ATE427560T1 - Elektronische vorrichtung, anordnung und verfahren zum herstellen einer elektronischen vorrichtung - Google Patents

Elektronische vorrichtung, anordnung und verfahren zum herstellen einer elektronischen vorrichtung

Info

Publication number
ATE427560T1
ATE427560T1 AT04736684T AT04736684T ATE427560T1 AT E427560 T1 ATE427560 T1 AT E427560T1 AT 04736684 T AT04736684 T AT 04736684T AT 04736684 T AT04736684 T AT 04736684T AT E427560 T1 ATE427560 T1 AT E427560T1
Authority
AT
Austria
Prior art keywords
electronic device
producing
arrangement
substrate
vertical
Prior art date
Application number
AT04736684T
Other languages
English (en)
Inventor
Freddy Roozeboom
Adrianus Buijsman
Patrice Gamand
Antonius Kemmeren
Gerardus Hubert
Original Assignee
Nxp Bv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nxp Bv filed Critical Nxp Bv
Application granted granted Critical
Publication of ATE427560T1 publication Critical patent/ATE427560T1/de

Links

Classifications

    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D1/00Resistors, capacitors or inductors
    • H10D1/60Capacitors
    • H10D1/68Capacitors having no potential barriers
    • H10D1/692Electrodes
    • H10D1/711Electrodes having non-planar surfaces, e.g. formed by texturisation
    • H10D1/716Electrodes having non-planar surfaces, e.g. formed by texturisation having vertical extensions
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W76/00Containers; Fillings or auxiliary members therefor; Seals
    • H10W76/10Containers or parts thereof
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W44/00Electrical arrangements for controlling or matching impedance
    • H10W44/20Electrical arrangements for controlling or matching impedance at high-frequency [HF] or radio frequency [RF]
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D1/00Resistors, capacitors or inductors
    • H10D1/01Manufacture or treatment
    • H10D1/045Manufacture or treatment of capacitors having potential barriers, e.g. varactors
    • H10D1/047Manufacture or treatment of capacitors having potential barriers, e.g. varactors of conductor-insulator-semiconductor capacitors, e.g. trench capacitors
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D1/00Resistors, capacitors or inductors
    • H10D1/60Capacitors
    • H10D1/62Capacitors having potential barriers
    • H10D1/66Conductor-insulator-semiconductor capacitors, e.g. MOS capacitors
    • H10D1/665Trench conductor-insulator-semiconductor capacitors, e.g. trench MOS capacitors
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D1/00Resistors, capacitors or inductors
    • H10D1/60Capacitors
    • H10D1/68Capacitors having no potential barriers
    • H10D1/692Electrodes
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D62/00Semiconductor bodies, or regions thereof, of devices having potential barriers
    • H10D62/10Shapes, relative sizes or dispositions of the regions of the semiconductor bodies; Shapes of the semiconductor bodies
    • H10D62/117Shapes of semiconductor bodies
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D84/00Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers
    • H10D84/201Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers characterised by the integration of only components covered by H10D1/00 or H10D8/00, e.g. RLC circuits
    • H10D84/204Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers characterised by the integration of only components covered by H10D1/00 or H10D8/00, e.g. RLC circuits of combinations of diodes or capacitors or resistors
    • H10D84/212Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers characterised by the integration of only components covered by H10D1/00 or H10D8/00, e.g. RLC circuits of combinations of diodes or capacitors or resistors of only capacitors
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W20/00Interconnections in chips, wafers or substrates
    • H10W20/01Manufacture or treatment
    • H10W20/021Manufacture or treatment of interconnections within wafers or substrates
    • H10W20/023Manufacture or treatment of interconnections within wafers or substrates the interconnections being through-semiconductor vias
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W20/00Interconnections in chips, wafers or substrates
    • H10W20/01Manufacture or treatment
    • H10W20/021Manufacture or treatment of interconnections within wafers or substrates
    • H10W20/023Manufacture or treatment of interconnections within wafers or substrates the interconnections being through-semiconductor vias
    • H10W20/0242Manufacture or treatment of interconnections within wafers or substrates the interconnections being through-semiconductor vias comprising etching via holes from the back sides of the chips, wafers or substrates
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W20/00Interconnections in chips, wafers or substrates
    • H10W20/01Manufacture or treatment
    • H10W20/021Manufacture or treatment of interconnections within wafers or substrates
    • H10W20/023Manufacture or treatment of interconnections within wafers or substrates the interconnections being through-semiconductor vias
    • H10W20/0245Manufacture or treatment of interconnections within wafers or substrates the interconnections being through-semiconductor vias comprising use of blind vias during the manufacture
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W20/00Interconnections in chips, wafers or substrates
    • H10W20/20Interconnections within wafers or substrates, e.g. through-silicon vias [TSV]
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W20/00Interconnections in chips, wafers or substrates
    • H10W20/20Interconnections within wafers or substrates, e.g. through-silicon vias [TSV]
