ATE419573T1 - Drucksteuerverfahren - Google Patents
DrucksteuerverfahrenInfo
- Publication number
- ATE419573T1 ATE419573T1 AT05701892T AT05701892T ATE419573T1 AT E419573 T1 ATE419573 T1 AT E419573T1 AT 05701892 T AT05701892 T AT 05701892T AT 05701892 T AT05701892 T AT 05701892T AT E419573 T1 ATE419573 T1 AT E419573T1
- Authority
- AT
- Austria
- Prior art keywords
- pressure
- chamber
- flow
- setting
- print control
- Prior art date
Links
- 230000001052 transient effect Effects 0.000 abstract 2
Classifications
-
- G—PHYSICS
- G05—CONTROLLING; REGULATING
- G05D—SYSTEMS FOR CONTROLLING OR REGULATING NON-ELECTRIC VARIABLES
- G05D16/00—Control of fluid pressure
- G05D16/20—Control of fluid pressure characterised by the use of electric means
- G05D16/2006—Control of fluid pressure characterised by the use of electric means with direct action of electric energy on controlling means
- G05D16/208—Control of fluid pressure characterised by the use of electric means with direct action of electric energy on controlling means using a combination of controlling means as defined in G05D16/2013 and G05D16/2066
Landscapes
- Physics & Mathematics (AREA)
- Fluid Mechanics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Automation & Control Theory (AREA)
- Control Of Fluid Pressure (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
- Electrical Discharge Machining, Electrochemical Machining, And Combined Machining (AREA)
- Manufacture, Treatment Of Glass Fibers (AREA)
- Flow Control (AREA)
- Chemical Vapour Deposition (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| GBGB0401396.7A GB0401396D0 (en) | 2004-01-22 | 2004-01-22 | Pressure control method |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| ATE419573T1 true ATE419573T1 (de) | 2009-01-15 |
Family
ID=31971282
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| AT05701892T ATE419573T1 (de) | 2004-01-22 | 2005-01-14 | Drucksteuerverfahren |
Country Status (8)
| Country | Link |
|---|---|
| US (1) | US8070459B2 (de) |
| EP (1) | EP1706803B1 (de) |
| JP (1) | JP2007519112A (de) |
| AT (1) | ATE419573T1 (de) |
| DE (1) | DE602005012050D1 (de) |
| GB (1) | GB0401396D0 (de) |
| TW (1) | TWI358620B (de) |
| WO (1) | WO2005071509A1 (de) |
Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US8161998B2 (en) * | 2007-06-04 | 2012-04-24 | Matos Jeffrey A | Frozen/chilled fluid for pipelines and for storage facilities |
| US8135529B2 (en) * | 2008-09-23 | 2012-03-13 | Delta Electronics, Inc. | Method for controlling constant-pressure fluid |
| DE102009017887A1 (de) * | 2009-04-17 | 2010-10-21 | Oerlikon Leybold Vacuum Gmbh | Grobpumpverfahren für eine Verdrängerpumpe |
| US9267605B2 (en) | 2011-11-07 | 2016-02-23 | Lam Research Corporation | Pressure control valve assembly of plasma processing chamber and rapid alternating process |
| FR2993614B1 (fr) * | 2012-07-19 | 2018-06-15 | Pfeiffer Vacuum | Procede et dispositif de pompage d'une chambre de procedes |
| JP6996289B2 (ja) | 2016-12-26 | 2022-01-17 | 株式会社島津製作所 | バルブ装置 |
Family Cites Families (27)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4850806A (en) * | 1988-05-24 | 1989-07-25 | The Boc Group, Inc. | Controlled by-pass for a booster pump |
| FR2640697B1 (fr) * | 1988-12-16 | 1993-01-08 | Cit Alcatel | Ensemble de pompage pour l'obtention de vides eleves |
| JPH02271185A (ja) * | 1989-04-13 | 1990-11-06 | Fujitsu Ltd | バルブ機構 |
| US6008133A (en) * | 1991-04-04 | 1999-12-28 | Hitachi, Ltd. | Method and apparatus for dry etching |
| JPH04326943A (ja) * | 1991-04-25 | 1992-11-16 | Hitachi Ltd | 真空排気システム及び排気方法 |
