ATE444999T1 - Strahlungshärtbare tinte enthaltend einen kondensierten polycyclischen aromatischen photosensibilisator - Google Patents

Strahlungshärtbare tinte enthaltend einen kondensierten polycyclischen aromatischen photosensibilisator

Info

Publication number
ATE444999T1
ATE444999T1 AT06016618T AT06016618T ATE444999T1 AT E444999 T1 ATE444999 T1 AT E444999T1 AT 06016618 T AT06016618 T AT 06016618T AT 06016618 T AT06016618 T AT 06016618T AT E444999 T1 ATE444999 T1 AT E444999T1
Authority
AT
Austria
Prior art keywords
polycyclic aromatic
condensed polycyclic
compound
ink composition
ink containing
Prior art date
Application number
AT06016618T
Other languages
English (en)
Inventor
Tomotaka Tsuchimura
Original Assignee
Fujifilm Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP2005251500A external-priority patent/JP2007063419A/ja
Priority claimed from JP2005256550A external-priority patent/JP4757572B2/ja
Priority claimed from JP2005260685A external-priority patent/JP2007070526A/ja
Application filed by Fujifilm Corp filed Critical Fujifilm Corp
Application granted granted Critical
Publication of ATE444999T1 publication Critical patent/ATE444999T1/de

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D11/00—Inks
    • C09D11/02—Printing inks
    • C09D11/10—Printing inks based on artificial resins
    • C09D11/101—Inks specially adapted for printing processes involving curing by wave energy or particle radiation, e.g. with UV-curing following the printing
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds
    • G03F7/0755—Non-macromolecular compounds containing Si-O, Si-C or Si-N bonds
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
    • Y10T428/24802—Discontinuous or differential coating, impregnation or bond [e.g., artwork, printing, retouched photograph, etc.]

Landscapes

  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Inorganic Chemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Wood Science & Technology (AREA)
  • Organic Chemistry (AREA)
  • Inks, Pencil-Leads, Or Crayons (AREA)
  • Ink Jet Recording Methods And Recording Media Thereof (AREA)
AT06016618T 2005-08-31 2006-08-09 Strahlungshärtbare tinte enthaltend einen kondensierten polycyclischen aromatischen photosensibilisator ATE444999T1 (de)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2005251500A JP2007063419A (ja) 2005-08-31 2005-08-31 インク組成物、インクジェット記録方法、印刷物、平版印刷版の製造方法、及び、平版印刷版
JP2005256550A JP4757572B2 (ja) 2005-09-05 2005-09-05 インク組成物、インクジェット記録方法、印刷物、平版印刷版の製造方法、及び、平版印刷版
JP2005260685A JP2007070526A (ja) 2005-09-08 2005-09-08 インク組成物、インクジェット記録方法、印刷物、平版印刷版の製造方法、及び、平版印刷版

Publications (1)

Publication Number Publication Date
ATE444999T1 true ATE444999T1 (de) 2009-10-15

Family

ID=37649484

Family Applications (1)

Application Number Title Priority Date Filing Date
AT06016618T ATE444999T1 (de) 2005-08-31 2006-08-09 Strahlungshärtbare tinte enthaltend einen kondensierten polycyclischen aromatischen photosensibilisator

Country Status (4)

Country Link
US (1) US7935741B2 (de)
EP (1) EP1760121B1 (de)
AT (1) ATE444999T1 (de)
DE (1) DE602006009595D1 (de)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2011062995A (ja) * 2009-09-18 2011-03-31 Seiko Epson Corp 液体吐出装置

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4233421A (en) * 1979-02-26 1980-11-11 Minnesota Mining And Manufacturing Company Fluoroelastomer composition containing sulfonium curing agents
US4229274A (en) * 1979-02-26 1980-10-21 Ppg Industries, Inc. Ultraviolet light curable compositions for producing coatings of low gloss
JPS6071631A (ja) * 1983-09-29 1985-04-23 Toshiba Corp 光硬化性組成物
US5691100A (en) * 1992-12-25 1997-11-25 Hoechst Japan Limited Pattern forming material including photoacid and photobase generators for large exposure latitude
US6313188B1 (en) * 1996-09-19 2001-11-06 Nippon Soda Co., Ltd. Photocationically polymerizable composition comprising a polycyclic aromatic compound
JP2003326691A (ja) * 2002-05-09 2003-11-19 Konica Minolta Holdings Inc 画像記録方法、エネルギー線硬化インク及び画像記録装置
JP4058620B2 (ja) 2002-08-30 2008-03-12 信越化学工業株式会社 ダイカスト用水性離型剤組成物
JP4404540B2 (ja) * 2002-11-26 2010-01-27 富士フイルム株式会社 インクジェット用インク、インクジェット記録方法およびインクジェット用インクの製造方法
US20040121399A1 (en) * 2002-12-20 2004-06-24 International Business Machines Corporation Substrate bound linker molecules for the construction of biomolecule microarrays
JP4595311B2 (ja) * 2003-11-06 2010-12-08 コニカミノルタエムジー株式会社 活性光線硬化型インクジェットインク組成物、それを用いた画像形成方法及びインクジェット記録装置
US7262228B2 (en) * 2003-11-21 2007-08-28 Curators Of The University Of Missouri Photoinitiator systems with anthracene-based electron donors for curing cationically polymerizable resins
US20050260522A1 (en) * 2004-02-13 2005-11-24 William Weber Permanent resist composition, cured product thereof, and use thereof
DE602005004320T2 (de) * 2004-03-29 2009-01-08 Fujifilm Corp. Lithographischer Druckplattenvorläufer und einen solchen verwendendes lithographisches Druckverfahren
JP2006257248A (ja) * 2005-03-17 2006-09-28 Fuji Photo Film Co Ltd インク組成物、インクジェット記録方法、印刷物、平版印刷版の製造方法及び平版印刷版

Also Published As

Publication number Publication date
EP1760121B1 (de) 2009-10-07
US20070048506A1 (en) 2007-03-01
EP1760121A1 (de) 2007-03-07
DE602006009595D1 (de) 2009-11-19
US7935741B2 (en) 2011-05-03

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