    • H10W20/211Through-semiconductor vias, e.g. TSVs
    • H10W20/212Top-view shapes or dispositions, e.g. top-view layouts of the vias
    • H10W20/2125Top-view shapes
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W70/00Package substrates; Interposers; Redistribution layers [RDL]
    • H10W70/01Manufacture or treatment
    • H10W70/05Manufacture or treatment of insulating or insulated package substrates, or of interposers, or of redistribution layers
    • H10W70/095Manufacture or treatment of insulating or insulated package substrates, or of interposers, or of redistribution layers of vias therein
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W70/00Package substrates; Interposers; Redistribution layers [RDL]
    • H10W70/60Insulating or insulated package substrates; Interposers; Redistribution layers
    • H10W70/62Insulating or insulated package substrates; Interposers; Redistribution layers characterised by their interconnections
    • H10W70/63Vias, e.g. via plugs
    • H10W70/635Through-vias
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W70/00Package substrates; Interposers; Redistribution layers [RDL]
    • H10W70/60Insulating or insulated package substrates; Interposers; Redistribution layers
    • H10W70/62Insulating or insulated package substrates; Interposers; Redistribution layers characterised by their interconnections
    • H10W70/65Shapes or dispositions of interconnections
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W70/00Package substrates; Interposers; Redistribution layers [RDL]
    • H10W70/60Insulating or insulated package substrates; Interposers; Redistribution layers
    • H10W70/62Insulating or insulated package substrates; Interposers; Redistribution layers characterised by their interconnections
    • H10W70/66Conductive materials thereof
    • H10W70/662Semiconductor materials
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W90/00Package configurations
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W44/00Electrical arrangements for controlling or matching impedance
    • H10W44/20Electrical arrangements for controlling or matching impedance at high-frequency [HF] or radio frequency [RF]
    • H10W44/203Electrical connections
    • H10W44/209Vertical interconnections, e.g. vias
    • H10W44/212Coaxial feed-throughs in substrates
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W44/00Electrical arrangements for controlling or matching impedance
    • H10W44/20Electrical arrangements for controlling or matching impedance at high-frequency [HF] or radio frequency [RF]
    • H10W44/241Electrical arrangements for controlling or matching impedance at high-frequency [HF] or radio frequency [RF] for passive devices or passive elements
    • H10W44/243Electrical arrangements for controlling or matching impedance at high-frequency [HF] or radio frequency [RF] for passive devices or passive elements for decoupling, e.g. bypass capacitors
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00Interconnections or connectors in packages
    • H10W72/823Interconnections through encapsulations, e.g. pillars through molded resin on a lateral side a chip
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00Interconnections or connectors in packages
    • H10W72/90Bond pads, in general
    • H10W72/921Structures or relative sizes of bond pads
    • H10W72/922Bond pads being integral with underlying chip-level interconnections
    • H10W72/9226Bond pads being integral with underlying chip-level interconnections with via interconnections
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00Interconnections or connectors in packages
    • H10W72/90Bond pads, in general
    • H10W72/921Structures or relative sizes of bond pads
    • H10W72/923Bond pads having multiple stacked layers
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00Interconnections or connectors in packages
    • H10W72/90Bond pads, in general
    • H10W72/941Dispositions of bond pads
    • H10W72/9415Dispositions of bond pads relative to the surface, e.g. recessed, protruding
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00Interconnections or connectors in packages
    • H10W72/90Bond pads, in general
    • H10W72/941Dispositions of bond pads
    • H10W72/942Dispositions of bond pads relative to underlying supporting features, e.g. bond pads, RDLs or vias
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W90/00Package configurations
    • H10W90/20Configurations of stacked chips
    • H10W90/22Configurations of stacked chips the stacked chips being on both top and bottom sides of a package substrate, interposer or RDL
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W90/00Package configurations
    • H10W90/701Package configurations characterised by the relative positions of pads or connectors relative to package parts
    • H10W90/721Package configurations characterised by the relative positions of pads or connectors relative to package parts of bump connectors
    • H10W90/724Package configurations characterised by the relative positions of pads or connectors relative to package parts of bump connectors between a chip and a stacked insulating package substrate, interposer or RDL
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W90/00Package configurations
    • H10W90/701Package configurations characterised by the relative positions of pads or connectors relative to package parts
    • H10W90/721Package configurations characterised by the relative positions of pads or connectors relative to package parts of bump connectors
    • H10W90/728Package configurations characterised by the relative positions of pads or connectors relative to package parts of bump connectors between a chip and a stacked discrete passive device, e.g. resistors, capacitors or inductors

