08-29 2001-09-10 株式会社東芝 電子部品装置
JPH07176565A (ja) * 1993-12-16 1995-07-14 Casio Comput Co Ltd 配線基板およびその製造方法
JPH07321583A (ja) 1994-05-20 1995-12-08 Kokusai Electric Co Ltd 弾性表面波装置及びその製造方法
JPH08204497A (ja) 1995-01-26 1996-08-09 Murata Mfg Co Ltd 弾性表面波装置
WO1997002596A1 (en) 1995-06-30 1997-01-23 Kabushiki Kaisha Toshiba Electronic component and method of production thereof
JPH10125825A (ja) 1996-10-23 1998-05-15 Nec Corp チップ型デバイスの封止構造およびその封止方法
US6228688B1 (en) * 1997-02-03 2001-05-08 Kabushiki Kaisha Toshiba Flip-chip resin-encapsulated semiconductor device
JP2943764B2 (ja) 1997-05-16 1999-08-30 日本電気株式会社 フリップチップ実装型半導体素子の樹脂封止構造
DE19806818C1 (de) * 1998-02-18 1999-11-04 Siemens Matsushita Components Verfahren zur Herstellung eines elektronischen Bauelements, insbesondere eines mit akustischen Oberflächenwllen arbeitenden OFW-Bauelements
JPH11239037A (ja) * 1998-02-20 1999-08-31 Nec Corp 弾性表面波装置
JP2000004139A (ja) 1998-06-16 2000-01-07 Oki Electric Ind Co Ltd 弾性表面波デバイスの封止構造及びその封止方法
JP2000058593A (ja) * 1998-08-03 2000-02-25 Nec Corp 表面弾性波素子の実装構造及びその実装方法
JP3303791B2 (ja) * 1998-09-02 2002-07-22 株式会社村田製作所 電子部品の製造方法
JP2000114918A (ja) * 1998-10-05 2000-04-21 Mitsubishi Electric Corp 表面弾性波装置及びその製造方法
KR100502222B1 (ko) 1999-01-29 2005-07-18 마츠시타 덴끼 산교 가부시키가이샤 전자부품의 실장방법 및 그 장치
JP2001110946A (ja) * 1999-10-05 2001-04-20 Toshiba Corp 電子デバイスおよびその製造方法
FR2799883B1 (fr) * 1999-10-15 2003-05-30 Thomson Csf Procede d'encapsulation de composants electroniques
KR200192458Y1 (ko) 2000-01-18 2000-08-16 김영식 타격식 발안마기
TW569424B (en) * 2000-03-17 2004-01-01 Matsushita Electric Industrial Co Ltd Module with embedded electric elements and the manufacturing method thereof
JP3376994B2 (ja) * 2000-06-27 2003-02-17 株式会社村田製作所 弾性表面波装置及びその製造方法
JP4049239B2 (ja) * 2000-08-30 2008-02-20 Tdk株式会社 表面弾性波素子を含む高周波モジュール部品の製造方法
JP2002217219A (ja) 2001-01-23 2002-08-02 Tdk Corp 電子装置の製造方法
JP2002217523A (ja) 2001-01-23 2002-08-02 Tdk Corp 電子装置の製造方法
JP2002217220A (ja) * 2001-01-23 2002-08-02 Tdk Corp 電子装置の製造方法
JP2002217221A (ja) * 2001-01-23 2002-08-02 Tdk Corp 電子装置の製造方法
JP2002330049A (ja) * 2001-04-27 2002-11-15 Tdk Corp 弾性表面波装置およびその製造方法
JP2003032061A (ja) * 2001-07-16 2003-01-31 Toshiba Corp 弾性表面波装置の製造方法
JP2003283295A (ja) * 2002-03-25 2003-10-03 Toshiba Corp 弾性表面波装置及びその製造方法
JP4166997B2 (ja) * 2002-03-29 2008-10-15 富士通メディアデバイス株式会社 弾性表面波素子の実装方法及び樹脂封止された弾性表面波素子を有する弾性表面波装置
JP3702961B2 (ja) * 2002-10-04 2005-10-05 東洋通信機株式会社 表面実装型sawデバイスの製造方法
JP4173024B2 (ja) * 2003-02-14 2008-10-29 富士通メディアデバイス株式会社 電子部品の製造方法及びそのベース基板
JP2004253839A (ja) * 2003-02-17 2004-09-09 Toyo Commun Equip Co Ltd 表面実装型sawデバイスの製造方法及び表面実装型sawデバイス
JP3689414B2 (ja) * 2003-06-03 2005-08-31 東洋通信機株式会社 弾性表面波デバイスの製造方法

Also Published As

Publication number Publication date
EP1427032B1 (de) 2008-07-30
US7261792B2 (en) 2007-08-28
CN1507150A (zh) 2004-06-23
US20040169444A1 (en) 2004-09-02
JP2004201285A (ja) 2004-07-15
KR20040049800A (ko) 2004-06-12
EP1427032A3 (de) 2006-01-11
EP1427032A2 (de) 2004-06-09
CN1323487C (zh) 2007-06-27
DE60322496D1 (de) 2008-09-11
KR100561319B1 (ko) 2006-03-16

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