| JPH06259144A (ja) | 1993-03-05 | 1994-09-16 | Kokusai Electric Co Ltd | 高速圧力制御方法 |
| JP3847357B2 (ja) * | 1994-06-28 | 2006-11-22 | 株式会社荏原製作所 | 真空系の排気装置 |
| DE19524609A1 (de) * | 1995-07-06 | 1997-01-09 | Leybold Ag | Vorrichtung zum raschen Evakuieren einer Vakuumkammer |
| US6142163A (en) * | 1996-03-29 | 2000-11-07 | Lam Research Corporation | Method and apparatus for pressure control in vacuum processors |
| US5758680A (en) | 1996-03-29 | 1998-06-02 | Lam Research Corporation | Method and apparatus for pressure control in vacuum processors |
| US5803107A (en) | 1996-03-29 | 1998-09-08 | Lam Research Corporation | Method and apparatus for pressure control in vacuum processors |
| DE19704234B4 (de) * | 1997-02-05 | 2006-05-11 | Pfeiffer Vacuum Gmbh | Verfahren und Vorrichtung zur Regelung des Saugvermögens von Vakuumpumpen |
| US5944049A (en) * | 1997-07-15 | 1999-08-31 | Applied Materials, Inc. | Apparatus and method for regulating a pressure in a chamber |
| GB9717400D0 (en) * | 1997-08-15 | 1997-10-22 | Boc Group Plc | Vacuum pumping systems |
| JPH11312640A (ja) * | 1998-02-25 | 1999-11-09 | Canon Inc | 処理装置および該処理装置を用いたデバイス製造方法 |
| JP3929185B2 (ja) * | 1998-05-20 | 2007-06-13 | 株式会社荏原製作所 | 真空排気装置及び方法 |
| JP4708516B2 (ja) | 1998-06-01 | 2011-06-22 | 財団法人国際科学振興財団 | 半導体又は液晶製造用装置並びに液体材料ガスの気化方法 |
| JP2000020138A (ja) * | 1998-07-07 | 2000-01-21 | Ckd Corp | 真空圧力制御システム |
| US7077159B1 (en) * | 1998-12-23 | 2006-07-18 | Applied Materials, Inc. | Processing apparatus having integrated pumping system |
| EP1043645B1 (de) * | 1999-04-07 | 2004-10-20 | Alcatel | Druckregelvorrichtung für eine Vakuumkammer, und eine mit einer solchen Vorrichtung versehenen Vakuumpumpeinheit |
| JP2001051723A (ja) | 1999-08-11 | 2001-02-23 | Matsushita Electronics Industry Corp | 流量制御装置および方法 |
| JP2002091573A (ja) * | 2000-09-19 | 2002-03-29 | Toshiba Corp | 圧力制御方法、処理装置および処理方法 |
| JP4335469B2 (ja) * | 2001-03-22 | 2009-09-30 | 株式会社荏原製作所 | 真空排気装置のガス循環量調整方法及び装置 |
| US6739840B2 (en) * | 2002-05-22 | 2004-05-25 | Applied Materials Inc | Speed control of variable speed pump |
| GB0212757D0 (en) * | 2002-05-31 | 2002-07-10 | Boc Group Plc | A vacuum pumping system and method of controlling the same |
| GB0214273D0 (en) * | 2002-06-20 | 2002-07-31 | Boc Group Plc | Apparatus for controlling the pressure in a process chamber and method of operating same |
| US7472581B2 (en) * | 2005-03-16 | 2009-01-06 | Tokyo Electron Limited | Vacuum apparatus |
-
2004
- 2004-01-22 GB GBGB0401396.7A patent/GB0401396D0/en not_active Ceased
-
2005
- 2005-01-14 EP EP05701892A patent/EP1706803B1/de not_active Expired - Lifetime
- 2005-01-14 US US10/586,200 patent/US8070459B2/en not_active Expired - Fee Related
- 2005-01-14 DE DE602005012050T patent/DE602005012050D1/de not_active Expired - Lifetime
- 2005-01-14 JP JP2006550270A patent/JP2007519112A/ja active Pending
- 2005-01-14 AT AT05701892T patent/ATE419573T1/de not_active IP Right Cessation
- 2005-01-14 WO PCT/GB2005/000124 patent/WO2005071509A1/en not_active Ceased
- 2005-01-21 TW TW094101854A patent/TWI358620B/zh not_active IP Right Cessation
Also Published As
| Publication number | Publication date |
|---|---|
| EP1706803B1 (de) | 2008-12-31 |
| US8070459B2 (en) | 2011-12-06 |
| TWI358620B (en) | 2012-02-21 |
| TW200532411A (en) | 2005-10-01 |
| DE602005012050D1 (de) | 2009-02-12 |
| US20070163330A1 (en) | 2007-07-19 |
| JP2007519112A (ja) | 2007-07-12 |
| WO2005071509A1 (en) | 2005-08-04 |
| EP1706803A1 (de) | 2006-10-04 |
| GB0401396D0 (en) | 2004-02-25 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| RER | Ceased as to paragraph 5 lit. 3 law introducing patent treaties |