Landscapes

  • Semiconductor Integrated Circuits (AREA)
  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
  • Apparatuses And Processes For Manufacturing Resistors (AREA)
  • Liquid Crystal (AREA)
  • Electrophonic Musical Instruments (AREA)
  • Physics & Mathematics (AREA)
  • Geometry (AREA)
  • Engineering & Computer Science (AREA)
  • Power Engineering (AREA)
AT04736684T 2003-06-20 2004-06-11 Elektronische vorrichtung, anordnung und verfahren zum herstellen einer elektronischen vorrichtung ATE427560T1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
EP03300035 2003-06-20
EP04300132 2004-03-10

Publications (1)

Publication Number Publication Date
ATE427560T1 true ATE427560T1 (de) 2009-04-15

Family

ID=33542572

Family Applications (1)

Application Number Title Priority Date Filing Date
AT04736684T ATE427560T1 (de) 2003-06-20 2004-06-11 Elektronische vorrichtung, anordnung und verfahren zum herstellen einer elektronischen vorrichtung

Country Status (7)

Country Link
US (2) US9530857B2 (de)
EP (1) EP1639634B1 (de)
JP (1) JP5058597B2 (de)
KR (1) KR101086520B1 (de)
AT (1) ATE427560T1 (de)
DE (1) DE602004020344D1 (de)
WO (1) WO2004114397A1 (de)

