ATE413632T1 - Modifizierte metallform zur verwendung bei druckprozessen - Google Patents

Modifizierte metallform zur verwendung bei druckprozessen

Info

Publication number
ATE413632T1
ATE413632T1 AT05749153T AT05749153T ATE413632T1 AT E413632 T1 ATE413632 T1 AT E413632T1 AT 05749153 T AT05749153 T AT 05749153T AT 05749153 T AT05749153 T AT 05749153T AT E413632 T1 ATE413632 T1 AT E413632T1
Authority
AT
Austria
Prior art keywords
metal mold
phosphoric acid
acid derivative
fluorinated alkyl
base metal
Prior art date
Application number
AT05749153T
Other languages
English (en)
Inventor
Matthias Keil
Goeran Frennesson
Marc Beck
Babak Heidari
Original Assignee
Obducat Ab
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from EP04445064A external-priority patent/EP1600811A1/de
Application filed by Obducat Ab filed Critical Obducat Ab
Application granted granted Critical
Publication of ATE413632T1 publication Critical patent/ATE413632T1/de

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D1/00—Processes for applying liquids or other fluent materials
    • B05D1/60—Deposition of organic layers from vapour phase
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C33/00—Moulds or cores; Details thereof or accessories therefor
    • B29C33/56—Coatings, e.g. enameled or galvanised; Releasing, lubricating or separating agents
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82B—NANOSTRUCTURES FORMED BY MANIPULATION OF INDIVIDUAL ATOMS, MOLECULES, OR LIMITED COLLECTIONS OF ATOMS OR MOLECULES AS DISCRETE UNITS; MANUFACTURE OR TREATMENT THEREOF
    • B82B3/00—Manufacture or treatment of nanostructures by manipulation of individual atoms or molecules, or limited collections of atoms or molecules as discrete units
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y30/00—Nanotechnology for materials or surface science, e.g. nanocomposites
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00—Manufacture or treatment of nanostructures
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0017—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor for the production of embossing, cutting or similar devices; for the production of casting means
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D1/00—Processes for applying liquids or other fluent materials
    • B05D1/18—Processes for applying liquids or other fluent materials performed by dipping
    • B05D1/185—Processes for applying liquids or other fluent materials performed by dipping applying monomolecular layers
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/31504—Composite [nonstructural laminate]
    • Y10T428/31678—Of metal

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Nanotechnology (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Mathematical Physics (AREA)
  • Materials Engineering (AREA)
  • Composite Materials (AREA)
  • Theoretical Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Shaping Of Tube Ends By Bending Or Straightening (AREA)
  • Moulds For Moulding Plastics Or The Like (AREA)
  • Laminated Bodies (AREA)
  • Magnetic Record Carriers (AREA)
  • Micromachines (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Chemically Coating (AREA)
AT05749153T 2004-05-28 2005-05-27 Modifizierte metallform zur verwendung bei druckprozessen ATE413632T1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US52158704P 2004-05-28 2004-05-28
EP04445064A EP1600811A1 (de) 2004-05-28 2004-05-28 Modifizierte Metallformen für Imprint-Verfahren

Publications (1)

Publication Number Publication Date
ATE413632T1 true ATE413632T1 (de) 2008-11-15

Family

ID=34969147

Family Applications (1)

Application Number Title Priority Date Filing Date
AT05749153T ATE413632T1 (de) 2004-05-28 2005-05-27 Modifizierte metallform zur verwendung bei druckprozessen

Country Status (9)

Country Link
US (2) US7717693B2 (de)
EP (1) EP1759245B1 (de)
JP (1) JP2008500914A (de)
KR (1) KR101257881B1 (de)
CN (1) CN101010632A (de)
AT (1) ATE413632T1 (de)
DE (1) DE602005010860D1 (de)
ES (1) ES2317246T3 (de)
WO (1) WO2005119360A1 (de)

