ATE438197T1 - Ein halterungssystem und ein verfahren zum modulieren von substratformen - Google Patents

Ein halterungssystem und ein verfahren zum modulieren von substratformen

Info

Publication number
ATE438197T1
ATE438197T1 AT03768879T AT03768879T ATE438197T1 AT E438197 T1 ATE438197 T1 AT E438197T1 AT 03768879 T AT03768879 T AT 03768879T AT 03768879 T AT03768879 T AT 03768879T AT E438197 T1 ATE438197 T1 AT E438197T1
Authority
AT
Austria
Prior art keywords
chuck body
recess
recesses
support region
support system
Prior art date
Application number
AT03768879T
Other languages
English (en)
Inventor
Byung-Jin Choi
Ronald Voisin
Sidlgata Sreenivasan
Michael Watts
Daniel Babbs
Mario Meissl
Hillman Bailey
Norman Schumaker
Original Assignee
Molecular Imprints Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US10/293,224 external-priority patent/US7019819B2/en
Priority claimed from US10/316,963 external-priority patent/US6980282B2/en
Application filed by Molecular Imprints Inc filed Critical Molecular Imprints Inc
Application granted granted Critical
Publication of ATE438197T1 publication Critical patent/ATE438197T1/de

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/50—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for positioning, orientation or alignment
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00—Manufacture or treatment of nanostructures
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
    • G03B27/00—Photographic printing apparatus
    • G03B27/32—Projection printing apparatus, e.g. enlarger, copying camera
    • G03B27/52—Details
    • G03B27/62—Holders for the original
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/707—Chucks, e.g. chucking or un-chucking operations or structural details
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/70866—Environment aspects, e.g. pressure of beam-path gas, temperature of mask or workpiece
    • G03F7/70875—Temperature, e.g. temperature control of masks or workpieces via control of stage temperature
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/70—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping
    • H10P72/76—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping using mechanical means, e.g. clamps or pinches
    • H10P72/7604—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping using mechanical means, e.g. clamps or pinches the wafers being placed on a susceptor, stage or support
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/70—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping
    • H10P72/76—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping using mechanical means, e.g. clamps or pinches
    • H10P72/7604—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping using mechanical means, e.g. clamps or pinches the wafers being placed on a susceptor, stage or support
    • H10P72/7611—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping using mechanical means, e.g. clamps or pinches the wafers being placed on a susceptor, stage or support characterised by edge profile or support profile
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/70—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping
    • H10P72/78—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping using vacuum or suction, e.g. Bernoulli chucks

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Nanotechnology (AREA)
  • Health & Medical Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Public Health (AREA)
  • Manufacturing & Machinery (AREA)
  • Atmospheric Sciences (AREA)
  • Mathematical Physics (AREA)
  • Theoretical Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Toxicology (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Epidemiology (AREA)
  • Shaping Of Tube Ends By Bending Or Straightening (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Micromachines (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Electric Connection Of Electric Components To Printed Circuits (AREA)
  • Manufacturing Optical Record Carriers (AREA)
AT03768879T 2002-11-13 2003-11-12 Ein halterungssystem und ein verfahren zum modulieren von substratformen ATE438197T1 (de)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US10/293,224 US7019819B2 (en) 2002-11-13 2002-11-13 Chucking system for modulating shapes of substrates
US10/316,963 US6980282B2 (en) 2002-12-11 2002-12-11 Method for modulating shapes of substrates
PCT/US2003/036012 WO2004044651A1 (en) 2002-11-13 2003-11-12 A chucking system and method for modulating shapes of substrates

Publications (1)

Publication Number Publication Date
ATE438197T1 true ATE438197T1 (de) 2009-08-15

Family

ID=32314388

Family Applications (3)

Application Number Title Priority Date Filing Date
AT03768879T ATE438197T1 (de) 2002-11-13 2003-11-12 Ein halterungssystem und ein verfahren zum modulieren von substratformen
AT09163924T ATE540427T1 (de) 2002-11-13 2003-11-12 Ein verfahren um formen von substraten zu modulieren
AT10183090T ATE549743T1 (de) 2002-11-13 2003-11-12 Ein lithographiesystem mit einem halterungssystem