Families Citing this family (82)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2005088699A1 (en) * 2004-03-10 2005-09-22 Koninklijke Philips Electronics N.V. Method of manufacturing an electronic device and a resulting device
CN101356637B (zh) * 2005-11-08 2012-06-06 Nxp股份有限公司 使用临时帽层产生受到覆盖的穿透衬底的通道
JP5033807B2 (ja) 2005-11-08 2012-09-26 エヌエックスピー ビー ヴィ 極めて高いキャパシタンス値のための集積キャパシタの配置
US7844997B2 (en) * 2006-01-12 2010-11-30 Honeywell International Inc. Securing standard test access port with an independent security key interface
US7626257B2 (en) * 2006-01-18 2009-12-01 Infineon Technologies Ag Semiconductor devices and methods of manufacture thereof
US8171542B2 (en) * 2006-02-13 2012-05-01 Honeywell International Inc. Advanced encryption standard to provide hardware key interface
US8135959B2 (en) * 2006-04-07 2012-03-13 Honeywell International Inc. External key to provide protection to devices
US8502362B2 (en) * 2011-08-16 2013-08-06 Advanced Analogic Technologies, Incorporated Semiconductor package containing silicon-on-insulator die mounted in bump-on-leadframe manner to provide low thermal resistance
CN101484976B (zh) 2006-05-02 2011-02-23 Nxp股份有限公司 包括改进的电极的电器件及其制造方法
WO2007131967A1 (en) * 2006-05-15 2007-11-22 Koninklijke Philips Electronics N.V. Integrated low-loss capacitor-arrray structure
WO2008007257A2 (en) 2006-06-20 2008-01-17 Nxp B.V. Integrated circuit and assembly therewith
TW200818534A (en) * 2006-08-10 2008-04-16 Icemos Technology Corp Method of manufacturing a photodiode array with through-wafer vias
US7531445B2 (en) * 2006-09-26 2009-05-12 Hymite A/S Formation of through-wafer electrical interconnections and other structures using a thin dielectric membrane
US8513789B2 (en) 2006-10-10 2013-08-20 Tessera, Inc. Edge connect wafer level stacking with leads extending along edges
US7901989B2 (en) 2006-10-10 2011-03-08 Tessera, Inc. Reconstituted wafer level stacking
US7829438B2 (en) 2006-10-10 2010-11-09 Tessera, Inc. Edge connect wafer level stacking
US7791199B2 (en) 2006-11-22 2010-09-07 Tessera, Inc. Packaged semiconductor chips
US8569876B2 (en) 2006-11-22 2013-10-29 Tessera, Inc. Packaged semiconductor chips with array
US7952195B2 (en) 2006-12-28 2011-05-31 Tessera, Inc. Stacked packages with bridging traces
DE102007009383A1 (de) 2007-02-20 2008-08-21 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Halbleiteranordnung und Verfahren zu deren Herstellung
EP2135280A2 (de) 2007-03-05 2009-12-23 Tessera, Inc. Chips mit rückseitigen kontakten, die durch durchkontaktierungen mit vorderseitigen kontakten verbunden werden
WO2008118352A1 (en) * 2007-03-23 2008-10-02 Innovatier, Inc. A step card and method for making a step card
DE102007019552B4 (de) * 2007-04-25 2009-12-17 Infineon Technologies Ag Verfahren zur Herstellung eines Substrats mit Durchführung sowie Substrat und Halbleitermodul mit Durchführung
EP3043381B1 (de) * 2007-05-10 2019-05-22 Murata Integrated Passive Solutions Integrationssubstrat mit kondensator mit ultrahoher dichte und substratdurchgang
US8395914B2 (en) 2007-05-10 2013-03-12 Nxp B.V. DC-to-DC converter comprising a reconfigurable capacitor unit
DE102007026445A1 (de) * 2007-06-06 2008-12-11 Robert Bosch Gmbh Mikromechanisches Bauelement und Verfahren zur Herstellung eines mikromechanischen Bauelements
CN101785103B (zh) * 2007-07-05 2011-12-28 Aac微技术有限公司 低阻抗晶圆穿孔
CN101809739B (zh) 2007-07-27 2014-08-20 泰塞拉公司 具有后应用的衬垫延长部分的重构晶片堆封装
KR101538648B1 (ko) 2007-07-31 2015-07-22 인벤사스 코포레이션 실리콘 쓰루 비아를 사용하는 반도체 패키지 공정
WO2009020572A2 (en) 2007-08-03 2009-02-12 Tessera Technologies Hungary Kft. Stack packages using reconstituted wafers
US8043895B2 (en) 2007-08-09 2011-10-25 Tessera, Inc. Method of fabricating stacked assembly including plurality of stacked microelectronic elements
JP4585561B2 (ja) * 2007-09-04 2010-11-24 株式会社東芝 半導体装置の製造方法
US8227847B2 (en) 2008-02-20 2012-07-24 Nxp B.V. Ultra high density capacity comprising pillar-shaped capacitors formed on both sides of a substrate
JP5639052B2 (ja) 2008-06-16 2014-12-10 テッセラ,インコーポレイテッド ウェハレベルでの縁部の積重ね
CN102164845A (zh) * 2008-09-30 2011-08-24 Nxp股份有限公司 鲁棒高宽比半导体器件
US7943473B2 (en) 2009-01-13 2011-05-17 Maxim Integrated Products, Inc. Minimum cost method for forming high density passive capacitors for replacement of discrete board capacitors using a minimum cost 3D wafer-to-wafer modular integration scheme
US8466542B2 (en) 2009-03-13 2013-06-18 Tessera, Inc. Stacked microelectronic assemblies having vias extending through bond pads
US8062975B2 (en) * 2009-04-16 2011-11-22 Freescale Semiconductor, Inc. Through substrate vias
US8791575B2 (en) 2010-07-23 2014-07-29 Tessera, Inc. Microelectronic elements having metallic pads overlying vias
US9640437B2 (en) 2010-07-23 2017-05-02 Tessera, Inc. Methods of forming semiconductor elements using micro-abrasive particle stream