Families Citing this family (27)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008500914A (ja) * 2004-05-28 2008-01-17 オブデュキャット、アクチボラグ インプリント方法に使用する変性された金属製成形型
DE102004037902A1 (de) * 2004-08-05 2006-03-16 Robert Bosch Gmbh Verfahren zur Abscheidung einer Anti-Haftungsschicht
JP4584754B2 (ja) * 2005-04-06 2010-11-24 株式会社日立産機システム ナノプリント金型、その製造方法及びこの金型を用いたナノプリント装置並びにナノプリント方法
TW200712196A (en) * 2005-04-28 2007-04-01 Sony Corp Lubricant composition and article, disk molding stamper, disk molding apparatus, disk forming method, method of forming lubrication coating
EP1731962B1 (de) 2005-06-10 2008-12-31 Obducat AB Kopieren eines Musters mit Hilfe eines Zwischenstempels
US7854873B2 (en) 2005-06-10 2010-12-21 Obducat Ab Imprint stamp comprising cyclic olefin copolymer
KR101264673B1 (ko) * 2005-06-24 2013-05-20 엘지디스플레이 주식회사 소프트 몰드를 이용한 미세 패턴 형성방법
JP4973089B2 (ja) * 2006-09-25 2012-07-11 凸版印刷株式会社 熱インプリント用モールド
US8337959B2 (en) * 2006-11-28 2012-12-25 Nanonex Corporation Method and apparatus to apply surface release coating for imprint mold
US20080173994A1 (en) * 2007-01-24 2008-07-24 International Business Machines Corporation Method of making release coatings for composite materials
JP5456465B2 (ja) * 2007-06-04 2014-03-26 丸善石油化学株式会社 微細加工品およびその製造方法
CN101795961B (zh) * 2007-09-06 2013-05-01 3M创新有限公司 用于制备微结构化制品的工具
EP2199855B1 (de) 2008-12-19 2016-07-20 Obducat Verfahren und Prozesse zur Modifizierung von Polymermaterialoberflächeninteraktionen
EP2199854B1 (de) 2008-12-19 2015-12-16 Obducat AB Hybridpolymerform für nanoimprintverfahren und verfahren zu seiner herstellung
WO2011060102A1 (en) * 2009-11-10 2011-05-19 Massachusetts Institute Of Technology Method and apparatus for embossing a deformable body
US8585954B2 (en) * 2009-11-10 2013-11-19 Massachusetts Institute Of Technology Method and apparatus for embossing a deformable body
US8747092B2 (en) 2010-01-22 2014-06-10 Nanonex Corporation Fast nanoimprinting apparatus using deformale mold
MX2012012317A (es) 2010-04-28 2012-11-21 Kimberly Clark Co Arreglo de microagujas moldeado por inyeccion y metodo para formar el arreglo de microagujas.
US8524134B2 (en) * 2010-07-12 2013-09-03 Graham J. Hubbard Method of molding polymeric materials to impart a desired texture thereto
JP5653769B2 (ja) * 2011-01-19 2015-01-14 富士フイルム株式会社 ナノインプリント方法
KR20140079429A (ko) 2011-10-27 2014-06-26 킴벌리-클라크 월드와이드, 인크. 생체활성 제제를 전달하기 위한 이식형 기구
WO2014145360A1 (en) 2013-03-15 2014-09-18 Nanonex Corporation Imprint lithography system and method for manufacturing
US10108086B2 (en) 2013-03-15 2018-10-23 Nanonex Corporation System and methods of mold/substrate separation for imprint lithography
CN104190859A (zh) * 2014-06-26 2014-12-10 芜湖市鸿坤汽车零部件有限公司 一种消失模铸造用醇基铸造涂料及其制作方法
JP5788577B2 (ja) * 2014-08-27 2015-09-30 Hoya株式会社 コピーモールドの製造方法
CN104399871A (zh) * 2014-11-08 2015-03-11 芜湖市鸿坤汽车零部件有限公司 一种沥青/草木灰复合的醇基铸造涂料及其制作方法
CN115724421B (zh) * 2021-08-23 2024-07-16 中国科学院苏州纳米技术与纳米仿生研究所 一种定向碳纳米管阵列结构及其制备方法与应用

Family Cites Families (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3972924A (en) * 1975-03-24 1976-08-03 The United States Of America As Represented By The Secretary Of Agriculture 1-(1H,1H-perfluorooctyl)-1,3-trimethylenediphosphonic tetrachloride
US4118235A (en) * 1975-09-18 1978-10-03 Daikin Kogyo Co., Ltd. Mold release agent
US5277788A (en) 1990-10-01 1994-01-11 Aluminum Company Of America Twice-anodized aluminum article having an organo-phosphorus monolayer and process for making the article
JPH0818336B2 (ja) * 1991-02-06 1996-02-28 松下電器産業株式会社 成形用部材およびその製造方法
JPH08120178A (ja) * 1994-10-21 1996-05-14 Daikin Ind Ltd 離型剤、該離型剤から得られる硬化皮膜および該離型剤を用いた成形方法
US6309580B1 (en) * 1995-11-15 2001-10-30 Regents Of The University Of Minnesota Release surfaces, particularly for use in nanoimprint lithography
US6048623A (en) * 1996-12-18 2000-04-11 Kimberly-Clark Worldwide, Inc. Method of contact printing on gold coated films
US5820678A (en) * 1997-05-30 1998-10-13 The Regents Of The University Of California Solid source MOCVD system
WO2001053889A1 (en) * 2000-01-21 2001-07-26 Obducat Aktiebolag A mold for nano imprinting
US6380101B1 (en) * 2000-04-18 2002-04-30 International Business Machines Corporation Method of forming patterned indium zinc oxide and indium tin oxide films via microcontact printing and uses thereof
US6852266B2 (en) 2001-01-19 2005-02-08 Korry Electronics Co. Ultrasonic assisted deposition of anti-stick films on metal oxides
US6824882B2 (en) * 2002-05-31 2004-11-30 3M Innovative Properties Company Fluorinated phosphonic acids
ATE346752T1 (de) * 2002-06-20 2006-12-15 Obducat Ab Formwerkzeug, verfahren zur herstellung eines formwerkzeugs und durch verwendung des formwerkzeugs gebildetes speichermedium
US6806809B2 (en) * 2003-01-03 2004-10-19 General Motors Corporation Trailer tongue length estimation using a hitch angle sensor
US7189479B2 (en) * 2003-08-21 2007-03-13 3M Innovative Properties Company Phototool coating
JP2008500914A (ja) 2004-05-28 2008-01-17 オブデュキャット、アクチボラグ インプリント方法に使用する変性された金属製成形型