Family Applications After (2)

Application Number Title Priority Date Filing Date
AT09163924T ATE540427T1 (de) 2002-11-13 2003-11-12 Ein verfahren um formen von substraten zu modulieren
AT10183090T ATE549743T1 (de) 2002-11-13 2003-11-12 Ein lithographiesystem mit einem halterungssystem

Country Status (9)

Country Link
EP (3) EP2099066B1 (de)
JP (1) JP4391420B2 (de)
KR (1) KR101056505B1 (de)
AT (3) ATE438197T1 (de)
AU (1) AU2003291477A1 (de)
DE (2) DE60328626D1 (de)
MY (1) MY133312A (de)
TW (1) TWI302228B (de)
WO (1) WO2004044651A1 (de)

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US7442336B2 (en) 2003-08-21 2008-10-28 Molecular Imprints, Inc. Capillary imprinting technique
US7077992B2 (en) 2002-07-11 2006-07-18 Molecular Imprints, Inc. Step and repeat imprint lithography processes
US7019819B2 (en) 2002-11-13 2006-03-28 Molecular Imprints, Inc. Chucking system for modulating shapes of substrates
US6871558B2 (en) 2002-12-12 2005-03-29 Molecular Imprints, Inc. Method for determining characteristics of substrate employing fluid geometries
US7452574B2 (en) 2003-02-27 2008-11-18 Molecular Imprints, Inc. Method to reduce adhesion between a polymerizable layer and a substrate employing a fluorine-containing layer
US7122079B2 (en) 2004-02-27 2006-10-17 Molecular Imprints, Inc. Composition for an etching mask comprising a silicon-containing material
EP2177951A1 (de) * 2003-05-14 2010-04-21 Molecular Imprints, Inc. Verfahren, System, Halter und Anordnung zur Übertragung von Vorlagen bei Drucklithografieverfahren
US7157036B2 (en) 2003-06-17 2007-01-02 Molecular Imprints, Inc Method to reduce adhesion between a conformable region and a pattern of a mold
US7019835B2 (en) * 2004-02-19 2006-03-28 Molecular Imprints, Inc. Method and system to measure characteristics of a film disposed on a substrate
US20050275311A1 (en) * 2004-06-01 2005-12-15 Molecular Imprints, Inc. Compliant device for nano-scale manufacturing
US20050270516A1 (en) * 2004-06-03 2005-12-08 Molecular Imprints, Inc. System for magnification and distortion correction during nano-scale manufacturing
JP4574240B2 (ja) 2004-06-11 2010-11-04 キヤノン株式会社 加工装置、加工方法、デバイス製造方法
US7635263B2 (en) 2005-01-31 2009-12-22 Molecular Imprints, Inc. Chucking system comprising an array of fluid chambers
JP3958344B2 (ja) 2005-06-07 2007-08-15 キヤノン株式会社 インプリント装置、インプリント方法及びチップの製造方法
US7927089B2 (en) 2005-06-08 2011-04-19 Canon Kabushiki Kaisha Mold, apparatus including mold, pattern transfer apparatus, and pattern forming method
ATE510241T1 (de) * 2005-12-08 2011-06-15 Molecular Imprints Inc Verfahren zum ausstossen von zwischen einem substrat und einer form befindlichen gas
EP2007566A4 (de) * 2006-04-03 2010-10-13 Molecular Imprints Inc Aufspannsystem mit einer anordnung aus druckkästen
US8215946B2 (en) * 2006-05-18 2012-07-10 Molecular Imprints, Inc. Imprint lithography system and method
EP2024512A4 (de) 2006-06-14 2009-12-09 Artemis Health Inc Verfahren zur diagnose fötaler anomalitäten
NL2003380A (en) * 2008-10-17 2010-04-20 Asml Netherlands Bv Imprint lithography apparatus and method.
US8652393B2 (en) * 2008-10-24 2014-02-18 Molecular Imprints, Inc. Strain and kinetics control during separation phase of imprint process
US8309008B2 (en) 2008-10-30 2012-11-13 Molecular Imprints, Inc. Separation in an imprint lithography process
KR101319353B1 (ko) * 2009-12-23 2013-10-16 엘지디스플레이 주식회사 평판 표시 소자의 제조 장치 및 방법
KR101960362B1 (ko) * 2010-04-27 2019-03-20 캐논 나노테크놀로지즈 인코퍼레이티드 나노임프린트 리소그래피를 위한 기판/주형의 분리 제어
JP6004738B2 (ja) * 2011-09-07 2016-10-12 キヤノン株式会社 インプリント装置、それを用いた物品の製造方法
JP5938218B2 (ja) * 2012-01-16 2016-06-22 キヤノン株式会社 インプリント装置、物品の製造方法およびインプリント方法
JP6252098B2 (ja) 2012-11-01 2017-12-27 信越化学工業株式会社 角形金型用基板
KR102294035B1 (ko) * 2013-11-08 2021-08-27 캐논 나노테크놀로지즈 인코퍼레이티드 향상된 오버레이 보정을 위한 저접촉 임프린트 리소그래피 템플레이트 척킹 시스템
JP6333031B2 (ja) * 2014-04-09 2018-05-30 キヤノン株式会社 インプリント装置および物品の製造方法
CN112445066A (zh) 2014-04-22 2021-03-05 Ev 集团 E·索尔纳有限责任公司 用于压印纳米结构的方法和装置
WO2016135565A1 (en) * 2015-02-23 2016-09-01 M Cubed Technologies, Inc. Film electrode for electrostatic chuck
US11454883B2 (en) * 2016-11-14 2022-09-27 Canon Kabushiki Kaisha Template replication
US10996560B2 (en) * 2017-07-31 2021-05-04 Canon Kabushiki Kaisha Real-time correction of template deformation in nanoimprint lithography
JP7134717B2 (ja) * 2018-05-31 2022-09-12 キヤノン株式会社 インプリント装置、インプリント方法および物品製造方法
CN109895235B (zh) * 2019-03-01 2023-09-15 佛山三劦智能科技有限公司 一种陶瓷自动注浆成型的模具夹具
JP7507641B2 (ja) 2020-09-08 2024-06-28 キヤノン株式会社 成形装置及び物品の製造方法
CN113370078A (zh) * 2021-06-28 2021-09-10 徐州超杰电动车配件有限公司 一种电动车配件用的加工操作台