US8796135B2 (en) 2010-07-23 2014-08-05 Tessera, Inc. Microelectronic elements with rear contacts connected with via first or via middle structures
US8076184B1 (en) * 2010-08-16 2011-12-13 Stats Chippac, Ltd. Semiconductor device and method of forming wafer-level multi-row etched leadframe with base leads and embedded semiconductor die
US8610259B2 (en) 2010-09-17 2013-12-17 Tessera, Inc. Multi-function and shielded 3D interconnects
US8847380B2 (en) 2010-09-17 2014-09-30 Tessera, Inc. Staged via formation from both sides of chip
JP5141740B2 (ja) * 2010-10-04 2013-02-13 株式会社デンソー 半導体装置およびその製造方法
US8232173B2 (en) 2010-11-01 2012-07-31 International Business Machines Corporation Structure and design structure for high-Q value inductor and method of manufacturing the same
EP2450995A1 (de) 2010-11-03 2012-05-09 Nxp B.V. Batterie
KR101059490B1 (ko) 2010-11-15 2011-08-25 테세라 리써치 엘엘씨 임베드된 트레이스에 의해 구성된 전도성 패드
US8637968B2 (en) 2010-12-02 2014-01-28 Tessera, Inc. Stacked microelectronic assembly having interposer connecting active chips
US8736066B2 (en) 2010-12-02 2014-05-27 Tessera, Inc. Stacked microelectronic assemby with TSVS formed in stages and carrier above chip
US8587126B2 (en) 2010-12-02 2013-11-19 Tessera, Inc. Stacked microelectronic assembly with TSVs formed in stages with plural active chips
US8610264B2 (en) 2010-12-08 2013-12-17 Tessera, Inc. Compliant interconnects in wafers
US8502340B2 (en) * 2010-12-09 2013-08-06 Tessera, Inc. High density three-dimensional integrated capacitors
US8742541B2 (en) 2010-12-09 2014-06-03 Tessera, Inc. High density three-dimensional integrated capacitors
JP6028887B2 (ja) * 2011-06-13 2016-11-24 セイコーエプソン株式会社 配線基板、赤外線センサー及び貫通電極形成方法
JP5834563B2 (ja) * 2011-07-14 2015-12-24 セイコーエプソン株式会社 半導体装置の製造方法
US20140021603A1 (en) 2012-07-23 2014-01-23 Rf Micro Devices, Inc. Using an interconnect bump to traverse through a passivation layer of a semiconductor die
KR101985404B1 (ko) * 2012-09-13 2019-06-03 해성디에스 주식회사 회로 기판의 제조 방법 및 그 방법으로 제조된 회로 기판
US10283854B2 (en) 2012-10-08 2019-05-07 Taoglas Group Holdings Limited Low-cost ultra wideband LTE antenna
CN105097794A (zh) * 2014-04-25 2015-11-25 中芯国际集成电路制造(上海)有限公司 Esd防护器件及其制作方法
JP6528550B2 (ja) * 2015-06-11 2019-06-12 株式会社デンソー 半導体装置およびその製造方法
US11342189B2 (en) 2015-09-17 2022-05-24 Semiconductor Components Industries, Llc Semiconductor packages with die including cavities and related methods
US9893058B2 (en) * 2015-09-17 2018-02-13 Semiconductor Components Industries, Llc Method of manufacturing a semiconductor device having reduced on-state resistance and structure
US9755310B2 (en) 2015-11-20 2017-09-05 Taoglas Limited Ten-frequency band antenna
CN105371878B (zh) 2015-12-04 2017-08-25 歌尔股份有限公司 一种环境传感器及其制造方法
EP3423993B1 (de) * 2016-03-01 2020-07-01 Cardlab ApS Schaltungsschicht für eine chipkarte
US10432172B2 (en) * 2016-09-01 2019-10-01 Samsung Electro-Mechanics Co., Ltd. Bulk acoustic filter device and method of manufacturing the same
US10944379B2 (en) * 2016-12-14 2021-03-09 Qualcomm Incorporated Hybrid passive-on-glass (POG) acoustic filter
US10199372B2 (en) * 2017-06-23 2019-02-05 Infineon Technologies Ag Monolithically integrated chip including active electrical components and passive electrical components with chip edge stabilization structures
US10381161B2 (en) * 2017-11-06 2019-08-13 Advanced Semiconductor Engineering, Inc. Capacitor structure
JP7021021B2 (ja) * 2018-07-25 2022-02-16 日産自動車株式会社 半導体装置及びその製造方法
MY201172A (en) * 2018-09-19 2024-02-08 Intel Corp Stacked through-silicon vias for multi-device packages
US11404534B2 (en) * 2019-06-28 2022-08-02 Taiwan Semiconductor Manufacturing Company, Ltd. Backside capacitor techniques
EP3849286B1 (de) * 2020-01-09 2025-08-27 Murata Manufacturing Co., Ltd. Elektronische vorrichtung mit differentiellen übertragungsleitungen, die mit von einer basis getragenen 3d-kondensatoren ausgestattet sind, und entsprechendes herstellungsverfahren
EP3930008A1 (de) 2020-06-24 2021-12-29 Murata Manufacturing Co., Ltd. Elektronisches bauelement mit einer kapazitiven 3d-struktur
JP2022147628A (ja) 2021-03-23 2022-10-06 株式会社東芝 半導体装置
US20230018448A1 (en) * 2021-07-14 2023-01-19 Qualcomm Incorporated Reduced impedance substrate
US20230394217A1 (en) * 2022-06-07 2023-12-07 Taiwan Semiconductor Manufacturing Co., Ltd. Integrated circuit (ic) design methods using process friendly cell architectures
FR3149467A1 (fr) * 2023-05-30 2024-12-06 Psa Automobiles Sa Dispositif semiconducteur comportant un condensateur de decouplage a structure stratifiee
WO2025154391A1 (ja) * 2024-01-17 2025-07-24 パナソニックIpマネジメント株式会社 インタポーザ
EP4718486A1 (de) * 2024-09-27 2026-04-01 Murata Manufacturing Co., Ltd. Elektrische vorrichtung mit einem kondensator für hochspannungsanwendungen und verfahren zur herstellung davon
CN119786435A (zh) * 2024-12-19 2025-04-08 深圳大学 一种双层镀铜的深槽电容兼容硅芯同轴硅通孔方法