Also Published As

Publication number Publication date
US7717693B2 (en) 2010-05-18
KR101257881B1 (ko) 2013-04-24
US20100227051A1 (en) 2010-09-09
WO2005119360A1 (en) 2005-12-15
EP1759245A1 (de) 2007-03-07
JP2008500914A (ja) 2008-01-17
CN101010632A (zh) 2007-08-01
ES2317246T3 (es) 2009-04-16
US8119197B2 (en) 2012-02-21
KR20070028468A (ko) 2007-03-12
DE602005010860D1 (de) 2008-12-18
US20070166557A1 (en) 2007-07-19
EP1759245B1 (de) 2008-11-05

Similar Documents

Publication Publication Date Title
ATE413632T1 (de) Modifizierte metallform zur verwendung bei druckprozessen
ATE386268T1 (de) Verfahren zur abscheidung von mono- und mehrfachschichten von organophosphor- und - phosphonsäuren und deren salzen sowie deren verwendung
PL2016161T3 (pl) Kwasowy środek czyszczący do powierzchni metalowych
ATE248179T1 (de) Verfahren zur herstellung von phosphinsäureestern
DE602004003506D1 (de) Perfluorpolyetheramidgebundene phosphonate, phosphate und derivate davon
ATE279421T1 (de) Verfahren zur herstellung von ethan-1,2- bis(alkylphosphinsäuren)
WO2009009249A3 (en) Polyester compositions, method of manufacture, and uses thereof
JP2003522228A5 (de)
ATE497769T1 (de) Verfahren zur herstellung von ibandronat
DE602004032577D1 (de) Amorphe Form das Natriumsalzes der Ibandronsäure
ATE312836T1 (de) Verfahren zur herstellung von 4-amino-1- hydroxybutyliden-1,1-bisphosphonsäure
ATE472511T1 (de) Verfahren zur herstellung stabiler dispersionen metallischer nanopartikel, stabile dispersion hergestellt auf basis dieses verfahrens und beschichtungszusammensetzungen enthaltend diese dispersionen
ATE520736T1 (de) Verwendung von phosphinsäuren und/oder phosphonsäuren in polymerisationsverfahren
DE50103200D1 (de) Verfahren zur Herstellung von Alkenylphosphonsäure-Derivaten
JP4656250B2 (ja) 耐熱性膨張黒鉛シート
JP2004292755A5 (de)
DE59906740D1 (de) Verfahren zur Herstellung von Phosphonigsäureestern
DE502004011432D1 (de) Verfahren zur herstellung von phosphoniumsalzen
ATE413409T1 (de) Verfahren zur herstellung von ä1-hydroxy-2-(3- pyridinyl)ethylidenübisphosphonsäure und dem hemipentahydrat-mononatriumsalz davon
ATE483719T1 (de) Verfahren zur herstellung von onium-salzen mit dialkylphosphat-, dialkylphosphinat- oder (o- alkyl)-alkyl- oder alkyl-phosphonat-anionen mit geringem halogenid-gehalt
JP2005097579A5 (de)
DE69916067D1 (de) Verfahren zur herstellung von n-phosphonomethyl iminodiessigsäure
ATE388156T1 (de) Verfahren zur herstellung von ethylen-1,2- diphosphonsäuren
ATE150755T1 (de) Neue 2-saccharinylmethyl und 4,5,6,7-tetrahydro-2-saccharinylmethyl phosphate, phosphonate und phosphinate, brauchbar als proteolytische enzyme- inhibitoren und zusammensetzungen und methode zur verwendung davon
DE602004004894D1 (de) Verfahren zur rückgewinnung von phosphor aus phosphorproduktionsschlamm

Legal Events

Date Code Title Description
UEP Publication of translation of european patent specification

Ref document number: 1759245

Country of ref document: EP

REN Ceased due to non-payment of the annual fee