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US6334960B1 (en) 1999-03-11 2002-01-01 Board Of Regents, The University Of Texas System Step and flash imprint lithography
JP2000340510A (ja) * 1999-05-31 2000-12-08 Matsushita Electric Ind Co Ltd プラズマ処理装置およびプラズマ処理方法
CA2399908A1 (en) * 2000-02-10 2001-08-16 Todd Dickinson Array of individual arrays as substrate for bead-based simultaneous processing of samples and manufacturing method therefor
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Also Published As

Publication number Publication date
WO2004044651B1 (en) 2004-08-05
WO2004044651A1 (en) 2004-05-27
DE20320446U1 (de) 2005-01-27
ATE549743T1 (de) 2012-03-15
ATE540427T1 (de) 2012-01-15
EP2261966A3 (de) 2010-12-29
AU2003291477A1 (en) 2004-06-03
DE60328626D1 (de) 2009-09-10
EP1567913A1 (de) 2005-08-31
AU2003291477A8 (en) 2004-06-03
JP4391420B2 (ja) 2009-12-24
KR20050086591A (ko) 2005-08-30
KR101056505B1 (ko) 2011-08-11
EP2261966B1 (de) 2012-03-14
TWI302228B (en) 2008-10-21
EP2099066B1 (de) 2012-01-04
TW200411340A (en) 2004-07-01
EP2099066A1 (de) 2009-09-09
MY133312A (en) 2007-11-30
EP1567913A4 (de) 2008-08-13
EP1567913B1 (de) 2009-07-29
EP2261966A2 (de) 2010-12-15
JP2006506814A (ja) 2006-02-23

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