Family Cites Families (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1514818A1 (de) 1951-01-28 1969-05-08 Telefunken Patent Festkoerperschaltung,bestehend aus einem Halbleiterkoerper mit eingebrachten aktiven Bauelementen und einer Isolierschicht mit aufgebrachten passiven Bauelementen und Leitungsbahnen
US4017885A (en) 1973-10-25 1977-04-12 Texas Instruments Incorporated Large value capacitor
EP0516031A1 (de) * 1991-05-29 1992-12-02 Ramtron International Corporation Ferroelektrische Stapelspeicherzelle und Herstellungsverfahren
JPH07135210A (ja) 1993-11-10 1995-05-23 Mitsubishi Electric Corp 半導体装置及びその製造方法
US5872393A (en) * 1995-10-30 1999-02-16 Matsushita Electric Industrial Co., Ltd. RF semiconductor device and a method for manufacturing the same
US5905279A (en) * 1996-04-09 1999-05-18 Kabushiki Kaisha Toshiba Low resistant trench fill for a semiconductor device
JP3724110B2 (ja) * 1997-04-24 2005-12-07 三菱電機株式会社 半導体装置の製造方法
US5998292A (en) * 1997-11-12 1999-12-07 International Business Machines Corporation Method for making three dimensional circuit integration
US6025226A (en) * 1998-01-15 2000-02-15 International Business Machines Corporation Method of forming a capacitor and a capacitor formed using the method
TW442873B (en) 1999-01-14 2001-06-23 United Microelectronics Corp Three-dimension stack-type chip structure and its manufacturing method
US6221769B1 (en) * 1999-03-05 2001-04-24 International Business Machines Corporation Method for integrated circuit power and electrical connections via through-wafer interconnects
US6617681B1 (en) 1999-06-28 2003-09-09 Intel Corporation Interposer and method of making same
US6559499B1 (en) * 2000-01-04 2003-05-06 Agere Systems Inc. Process for fabricating an integrated circuit device having capacitors with a multilevel metallization
US6384468B1 (en) 2000-02-07 2002-05-07 International Business Machines Corporation Capacitor and method for forming same
JP4386525B2 (ja) 2000-02-23 2009-12-16 イビデン株式会社 プリント配線板
JP3796099B2 (ja) 2000-05-12 2006-07-12 新光電気工業株式会社 半導体装置用インターポーザー、その製造方法および半導体装置
JP4895420B2 (ja) 2000-08-10 2012-03-14 ルネサスエレクトロニクス株式会社 半導体装置およびその製造方法
US6538300B1 (en) * 2000-09-14 2003-03-25 Vishay Intertechnology, Inc. Precision high-frequency capacitor formed on semiconductor substrate
US6737740B2 (en) * 2001-02-08 2004-05-18 Micron Technology, Inc. High performance silicon contact for flip chip
US6420776B1 (en) * 2001-03-01 2002-07-16 Amkor Technology, Inc. Structure including electronic components singulated using laser cutting
FR2830683A1 (fr) * 2001-10-10 2003-04-11 St Microelectronics Sa Realisation d'inductance et de via dans un circuit monolithique
US7030481B2 (en) 2002-12-09 2006-04-18 Internation Business Machines Corporation High density chip carrier with integrated passive devices

Also Published As

Publication number Publication date
US20060131691A1 (en) 2006-06-22
KR20060033866A (ko) 2006-04-20
EP1639634B1 (de) 2009-04-01
WO2004114397A1 (en) 2004-12-29
DE602004020344D1 (de) 2009-05-14
JP2007516589A (ja) 2007-06-21
EP1639634A1 (de) 2006-03-29
US20170170131A1 (en) 2017-06-15
JP5058597B2 (ja) 2012-10-24
US9530857B2 (en) 2016-12-27
KR101086520B1 (ko) 2011-11-23

Similar Documents

Publication Publication Date Title
ATE427560T1 (de) Elektronische vorrichtung, anordnung und verfahren zum herstellen einer elektronischen vorrichtung
SG157351A1 (en) Hybrid conductive vias including small dimension active surface ends and larger dimension back side ends, semiconductor devices including the same, and associated methods
TW200501216A (en) Organic semiconductor device and method of manufacture of same
WO2009105367A3 (en) Integrated circuit package and method of manufacturing same
TW200621114A (en) Structure and method for embedded passive component assembly
TW200731889A (en) Method of fabricating substrate with embedded component therein
ATE531242T1 (de) Verfahren zur herstellung eines elektronsichen moduls und elektronisches modul
TW200620664A (en) Semicomductor device and method for manufacturing the same
TW200610017A (en) Wiring board, method of manufacturing the same, and semiconductor device
TW200601550A (en) Method of forming high voltage devices with retrograde well
EP1758166A3 (de) Zwischenträger und dessen Herstellungsverfahren und elektronisches Gerät
TW200605266A (en) Manufacturing method of semiconductor device having groove wiring or connecting hole
TW200629434A (en) Module structure having an embedded chip
ATE354182T1 (de) Organische elektronische schaltung mit stukturierter halbleitender funktionsschicht und herstellungsverfahren dazu
ATE449502T1 (de) Elektronische vorrichtung mit drei beweglichen schichten
ATE522924T1 (de) Textilschicht-anordnung, textilschicht-array und verfahren zum herstellen einer textilschicht- anordnung
TW200715708A (en) Electronic substrate, manufacturing method for electronic substrate, and electronic device
ATE535019T1 (de) Verfahren zur herstellung einer waferanordnung mit mittels pn-übergang isolierten vias
TW200638821A (en) Conducting bump structure of circuit board and method for fabricating the same
TW200610080A (en) Electronic device and method of manufacturing the same
EP1688996A3 (de) Integrierte Halbleitervorrichtung und Verfahren zur Herstellung abgeschirmter Verbindung
PL2002471T3 (pl) Wzajemne połączenie pomiędzy urządzeniami elektronicznymi z podniesionymi doprowadzeniami
TW200618162A (en) Methods for fabricating semiconductor devices
TW200715621A (en) Procedure for producing a semiconductor component with a planner contact and the semiconductor component
TW200629998A (en) Printed circuit board and forming method thereof

Legal Events

Date Code Title Description
RER Ceased as to paragraph 5 lit. 3 law introducing patent treaties